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1. 发明专利

JPH1055993A SEMICONDUCTOR ELEMENT MANUFACTURING WASHING LIQUID AND MANUFACTURE OF SEMICONDUCTOR ELEMENT USING IT 失效
公开(公告)号：JPH1055993A
公开(公告)日：1998-02-24
申请号：JP21121796
申请日：1996-08-09
申请人： HITACHI LTD , TEXAS INSTRUMENTS JAPAN , MITSUBISHI GAS CHEMICAL CO
发明人： TORII YOSHIMI , SASABE SHUNJI , KOJIMA MASAYUKI , USUAMI KAZUHISA , TOKUNAGA TAKAFUMI , HARA KAZUSATO , OHIRA YOSHIKAZU , MATSUI TSUYOSHI , GOTOH HIDETO , AOYAMA TETSUO , HASEMI RYUJI , IKEDA HIDETOSHI , ISHIHARA FUKUSABURO , SOTOAKA RYUJI
IPC分类号： C11D7/60 , G03F7/42 , H01L21/02 , H01L21/302 , H01L21/304 , H01L21/3065 , H01L21/3213
摘要： PROBLEM TO BE SOLVED: To easily remove a polymer accumulated at dry etching process without corroding a metal film by using an aqueous solution containing specified quaternary ammonium salt, fluorine-containing compound, water soluble or water-miscible organic solvent, inorganic acid and organic acid. SOLUTION: An aqueous solution, expressed with a formula [(R )3 N-R ] aX (R is an alkyl group of carbon number 1-4, 3R s may be the same or different from one another, and R is an alkyl group of carbon number 1-4 or hydroxy alkyl group. X is inorganic or organic anion, and (a) is valence of the anion.), containing quaternary ammonium slat, fluorine-containing compound such as hydrofluoric acid and ammonium fluoride, water soluble or water- miscible organic solvent, inorganic acid and organic acid, is used. Thereby an accumulated polymer generated at dry etching process is easily removed without corroding a metal film.

2. 发明专利

JPH11323394A DETERGENT FOR PREPARING SEMICONDUCTOR ELEMENT AND PREPARATION OF SEMICONDUCTOR ELEMENT USING SAME 失效
公开(公告)号：JPH11323394A
公开(公告)日：1999-11-26
申请号：JP13222898
申请日：1998-05-14
申请人： TEXAS INSTRUMENTS JAPAN , MITSUBISHI GAS CHEMICAL CO
发明人： GOTO HIDETO , MATSUI TAKESHI , NIBUYA TAKAYUKI , AOYAMA TETSUO , MARUYAMA TAKEHITO , KARITA TETSUYA , ABE KOJIRO , ISHIHARA FUKUSABURO , SOTOAKA RYUJI
IPC分类号： C11D7/10 , C11D3/02 , C11D3/20 , C11D3/33 , C11D7/32 , C11D7/50 , C11D7/60 , C11D11/00 , H01L21/02 , H01L21/302 , H01L21/304 , H01L21/3065 , H01L21/311 , H01L21/3213
摘要： PROBLEM TO BE SOLVED: To obtain a detergent capable of effectively removing deposited polymers formed on dry-etching of a via hole and metal wiring formed on a semiconductor substrate in a process for the production of semiconductor elements, which comprises an aqueous solution containing a fluorine-containing compound, a borate salt and a water-soluble organic solvent. SOLUTION: For example, there are employed ammonium fluoride as a fluorine-containing compound (A), ammonium pentaborate as a borate salt (B) and dimethyl formamide as a water-soluble organic solvent (C). Usually the titled detergent comprises 0.1-15 wt.% of the component A, 0.1-15 wt.% of the component B and 5-80 wt.% of the component C. Further is added a quaternary ammonium salt of formula I or an ammonium salt and/or an amine salt of an organic carboxylic acid of formula II. In the formulae, R is 1-4C alkyl; R is 1-4C alkyl or hydroxyalkyl; X is an inorganic or organic anion; Z is H or 1-18C hydrocarbon; R is 1-4C alkyl or 2-4C hydroxyalkyl; n is 0-3; and m is 1-4.

3. 发明专利

JPH08268807A FUNGICIDAL DISINFECTANT FOR BARN AND HENHOUSE 失效
公开(公告)号：JPH08268807A
公开(公告)日：1996-10-15
申请号：JP7165095
申请日：1995-03-29
申请人： MITSUBISHI GAS CHEMICAL CO
发明人： YOSHIZAWA SHIN , NITO SHOICHI , ISHIHARA FUKUSABURO
IPC分类号： A01N25/02 , A01N25/30 , A01N37/16 , A01N37/44 , A01N59/00
摘要： PURPOSE: To obtain a fungicidal disinfectant for a barn and a henhouse compris ing a percarboxylic acid as an active ingredient, preferably used in the form of an aqueous solution, showing sufficiently disinfecting and sterilizing effect on ordinary bacteria, being safe, stable and inexpensive. CONSTITUTION: This fungicidal disinfectant for a barn and a henhouse is obtained by using an aqueous solution containing 0.04-40wt.% of a percarboxylic acid (e.g., performic acid, peracetic acid, perpropionic acid, etc.). The fungicidal disinfectant for a barn and a henhouse comprises the aqueous solution containing 0.04-40wt.% of the percarboxylic acid and an aqueous solution containing 0.001-40wt.% of an amphoteric surfactant and shows excellent destroying effect on oocyst. An aminocarboxylic acid or its salt or imidazolium betaine is preferable as the amphoteric surfactant. The fungicidal disinfectant for the barn and the henhouse comprises also the aqueous solution containing 0.04-40wt.% of the percarboxlic acid and an aqueous solution containing 0.001-40wt.% of a mineral acid (especially preferably hydrochloric acid) and shows excellent destroying power on oocyst. Since the fungicidal disinfectant has low toxicity, it has excellent adaptability to environment.

4. 发明专利

JP2002141666A MANUFACTURING METHOD FOR MULTI-LAYERED COPPER PLATE 失效
公开(公告)号：JP2002141666A
公开(公告)日：2002-05-17
申请号：JP2000333694
申请日：2000-10-31
申请人： MITSUBISHI GAS CHEMICAL CO
发明人： ISHIZUKA KOICHI , KOGURE NAOKI , KATO SADAHIRO , SOTOAKA RYUJI , ISHIHARA FUKUSABURO , KAWAMURA TOSHIMITSU
IPC分类号： C23F1/18 , H05K3/26 , H05K3/42 , H05K3/46
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method for a multi-layered copper plate which can efficiently etch away projecting copper around and in a small- diameter hole of the multi-layered copper plate and make external layer copper foil thin by etching. SOLUTION: The projection copper around and in the small-diameter hole is etched away by using a solution containing 0.5 to 10 wt.% hydrogen peroxide, 1 to 15 wt.% sulfuric acid, at least one of 0.001 to 1 wt.% tetrasol and a tetrasol derivative, and 0.005 to 0.5 wt.% phenyl uric acid at need. The surface of the copper foil is uniformly etched to make the copper thin.

5. 发明专利

JPH10260172A DETECTOR FOR CONCENTRATION OF TRACE HYDROGEN PEROXIDE 失效
公开(公告)号：JPH10260172A
公开(公告)日：1998-09-29
申请号：JP6641397
申请日：1997-03-19
申请人： MITSUBISHI GAS CHEMICAL CO
发明人： YOSHIZAWA SHIN , ISHIHARA FUKUSABURO , YAMAGUCHI YOSHIMASA
IPC分类号： G01N31/00 , G01N31/22
摘要： PROBLEM TO BE SOLVED: To obtain a detector high in sensitivity and simple by a method wherein a solid coloring agent which is composed of phenolphthalin, of a compound which generates copper ions when dissolved in water and of an alkaline compound is sealed in a translucent container from which oxygen and carbon dioxide are removed. SOLUTION: As phenophthalin, its salt with an alkaline compound is used in an amount which amounts to about 3 to 30μmol/l when a sample is dissolved. As a compound which generates copper ions when dissolved in water, copper sulfate, copper chloride, copper formate or the like is used in an amount which amounts to about 0.03 to 2.8μmol/l of copper ions when the sample is dissolved. As an alkaline compound, lithium hydroxide, sodium hydroxide, potassium hydroxide or the like is used in an amount which amounts to a pH of about 10 to 13 when the sample is dissolved. A coloring agent which is composed of them is sealed into the inside of a glass pipe 1 in the order of glass wool 2, a filtering material 3, glass wool 4 and the coloring agent 5, and a detector is formed. The sample is sucked into the detector so as to come into contact with the coloring agent. Then, when hydrogen peroxide is contained in the sample, it is colored to be a reddish purple color, and it is compared with a color reference so as to be determined quantitatively.

6. 发明专利

JPH1167703A CLEANING SOLVENT FOR MANUFACTURING SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR ELEMENT USING THE SAME 失效
公开(公告)号：JPH1167703A
公开(公告)日：1999-03-09
申请号：JP22641097
申请日：1997-08-22
申请人： MITSUBISHI GAS CHEMICAL CO
发明人： SOTOAKA RIYUUJI , ISHIHARA FUKUSABURO , AOYAMA TETSUO
IPC分类号： G03F7/42 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To remove the deposited polymer in dry etching readily without corroding an SOG film and a metal film by using aqueous solution including boric acid, boric acid ester or phosphoric acid, flourine compound and aqueous or water miscible flux. SOLUTION: The cleaning solvent for semiconductor manufacturing comprising aqueous solution including boric acid, boric acid ester or phosphoric acid, flourine compound and aqueous or water miscible organic flux is used, and the deposited polymer in dry etching is removed. Thus a semiconductor element is formed. In this way, in the manufacturing process of the semiconductor element the removal of the deposited polymer in the dry etching, especially, the removal of the deposited polymer, which is formed and attached in and around a via-hole, can be performed without corroding an SOG film and a metal film. Therefore, the formation of the clean wiring can be performed, and the semiconductor element having high quality and high reliability is obtained.

7. 发明专利

JPH1137991A COLOR FORMER FOR ANALYZING HYDROGEN PEROXIDE AND SIMPLIFIED QUANTITATIVE DETERMINATION METHOD 失效
公开(公告)号：JPH1137991A
公开(公告)日：1999-02-12
申请号：JP19127597
申请日：1997-07-16
申请人： MITSUBISHI GAS CHEMICAL CO
发明人： TOSEN EMI , KIMURA YOSHIYA , ISHIHARA FUKUSABURO , YAMAGUCHI YOSHIMASA
IPC分类号： G01N31/00 , G01N31/22
摘要： PROBLEM TO BE SOLVED: To easily measure the hydrogen peroxide concentration of water, such as the sea water, etc., in a short time by using a solid composition composed of a compound which generates iodine ions when the compound solves in water, an acidic compound, and a molybdic acid compound. SOLUTION: A color former for analyzing hydrogen peroxide is prepared by putting prescribed amounts of, for example, potassium iodide, citric acid, and hexaammonium heptamolybdate tetrahydrate in a light shielding container using an aluminum-foil composite film, etc., in a nitrogen substituting atmosphere, etc., shielded from oxygen and moisture and sealing the container by fusion. When the hydrogen peroxide concentration of water is measured at the time of using the hydrogen peroxide as a disinfectant, etc., the sample is dissolved by adding the color former from the light shielding container. When the sample contains hydrogen peroxide, the sample is colored in brown and the hydrogen oxide concentration can be measured after a prescribed period of time by comparing the color with color samples. It is also possible to measure the hydrogen oxide concentration by coloring the sample water in a graduated measuring cylinder, etc., and comparing the transparency of the sample water measured by putting a labeled plate in the water with that of a standard sample.

8. 发明专利

JPH1096720A REAGENT FOR ESTIMATING AMOUNT OF TRACE HYDROGEN PEROXIDE 失效
公开(公告)号：JPH1096720A
公开(公告)日：1998-04-14
申请号：JP25307396
申请日：1996-09-25
申请人： MITSUBISHI GAS CHEMICAL CO
发明人： YOSHIZAWA SHIN , ISHIHARA FUKUSABURO , YAMAGUCHI YOSHIMASA
IPC分类号： G01N31/00 , G01N31/22
摘要： PROBLEM TO BE SOLVED: To estimate easily amount of trace hydrogen peroxide in water or sea, by using as a reagent a solid compound consisting of phenolphthalein with specified concentration, a chemical compound which generates copper ion in water, and alkali component. SOLUTION: The amount of phenolphthalein is desired such that its concentration is 0.003-30mol/l in sample solution. Chemical compound which generates copper ions in water solution condition is such as sulfuric acid copper or copper chloride, but any compound is not defined as used. Its amount is desired such that the concentration for copper ion is 0.03-2.8mol/l in sample solution. Small amount of the compound causes the reaction to delay, and large amount of it causes the hydrogen peroxide to resolve. As an alkali component, hydroxide of alkali metal like sodium hydroxide or a compound which generates the hydroxide of alkali metal in its solution is desired. The coloring reagent is used in the form of powder, tablet, or capsule, and can easily be treated if a compound which does not affect its coloring is added as an extender.

9. 发明专利

JPS51108030A 55 HIDOROKISHIISOFUTARUSANNO SEIZOHO 失效
公开(公告)号：JPS51108030A
公开(公告)日：1976-09-25
申请号：JP3206775
申请日：1975-03-17
申请人： MITSUBISHI GAS CHEMICAL CO
发明人： AOYAMA TETSUO , ISHIHARA FUKUSABURO
IPC分类号： C07C65/03 , B01J23/00 , B01J23/32 , B01J23/74 , B01J27/00 , B01J27/08 , B01J31/00 , B01J31/04 , C07B61/00 , C07C51/00 , C07C67/00

10. 发明专利

JP2002114993A CLEANING AGENT AND CLEANING METHOD 失效
公开(公告)号：JP2002114993A
公开(公告)日：2002-04-16
申请号：JP2000309171
申请日：2000-10-10
申请人： TOKYO ELECTRON LTD , MITSUBISHI GAS CHEMICAL CO
发明人： GOTO HIDETO , NIUYA TAKAYUKI , MORI HIROYUKI , MATSUNAGA HIROTSUGU , ISHIHARA FUKUSABURO , KIMURA YOSHIYA , SOTOAKA RYUJI , GOTO TAKUYA , AOYAMA TETSUO , ABE KOJIRO
IPC分类号： B08B3/08 , B08B3/00 , C11D1/00 , C11D3/32 , C11D3/34 , C11D3/43 , C11D11/00 , C11D17/08 , H01L21/02 , H01L21/304 , H01L21/311 , H01L21/461
摘要： PROBLEM TO BE SOLVED: To provide a cleaning agent and a cleaning method which can easily remove the substances firmly attached to the surface of an article to be treated without damaging the article. SOLUTION: The cleaning agent comprises a surface active agent and an organic solvent, and the cleaning method comprises dashing the cleaning agent over the surface of an article to be treated at a high speed to clean the surface.

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