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1. 发明专利

JPS57138757A CORRECTION OF DEFLECTION DISTORTION 失效
公开(公告)号：JPS57138757A
公开(公告)日：1982-08-27
申请号：JP2432781
申请日：1981-02-23
申请人： HITACHI LTD , NIPPON TELEGRAPH & TELEPHONE
发明人： SAITOU NORIO , OZASA SUSUMU , SHIMAZU NOBUO , OOKUBO TSUNEO
IPC分类号： H01J37/147 , H01J37/153 , H01J37/304 , H01J37/305 , H01L21/027
摘要： PURPOSE:To shorten time required for the calibration of the deflection distortion by using a large area deflector sufficiently calibrated instead of moving a stage, in order to obtain the calibrated value of the deflection distortion of a small area deflector. CONSTITUTION:A picturing area provided on a state 3 is divided into several small areas 11. A deflection toward the center (X, Y) of each small area 11 is performed with an electromagnetic deflector 4 (large area deflector), while a deflection toward the inner part (x, y) of each small area 11 is performed with an electrostatic deflector 5 (small area deflector). The calibration of the deflection distortion of the deflector 4 is carried out by moving a mark 18 formed on the state 3 over each small area 11 so as to adjust electron beams on the mark 18. On the other hand, the calibration of the deflection distortion of the deflector 5 is carried out by deflecting an electron beam by means of the calibrated deflector 4 by (X+ or -a, Y+ or -a)(a equals half the length of the side of the small area 11) so as to adjust the electron beam on the mark 18. Consequently, any movement of the stage 13 becomes unnecessary for the calibration of the deflector 5, and the calibration time can be shortened.

2. 发明专利

JPS57210549A METHOD OF CORRECTION ATTENDANT ON DEFLECTION 失效
公开(公告)号：JPS57210549A
公开(公告)日：1982-12-24
申请号：JP9392081
申请日：1981-06-19
申请人： HITACHI LTD , NIPPON TELEGRAPH & TELEPHONE
发明人： KURODA KATSUHIRO , MIYAZAKI MASARU , SHIMAZU NOBUO
IPC分类号： H01J37/04 , H01J37/147 , H01L21/027
摘要： PURPOSE:To correct various aberrations attendant on deflection, by arranging at least eight marks in the vicinity of a deflecting field on the surface of irradiation, while irradiating a charged corpuscular beam to these marks, in reference to a charged corpuscular beam allied unit. CONSTITUTION:Marks 1-8 are added to the vicinity of a deflecting field in advance. When a charged corpuscular beam 11 is scanned on each mark, a secondary charged corpuscular beam is generated from the sample face and the incident beam falls in a detector 16. At this moment, the generating value of the charged corpuscular beam from the top of the mark and from the outside of it is different so that if the value is checked by the detector 16, relationships between this signal value to a deflector 14 and the mark position and the converged size of the charged corpuscular beam, etc., are made out. This operation is carried out by a measuring system 17. For example, each factor is found by a factorial determination system 18 with a minimal square-law, etc. On a basis of this factor, when deflection is carried out at a desirable position, a correction signal 20 is to be found by this factor and accurate correction comes achieved by the detector 21.

3. 发明专利

JPS5541736A DETECTION OF MARK LOCATION 失效
公开(公告)号：JPS5541736A
公开(公告)日：1980-03-24
申请号：JP11462578
申请日：1978-09-20
申请人： HITACHI LTD , NIPPON TELEGRAPH & TELEPHONE
发明人： KURODA KATSUHIRO , TAKAGI KIICHI , SHIMAZU NOBUO
IPC分类号： H01L21/027 , H01J37/304
摘要： PURPOSE:To provide a device for detecting the location of a mark on a sample surface with ease and accuracy by scanning electron beams to the mark in accordance with certain scanning speed signals coupled with sine waves, and applying synchronous detection to the detecting output in consideration of the sine waves. CONSTITUTION:Electron beams 1 are scanned over a mark 3 provided on a sample surface 2, thereby to detect the location of the mark. In this device, the scanning of electron beams 1 is conducted by use of a detecting apparatus besides a signal oscillator 6 comprising a lamp generator and a sine wave generator, while the reflecting or passing electrons of the beams 1 are detected by use of an electron beam detector 7 or 8. With the detecting signals having passed an amplifier 9 and the sine wave phase at the signal oscillator 6 being adjusted by a changer 10, synchronous detection is carried out by a detector 11. Following the synchronous detection, observation is conducted by an observation apparatus 13 by way of a smoothing circuit 12. Thus, the mark location on the sample can be detected easily and accurately.

4. 发明专利

JPH0729814A MASK SUBSTRATE HOLDING MECHANISM 失效
公开(公告)号：JPH0729814A
公开(公告)日：1995-01-31
申请号：JP19184693
申请日：1993-07-07
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： KUNIOKA TATSUYA , SHIMAZU NOBUO , SHIMIZU AKIRA
IPC分类号： G03F1/22 , G03F7/20 , H01L21/027 , H01L21/68 , H01L21/683 , G03F1/16
摘要： PURPOSE:To provide a mask substrate holding mechanism in which three conditions of suppressed deformation, short thermal time constant, and rigid fixing are satisfied simultaneously while enhancing the description accuracy and throughput. CONSTITUTION:A mask substrate 2 is suction held by means of three electrostatic chucks 4 having same height. The electrostatic chucks 4 are disposed at positions where the deformation due to the empty weight of the mask substrate 2 is minimized. More specifically, the electrostatic chucks 4 are disposed on a circle with center matching the center O of the mask substrate 2.

5. 发明专利

JPH0531297B2 失效
公开(公告)号：JPH0531297B2
公开(公告)日：1993-05-12
申请号：JP4806985
申请日：1985-03-11
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： YOSHIZAWA MASAHIRO , KIKUCHI AKIRA , WADA YASUSHI , FUJINAMI AKIHIRA , SHIMAZU NOBUO
IPC分类号： H01J37/28 , G01R31/26 , G01R31/302 , H01L21/66

6. 发明专利

JPS61283121A CHARGED BEAM PROJECTING EXPOSURE DEVICE 失效
公开(公告)号：JPS61283121A
公开(公告)日：1986-12-13
申请号：JP12432385
申请日：1985-06-10
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： SHIMAZU NOBUO
IPC分类号： H01J37/20 , H01J37/305 , H01L21/027 , H01L21/30
摘要： PURPOSE:To enable accurately the contracted image of a mask pattern to be transferred on a sample surface at high speed by providing an electro-optical system having a mask stage for placing a mask, a sample stage for placing a sample and a unit for scanning a charged beam on the mask. CONSTITUTION:An electron beam 21 from an electron gun 20 is emitted through emitting lenses 22, 23, a beam forming aperture 24 to a mask 6 on a mask stage 26. The electron beam image of the mask 6 is projected as a contracted image on a sample 14 through a contracting projection lens 29 to print (draw) a pattern. A large deflector 25 scans a beam on the mask 6. The emitting position is corrected by a small deflector 27 in the scanning step. The deflector 27 is used to small-deflect to scan the mask. The pattern is drawn on the entire surface of the sample while moving the stage 26 and a sample stage 31. In this case, the moving error is corrected by information of a mask stage laser length measuring unit 46 and a sample stage laser length measuring unit 48.

7. 发明专利

JPS60180133A ELECTRONIC DEVICE TEST BY CHARGED BEAM 失效
公开(公告)号：JPS60180133A
公开(公告)日：1985-09-13
申请号：JP3435984
申请日：1984-02-27
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： KIKUCHI AKIRA , WADA YASUSHI , FUJINAMI AKIHIRA , SHIMAZU NOBUO
IPC分类号： H01J37/28 , G01R31/302 , H01J37/00 , H01L21/66
摘要： PURPOSE:To realize fault detection and characteristic evaluation of electronic device by irradiation of charged beam obtained by accelerating a primary charged beam with a primary and a secondary acceleration voltage sources in such a way as changing a voltage value and detection of voltage level at the irradiation point with a secondary electron detector. CONSTITUTION:A first point A and a second point B on a conductor pattern 5 which is a part of an electronic device are respectively irradiated with a first and a second charged beams 1, 2 obtained by accelerating a primary charged beam with a first and a second acceleration voltage sources 21, 22 in such a way as varying a voltage value. When an acceleration voltage of said first charged beam 1 is set for delta>1 or delta

8. 发明专利

JPS60119721A CORRECTION OF PROJECTING POSITION AT CHARGED BEAM EXPOSURE DEVICE 失效
公开(公告)号：JPS60119721A
公开(公告)日：1985-06-27
申请号：JP22679583
申请日：1983-12-02
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： MOROSAWA TETSUO , SHIMAZU NOBUO , SHIBAYAMA AKINORI , FUJINAMI AKIHIRA
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
摘要： PURPOSE:To perform pattern drawing in a high speed and moreover with high precision when a pattern is to be drawn on a sample using a charged beam by transferring continuously the sample by a method wherein the transferred quantity of the sample during the period from the time when the position of the sample is detected up to the time when the beam is projected actually is added to pattern data to be applied to a deflector. CONSTITUTION:A deflector 2 and a stage 3 put on with a sample 5 to be exposed are provided in an electrooptic lens barrel 1, data are read from a pattern memory 7 according to the command of a control computer 6, and the distortion of the sample 5 is corrected by a correction computing circuit 8. Then the position of the sample 5 is corrected by a position correcting circuit 9, the result thereof is sent to a correction computing circuit 12 through a displacement quantity calculating circuit 10 and an adder 11, and output therefrom is applied to the deflector 2 through a D/A converter 13 and an amplifier 14. While, the stage 3 is controlled by a stage control circuit 15 and a stage driving circuit 16 connected to the computer 6, and the position thereof is measured successively by a laser measuring machine 17. At this construction, signal processing time from the circuit 12 up to the deflector 2 is set previously in the circuit 10.

9. 发明专利

JPS5844718A EXPOSURE SYSTEM BY CHARGED BEAM 失效
公开(公告)号：JPS5844718A
公开(公告)日：1983-03-15
申请号：JP14342681
申请日：1981-09-11
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： SHIMAZU NOBUO , IDO SATOSHI , TSUYUZAKI HARUO
IPC分类号： H01L21/027 , H01J37/302 , H01L21/30
摘要： PURPOSE:To improve productivity by driving a base by a command set in response to drawing and a simple feeding mode, adding the quantity of the beams deflected to a speed command and drawing information. CONSTITUTION:A switch SW is at OFF in a simple feeding mode forwarding the base 6 to the position of the starting of drawing, and driven DR by signals from a D/A converter in response to the information of a memory MS, and the base 6 is sent at predetermined high speed V1. The mode is changed into a drawing mode at the point of time t1, a control section CT turns the SW ON, deflection signals are added to speed signals from the D/A converter, the speed of the base reaches speed V2 corresponding to the quantity of the beams 3 deflected, and the prescribed density of projection is kept in response to the positions of projection. Drawing is completed at the point of time t2, the SW is turned OFF, the base 6 starts movement at V4=V1 in the +X direction through the state of suspension at speed V3 by a command corresponding to the information of the memory MS, and the same speed change as V2 and V3 is repeated. Accordingly, information can be drawn at the optimum movement-speed at all times by simple constitution, and productivity is largely improved.

10. 发明专利

JPS5654744A PREVENTIVE DEVICE AGAINST CONTAMINATION ON ELECTRON OPTICS EQUIPMENT 失效
公开(公告)号：JPS5654744A
公开(公告)日：1981-05-14
申请号：JP13117579
申请日：1979-10-11
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： SHIMAZU NOBUO , MATSUDA KOREHITO
IPC分类号： H01J37/20 , H01J37/02 , H01L21/027
摘要： PURPOSE:To keep clean a part on which the contamination is apt to occur by keeping the part at a predetermined temperature or higher. CONSTITUTION:An iris diaphragm 4 is kept clean of contamination by heating it to a predetermined temperature, for example 500 deg.C. A driver 10 operates responding to a temperature detected by thermo-sensor 9, and a heater 11 is controlled at the determined temperature by the driver 10. The heat is transmitted quickly to a jig 3 and the iris diaphragm 4 through a heat pipe 1 for heating, and heats the instrument 3 and the iris diaphragm 4 to the predetermined temperature.

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