专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPS6046401B2 失效
公开(公告)号：JPS6046401B2
公开(公告)日：1985-10-16
申请号：JP2080179
申请日：1979-02-26
申请人： HITACHI LTD
发明人： NAKANO TOSHIO , KANEKO TADAO , HASHIMOTO MICHIAKI , HATANO YUKIO , MATSUMARU HARUO , SASANO AKIRA , MARUYAMA EIICHI
IPC分类号： G02B5/20 , H01L27/14 , H01L27/146

2. 发明专利

JPS55104312A RADIATIONNSENSITIVE MACROMOLECULAR 失效
公开(公告)号：JPS55104312A
公开(公告)日：1980-08-09
申请号：JP1037879
申请日：1979-02-02
申请人： HITACHI LTD
发明人： HATANO YUKIO , SHIRAISHI HIROSHI , TANIGUCHI MORIO , HORIGOME SHINKICHI , NONOGAKI SABUROU
IPC分类号： G03F7/038 , C08F20/00 , C08F20/32 , C08F220/00 , C08F220/32 , C08F220/42 , C08F220/44 , H01L21/302
摘要： PURPOSE:To provide a negative type variation-sensitive macromolecular material, which exhibits high sensitiveness, high resolution and short curing time, consisting of glycidyl methacrylate-acrylonitrile copolymer contg. acrylonitrile in a specific proportion. CONSTITUTION:32-80mol%, preferably 35-60mol% of acrylonitrile is copolymerized with 68-20mol%, preferably 65-40mol% of glycidyl methacrylate in the atmosphere to inert gas and in the presence of a polymn. initiator to obtain a radiation-sensitive mcromolecular material consisting of glycidyl methacrylate-acrylonitrile copolymer having a weight-average MW of 1000-5,000,000, preferably 10,000-500,000.

3. 发明专利

JPS5359367A FORMATION OF ELECTRON BEAM RESIST IMAGE 失效
公开(公告)号：JPS5359367A
公开(公告)日：1978-05-29
申请号：JP13403976
申请日：1976-11-10
申请人： HITACHI LTD , NIPPON TELEGRAPH & TELEPHONE
发明人： HATANO YUKIO , NONOGAKI SABUROU
IPC分类号： G03F7/039 , G03F7/00 , G03F7/038 , G03F7/30 , G03F7/32 , H01L21/027 , H01L21/312 , H05K3/06
摘要： PURPOSE:To give a higher sensitivety than the usual and develop clearly with the developer where negative type electron beam sensitive epoxy high polymer includes acetic ester.

7. 发明专利

JPH0582561B2 失效
公开(公告)号：JPH0582561B2
公开(公告)日：1993-11-19
申请号：JP10761889
申请日：1989-04-28
申请人： HITACHI LTD
发明人： NAKANO TOSHIO , KANEKO TADAO , HASHIMOTO MICHIAKI , HATANO YUKIO , MATSUMARU HARUO , SASANO AKIRA , MARUYAMA EIICHI
IPC分类号： G02B5/20 , H01L27/14 , H04N5/335 , H04N5/376 , H04N9/07

8. 发明专利

JPS6329241B2 失效
公开(公告)号：JPS6329241B2
公开(公告)日：1988-06-13
申请号：JP8235185
申请日：1985-04-19
申请人： HITACHI LTD
发明人： NAKANO TOSHIO , KANEKO TADAO , HASHIMOTO MICHIAKI , HATANO YUKIO , MATSUMARU HARUO , SASANO AKIRA , MARUYAMA EIICHI
IPC分类号： H01L27/14 , G02B5/20 , H01L31/0216 , H04N9/07

10. 发明专利

JPS5639538A PATTERN FORMING METHOD 失效
公开(公告)号：JPS5639538A
公开(公告)日：1981-04-15
申请号：JP11418579
申请日：1979-09-07
申请人： HITACHI LTD
发明人： IWAYAGI TAKAO , HATANO YUKIO , KOBASHI TAKAHIRO , NONOGAKI SABUROU
IPC分类号： G03F7/20 , G03F7/008 , H01L21/027
摘要： PURPOSE:To form a minute pattern of several mum width by using a specified bisazide compound having photosensitivity to ultraviolet light of 200-300nm shorter wavelengths as a component of a photosensitive composition. CONSTITUTION:A photosensitive composition consisting of a bisazide compound represented by the formula (where A is O, S, CH2, CH2CH2, SO2 or S2, X is H or N3, and Z is N3 and H or Cl when X is H and N3, respectively) and a high molecular compound which is crosslinked with the photoreaction product of the bisazide compound is applied to a substrate and patternwise exposed to ultraviolet light of 200-300nm shorter wavelengths. Thus, for example, patterns of 1mum width can be formed at 2mum intervals. The above-mentioned high molecular compound includes natural rubber, modified rubber, synthetic rubber and synthetic high molecular compounds such as polystyrene and nylon. Especially, a photosensitive composition contg. a bisazide compound, as a crosslinking agent, in which A in the formula is SO2 shows no oxygen desensitization.

你已经成功收藏专利！

检索式保存成功!

IPRDB