专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPS63131115A SCANNING LASER MICROSCOPE 失效
公开(公告)号：JPS63131115A
公开(公告)日：1988-06-03
申请号：JP27653886
申请日：1986-11-21
申请人： HITACHI LTD
发明人： KIMURA SHIGEJI , MUNAKATA TADASUKE , HASE SHINOBU
IPC分类号： G02B21/00 , G02B27/00 , G02B27/09
摘要： PURPOSE:To obtain a confocal focus type microscope which has an easy-to- position mechanism by using two slits and lenses to constitute an optical system which serves as a pinhole. CONSTITUTION:Projection light 2 from a laser 1 is converged by a lens 31 and a sample 4 is placed on the image plane of a point source by a lens 32 and scanned by a stage 71. The transmitting light of the sample 4 is converged by a lens 33 on a slit 81. The slit 81 is movable by a stage 72 and the passing light of the slit 81 is converged again on a slit 82 by a lens 34. The slits 81 and 82 are so positioned that the output of a photodetector 6 is maximum. The signal from the photodetector 6 is displayed after being written in an image display device 8 according to the position signal of the sample from the stage 71.

2. 发明专利

JPS60154634A APPARATUS FOR DETECTING PATTERN DEFECT 失效
公开(公告)号：JPS60154634A
公开(公告)日：1985-08-14
申请号：JP1003084
申请日：1984-01-25
申请人： HITACHI LTD
发明人： KIMURA SHIGEJI , SUDA TADASHI , HASE SHINOBU
IPC分类号： G01N21/88 , G01N21/956 , H01L21/66
摘要： PURPOSE:To remove error signals due to rounding caused by the limit of lighography in an apparatus for detecting pattern defects with the use of reflection diffraction light, by judging presence of defects according to the relation in amplitude between specific two signals. CONSTITUTION:The surface of a substrate 7 is scanned with laser lights and the light reflected and diffracted by a fine pattern is detected with light detectors 10-25. If the pattern has any defect or rounding, the reflection diffraction light becomes stronger in the directions of 22.5 deg.-157.5 deg. (abnormal directions) which are intermediate directions of 0 deg., 45 deg., 90 deg. and 135 deg. (normal directions). Four signals of the abnormal directions are summed up by an adding circuit 29 so that when the sum is smaller than a threshold value Vth, the second largest signal in the abnormal directions is selected by a signal selecting circuit 31. The second largest signal in the normal direction is also selected by the signal selecting circuit 32 and multiplied by a constant. The result is compared with the selected signal in the abnormal direction to judge which is larger by an amplitude judging circuit 33. If the selected signal in the abnormal direction is larger, it is judged that there is a defect in the pattern, and the judgement is outputted by a judging circuit 30.

3. 发明专利

JPS60115834A INSPECTING DEVICE FOR DEFECT OF INTEGRATED CIRCUIT PATTERN 失效
公开(公告)号：JPS60115834A
公开(公告)日：1985-06-22
申请号：JP23837884
申请日：1984-11-14
申请人： HITACHI LTD
发明人： KONAME KANJI , HASE SHINOBU
IPC分类号： G01N21/88 , G01N21/956 , H01L21/66
摘要： PURPOSE:To detect a defect of specific size occurring to an integrated circuit pattern by using a photodetector which has specific opening angles horizontally and vertically. CONSTITUTION:A laser beam from a light source 1 is passed through an expander 2 and a mirror 3 and forms an extremely spot image on the surface of a semiconductor integrated circuit chip 5 through a lens 4. Reflected diffracted light from the chip 5 is detected by a photodetector 6'. The photodetector 6' has a large opening angle in a horizontal direction (phi) and a large opening angle in a vertical direction (theta). The opening angle phi2-phi1 in the direction phi is decreased to reduce the influence of the diffracted light from a normal pattern, and the opening angle theta2-theta1 in the direction theta is increased to average and absorb variation in the intensity of the diffracted light by the size of the pattern.

4. 发明专利

JPS59178740A Device for inspecting defect in appearance 失效
标题翻译：检查外观缺陷的装置
公开(公告)号：JPS59178740A
公开(公告)日：1984-10-11
申请号：JP5241283
申请日：1983-03-30
申请人： Hitachi Ltd
发明人： HASE SHINOBU , MUNAKATA TADASUKE , SUDA TADASHI , KONAME KANJI , NAGATOMO HIROTO , TANIGUCHI YUUZOU
IPC分类号： G01B11/30 , H01L21/66
CPC分类号： H01L22/00
摘要： PURPOSE:To make it possible to distinguish the size of a dafect similar to a circular pattern; when laser light is projected on the surface of a sample, the reflected signal is detected by a light detector, and the defect is found; by providing a discriminating means comprising a photodiode array, optical fiber, and the like in the light detector. CONSTITUTION:Laser light from a laser light source 1 is magnified by a beam magnifying system 2 and projected on a movable mirror 3. The reflected light is converged by a condenser lens 4 and projected on the surface of a sample 5. Then, the reflected light here is received by a Fresnel lens 7, which magnifies a light receiving area, and inputted to an optical fiber 8. The light is detected by a light detector 6 provided at a rear end part. Then, the output of the detector 6 is guided to a comparing and judging circuit 10, which distinguishes the size of a defect to be evaluated, and to a signal processing circuit 11, which digitizes the defect. The address where the defect is located and the size of the defect are displayed on a display device 12. In this constitution, the same result can be obtained by using a photodiode array instead of the combination of the lens 7 and the fiber 8.
摘要翻译：目的：使得可以区分类似于圆形图案的dafect的大小; 当激光投射在样品的表面上时，由光检测器检测反射信号，发现缺陷; 通过在光检测器中提供包括光电二极管阵列，光纤等的识别装置。构成：来自激光光源1的激光由光束放大系统2放大并投射在可移动反射镜3上。反射光被聚光透镜4会聚并投射在样品5的表面上。然后，反射这里的光被菲涅耳透镜7接收，菲涅耳透镜7放大光接收面积，并输入到光纤8.光由设在后端部的光检测器6检测。然后，检测器6的输出被引导到比较判断电路10，该比较判定电路10区分要评估的缺陷的尺寸，并将该缺陷数字化的信号处理电路11。缺陷所在的地址和缺陷的大小被显示在显示装置12上。在这种结构中，通过使用光电二极管阵列而不是透镜7和光纤8的组合，可以获得相同的结果。

5. 发明专利

JPS58193440A Scanning photo detector 失效
标题翻译：扫描照片检测器
公开(公告)号：JPS58193440A
公开(公告)日：1983-11-11
申请号：JP7525082
申请日：1982-05-07
申请人： Hitachi Ltd
发明人： HASE SHINOBU , ITOU YOSHITOSHI , MUNAKATA TADASUKE
IPC分类号： G01N21/88 , G01N21/956 , H01L21/66
CPC分类号： G01N21/88
摘要： PURPOSE:To improve the level fluctuations of signals in accordance with scanned positions by a method wherein a reflected diffraction light generated upon scanning of a beam is received by a detector through a combination of a Fresnel lens and an optical fiber. CONSTITUTION:A Fresnel lens 8 is set in a position to avoid reflected diffraction lights from a normal pattern. A flexible optical fiber 9 has its front end fixed to the rear image face of the Fresnel lens and its rear end connected to a photomultiplier (PMT)6'. The Fresnel lens can be disposed in 8 locations as represented by phii=(2n+1)X22.5 deg. (n=0-7). All such Fresnel lenses are finally coupled together to the single PMT6' through associated optical fibers. As a result, signal levels due to faults of the same size locating at both end parts of scanning become equal to each other, and hence levelling can be achieved.
摘要翻译：目的：通过一种方法来改善与扫描位置相关的信号的电平波动，其中通过菲涅尔透镜和光纤的组合由检测器接收光束扫描时产生的反射衍射光。构成：菲涅尔透镜8设置在避免来自正常图案的反射衍射光的位置。柔性光纤9的前端固定在菲涅尔透镜的后像面上，其后端连接到光电倍增管（PMT）6'。菲涅尔透镜可以设置在由phii =（2n + 1）X22.5度表示的8个位置中。（n = 0-7）。所有这些菲涅尔透镜最终通过相关联的光纤耦合到单个PMT6'。结果，由于位于扫描的两个端部处的相同尺寸的故障引起的信号电平彼此相等，因此可以实现调平。

6. 发明专利

JPS52140384A FLAW DETECTOR 失效
公开(公告)号：JPS52140384A
公开(公告)日：1977-11-22
申请号：JP5652076
申请日：1976-05-19
申请人： HITACHI LTD
发明人： SUDA TADASHI , HASE SHINOBU , TAKAMI KATSUMI , YONEZAWA SHIGEJI , SHIONO HIDEKI
IPC分类号： G01N21/88 , G01N21/89 , G01N21/94 , G01N21/956
摘要： PURPOSE:To automatically detect the flaw in the face of glass plate, by receiving and indicating the secondary light caused by disturbance resulted from reflection, diffraction, scattering, absorption, etc., when the ray goes through the defective place.

7. 发明专利

JPS63131116A CONFOCAL MICROSCOPE 失效
公开(公告)号：JPS63131116A
公开(公告)日：1988-06-03
申请号：JP27654886
申请日：1986-11-21
申请人： HITACHI LTD
发明人： HASE SHINOBU , MUNAKATA TADASUKE , KIMURA SHIGEJI
IPC分类号： G02B21/00 , G01B11/00
摘要： PURPOSE:To reduce up/down variation when an optional plane at the waist position of a beam for irradiation scans on a sample by interposing piezoelectric elements for correcting an up/down displacement quantity between a sample holding base and an (x)-(y) stage, and applying voltages to the respective elements individually. CONSTITUTION:Light from a semiconductor laser 1 is made circular through a collimator lens 8 and a cylindrical lens 9 and made incident on a 1/4-wavelength plate 10. The beam converted by the plate 10 from a linear polarized light state to a circular polarized light state is split by a half-prism 12 into a component changed in polarization and a straight traveling component for reference light. A signal for three-dimensional shape measurement is reflected by the sample 3 to travel backward and then passes through two half-prisms 12. Light from a condenser lens 4 is converged on the surface of a pinhole 5, its transmitted light is detected by an infrared detector 6, and a signal corresponding to the projections and recesses of the sample 3 is stored in respective (x) and (y) coordinates by a processing circuit 17 and displayed on a display device 18. When the inclination and up/down displacement quantity of the sample are measured, the interference effect between a reference light signal from a detector 23 and a reflected light signal from the sample 3 is utilized and the individual voltages are applied to the respective piezoelectric elements 15 for displacement quantity correction.

8. 发明专利

JPS62208017A INFRARED COFOCAL MICROSCOPE 失效
公开(公告)号：JPS62208017A
公开(公告)日：1987-09-12
申请号：JP5037186
申请日：1986-03-10
申请人： HITACHI LTD
发明人： HASE SHINOBU , MUNAKATA TADASUKE , KIMURA SHIGEJI , ITO YOSHITOSHI
IPC分类号： H01L21/66 , G02B7/28 , G02B21/00
摘要： PURPOSE:To put a pinhole nearby the center of a beam speedily by utilizing a visible light beams for an optical element which constitutes an infrared cofocal microscope simultaneously with an infrared-ray source. CONSTITUTION:Light beams from the light source 1 are collimated by a collimator 8 into parallel luminous flux, which is converged on a sample surface which is at a distance of focal length F through an objective 2. A 1/4-wavelength plate 10 is arranged at a polarization beam splitter 9 which is coated matching with the wavelength of the light source in the middle of an optical system so as to obtain enough energy to photodetect light beams by a photodetector 6 after the light beams are reflected by the sample 3. Image processing and final three-dimensional display are carried out by converting the current of an electric signal from the photodetector 6 into a voltage by a signal processing circuit 11, finding the quantity of Z-directional variation by a zero-cross point detecting circuit 12, and then storing it in an image memory 13 in synchronism with an (x) and (y) axis and transmitting information of one image plane to a display monitor 14.

9. 发明专利

JPS5949530B2 JPS5949530B2 - 失效
公开(公告)号：JPS5949530B2
公开(公告)日：1984-12-03
申请号：JP9708176
申请日：1976-08-16
申请人： Hitachi Ltd
发明人： SUDA TADASHI , HASE SHINOBU , TAKAMI KATSUMI
IPC分类号： G01N21/53 , G01N15/14
CPC分类号： G01N15/1425

10. 发明专利

JPS59934A Device for inspection of defect 失效
标题翻译：检查缺陷的装置
公开(公告)号：JPS59934A
公开(公告)日：1984-01-06
申请号：JP9942483
申请日：1983-06-06
申请人： Hitachi Ltd
发明人： SUDA TADASHI , HASE SHINOBU , TAKAMI KATSUMI
IPC分类号： G01N21/94 , G01N21/956 , G02B27/42 , H01L21/66
CPC分类号： H01L22/00
摘要： PURPOSE:To discriminate as to whether there is any defect by a method wherein a reflected diffraction light is compared with the reflected diffraction light generated by an ordinary circuit pattern. CONSTITUTION:The pattern as shown in the diagram is formed by the diffraction light generated by the circuit pattern of an integrated circuit chip having systematic property, and the component of said diffraction light can be shielded by a spatial filter 8. On the contrary to the above, the diffraction pattern of the diffraction light originated in defect is deviated from the above-mentioned diffraction pattern, the diffaction light is not shielded by the spatial filter 8 and it is converted to an electric signal when it reaches a photo inspector 9. Then, among the reflected diffraction patterns of light, only the diffraction light reaching the region where the diffraction light from the normal circuit pattern is focussed and converted into an electric signal, thereby enabling to detect only the diffraction light originated in defect and to detect the defect on the patterning wafer.
摘要翻译：目的：通过将反射衍射光与由普通电路图案产生的反射衍射光进行比较的方法来区分是否存在缺陷。构成：如图所示的图案由具有系统特性的集成电路芯片的电路图案产生的衍射光形成，并且所述衍射光的分量可以被空间滤光器8屏蔽。与上述衍射光衍射图案偏离上述衍射图案，不会被空间滤光器8屏蔽，并且当到达光检测器9时，其变为电信号。然后，在光的反射衍射图案中，只有到达来自正常电路图案的衍射光的区域的衍射光被聚焦并转换成电信号，从而能够仅检测出现在缺陷中的衍射光并检测缺陷在图案化晶片上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式