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JP2007186792A Physical vapor deposition method and apparatus therefor 审中-公开
标题翻译：物理蒸气沉积方法及其设备
公开(公告)号：JP2007186792A
公开(公告)日：2007-07-26
申请号：JP2006353662
申请日：2006-12-28
申请人： General Electric Co , ゼネラル・エレクトリック・カンパニイGeneral Electric Company
发明人： MARIJNISSEN GILLION HERMAN , VERGELDT ERIC RICHARD IRMA CAR , RIGNEY JOSEPH DAVID , KLOOSTERMAN ANNEJAN BERNARD , DAROLIA RAMGOPAL
IPC分类号： C23C14/30 , C23C14/24 , F01D5/28 , F02C7/00 , F23R3/42
CPC分类号： C23C14/30 , C23C14/16 , C23C14/243 , C23C14/246
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for physical vapor deposition (PVD) for depositing a coating from a plurality of sources of materials having different vapor pressures.
SOLUTION: The method for physical vapor deposition is inevitably associated with the steps of: forming molten pools (114, 115) of first and second materials in a coating chamber (122) of the apparatus (120); supporting an article (130) in the coating chamber; and depositing the coating (132) by a controlled synthesized product on the article by evaporating the molten pools (114, 115) by an energy beam (126). The controlled synthesized product contains a first metal and a relatively small amount of a reactive metal having a vapor pressure lower than that of the first metal. The first material contains at least the first metal, and the second material contains a reactive metal and at least a second metal. The second metal binds to the reactive metal so that the second material achieves a melting point lower than that of the reactive metal and a melting range broader than that of the reactive metal.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供用于从具有不同蒸气压的多种材料源沉积涂层的用于物理气相沉积（PVD）的方法和装置。物理气相沉积的方法不可避免地与以下步骤相关联：在装置（120）的涂覆室（122）中形成第一和第二材料的熔池（114,115）; 在涂布室中支撑物品（130）; 以及通过用能量束（126）蒸发所述熔池（114,115），通过受控的合成产物将所述涂层（132）沉积在所述制品上。受控合成产物含有第一金属和相对少量的蒸汽压低于第一金属的反应性金属。第一材料至少含有第一金属，第二材料含有活性金属和至少第二金属。第二金属与反应性金属结合，使得第二材料的熔点低于反应性金属的熔点，熔融范围比反应性金属更宽。版权所有（C）2007，JPO＆INPIT

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