专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPS5572811A PATTERN CHECK UNIT 失效
公开(公告)号：JPS5572811A
公开(公告)日：1980-06-02
申请号：JP14687078
申请日：1978-11-28
申请人： FUJITSU LTD
发明人： MITA KIKUO , OYAMA MASAYUKI , YOSHIDA TAKU , NAKASHIMA MASAHITO , FUJIWARA KATSUMI , NAKAKUKI TADAO
IPC分类号： G01N21/88 , G01B11/24 , G01B21/20 , G01N21/956 , G03F1/00 , G03F1/84 , G06K9/40 , G06T5/00 , H01L21/027 , H01L21/30 , H01L21/66
摘要： PURPOSE:To improve check reliability by storing data obtained by a light beam scan with black spots and pin-holes removed. CONSTITUTION:Binary signals obtained by a light beam scan on a checked sample pattern surface are applied from light scanner 2 to shift register 6 in sequence; when the data pattern of register 6 has its circumference in an all-''1'' state centering on center point P, output 1 of AND gate 8 makes FF12 generate set output ''1'' and data ''0'' at point P to be applied to shift register 7 is stored as ''1'', thereby removing pinhole data substantially. Similarly, pattern data with data corresponding to black spots removed in register 7 are stored in memory 4, thereby improving check reliability.

2. 发明专利

JPS5855550B2 JPS5855550B2 - 失效
公开(公告)号：JPS5855550B2
公开(公告)日：1983-12-10
申请号：JP10878479
申请日：1979-08-27
申请人： Fujitsu Ltd
发明人： FUJIWARA KATSUMI , NAKAJIMA MASAHITO , YOSHIDA TAKU , OYAMA MASAYUKI , MITA KIKUO , NAKAKUKI TADAO
IPC分类号： G06T1/00 , G06K9/36 , G06T7/60

3. 发明专利

JPS5633831A PATTERN INSPECTION DEVICE 失效
公开(公告)号：JPS5633831A
公开(公告)日：1981-04-04
申请号：JP10989979
申请日：1979-08-29
申请人： FUJITSU LTD
发明人： NAKAKUKI TADAO , YOSHIDA TAKU , OYAMA MASAYUKI , MITA KIKUO , NAKASHIMA MASAHITO , FUJIWARA KATSUMI
IPC分类号： G01N21/88 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66 , H01L21/30
摘要： PURPOSE:To minimize the movement of a stage or a light source for light scanning required for inspection and to perform accurate inspection by splitting the inspection region of a tested substance into several specific regions wherein pattern inspection is done for the splitted regions. CONSTITUTION:A photo mark P is installed on the stage of a pattern inspection device. At that time, one region A out of the regions of the photo mask splitted into n>=2, for example, four-splitted regions is placed under a window W' for light beam inspection. A light spot scans on the region A as shown in an arrow dashed line and defective positions are recorded by an X-Y plotter. After completing the inspection of the region A, the photo mask P is then installed on the stage so that a region B may locate under the window W' for light beam inspection and defective positions are converted into a co-ordinate and plotted to perform inspection. The inspection of C and D regions is done in a same mannger. In this way, a small range of the movement of the stage or light source required for the inspection is permitted and measuring errors will be minimized.

4. 发明专利

JPS5572804A PATTERN CHECK SYSTEM 失效
公开(公告)号：JPS5572804A
公开(公告)日：1980-06-02
申请号：JP14687478
申请日：1978-11-28
申请人： FUJITSU LTD
发明人： NAKAKUKI TADAO , YOSHIDA TAKU , OYAMA MASAYUKI , MITA KIKUO , NAKASHIMA MASAHITO , FUJIWARA KATSUMI
IPC分类号： G01B11/24 , G06K9/74 , G06T1/00
摘要： PURPOSE:To make it possible to inspect a pattern by a simple constitution by irradiating an inspected material pattern with light from a projector while moving the light, constant pitch by constant pitch, and then by measuring the reflected light or a quantity of penetrating light. CONSTITUTION:Laser light from light source 1 reaches light projector 5 by way of lenses 2 and 3 and mirror 4. Over projector 5, a shutter is provided which allows the light to pass for constant time and is controlled by circuit 9. Under projector 5, light irradiation window 13 which irradiates an inspected material pattern with the light is provided and inspected sample 7 is fixed on stage 6. Stage 6 moves by a fixed pitch by feed mechanism 11. On the reverse of sample 7, photo detector 8 is arranged which receives the penetrating light from projector 5 and then sends it output to decision circuit 12, where a decision on a defect of the pattern is made.

5. 发明专利

JPS5568631A PATTERN INSPECTION SYSTEM 失效
公开(公告)号：JPS5568631A
公开(公告)日：1980-05-23
申请号：JP14190978
申请日：1978-11-17
申请人： FUJITSU LTD
发明人： MITA KIKUO , OYAMA MASAYUKI , YOSHIDA TAKU , NAKASHIMA MASAHITO , NAKAFUJIWARA KATSUMI , NAKAKUKI TADAO
IPC分类号： G01N21/88 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/302 , H01L21/66
摘要： PURPOSE:To dispense with manual sorting, by inspecting the region of a pattern stored in a memory and the vicinity of the region. CONSTITUTION:A section A-A' of a pattern data memory 10 and a section B-B' of a pattern verge signal memory 8 are observed. When a pattern verge signal is detected at a point P' on the memory 8, the OR of values at several points under another corresponding point P on the memory 10 is taken by an OR circuit 12. After it is confirmed that there is a pattern under a pattern verge, it is checked about several bits over the point P by another OR circuit 13 whether there is a black spot or not. A black spot is regarded as present near a pattern when the pattern verge signal is detected at the point P' and the OR circuits 12, 13 generate outputs. At that time, an AND circuit 14 produces a black spot detection signal (f). It is detected judged in the same manner about other points on a pattern verge whether there is a black spot or not.

6. 发明专利

JPS5560806A INSPECTING METHOD FOR PATTERN 失效
公开(公告)号：JPS5560806A
公开(公告)日：1980-05-08
申请号：JP13361078
申请日：1978-10-30
申请人： FUJITSU LTD
发明人： MITA KIKUO , OYAMA MASAYUKI , YOSHIDA TAKU , NAKASHIMA MASAHITO , FUJIWARA KATSUMI , NAKAKUKI TADAO
IPC分类号： G01B11/00 , G01B11/02 , G01B11/24 , G01B11/245 , G06K9/20 , G06T7/60 , H01L21/302
摘要： PURPOSE:To determine the direction of a pattern line automatically and measure the width of the pattern automatically by memorizing optically scanned and detected pattern lines separately at every given angular domain and calculating the widths between the memorized pattern edges. CONSTITUTION:The scanning laser rays penetrating a tested sample 6 are received and detected by a photo detector 9 and an angle detecting photo detector 10 where photo detecting elements are arranged fanwise around the photo detector 9. Angles of the pattern lines of the sample 6 such as 0 deg., 45 deg., 90 deg., 135 deg., etc. are determined by a pattern angle detecting circuit 11 and the pattern edges are separated and memorized at every given angular domain of the pattern edge signal memory circuit 12. If these separated and memorized pattern edges are read in the rectangular direction by a pttern width measuring circuit 13 and treated with read signals and a shift register, etc., the width of both pattern edges is calculated and the width of a pattern can be measured automatically according the automatic discrimination in the pattern line direction. In addition, if part of read pattern edge signals are short within a given width, contents of memory are changed in order to interpolate the the short part.

7. 发明专利

JPS5635419A PATTERN INSPECTION DEVICE 失效
公开(公告)号：JPS5635419A
公开(公告)日：1981-04-08
申请号：JP11072279
申请日：1979-08-30
申请人： FUJITSU LTD
发明人： FUJIWARA KATSUMI , NAKASHIMA MASAHITO , YOSHIDA TAKU , OYAMA MASAYUKI , MITA KIKUO , NAKAKUKI TADAO
IPC分类号： G01N21/88 , G01N21/956 , G03F1/00 , G03F1/84 , H01L21/027 , H01L21/30 , H01L21/66
摘要： PURPOSE:To eliminate the overlooking of inspection and ensure the inspection of a pattern, by checking the pattern of a mask with a light scanner while irradiating laser light upon the mask located on an X-Y stage and by simultaneously determining a light spot address through a position clock plate and synthesizing signals. CONSTITUTION:A mask 32 is placed on an X-Y stage 30 which is operated by motors 32, 34. Laser light from a laser light source 36 is irradiated upon the mask through lenses 38, 40. At the same time, a light scanner 42 made of a rotary polyhedral reflector or the like to scan the mask 32 zigzag to obtain signals. The signals are displayed on an inspection result indicator 36 through an inspector control system 54. A half mirror is provided in an optical path for the laser light to apply the light to a position locking plate 50. A light spot address is determined by a light detector 52 and applied to the control system 54 to produce a signal. These signals are synthesized, while a light transmitted through the mask 32 is changed into an electric pattern signal by a light detector 44. The pattern signal is converted into a binary code by a processing circuit 46. If the existence of a defect is detected, it is also displayed.

8. 发明专利

JPS5633775A PATTERN TESTING SYSTEM 失效
公开(公告)号：JPS5633775A
公开(公告)日：1981-04-04
申请号：JP10878479
申请日：1979-08-27
申请人： FUJITSU LTD
发明人： FUJIWARA KATSUMI , NAKASHIMA MASAHITO , YOSHIDA TAKU , OYAMA MASAYUKI , MITA KIKUO , NAKAKUKI TADAO
IPC分类号： G06T1/00 , G06K9/36 , G06T7/60
摘要： PURPOSE:To secure a high-accuracy detection of the black point defect which exists near the edge of the picture pattern, by securing such constitution in that the test pattern includes the black point detection pattern and several guard patterns distributed across the detection pattern. CONSTITUTION:The test pattern (a) is set previously on the surface of the 2- dimensional shift register to be distributed in the directions of 0 deg., 90 deg., 180 deg. and 270 deg. each to the scanning direction; while the test pattern (b) is distributed in the directions of 45 deg., 135 deg., 225 deg. and 315 deg. each. And the pattern (a) comprises the black point detection patterns 111 and 112 consisting of several linear bits in the direction of 90 deg. which is orthogonal to the pattern edge 10 formed in the direction of 0 deg., the 1st guard patterns 121 and 122 consisting of 3 bits across the center of the black point detection patterns each, and the 2nd guard patterns 131 and 132 consisting of the bit groups distributed at the front and both sides the 1st guard patterns each. The black point detection pattern detects the pattern edge and also shows the length of the scanning direction at the black point part. And the guard pattern inhibits the misdetection at the pattern bend part near the edge of the detection pattern and then inhibits the detection in the directions other than the designated angle.

9. 发明专利

JPS5572803A PATTERN CHECK SYSTEM 失效
公开(公告)号：JPS5572803A
公开(公告)日：1980-06-02
申请号：JP14686578
申请日：1978-11-28
申请人： FUJITSU LTD
发明人： OYAMA MASAYUKI , MITA KIKUO , YOSHIDA TAKU , NAKASHIMA MASAHITO , FUJIWARA KATSUMI , NAKAKUKI TADAO
IPC分类号： G01N21/88 , G01B11/02 , G01B11/24 , G01N21/956 , G06K9/36 , G06T1/00 , H01L21/027 , H01L21/30 , H01L21/66
摘要： PURPOSE:To reduce memory capacity and also to attain adequate pattern precision inspection, by carrying the inspection out while varying measurement resolution in accordance with a inspected part of a pattern for a photo mask for a printed board. CONSTITUTION:A binary coded signal read out by scanning 2 the surface of pattern 1 of an inspected material by ligh beams, etc., is recorded in pattern data memory 3 and also in contracted data memory 7 being contracted by way of pattern contracting circuit 12 at the same time. Inspection unit 4 take a measurement paying attention to a lead part from contents of memory 3 and a land part from those of memory 7.

10. 发明专利

JPS5565437A PATTERN INSPECTION CIRCUIT 失效
公开(公告)号：JPS5565437A
公开(公告)日：1980-05-16
申请号：JP13965178
申请日：1978-11-13
申请人： FUJITSU LTD
发明人： MITA KIKUO , OYAMA MASAYUKI , YOSHIDA TAKU , NAKASHIMA MASAHITO , FUJIWARA KATSUMI , NAKAKUKI TADAO
IPC分类号： G01B11/00 , G01B11/02 , G01N21/88 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/302 , H01L21/66
摘要： PURPOSE:To eliminate miss detection of print plate photomask by providing an inspection circuit with a diffraction light detecting circuit and a permeable light detecting circuit to judge from these output conditions whether or not it is a pattern periphery signal. CONSTITUTION:A pattern periphery signal detector 2 is arranged through a focussing lense on the back side of a pattern of materials for inspection having the transparent and opaque parts. Said detector 2 is provided with a pattern circuit for detecting diffraction light and together therewith a permeable light detecting element 7 is attached in the center part. With said constitution, an AND-gate 10 is connected with the diffraction light detecting pattern circuit through a comparator 3. As said above, when the output A of the comparator 3 and the output B of the comparator 8 inverted by an inverter 9 are added to the gate 10, the output C becomes the peripheral signals in the direction zero thus eliminating miss detection due to flaws.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式