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    • 6. 发明专利
    • WAVEGUIDE DEVICE AND ITS PRODUCTION
    • JPH06324226A
    • 1994-11-25
    • JP10916693
    • 1993-05-11
    • FURUKAWA ELECTRIC CO LTD
    • KAMATA YOSHIYUKIYANAGAWA HISAHARU
    • G02B6/13G02B6/12
    • PURPOSE:To lessen connection loss by forming specific grooves by dry etching near the connecting surface of a first waveguide part. CONSTITUTION:Only the points 6a, 6b corresponding to connecting surfaces at the time of butt connection are exposed at a desired width and the other surface parts are coated with a resist 7. After the surface over the entire part is subjected to dry etching, the resist 7 is peeled away. Consequently, only the constituting material of the thin-film body existing right under the exposed surfaces 6a, 6b is etched away and the grooves 8 are so formed as to enclose the first waveguide part A to be formed. The grooves 8 are so formed as to have the depth at which the grooves penetrate the entire part of the core layer 4 and further arrive at the point lower than the front surface 2a of a common lower clad 2 existing thereunder. Then, the dry etching surfaces A1, A2 in the first waveguide part A are formed as perpendicular surfaces which are both flat from the surface of the gap layer 6 clown to the desired depth of the common clad 2.
    • 7. 发明专利
    • OPTICAL CIRCUIT
    • JPH06102544A
    • 1994-04-15
    • JP25016992
    • 1992-09-18
    • FURUKAWA ELECTRIC CO LTD
    • KAMATA YOSHIYUKIYANAGAWA HISAHARU
    • G02B6/122G02B6/12G02F1/313H01S3/10
    • PURPOSE:To enable the changeover of optical paths without generating the light emission to act as a noise at the time of a switching operation by constituting the current implantation part of a waveguide of an indirect transition type compd. CONSTITUTION:A buffer layer 12, a lower clad layer 13, a core layer 14, an upper clad layer 15 and a cap layer 16 are successively formed on a substrate 11. Both of the core layer 14 and the clad layer 15 are constituted of the indirect transition type compd. Zn is diffused into the switch current implantation part 17. The upper clad layer 15 and the cap layer 16 are etched in such a manner that the waveguide remains. An insulating layer 18 consisting of SiO2 is deposited over the entire surface and an upper electrode 19 is formed. A lower electrode 20 is formed on the rear surface, by which the waveguide type optical switch is completed. Since the current implantation part 17 of the waveguide is constituted of the indirect transition type compd. in such a manner, the current implantation part doe not emit light at the time of the switching operation.
    • 10. 发明专利
    • OPTICAL SWITCH
    • JPH04362609A
    • 1992-12-15
    • JP13919791
    • 1991-06-11
    • FURUKAWA ELECTRIC CO LTD
    • KAMATA YOSHIYUKIYANAGAWA HISAHARU
    • G02B6/26G02B26/08
    • PURPOSE:To provide the optical switch which can be manufactured efficiently to small size and is adaptive to various kinds of nXm switch. CONSTITUTION:The optical switch is equipped with an optical connector 1 formed by inserting plural optical fibers 10 at specific intervals so that their fiber end surfaces are exposed and an optical waveguide 2 which has a waveguide circuit 11 for connecting at least two of the optical fibers 10 of the optical connector 1 while a circuit end surface of the waveguide circuit 11 is exposed. Optical fibers 10 are connected through the waveguide circuit 11 by connecting a fiber end surface to the circuit end surfaces in 1st combination and the fiber end surface and the circuit end surface are connected in 2nd combination by moving at least one of the optical connector 1 and optical waveguide 2 to the other along the connection end surface to connect the optional optical fiber 10 selectively through the waveguide circuit 11.