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    • 1. 发明专利
    • SEMICONDUCTOR DEVICE AND ITS MANUFACTURE
    • JPH05206201A
    • 1993-08-13
    • JP3853792
    • 1992-01-28
    • FURUKAWA ELECTRIC CO LTDFURUKAWA SAAKITSUTO FOIL KK
    • MUGISHIMA TOSHIOSEKI OSAMUOTANI KENICHI
    • H01L21/60
    • PURPOSE:To improve bonding workability and durability of a chip carrier, by arranging a theremally conductive penetration post which penetrates a flexible film part, on the rear side of an inner lead part of metal wiring. CONSTITUTION:Metal wiring 1 is radially arranged in four directions in the manner in which inner lead parts la are positioned inside and outer lead parts 1b are positioned outside. The inner lead parts 1a are bonded to bumps 7 of a semiconductor chip 6, and the outer lead parts 1b are connected with a lead frame, terminal parts of an external circuit board, etc. Coating and exposure of cyclized isoprene rubber are repeated on the surface of a compound tape on which surface metal wiring 1 is formed and on the surface of a flexible tape 2, thereby forming through holes, sprocket holes 5, and outer lead holes 1b. After the wall surface of the through hole is subjected to conduction treatment, the hole is filled by electroplating, and a penetration post 8 is formed. At the time of bonding, a tool is made to abut against the penetration post 8, heat and pressure are applied, and the bump of the chip 6 is bonded to the inner lead part 1a. Sufficient finger strength can be obtained and the metal wiring can be made fine.
    • 10. 发明专利
    • THROUGH HOLE PLATING METHOD
    • JPH06334335A
    • 1994-12-02
    • JP14673493
    • 1993-05-27
    • FURUKAWA ELECTRIC CO LTDFURUKAWA SAAKITSUTO FOIL KK
    • MUGISHIMA TOSHIOOTANI KENICHISEKI OSAMU
    • H01L21/60H05K3/14H05K3/40
    • PURPOSE:To enable applying a continuous through plating method to the manufacture of a continuous length double-sided TAB carrier tape, by forming evaporation layer of conductive material on the inner surface of a through hole and the surface of an insulating layer, by physical evaporation treatment. CONSTITUTION:A circular aperture part 17c is formed by etching. and eliminating a through hole forming part of a metal conductor layer 17a by photolithography for a double-sided tape. The metal conductor layer 17a is used as a mask, and a through hole 14 is formed by etching an insulator layer 16. Conductor layers 17a and 17b on the surface and the rear are all etched and eliminated, and the whole surface of the insulator layer 16 is exposed. After washing and drying, both surfaces of the insulator layer 16 and the inner wall surface of the through hole are all coverd with a copper film. By electrolytic plating on the copper film, metal conductor layers 12a, 12b on the surface and the rear and a conductor layer 10 on the inner wall surface of the through hole are formed. A specified circuit pattern is formed by using a dry film 19 as resist.