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1. 发明专利

JP2000006303A LAMINATED STRUCTURE HAVING PHOTOCATALYST LAYER 失效
公开(公告)号：JP2000006303A
公开(公告)日：2000-01-11
申请号：JP19364598
申请日：1998-06-25
申请人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , YKK CORP , NIPPON SODA CO
发明人： FUKUI HIDEO , BANSHO NOBUYUKI , NAKADA NOBUYUKI , AIKAWA KAZUO , YONEYA TOSHIMASA , SATO TOSHIJI , FUJISHIMA AKIRA , HASHIMOTO KAZUHITO
IPC分类号： A61L9/00 , B01J21/06 , B01J35/02 , B32B9/00 , B32B33/00
摘要： PROBLEM TO BE SOLVED: To provide the subject structure preventing photocatalytic action reaching the surface part of an org. base material being a substrate during long-term use under environment such as the outdoors or the like where light with a wavelength of about 400 nm or less is present, stably holding a photocatalyst layer on the org. base material indefinitely and capable of stably developing antibacterial, antifungal, antistaining, deodorizing or air purifying actions over a long period of time. SOLUTION: An intermediate layer 2 of a material not invaded by photocatalytic action is interposed between the surface of an org. base material 1 and a photocatalyst layer 3 and the distance between the surface of the org. base material 1 and the photocatalyst layer 3 is set to 3.2 μm or more. the photocatalyst layer 3 may be a membrane of a semiconductor having photocatalytic action or a membrane having fine particles of this semiconductor (supported thereon and/or added thereto). As a binder of the membrane containing semiconductive fine particles, an inorg. binder, especially silica is pref. used and, further, the inorg. material having silica as a main component is preferably used as the intermediate layer.

2. 发明专利

JP2001199001A LAMINATED STRUCTURE HAVING PHOTOCATALYST LAYER 失效
公开(公告)号：JP2001199001A
公开(公告)日：2001-07-24
申请号：JP2000011377
申请日：2000-01-20
申请人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , YKK CORP
发明人： FUKUI HIDEO , BANSHO NOBUYUKI , NAKADA NOBUYUKI , IMAI TAKASHI , YONEYA TOSHIMASA , SATO TOSHIJI , HASHIMOTO KAZUHITO , FUJISHIMA AKIRA
IPC分类号： B32B9/00 , B01J21/06 , B01J21/16 , B01J23/04 , B01J27/224 , B01J35/02 , B01J37/02 , B32B7/02 , C09D5/16
摘要： PROBLEM TO BE SOLVED: To provide a photocatalyst film structure capable of forming a matte photocatalyst film low in glossiness without lowering the original action such as antistaining action, antibacterial action, antifungal action, deodorizing action or air cleaning action and durability of the photocatalyst film and capable of controlling finish glossiness. SOLUTION: An intermediate layer 2 is interposed between a base material 1 and a photocatalyst layer 3 and a filler comprising inorganic fine particles 4, for example, metal fine particles or oxide fine particles having a refractive index different from that of the matrix itself of the intermediate layer is added to the intermediate layer 2 and the difference between the refractive index of the filler and that of the intermediate layer is utilized or the surface of the intermediate layer or the internal surface (cross-sectional face of the intermediate layer) is made uneven to make it possible to scatter incident light to lower glossiness. By controlling the addition amount or mean particle size of the filler, glossiness can be controlled arbitrarily and freely. As the inorganic fine particles, metal fine particles, oxide fine particles or mixed fine particles of them can be used but SiO2 fine particles are especially preferable.

3. 发明专利

JPH10249212A PHOTOCATALYST SUPPORTER HAVING ODOR-PREVENTING/ DEODORIZING PROPERTY AND ITS PRODUCTION 失效
公开(公告)号：JPH10249212A
公开(公告)日：1998-09-22
申请号：JP6897397
申请日：1997-03-07
申请人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , YKK CORP
发明人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , NAKADA NOBUYUKI , ARAI TOSHIO
IPC分类号： A61L9/01 , B01J21/06 , B01J35/02
摘要： PROBLEM TO BE SOLVED: To provide a photocatalyst by which excellent odor-preventing/ deodorizing effect is stably exhibited for a long term by carrying the photocatalyst at plenty amount with high adhesion strength on a metallic supporter stable for photocatalytic action and to provide a producing method thereof. SOLUTION: Base material consisting of aluminum alloy formed with an anodic oxide film 1 is immersed into dispersion liquid or a paint solution containing semiconductor particles having photocatalytic action and a cataphoresis method is applied thereto. Or, the base material is immersed into the above-mentioned solution at pressure not higher than the atmospheric pressure. The photocatalyst supporter having odor-preventing/deodorizing property is produced. In the photocatalyst supporter, the semiconductor particles or paint grains 3 containing the semiconductor particles or being carried with them are filled into pores 2 of the anodic oxide film 1 of the base material and carried on the surface thereof.

4. 发明专利

JPH10195694A ANTIMICROBIAL/ANTIFOULING ALUMINUM OR ALUMINUM ALLOY MATERIAL AND ITS PRODUCTION 失效
公开(公告)号：JPH10195694A
公开(公告)日：1998-07-28
申请号：JP35659096
申请日：1996-12-27
申请人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , YKK CORP
发明人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , NAKADA NOBUYUKI , ARAI TOSHIO
IPC分类号： A61L2/02 , B05D5/00 , B05D7/14 , C25D11/18 , C25D13/00 , C25D13/02
摘要： PROBLEM TO BE SOLVED: To form a photocatalyst film which has a good throwing power even to an aluminum alloy base material having intricate shapes without degrading the strength of the base material and has an excellent adhesion property and photocatalyst activity. SOLUTION: After the base material 11 consisting of an aluminum alloy is subjected to an anodic oxidation treatment, the base material is immersed into a soln. suspended with semiconductor particulates 10 having the photocatalyst effect or the suspension of the semiconductor particulates 10 is applied thereon or an electrophoresis method is executed in the suspension of the semiconductor particulates, by which the semiconductor particulates are deposited on the anodically oxidized film 12. The film is thereafter impregnated with an inorg. high polymer 13, by which the photocatalyst film 14 consisting of the mixture composed of the semiconductor particulates and the inorg. high polymer is formed on the anodically oxidized film. This process is a process of a wet type and, therefore, the throwing power to the aluminum alloy base material 11 having the intricate shapes is good. In addition, the formation of the photocatalyst film at a low temp. is possible and, therefore, there is no possibility of degrading the strength of the aluminum alloy base material. The method for forming the photocatalyst film having the high mass productivity is thus obtd. The photocatalyst film has a high content of the semiconductor particulates and exhibits the excellent photocatalyst activity.

5. 发明专利

JP2002167871A COMPARATIVELY ANTIFOULING SEALING COMPOUND FOR BUILDING AND BUILDING MATERIAL 失效
公开(公告)号：JP2002167871A
公开(公告)日：2002-06-11
申请号：JP2000368560
申请日：2000-12-04
申请人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , YKK CORP
发明人： NAKADA NOBUYUKI , IMAI TAKASHI , FUKUI HIDEO , BANSHO NOBUYUKI , FUJISHIMA AKIRA , HASHIMOTO KAZUHITO
IPC分类号： E04B1/682 , B01J35/02 , C09K3/10
摘要： PROBLEM TO BE SOLVED: To provide a sealing compound for building and a building material, which can prevent dirt resulting from silicone oil attachment, and does not degrade the antifouling effect and self-cleaning effect produced by a photocatalytic film or a hydrophilic film. SOLUTION: As a sealing compound used in combination with building material, the sealing compound consisting of a modified silicone or polyisobutylene sealant is employed. While the sealing compound consisting of such a sealant is employed, the execution of work and fitting of building materials is carried out, the building materials including a glass having the photocatalytic film or hydrophilic film for antifouling treatment, an aluminum panel, an aluminum extrusion material, and a tile, etc., are used and mounted.

6. 发明专利

JP2000246115A PHOTOCATALYTICALLY FUNCTIONAL MEMBER 失效
公开(公告)号：JP2000246115A
公开(公告)日：2000-09-12
申请号：JP5126299
申请日：1999-02-26
申请人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , YKK CORP
发明人： FUKUI HIDEO , BANSHO NOBUYUKI , NAKADA NOBUYUKI , YONEYA TOSHIMASA , SATO TOSHIJI , FUJISHIMA AKIRA , HASHIMOTO KAZUHITO
IPC分类号： A61L9/20 , B01J35/02 , B32B9/00
摘要： PROBLEM TO BE SOLVED: To easily form a discontinuous photocatalyst film by spraying or other method and to obtain a photocatalytically functional member excellent in designability and durability, well applicable even under severe service conditions in the open air and capable of stably exhibiting actions such as antifouling, antibacterial, antimold, deodorizing and air cleaning actions over a long period of time. SOLUTION: An insular photocatalyst film 2 is deposited as a discontinuous film on the surface of a substrate 1 at

7. 发明专利

JPH09195647A ANTIFOULING SCREEN NET 失效
公开(公告)号：JPH09195647A
公开(公告)日：1997-07-29
申请号：JP2297596
申请日：1996-01-17
申请人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , YKK CORP
发明人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , NAKADA NOBUYUKI , ARAI TOSHIO
IPC分类号： E06B9/52 , A61L2/16 , B21F27/00 , C23C14/06
摘要： PROBLEM TO BE SOLVED: To provide a screen net excellent in safety and durability without requiring a special device, treatment, etc., free from maintenance, showing a high antifouling property and capable of maintaining sufficient cleanliness only by natural cleaning by rain and simple water cleaning. SOLUTION: This screen net is constituted by coating a semiconductor thin film showing photocatalystic action or a thin film 2 containing semiconductor particulates showing the photocatalystic action on a wire rod 1. Or additionally, an antibacterial metal or an antibacterial metal alloy 5 is deposited on the thin film. It is possible to decompose soil of fat and oil, etc., to prevent attachment of soil of diesel dust, tire dust, carbon particulates, etc., hard to remove, to prevent growth of mold and to maintain sufficient cleanliness by natural cleaning by rain and simple cleaning of waterwashing, etc., by applying the aforementioned treatment.

8. 发明专利

JP2001064683A METHOD FOR RECOVERING PHOTOCATALYTIC ACTION OF PHOTOCATALYST FILM AND DETERGENT USED THEREFOR 失效
公开(公告)号：JP2001064683A
公开(公告)日：2001-03-13
申请号：JP24283299
申请日：1999-08-30
申请人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , YKK CORP
发明人： NAKADA NOBUYUKI , IMAI TAKASHI , FUKUI HIDEO , BANSHO NOBUYUKI , FUJISHIMA AKIRA , HASHIMOTO KAZUHITO
IPC分类号： B05D5/00 , C11D7/04 , C11D7/06 , C11D7/08 , C11D7/50
摘要： PROBLEM TO BE SOLVED: To provide a method for recovering stain-resisting properties and easy cleanability inherent in a photocatalyst film, by easily removing stain adhered to the photocatalyst film, even when a plasticizer or a fat and oil component contained in a polymeric sealing medium, especially a silicone-based oil contained in the silicone-based sealing medium, effuses to adhere onto the film in a large amount, and the stain caused by the above effluent firmly adheres to the photocatalyst film to deteriorate the stain-resisting properties and easy cleanability inherent in the photocatalyst film. SOLUTION: This method for recovering a photocatalytic action of a photocatalyst film comprises removing stain firmly adhered to the photocatalyst film with a detergent containing at least one kind of compound selected from the group consisting of acids, bases and solvents so recover stain-resisting properties and easy cleanability inherent in the photocatalyst film, when an organic substance comprising semiconductive fine particles or a material containing the semiconductive fine particles adheres firmly to the photocatalyst film to deteriorate the stain-resisting properties and easy cleanability.

9. 发明专利

JP2001064625A LOW-STAINING SEALING MATERIAL FOR BUILDING 失效
公开(公告)号：JP2001064625A
公开(公告)日：2001-03-13
申请号：JP24282999
申请日：1999-08-30
申请人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , YKK CORP
发明人： NAKADA NOBUYUKI , IMAI TAKASHI , FUKUI HIDEO , BANSHO NOBUYUKI , FUJISHIMA AKIRA , HASHIMOTO KAZUHITO
IPC分类号： E04B1/682 , B01J35/02 , C09K3/10
摘要： PROBLEM TO BE SOLVED: To obtain a sealing material for building that can reduce the exudation of a plasticizer and a fat or oil component that are included in a polymer sealing material and increase the staining on external finishing materials. SOLUTION: In a sealing material including organic substances 1, for example, a plasticizer, a fat or oil component, particularly a silicone oil-containing silicone sealing material, fine particles of a photocatalyst 3 area allowed to distribute in the material to decompose or degenerate the organic substances, the included plasticizer, fat and oil components, and the like, by the action of the photocatalyst, thereby reducing the staining of buildings due to adhesion of these organic substances to the buildings. The photocatalyst fine particles may be dispersed in the sealing material or may distribute on the surface of the sealing material. Further, a layer including the photocatalyst fine particles may be formed on the sealing material, when necessary, via a layer that inhibits the action of the photocatalyst.

10. 发明专利

JPH10147898A ANTIMICROBIAL ALUMINUM OR ALUMINUM ALLOY MATERIAL AND ITS PRODUCTION 失效
公开(公告)号：JPH10147898A
公开(公告)日：1998-06-02
申请号：JP31854496
申请日：1996-11-15
申请人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , YKK CORP
发明人： FUJISHIMA AKIRA , HASHIMOTO KAZUHITO , NAKADA NOBUYUKI , ARAI TOSHIO
IPC分类号： A01N59/16 , A01N59/20 , C25D11/18
摘要： PROBLEM TO BE SOLVED: To provide production by which a photocatalyst layer that shows good covering power and excellent adhesion even to an aluminum alloy base material having a complicated shape, can be formed without reducing strength of the aluminum alloy base material. SOLUTION: This production comprises: subjecting a base material 11 that consists of an aluminum alloy, to anodic oxidation treatment to form an anodic oxide coating film 12 on the base material 11; further immersing the treated material in a solution contg. suspended fine semiconductor particles 10, coating the treated material with the solution contg. suspended fine semiconductor particles 10 (liquid suspension of fine semiconductor particles 10) or subjecting the treated base material to electrophoresis treatment in the liquid suspension of fine semiconductor particles 10, to deposit the fine semiconductor particles 10 on the anodic oxide coating film 12; and thereafter, subjecting the resulting material to sealing treatment to form a photocatalyst layer consisting of a composite phase in which a swelled anodic oxide coating film 12a and the fine semiconductor particles 10 coexist, and also to improve corrosion resistance of the aluminum alloy base material 11. At this time, since the production is a wet process, the photocatalyst layer that shows good covering power even to the base material having a complicated shape, can be formed even at room temp. Thus, the formation of the photocatalyst layer also having sufficient massproductivity can be performed without any possibility of reducing strength of the aluminum alloy base material 11.

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