专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPS6411850A THERMAL RESISTOR FORMING METHOD OF THERMAL HEAD 失效
公开(公告)号：JPS6411850A
公开(公告)日：1989-01-17
申请号：JP16667287
申请日：1987-07-03
申请人： FUJI XEROX CO LTD , JAPAN RES DEV CORP
发明人： KOBAYASHI MASAKAZU , KATO YOSHITAKE , BABA KAZUO , ARISAWA HIROSHI , SHIROTSUKI YOSHIYUKI
IPC分类号： B41J2/335 , H01C17/08
摘要： PURPOSE:To remove dispersion of characteristics of a thermal head and besides, to achieve improvement of said characteristics, by forming a resistant film as a thermal resistor by a gas deposition method. CONSTITUTION:Insides of generation chambers 1, 2 of respective powdery materials are made to be of a set gas atmosphere by opening valves 13. Then, the inside pressure is regulated to a specific pressure with pumps 6 by opening valves 7. Thereafter, in the generation chambers 1 and 2 of respective powdery materials, materials 11, 12, bases of respective powdery materials are vaporized in the gas atmosphere by connection of electric source 9 to an electrode 10 to generate respective powdery materials. Successively, the powdery materials in respective generation chambers are delivered to a surge chamber 3 while being mixed in respective delivery tubes 5. Mist of mixed powdery materials is delivered from the surge chamber 3 to a nozzle 15 at which spraying of the powdery material is performed in a filming chamber 4 through the delivery tube 5, and is sprayed onto a base material 14 of a thermal head from the nozzle 15 to form a thermal resistor 16.

2. 发明专利

JPS6292412A FORMATION OF THICK FILM RESISTANCE ELEMENT 失效
公开(公告)号：JPS6292412A
公开(公告)日：1987-04-27
申请号：JP23254585
申请日：1985-10-18
申请人： FUJI XEROX CO LTD
发明人： KATO YOSHITAKE
IPC分类号： H01L27/01 , B41J2/335 , B41J2/345 , H01C17/22 , H01L49/00

3. 发明专利

JPS6292410A FORMATION OF THICK FILM RESISTANCE ELEMENT 失效
公开(公告)号：JPS6292410A
公开(公告)日：1987-04-27
申请号：JP23254185
申请日：1985-10-18
申请人： FUJI XEROX CO LTD
发明人： KATO YOSHITAKE
IPC分类号： H01L27/01 , H01C17/06 , H01C17/22 , H01L49/00

4. 发明专利

JPH0533539B2 失效
公开(公告)号：JPH0533539B2
公开(公告)日：1993-05-19
申请号：JP23254385
申请日：1985-10-18
申请人： FUJI XEROX CO LTD
发明人： KATO YOSHITAKE
IPC分类号： H01L27/01 , H01C17/22 , H05K1/16

5. 发明专利

JPH01184963A CONTACT-TYPE IMAGE SENSOR 失效
公开(公告)号：JPH01184963A
公开(公告)日：1989-07-24
申请号：JP1016788
申请日：1988-01-20
申请人： FUJI XEROX CO LTD
发明人： SEKO YASUJI , KATO YOSHITAKE
IPC分类号： H04N1/028 , H01L27/14 , H01L27/146 , H01L31/02 , H01L31/12
摘要： PURPOSE:To enhance the sensor resolution capability by a method wherein a photodetecting element is provided on a substrate, a light-transmitting layer is formed on them, a light guidance section is provided capable of leading the light from the light-emitting section to a text reading section through the light-transmitting layer for the efficient guidance of the light from the light-emitting section to the text, and it is so arranged that the light reaching the photodetecting element will land on the text only. CONSTITUTION:A first light-screening layer 8 with a light receiving widow 2 and a light- guiding window 10 is provided on a first light-transmitting layer 4. Further, a second light- transmitting layer 3 and a second light-screening layer 9 are provided. In the second light- screening layer 9, there is a reading widow 11, which corresponds to the section to be read of a text 5. On the rear side of a glass substrate 6, there is a light-emitting layer 7 composed of an EL element or the like. In an image sensor designed as such, a photodetecting element 1 is built for example of amorphous silicon on a glass substrate 6, water glass is applied to be a light-transmitting layer 4 and then curing is accomplished. On the light-transmitting layer 4, a Cr light-screening layer 8 is deposited, and a light-receiving window 2 is provided by etching just on the photodetecting element 1. A process follows wherein glass is applied onto the light-screening layer 8 by spattering for the formation of a light-transmitting layer 3. Further, a light-screening layer 9 is formed for defining the text face.

6. 发明专利

JPS63134251A INK JET RECORDER 失效
公开(公告)号：JPS63134251A
公开(公告)日：1988-06-06
申请号：JP28057986
申请日：1986-11-27
申请人： FUJI XEROX CO LTD
发明人： INOUE NANAO , SAITO KOICHI , KATO YOSHITAKE , FUJIMAGARI KEIJI , FUJIMURA YOSHIHIKO , KATO SEIICHI , NAITO KOICHI , HORIE KIYOSHI
IPC分类号： B41J2/05 , B41J2/06 , B41J2/14
摘要： PURPOSE:To contrive enhancement of the density of recorded images, by a construction wherein of energizing electrodes for a pair of adjacent heat generating electrodes, those on the adjacent side are composed of a single common electrode. CONSTITUTION:A thermal energy applying means 3 comprises a plurality of heat generating resistors 8 provided near an aperture edge on one side of a slit form space part 1, and pairs of energizing electrodes 9 provided one pair for each of the resistors 8 so as to selectively energize the resistors 8. Of the energizing electrodes 9 for each pair of adjacent heat generating resistors 8, those on the adjacent side are composed of a single common electrode 10. As a result, the number of the energizing electrodes is reduced, whereby the density of the electrodes can be reduced, and a switching circuit 18 can be simplified. Accordingly, it is possible to reduce the pitch of arrangement of the heat generating resistors 8 and to contrive an increase in the density of recorded images.

7. 发明专利

JPS61179401A FORMATION OF FEMALE MOLD FOR REPRODUCTION OF ROTARY POLYGON MIRROR 失效
公开(公告)号：JPS61179401A
公开(公告)日：1986-08-12
申请号：JP993986
申请日：1986-01-22
申请人： FUJI XEROX CO LTD
发明人： TOMIYAMA SHUNSUKE , TAKENOUCHI MUTSUO , KATO YOSHITAKE
IPC分类号： G02B26/12 , B29C33/38 , B29L11/00 , G02B5/08 , G02B5/09
摘要： PURPOSE:To form easily a precision female mold for reproduction by superposing a preliminarily manufactured laminate body onto a substrate structural body, which is deposited by evaporation with a high reflection film on a release agent layer and is coated thereon with a low-viscosity adhesive agent and removing the release agent layer after curing of the release agent. CONSTITUTION:An Si oil is thinly deposited by evaporation as the release agent layer 22A on each specular surface 77 of a master polygon mirror 40 and the high-reflectivity film 33A consisting of Al, etc. is deposited by evaporation on the layer 22A. The assembly in such a state is taken out of the vacuum and is inserted into a preliminarily prepd. hollow cylindrical metallic mold 51. The assembly is held while the center of a revolving shaft 78 and the central axis of the mold 51 are matched, then the low-viscosity adhesive agent is press-injected into the space between the mold 51 and the layer 33A to form the adhesive agent layer 44A. The polygon mirror 40 is pulled after the curing of the layer 44A, by which the primary transfer of the master polygon mirror is completed. The female mold for reproduction of the rotary polygon mirror made of the metal having the layers 44A, 33A on the inside thereof is thus completed.

8. 发明专利

JPH0553044B2 失效
公开(公告)号：JPH0553044B2
公开(公告)日：1993-08-09
申请号：JP23254185
申请日：1985-10-18
申请人： FUJI XEROX CO LTD
发明人： KATO YOSHITAKE
IPC分类号： H01L27/01 , H01C17/06 , H01C17/22 , H01L49/00

9. 发明专利

JPS649756A METHOD FOR FORMING HEATING RESISTOR OF THERMAL HEAD 失效
公开(公告)号：JPS649756A
公开(公告)日：1989-01-13
申请号：JP16506687
申请日：1987-07-01
申请人： FUJI XEROX CO LTD , JAPAN RES DEV CORP
发明人： KOBAYASHI MASAKAZU , KATO YOSHITAKE
IPC分类号： B41J2/335 , H01C17/08 , H05K1/16
摘要： PURPOSE:To stabilize characteristics in heating resistors of a thermal head, by a method wherein, after a heating resistor was formed by spraying fine particles on a substrate, it is sintered under heat. CONSTITUTION:Fine particles 11 (e.g., silicon), 12 (e.g., ruthenium) formed in forming chambers 1, 2 by being evaporated in a gas are supplied to a nozzle 15 through a pressure control chamber 3 together with the gas, thereafter being sprayed from the nozzle 15 to a substrate 14 of a thermal head with electrodes made of a thick film etc.; in this manner, a resistant film 16 as a heating resistor is formed on the substrate 14. Thereafter, the resistant film 16 is baked at a predetermined temperature to obtain a desired heating resistor. If the substrate 14 is previously heated to the order of 0-400 deg.C by a heater 17 in the forming of the resistant film 16, an adhesion strength between the resistant film 16 and the substrate 14 is increased, and the characteristics of the heating resistor is further stabilized.

10. 发明专利

JPS6221557A ELECTROSTATIC RECORDING HEAD 失效
公开(公告)号：JPS6221557A
公开(公告)日：1987-01-29
申请号：JP16168685
申请日：1985-07-22
申请人： FUJI XEROX CO LTD
发明人： TSUDA DAISUKE , WAKO MASAJI , KATO YOSHITAKE , TOYOSHIMA TOSHIHIKO , SUDA SHINGO , KOBAYASHI MASAKAZU
IPC分类号： G03G15/05 , B41J2/395 , G03G15/00
摘要： PURPOSE:To enable electrodes to be integrally formed on respective conductor patterns by plating, by a method wherein the conductor patterns as the base of multi-needle electrode and the other grouping wiring are formed on a substrate by a fine machining technique and walls for preventing the short-circuit are previously formed between the respective conductor patterns. CONSTITUTION:On a substrate 2 of ceramics, glass etc., conductor patterns 3 as the base of multi-needle electrode and a grouping circuit for matrix driving are formed of gold in the form of multi-layer by a fine machining technique. Walls 4 preventing the short-circuit from occurring between the needle electrodes are formed by baking between the respective conductor patterns 3, by a method in which a dry film photoresist laminated on the face of the substrate disposed between the conductor patterns spaced at a same distance with each other is exposed by using a specified photo mask. Thereafter, needle electrodes 5 are formed on the conductor patterns 3 by nickel plating by use of sulfamine acid nickel plating solution. Production of the multi-needle electrode 5 is completed after the photoresists 4 are removed.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式