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    • 7. 发明专利
    • PHOTOPOLYMERIZABLE COMPOSITION
    • JPS6221141A
    • 1987-01-29
    • JP16145885
    • 1985-07-22
    • FUJI PHOTO FILM CO LTD
    • IWASAKI MASAYUKIMAEDA MINORUFUJIKURA SADAO
    • C08F2/44C08F2/48G03C1/00G03F7/004
    • PURPOSE:To enable a photoresist to easily peel off with a dil. alkaline aqueous solution which is usually used by incorporating an org. allyl compd. having at least one of an allyl group in a molecule and a specific b.p. to the titled composition which can be developed with an alkaline condition. CONSTITUTION:The titled composition comprises the compd. having at least two ethylenically unsatd. group in the molecule, a photopolymerizable initiator, a binder polymer contg. a carboxylic acid group and the org. allyl compd. having at least one of the allyl groups in the molecule and >=100 deg.C b.p. at 760mmHg as an essential components. A thermal polymerization inhibitor, a plasticizer, coloring matter, a discoloring agent and an another auxiliary agent may be optionally used together with the prescribed components. The titled composition is most preferable to be used to the photoresist layer of the film photoresist. The titled composition capable of developing with a weak alkaline aqueous solution and having a good alkaline resisting property and capable of forming a photocured film which is a soft and no brittle, is obtd., thereby enabling of working the substrate with a high accuracy.