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1. 发明专利

JP2013230424A Container cleaning apparatus and container cleaning method 审中-公开
标题翻译：集装箱清洁装置和容器清洗方法
公开(公告)号：JP2013230424A
公开(公告)日：2013-11-14
申请号：JP2012103162
申请日：2012-04-27
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KISO SHOICHI
IPC分类号： B08B9/30 , B08B3/02 , B08B11/00
摘要： PROBLEM TO BE SOLVED: To effectively clean and dry the inside of a liquid housing part of a plate-shaped container for the biochemical test.SOLUTION: A container cleaning apparatus 1 has a conveyor 6 conveying a plate-shaped container 40, a cleaning liquid supply shower head 3 supplying a cleaning liquid into a liquid housing part 41 of the plate-shaped container 40, a water removing roll 1 sucking the cleaning liquid in the liquid housing part 41, and an air knife head 2 supplying gas into the liquid housing part 41. The cleaning liquid supply shower head 3, the water removing roll 1, and the air knife head 2 are arranged in this order from an upstream side to a downstream side. The water removing roll 1 has a porous absorbing body 1a in the outer periphery of the same.
摘要翻译：要解决的问题：有效地清洁和干燥用于生化测试的板状容器的液体容纳部分的内部。解决方案：容器清洁装置1具有输送板状容器40的输送机6，清洗液供给喷淋头3，将洗涤液供给到板状容器40的液体容纳部41，将液体容纳部41中的清洗液吸引的除水辊1和将气体供给到液体壳体中的气刀头2 清洗液供给用花洒3，除水辊1，气刀头2从上游侧向下游侧依次配置。除水辊1的外周具有多孔吸收体1a。

2. 发明专利

JP2013190277A Container cleaning apparatus and container cleaning method 审中-公开
标题翻译：集装箱清洁装置和容器清洗方法
公开(公告)号：JP2013190277A
公开(公告)日：2013-09-26
申请号：JP2012055911
申请日：2012-03-13
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KISO SHOICHI
IPC分类号： G01N35/02
摘要： PROBLEM TO BE SOLVED: To effectively clean a container for a biochemical test, dry it and remove residue in the container.SOLUTION: A container cleaning apparatus 1 includes a lid body 2 mounted on an aperture 8c of a container 8, and a nozzle group 25 held by the lid body 2. The nozzle group 25 includes cleaning liquid supply nozzles 6a, 6b for supplying cleaning liquid into the container 8, a suction nozzle 5 for suctioning the cleaning liquid in the container 8, and gas supply nozzles 7a, 7b for supplying gas into the container 8. The suction nozzle 5 is arranged so as to extend in the axis line of the container 8, and the cleaning liquid supply nozzles 6a, 6b and the gas supply nozzles 7a, 7b are arranged so as to be inclined to the outside downward with respect to the axis line.
摘要翻译：要解决的问题：为了有效地清洁用于生化试验的容器，将其干燥并除去容器中的残留物。解决方案：容器清洁装置1包括安装在容器8的孔8c上的盖体2和喷嘴组由喷嘴组25包括用于向容器8供给清洗液的清洗液供给喷嘴6a，6b，吸引容器8内的清洗液的吸嘴5，气体供给喷嘴7a，7b 用于将气体供给到容器8中。吸嘴5布置成在容器8的轴线上延伸，并且清洁液供给喷嘴6a，6b和气体供给喷嘴7a，7b被布置成相对于轴线向下倾斜。

3. 发明专利

JP2006208726A Optical functional sheet 审中-公开
标题翻译：光学功能表
公开(公告)号：JP2006208726A
公开(公告)日：2006-08-10
申请号：JP2005020390
申请日：2005-01-27
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： HATTORI SHUJI , KISO SHOICHI , SEKIZUKA TAKANORI
IPC分类号： G02B1/11 , G02B5/02
摘要： PROBLEM TO BE SOLVED: To provide an optical functional sheet having an antireflection layer applicable on a large base material having an optical functional shape on its surface. SOLUTION: The optical functional sheet comprises a base material having an optical functional shape formed on its top surface, and an antireflection layer formed on the top surface of the base material and having voids in the layer; and the sheet has an optical function by the optical functional shape. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种具有抗反射层的光学功能片，可应用于其表面具有光学功能形状的大型基材。解决方案：光学功能片包括在其顶表面上形成有光学功能形状的基材，以及形成在基材的顶表面上且在该层中具有空隙的抗反射层; 并且片材具有通过光学功能形状的光学功能。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2004130557A Manufacturing process for fine unevenness 审中-公开
公开(公告)号：JP2004130557A
公开(公告)日：2004-04-30
申请号：JP2002295279
申请日：2002-10-08
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SUZUKI TOMOYUKI , ITO ARIMICHI , HASEGAWA TOSHIYUKI , KISO SHOICHI , NAGANUMA HIROYUKI , MATSUOKA MASANAO
IPC分类号： B29C39/10 , B29C39/24 , G11B7/26
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing process for fine unevenness capable of stably duplicating the fine unevenness of an original form at a low cost with high accuracy.
SOLUTION: The manufacturing process for fine unevenness comprises a process (a) for preparing the original form (stamper) having fine unevenness on its surface, a process (b) for coating the almost entire surface of the stamper or substrate with a liquid ultraviolet curable resin, a process (c) for filling the gap between the stamper and the substrate with the liquid ultraviolet curable resin, a process (d) for irradiating the resin with ultraviolet rays to cure the same and a process (e) for peeling the stamper.
COPYRIGHT: (C)2004,JPO

5. 发明专利

JP2008158204A Antireflection film, molding die and manufacturing methods therefor, and optical member having the antireflection film 审中-公开
标题翻译：抗反射膜，成型模具及其制造方法，以及具有抗反射膜的光学部件
公开(公告)号：JP2008158204A
公开(公告)日：2008-07-10
申请号：JP2006346135
申请日：2006-12-22
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KISO SHOICHI , GOTO MASAHIRO , YAMAMOTO HIROSHI , HASEGAWA TOSHIYUKI
IPC分类号： G02B1/11 , B29C59/04
摘要： PROBLEM TO BE SOLVED: To provide an antireflection film which has an anti-reflectiveness and is restrained from deteriorating in the anti-reflectiveness due to adhesion of contaminants and to easily mass-produce the antireflection film inexpensively. SOLUTION: The antireflection film has irregularities of 1 to 30 μm arithmetic mean roughness (Ra). A recessed secondary surface shape is formed of a recessed basic shape which may be connected with each other, the basic shape has 30 to 200 nm average depth and 80 to 400 nm average diameter and arrangement of the basic shapes at an antireflection surface is substantially irregular. A protruded secondary surface shape is formed of a protruded basic shape which may be connected with each other, the basic shape has 30 to 200 nm average height and 80 to 400 nm average diameter and arrangement of the basic shapes at the antireflection surface is substantially irregular. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有抗反射性并且由于污染物的粘附而在抗反射性方面受到抑制的抗反射膜，并且容易廉价地大量生产抗反射膜。解决方案：抗反射膜具有1至30μm的算术平均粗糙度（Ra）的不规则性。凹陷的第二表面形状由可以彼此连接的凹入的基本形状形成，基本形状具有30至200nm的平均深度和80至400nm的平均直径，并且在抗反射表面处的基本形状的布置基本上是不规则的。突出的二次表面形状形成为可以彼此连接的突出的基本形状，基本形状具有30至200nm的平均高度和80至400nm的平均直径，并且在防反射表面处的基本形状的布置基本上是不规则的。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2006065303A Antireflection structure and optical member having the same 审中-公开
标题翻译：抗反射结构和具有该反射结构的光学成员
公开(公告)号：JP2006065303A
公开(公告)日：2006-03-09
申请号：JP2005201879
申请日：2005-07-11
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： HATTORI SHUJI , HASEGAWA TOSHIYUKI , KISO SHOICHI , SEKIZUKA TAKANORI
IPC分类号： G02B1/11
摘要： PROBLEM TO BE SOLVED: To stably and easily mass-produce an antireflection structure having fine ruggedness and an optical member having the antireflection structure at a low cost. SOLUTION: Regarding the antireflection structure having an antireflection surface on which fine projections are formed, the ratio of the projections occupying the antireflection surface is within the extent of 10% to 90% to the effective area of the antireflection surface, and the projections are constituted of a mutually connectable basic shape. The basic shape is 30 nm to 20 nm in mean height, and 80 nm to 400 nm in mean diameter, and the arrangement of the basic shape on the antireflection surface is substantially irregular, the optical member having the antireflection structure, an original mold for molding the antireflection structure, a manufacturing method for the original mold and a manufacturing method for a reproduction mold are offered. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了稳定且容易地以低成本大量生产具有良好凹凸性的抗反射结构和具有抗反射结构的光学部件。解决方案：对于具有形成微细突起的抗反射表面的抗反射结构，占抗反射表面的突起的比例在抗反射表面的有效面积的10％至90％的范围内，并且突起由相互连接的基本形状构成。基本形状的平均高度为30nm〜20nm，平均直径为80nm〜400nm，防反射面上的基本形状的配置基本不规则，具有防反射结构的光学部件，成型抗反射结构，提供原始模具的制造方法和再现模具的制造方法。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2006065302A Antireflection structure and optical member having the same 审中-公开
标题翻译：抗反射结构和具有该反射结构的光学成员
公开(公告)号：JP2006065302A
公开(公告)日：2006-03-09
申请号：JP2005201866
申请日：2005-07-11
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： HATTORI SHUJI , KISO SHOICHI , SEKIZUKA TAKANORI , HASEGAWA TOSHIYUKI
IPC分类号： G02B1/11 , G02F1/1335 , H01L31/04
CPC分类号： Y02E10/50
摘要： PROBLEM TO BE SOLVED: To stably, easily mass-produce an antireflection structure having fine ruggedness, and an optical member having the antireflection structure at a low cost. SOLUTION: Regarding the antireflection structure having an antireflection surface on which the fine recessed parts are formed, the ratio of the recessed parts occupying the antireflection surface is within the extent of 10% to 90% to the effective area of the antireflection surface, and the recessed parts are constituted of a mutually connectable basic shape, and the basic shape is 30 nm to 200 nm in mean depth, and the basic shape is 80 nm to 400 nm in mean diameter, and the arrangement of the basic shape on the antireflection surface is substantially irregular, the optical member provided with the aforesaid antireflection structure, an original mold for molding the antireflection structure, a manufacturing method for the original mold and a manufacturing method for a reproduction mold are offered. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题为了稳定地，容易地批量生产具有优良凹凸性的抗反射结构和具有低反射结构的光学部件。解决方案：对于具有形成微细凹部的抗反射面的防反射结构，占防反射面的凹部的比例与防反射面的有效面积的比例在10％〜90％的范围内并且凹部由相互连接的基本形状构成，基本形状的平均深度为30nm〜200nm，平均直径的基本形状为80nm〜400nm，基本形状的布置防反射面基本上是不规则的，提供具有上述抗反射结构的光学构件，用于模制抗反射结构的原始模具，原始模具的制造方法和再现模具的制造方法。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JPH04176614A FORMING METHOD OF DISC AND FORMING DEVICE THEREOF 失效
公开(公告)号：JPH04176614A
公开(公告)日：1992-06-24
申请号：JP30580990
申请日：1990-11-09
申请人： DAINIPPON PRINTING CO LTD
发明人： MATSUMOTO TAKESHI , KISO SHOICHI
IPC分类号： B29C39/10 , B29C39/22 , B29C43/18 , B29C43/32 , B29L17/00
摘要： PURPOSE:To realize uniform coating with small amount of resin and prevent bubble from mixing by a method wherein ionizing radiation curing resin application process, which is performed by spreading the resin through the rotation of the whole assembly prepared by placing a disc board on the ionizing radiation curing resin under the condition being dropped on a master, is present. CONSTITUTION:Under the condition that a disc board 72 is laminated ionizing radiation curing resin 71, which is dropped on a master 61 supported with a center jig 52, the center jig 52 is rotated so as to disperse the ionizing radiation curing resin 71 over the whole surfaces of the master and of the disc board. As the ionizing radiation curing resin 71, various oligomers, various acrylic monomers such as epoxy acrylate or the like or their mixture can be employed. Next, the ionizing radiation curing resin 71, which is applied between the master 61 and the disc board 72, is cured by being irradiated by ionizing radiation from radiation sources 32. After that, the master 61 is peeled off the ionizing radiation cured resin layer 71a fixed onto the disc board 72. Thus, uniform coating can be realized even with small amount of resin and burr can be prevented from developing at the outer peripheral edge of the disc board.

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