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1. 发明专利

JP2008019293A Polyester containing terpene phenol unit 有权
标题翻译：含聚烯烃酚醛单元的聚酯
公开(公告)号：JP2008019293A
公开(公告)日：2008-01-31
申请号：JP2006189871
申请日：2006-07-10
申请人： Dai Ichi Kogyo Seiyaku Co Ltd , Jsr Corp , Jsr株式会社 , 第一工業製薬株式会社
发明人： SHIRATO KAORI , HIRAI TAKESHI , IIJIMA TAKAHIRO , TAKAMURA NAOHIRO , SUGAWARA TERUAKI
IPC分类号： C08G63/56 , C08F290/00 , G03F7/027
CPC分类号： C08F290/14 , C08G63/54 , C08G63/918 , G03F7/0388
摘要： PROBLEM TO BE SOLVED: To provide a new polyester used as a photosensitive resin having flexibility. SOLUTION: The polyester has a terpene skeleton represented by general formula (1) (wherein, X represents a terpene diphenoxy group; Y represents a residue after removing carboxy groups from a tetrabasic acid dianhydride; R represents an H or a CH 3 ; R' represents an H or a residue of a carboxy group-blocking agent; and n represents an integer of 1-40). COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供用作具有柔性的感光性树脂的新型聚酯。解决方案：聚酯具有由通式（1）表示的萜烯骨架（其中X表示萜烯二苯氧基; Y表示从四元酸二酐除去羧基后的残基; R表示H或CH < SB> 3 ; R'表示H或羧基封闭剂的残基，n表示1-40的整数）。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2009300835A Radiation-sensitive composition, color filter and color liquid crystal display element 审中-公开
标题翻译：辐射敏感组合物，彩色滤光片和彩色液晶显示元件
公开(公告)号：JP2009300835A
公开(公告)日：2009-12-24
申请号：JP2008156481
申请日：2008-06-16
申请人： Jsr Corp , Jsr株式会社
发明人： NARUSE HIDENORI , MINOWA TAKAKI , MATOBA TAKUMI , IIJIMA TAKAHIRO
IPC分类号： G03F7/038 , C08F8/14 , C08F290/12 , G02B5/20 , G02F1/1335 , G03F7/004
摘要： PROBLEM TO BE SOLVED: To provide a new radiation-sensitive composition which forms a fine pattern without causing chipping and undercut of a pattern edge even with a small amount of light exposure or generating undissolved residues and scum on a pattern edge in development. SOLUTION: The radiation-sensitive composition comprises (A) an alkali-soluble resin, (B) a polymerizable unsaturated compound containing a polymer having in a side chain a group obtained by addition reaction of a carboxylic acid having an unsaturated bond to a specific oxiranyl group, and (C) a photopolymerization initiator. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种新的辐射敏感性组合物，其即使在少量的曝光下也会形成图案边缘的切屑和底切，从而形成精细图案，或者在显影图案边缘上产生未溶解的残留物和浮渣。解决方案：辐射敏感性组合物包含（A）碱溶性树脂，（B）含有侧链的聚合物的可聚合不饱和化合物是通过具有不饱和键的羧酸的加成反应获得的基团与特定的环氧乙烷基，（C）光聚合引发剂。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2009229567A Radiation sensitive resin composition, interlayer dielectric, and microlens, and method of producing the same 有权
标题翻译：辐射敏感性树脂组合物，中间层介电材料和微晶玻璃及其制造方法
公开(公告)号：JP2009229567A
公开(公告)日：2009-10-08
申请号：JP2008072063
申请日：2008-03-19
申请人： Jsr Corp , Jsr株式会社
发明人： HAMADA KENICHI , NAGAYA MASAYA , ONUMA YUUKI , HANAMURA MASAAKI , IIJIMA TAKAHIRO
IPC分类号： G03F7/023 , C08F2/44 , C08F265/00 , G02B1/04 , G02B3/00 , G03F7/004 , G03F7/40
摘要： PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition with which an interlayer dielectric having high surface hardness, excellent heat resistance and solvent resistance, and further having low dielectric constant can be formed, and with which a microlens with an excellent melted shape can be formed. SOLUTION: The radiation sensitive resin composition includes: a copolymer of a mixture of unsaturated compounds containing at least one selected from a group comprising an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and an unsaturated compound having an oxetanyl group; a 1,2-quinonediazide compound; and a carboxylic acid with a molecular weight of ≤1,000. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有高表面硬度，优异的耐热性和耐溶剂性并且还具有低介电常数的层间电介质的辐射敏感性树脂组合物，并且可以形成具有优异的微透镜可以形成熔化的形状。解决方案：辐射敏感性树脂组合物包括：含有选自不饱和羧酸和不饱和羧酸酐的基团中的至少一种的不饱和化合物的混合物和具有氧杂环丁烷基的不饱和化合物的共聚物; 1,2-醌二叠氮化合物; 和分子量≤1,000的羧酸。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2009053667A Radiation-sensitive resin composition, and interlayer insulation film, microlens, and method for producing those 有权
标题翻译：辐射敏感性树脂组合物和中间层绝缘膜，微生物及其生产方法
公开(公告)号：JP2009053667A
公开(公告)日：2009-03-12
申请号：JP2008159870
申请日：2008-06-19
申请人： Jsr Corp , Jsr株式会社
发明人： UCHIIKE KAZUHIRO , HANAMURA MASAAKI , HAMADA KENICHI , IIJIMA TAKAHIRO
IPC分类号： G03F7/023 , C08F2/38 , C08F220/02 , C08F222/00 , G02B1/04 , G02B3/00 , G03F7/40
摘要： PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high radiation sensitivity and enabling a patterned thin film excellent in heat resistance to be easily formed. SOLUTION: The radiation-sensitive resin composition includes [A] a polymer having at least one group selected from the group consisting of a carboxyl group and a carboxylic acid anhydride group, at least one group selected from the group consisting of an oxiranyl group and an oxetanyl group, and an n-valent group represented by formula (1) (wherein R 1 is a methylene group or a 2-10C alkylene group or alkylmethylene group; Y is a single bond, -CO-, -O-CO- * (provided that a bonding radical with "*" bonds to R 1 ) or -NHCO- * (provided that a bonding radical with "*" bonds to R 1 ); n is an integer of 2-10; X is a 2-70C n-valent hydrocarbon group which may have one or more ether bonds; and "+" is a bonding radical), and [B] a 1,2-quinonediazide compound. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供具有高辐射灵敏度的辐射敏感性树脂组合物，并且能够容易地形成耐热性优异的图案化薄膜。解决方案：辐射敏感性树脂组合物包括[A]具有至少一个选自羧基和羧酸酐基团的基团的聚合物，至少一种选自环氧乙烷基（1）表示的n价基团（式中，R“SP”是亚甲基或2-10C亚烷基或烷基亚甲基; Y是单键， -CO-，-O-CO- * （条件是具有“*”键与R 1键的键合基团）或-NHCO- （条件是具有“*”的键合基团与R 1键合）; n是2-10的整数; X是2-70C n价烃基，其可以具有一个或多个醚键;“+”是键合基团），[B]是1,2-醌二叠氮化合物。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2008158021A Composition for forming light diffuse reflecting film, light diffuse reflecting film and liquid crystal display element 审中-公开
标题翻译：用于形成光折射膜的组合物，轻微透射反射膜和液晶显示元件
公开(公告)号：JP2008158021A
公开(公告)日：2008-07-10
申请号：JP2006343828
申请日：2006-12-21
申请人： Jsr Corp , Jsr株式会社
发明人： HAMADA KENICHI , HANAMURA MASAAKI , UCHIIKE KAZUHIRO , IIJIMA TAKAHIRO
IPC分类号： G02B5/02 , C08F220/26 , G02B5/08 , G02F1/1335 , G03F7/004 , G03F7/023 , G03F7/027 , G03F7/038
摘要： PROBLEM TO BE SOLVED: To provide a composition having a sufficient process margin and proper storage stability, that is superior in adhesion to a substrate, heat resistance and solvent resistance and property of controlling an irregular shape, and capable of easily forming a film for use as a light diffusion reflecting film of a reflecting or semi-transmissive liquid crystal display element. SOLUTION: The composition for forming a light diffusion reflecting film contains [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) a specific oxetanyl group-containing (meth)acrylate and (a3) another olefinically unsaturated compound, and [B] a 1,2-quinonediazide compound. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：待解决的问题：提供具有足够的加工余量和适当的储存稳定性的组合物，其对基材的粘附性优异，耐热性和耐溶剂性以及控制不规则形状的性质，并且能够容易地形成用作反射或半透射型液晶显示元件的光扩散反射膜的膜。解决方案：用于形成光扩散反射膜的组合物含有（A）不饱和羧酸和/或不饱和羧酸酐的共聚物，（a2）特定的含氧杂环丁烷基的（甲基）丙烯酸酯和（a3）另一种烯属不饱和化合物，和[B] 1,2-醌二叠氮化合物。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2005300994A Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel 审中-公开
标题翻译：用于形成彩色层，彩色滤光片和彩色液晶显示面板的辐射敏感组合物
公开(公告)号：JP2005300994A
公开(公告)日：2005-10-27
申请号：JP2004118245
申请日：2004-04-13
申请人： Jsr Corp , Jsr株式会社
发明人： KAMII HIDEYUKI , IIJIMA TAKAHIRO , KOYAMA TAKAYOSHI , NAGATSUKA TOMIO
IPC分类号： G03F7/028 , G02B5/20 , G02B5/23 , G02F1/13 , G03F7/004
摘要： PROBLEM TO BE SOLVED: To provide a radiation sensitive composition for forming a colored layer which gives pixels and a black matrix that produce neither undissolved matter nor scum on a pattern edge in development, cause neither chipping of a pattern edge nor undercut even under low exposure energy. SOLUTION: The radiation sensitive resin composition for forming a colored layer contains (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photo-radical generator containing a compound represented by formula (1) or (2) as an essential component, wherein R 1 denotes a 1-12C (cyclo)alkyl or phenyl; R 2 denotes H, a 1-12C (cyclo)alkyl or phenyl; R 3 denotes H or a 1-12C (cyclo)alkyl; and R 4 -R 6 each denotes H or a 1-6C (cyclo)alkyl. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种用于形成着色层的辐射敏感组合物，其给出像素和黑色矩阵，其在显影中在图案边缘上既不会形成未溶解的物质也不产生浮渣，也不会导致图案边缘的切割或均匀的下切低曝光能量。解决方案：用于形成着色层的辐射敏感性树脂组合物含有（A）着色剂，（B）碱溶性树脂，（C）多官能单体和（D）含有表示的化合物的光激发生成剂（1）或（2）作为必需组分，其中R 1表示1-12C（环）烷基或苯基; R 2 表示H，1-12C（环）烷基或苯基; R 3表示H或1-12C（环）烷基; 且R 4各自表示H或1-6C（环）烷基。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2010084126A Curable resin composition, set for forming resin cured film, protection film and method for forming the protection film 有权
标题翻译：可固化树脂组合物，用于形成树脂固化膜，保护膜和形成保护膜的方法
公开(公告)号：JP2010084126A
公开(公告)日：2010-04-15
申请号：JP2009172002
申请日：2009-07-23
申请人： Jsr Corp , Jsr株式会社
发明人： IIJIMA TAKAHIRO , UEDA JIRO , FUJIOKA MASAYASU , TANIMOTO KANAKO
IPC分类号： C08L33/14 , C08F220/26 , C08K5/5435 , C08L83/06 , G02B5/20
摘要： PROBLEM TO BE SOLVED: To provide a curable resin composition capable of forming cured films having high flatness and being preferably used to form protective films for optical devices having high transparency and surface hardness, excellent in heat and pressure resistance, acid resistance, alkali resistance and spattering resistance and having good patterning characteristics of wired electrodes, and excellent in preservation stability.
SOLUTION: The curable resin composition comprises [A] a polymer having repeating units derived from a polymerizable unsaturated compound having an oxyranyl group or oxetanyl group, and [B] a specific polyorganosiloxane having oxetanyl groups.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决问题的方案：提供能够形成平坦度高的固化膜的固化性树脂组合物，优选用于形成透明性，表面硬度高，耐热性，耐酸性优异的光学元件用保护膜，耐碱性和耐飞溅性，并且具有良好的布线电极图案化特性，保存稳定性优异。解决方案：可固化树脂组合物包含[A]具有衍生自具有氧基乙酰基或氧杂环丁烷基的可聚合不饱和化合物的重复单元的聚合物，和[B]具有氧杂环丁烷基的特定聚有机硅氧烷。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2008286936A Radiation-sensitive resin composition, interlayer insulation film and microlens and method for forming those 有权
标题翻译：辐射敏感性树脂组合物，层间绝缘膜和微孔及其形成方法
公开(公告)号：JP2008286936A
公开(公告)日：2008-11-27
申请号：JP2007130723
申请日：2007-05-16
申请人： Jsr Corp , Jsr株式会社
发明人： HANAMURA MASAAKI , UCHIIKE KAZUHIRO , IIJIMA TAKAHIRO , HAMADA KENICHI
IPC分类号： G03F7/023 , C08F220/04 , C08F220/26 , G02B1/04 , G02B3/00 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high radiation sensitivity, having such a development margin as to form a good pattern profile even in a developing time exceeding the optimum developing time in a developing step, and capable of easily forming a patterned thin film excellent in adhesion. SOLUTION: The radiation-sensitive resin composition comprises: [A] a copolymer of (a1) at least one compound selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides, (a2) an unsaturated compound having at least one group selected from the group consisting of an oxiranyl group and an oxetanyl group, and (a3) an unsaturated compound other than the compounds (a1) and (a2); [B] a 1,2-quinonediazide compound; and [C] a compound having an alicyclic oxiranyl group but not having a carboxyl group. The radiation-sensitive resin composition is suitable for use particularly in the formation of an interlayer insulation film or microlenses. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有高辐射敏感性的辐射敏感性树脂组合物，具有如此的显影余量，即使在显影步骤中超过最佳显影时间的显影时间也形成良好的图案图形，并且能够容易地形成粘附性优异的图案化薄膜。解决方案：辐射敏感性树脂组合物包含：[A]（a1）至少一种选自不饱和羧酸和不饱和羧酸酐的化合物的共聚物，（a2）至少具有不饱和羧酸选自环氧乙烷基和氧杂环丁烷基的一个基团，和（a3）除化合物（a1）和（a2）之外的不饱和化合物; [B] 1,2-醌二叠氮化合物; 和[C]具有脂环族环氧乙烷基但不具有羧基的化合物。辐射敏感性树脂组合物特别适用于形成层间绝缘膜或微透镜。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2008233619A Radiation-sensitive resin composition, interlayer insulation film and microlens, and method for manufacturing the same 有权
标题翻译：辐射敏感性树脂组合物，中间层绝缘膜和微晶玻璃及其制造方法
公开(公告)号：JP2008233619A
公开(公告)日：2008-10-02
申请号：JP2007074501
申请日：2007-03-22
申请人： Jsr Corp , Jsr株式会社
发明人： HANAMURA MASAAKI , UCHIIKE KAZUHIRO , IIJIMA TAKAHIRO , HAMADA KENICHI
IPC分类号： G03F7/023 , C08G59/32 , C08G59/68 , G02B3/00 , G03F7/40 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivity to radiation, having a development margin allowing formation of a preferable pattern even through development exceeding the optimum developing time in a developing process, and capable of easily forming a patterned thin film having excellent adhesiveness with a substrate. SOLUTION: The radiation-sensitive resin composition contains: [A] a copolymer of (a1) a specified unsaturated compound having a carboxyl group, (a2) a specified unsaturated compound having an alicyclic epoxy skeleton and (a3) an unsaturated compound except for the above (a1) and (a2); and [B] a 1,2-quinonediazide compound. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供对辐射具有高灵敏度的辐射敏感性树脂组合物，具有允许形成优选图案的显影余量，甚至在显影过程中超过最佳显影时间的显影，并且能够容易地形成与基板具有优异粘附性的图案化薄膜。解决方案：辐射敏感性树脂组合物包含：[A]（a1）具有羧基的特定不饱和化合物的共聚物，（a2）具有脂环族环氧骨架的特定不饱和化合物和（a3）不饱和化合物除上述（a1）和（a2）外; 和[B] 1,2-醌二叠氮化合物。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2008175889A Radiation-sensitive resin composition, interlayer insulating film and microlens, and method for producing those 审中-公开
标题翻译：辐射敏感性树脂组合物，中间层绝缘膜和微晶，以及用于生产它们的方法
公开(公告)号：JP2008175889A
公开(公告)日：2008-07-31
申请号：JP2007007125
申请日：2007-01-16
申请人： Jsr Corp , Jsr株式会社
发明人： ONUMA YUUKI , HANAMURA MASAAKI , HAMADA KENICHI , IIJIMA TAKAHIRO
IPC分类号： G03F7/023 , C08F220/26 , G02B3/00 , G03F7/004 , G03F7/40 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having a sufficient process margin and good storage stability, and capable of giving a cured product excellent in heat and solvent resistances. SOLUTION: The radiation-sensitive resin composition comprises [A] a copolymer obtained by copolymerizing (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) (meth)acryloyloxyalkyloxetanes and (a3) an olefinically unsaturated compound different from the components (a1) and (a2), [B] a 1,2-quinonediazide compound, [C] a thermosensitive acid generator and [D] a nitrogen-containing crosslinking agent. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有足够的工艺余量和良好的储存稳定性的能够提供耐热和耐溶剂性优异的固化产物的辐射敏感性树脂组合物。解决方案：辐射敏感性树脂组合物包含[A]通过共聚（a1）不饱和羧酸和/或不饱和羧酸酐得到的共聚物，（a2）（甲基）丙烯酰氧基烷氧基乙烷和（a3）烯属不饱和羧酸不同于组分（a1）和（a2）的化合物，[B] 1,2-醌二叠氮化合物，[C]热敏酸产生剂和[D]含氮交联剂。版权所有（C）2008，JPO＆INPIT

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