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2. 发明专利

JPS5597220A METHOD OF PRODUCING METAL FILTER 失效
公开(公告)号：JPS5597220A
公开(公告)日：1980-07-24
申请号：JP393379
申请日：1979-01-19
申请人： DAINIPPON PRINTING CO LTD
发明人： ABE YASUYUKI , NAKADA TOMIHIRO , TAKAHASHI TATSUMI , KODERA MASAO
IPC分类号： B01D39/10 , B01D39/12 , B07B1/00 , B07B1/46 , G03F1/00 , G03F1/68
摘要： PURPOSE:To produce a metal filter for sieving ultrafine particles having uniform holes and high aperture rate by an electroforming method on an electroconductive base plate using a photomask having a light-shielding material of interference fringe pattern obtained by the interference of laser light. CONSTITUTION:In a transparent base plate 17 made of glass or the like there is provided a layer of a light-shielding material such as Cr or the like thereby to produce a mask original plate, and a phtotsensitive material layer 19 is applied on the layer 18. Then, an interference fringe pattern is baked on the layer 19, and developed to form a resist pattern 19A. Then, the exposed layer 18 is subjected to etching through the layer 19A. Thereafter, the resist 19A is exfoliated to obtain the object photomask P. Then, by use of the photomask P a fine diffraction grating pattern is baked on a photoresist layer 20 by ultraviolet rays 20, and developed to produce a resist pattern 22A. Then, a metal 23 is electroplated by using an ordinary electroforming method. Then, the metal 23 is exfoliated to obtain a metal filter having uniform ultrafine holes having a hole diameter of, for instance, 1mu or less, and a high aperture rate.

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