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1. 发明专利

JP2009164551A Batch forming system for amorphous silicon film 审中-公开
标题翻译：用于非晶硅膜的批量成型系统
公开(公告)号：JP2009164551A
公开(公告)日：2009-07-23
申请号：JP2008120521
申请日：2008-05-02
申请人： Contrel Technology Co Ltd , 東捷科技股▲分▼有限公司
发明人： YEH KUNG-HSU , HUANG MING-HUNG
IPC分类号： H01L31/04
CPC分类号： H01L31/206 , C23C16/54 , H01L21/67161 , H01L21/67754 , Y02E10/50 , Y02P70/521
摘要： PROBLEM TO BE SOLVED: To provide a batch forming system for an amorphous silicon thin film, which can improve a production speed. SOLUTION: A p-layer formation chamber 11 has a sealing gate 12 by stacking one layer of amorphous silicon p-type thin film on a piece-like stacking object 99. An i-layer formation chamber 13 has a sealing gate 14 by stacking one layer of amorphous silicon i-type thin film on a piece-like stacking object 99. An n-layer formation chamber 15 has a sealing gate 16 by stacking one layer of amorphous silicon n-type thin film on a piece-like stacking object 99. A shared vacuum chamber 17 communicates with the p-layer formation chamber 11, the i-layer formation chambers 13 and the n-layer formation chamber 15. A transport device 21 is arranged to be movable in the shard vacuum chamber 17, and has a reception surface 22. A transport vehicle 25 is positioned on the reception surface 22, and transports the plurality of piece-like stacking objects 99. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以提高生产速度的非晶硅薄膜的批量形成系统。解决方案：p层形成室11通过在片状堆叠物体99上层叠一层非晶硅p型薄膜而具有密封栅极12. i层形成室13具有密封栅极14 通过将一层非晶硅i型薄膜层叠在片状堆叠物体99上.n层形成室15具有密封栅极16，其通过将一层非晶硅n型薄膜堆叠在片状堆叠物体共用真空室17与p层形成室11，i层形成室13和n层形成室15连通。传送装置21被布置成可在碎片真空室17中移动，并具有接收面22.运送车辆25位于接收面22上，并且运送多个片状堆叠物体99.版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2009218542A Substrate cassette 审中-公开
标题翻译：基材CASSETTE
公开(公告)号：JP2009218542A
公开(公告)日：2009-09-24
申请号：JP2008120531
申请日：2008-05-02
申请人： Contrel Technology Co Ltd , 東捷科技股▲分▼有限公司
发明人： YANG CHENG-AN , HO CHIEN-LI , YEH KUNG-HSU , HUANG MING-HUNG
IPC分类号： H01L21/205 , B65G49/06 , C23C16/44 , C23C16/458 , H01L21/67
CPC分类号： C23C16/4587 , C30B25/105 , C30B25/12 , C30B29/06 , H01L21/67326 , H01L21/6734
摘要： PROBLEM TO BE SOLVED: To provide a substrate cassette which is applicable to chemical vapor deposition process and has an electrode array therein adaptive to attachment of a plurality of substrates. SOLUTION: A case 11 has a conductive members 12 on a bottom side thereof and has a plurality of fixtures 16 on a top side, and the conductive member 12 has a plurality of first channels 14 and a plurality of second channels 15 parallel to each other. The fixtures 16 are located above the first and second channels 14 and 15, and an insulator 17 is mounted in each second channel 15. A plurality of first electrode plates 21 have bottom edges separately fixed into corresponding first channels 14 and have top edges separately fixed to corresponding fixtures 16. A plurality of second electrode plates 31 have bottom edges separately fixed into corresponding insulators 17 and have top edges separately fixed to corresponding fixtures 16. A plurality of struts 41 are mounted to both sides of bottom edges of corresponding first electrode plates 21 and to both sides of bottom edges of corresponding second electrode plate 31 to form a limited space for receiving substrates. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种适用于化学气相沉积工艺的基片盒，并且其中具有适于多个基片的附着的电极阵列。解决方案：壳体11在其底侧上具有导电构件12，并且在顶侧上具有多个固定件16，并且导电构件12具有多个第一通道14和多个平行的第二通道15 对彼此。固定件16位于第一和第二通道14和15的上方，并且绝缘体17安装在每个第二通道15中。多个第一电极板21具有分别固定到相应的第一通道14中的底边缘，并且具有分别固定的顶部边缘多个第二电极板31具有分别固定到相应的绝缘体17中的底边缘，并且具有分别固定到相应固定件16的顶边缘。多个支柱41安装在相应的第一电极板的底部边缘的两侧 21和对应的第二电极板31的底部边缘的两侧，以形成用于接收基板的有限空间。版权所有（C）2009，JPO＆INPIT

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