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1. 发明专利

JP2008159905A Gas integration unit 有权
标题翻译：气体整合单元
公开(公告)号：JP2008159905A
公开(公告)日：2008-07-10
申请号：JP2006347957
申请日：2006-12-25
申请人： Ckd Corp , シーケーディ株式会社
发明人： OGIWARA TATSUNORI , INOUE TAKASHI , INAGAKI TAKEYA
IPC分类号： H01L21/31 , B01J4/02
摘要： PROBLEM TO BE SOLVED: To provide a gas integration unit whose foot space is reduced.
SOLUTION: A gas integration unit 1 is provided with: first gas units 72A, 72B and 72C for controlling the supply of the first gas; a second gas unit 73 connected to the first gas units 72A, 72B and 72C for controlling purge gas to join the first gas units 72A, 72B and 72C by a plurality of fluid control equipment 31 to 34, 38A to 43A, 38B to 43B and 38C to 43C; and layered blocks 61A, 61B and 61C laminated on the first gas units 72A, 72B and 72C, wherein a part of the fluid control equipment 38A, 38B and 38C is laminated on the layered blocks 61A, 61B and 61C.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供脚部空间减小的气体积分单元。气体积分单元1设置有用于控制第一气体的供给的第一气体单元72A，72B和72C; 连接到第一气体单元72A，72B和72C的第二气体单元73，用于通过多个流体控制设备31至34,38A至43A，38B至43B控制吹扫气体以连接第一气体单元72A，72B和72C，以及 38℃〜43℃; 以及层压在第一气体单元72A，72B和72C上的分层块61A，61B和61C，其中流体控制设备38A，38B和38C的一部分层压在分层块61A，61B和61C上。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2005163952A Block for gas supply unit 有权
标题翻译：气体供应单元块
公开(公告)号：JP2005163952A
公开(公告)日：2005-06-23
申请号：JP2003405615
申请日：2003-12-04
申请人： Ckd Corp , シーケーディ株式会社
发明人： YOSHIDA KAZUHIRO , OGIWARA TATSUNORI , MIWA TOSHIICHI
IPC分类号： F16K27/00
摘要： PROBLEM TO BE SOLVED: To provide a block for a gas supply unit capable of constituting apparatuses, such as an opening and closing valve, in series.
SOLUTION: This block 1 for the gas supply unit has a first port 11, a second port 12, a third port 13 and a forth port 14 formed in a straight line on its upper face, and has a first gas flow channel 21 communicating the first port 11 and the third port 13 and formed on a first division part 31, and a second gas flow channel 22 communicating the second port 12 and the fourth port 14 and formed on a second division part 32. The gas supply unit can be serialized by mounting the apparatuses such as the opening and closing valve in series, and a space for a semiconductor manufacturing process by integration of a plurality of units can be saved.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够构成诸如开合阀等装置的气体供应单元的块。解决方案：用于气体供应单元的块1具有在其上表面上以直线形成的第一端口11，第二端口12，第三端口13和第四端口14，并且具有第一气体流动通道 21连接第一端口11和第三端口13并形成在第一分隔部分31上，以及连通第二端口12和第四端口14并形成在第二分隔部分32上的第二气体流动通道22.气体供应单元可以通过串联安装诸如开关阀等装置来串联，并且可以节省通过集成多个单元的半导体制造工艺的空间。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2000240900A VALVE UNIT 失效
公开(公告)号：JP2000240900A
公开(公告)日：2000-09-08
申请号：JP4196499
申请日：1999-02-19
申请人： CKD CORP
发明人： NAGAYA AKINORI , OGIWARA TATSUNORI
IPC分类号： F17D1/02
摘要： PROBLEM TO BE SOLVED: To provide a valve unit for replacing residual gas with high efficiency. SOLUTION: A valve unit 10 is constituted with a plurality of fluid control apparatuses 2, 3, and 4 to control the flow of fluid flowing through a flow passage are mounted on a manifold 1 wherein a flow passage is formed in a block body, and the valve unit comprises the gas feed valve 2, and the gas substitution valve 3 arranged downstream of the flow of process gas and controlling the flow of purge gas. A confluent point between a process gas flow passage 22 formed on the discharge side from the gas feed valve 2 and a purge gas flow passage 25 formed so as to be confluent with the process gas flow passage 22 from a gas substitution valve 3 is situated upper stream from the gas substitution valve 3.

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