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    • 1. 发明专利
    • Method for measuring frequency of quartz oscillator
    • 用于测量QUARTZ振荡器频率的方法
    • JPH11271368A
    • 1999-10-08
    • JP9834698
    • 1998-03-25
    • Citizen Watch Co LtdMiyota Kkシチズン時計株式会社ミヨタ株式会社
    • AKUTSU SATORUSAKURAI HIDENORIYANAGISAWA KATSUNORIIKEDA RYOTA
    • G01R29/22
    • PROBLEM TO BE SOLVED: To provide a measurement method whereby a resonant frequency can be measured sufficiently correctly and efficiently under a condition close to a final product with error factors and operation inconvenience in the prior art measurement method eliminated.
      SOLUTION: A quartz oscillator 1 of a rectangular plate having a plurality of lead electrodes for excitation electrodes disposed in the vicinity of at least one short side is an object to be measured according to this method. A pair of contact elements 2 are provided which touch thereby holding a small area of a predetermined position of the vicinity of the short side in a perpendicular direction to a plate face. A conductor to be in touch with the lead electrode 12 is set at the contact element. A jig to which a measurement terminal of an oscillator characteristic-measuring circuit 3 according to a transmission method is connected beforehand is used for the conductor. While the quartz oscillator to be measured is held by the contact elements 2, a resonant frequency of the quartz oscillator to be measured is measured by the transmission method.
      COPYRIGHT: (C)1999,JPO
    • 要解决的问题:提供一种测量方法,其可以在接近最终产品的状况下充分正确和有效地测量共振频率,并且消除了现有技术测量方法中的误差因素和操作不便。 解决方案:根据该方法,具有设置在至少一个短边附近的用于激励电极的多个引线电极的矩形板的石英振荡器1是待测量的对象。 提供一对接触元件2,从而将短边附近的预定位置的小面积保持在与板面垂直的方向上。 与引线电极12接触的导体设置在接触元件上。 导体使用根据传输方法连接的振荡器特性测量电路3的测量端的夹具。 当被测量的石英振荡器被接触元件2保持时,通过传输方法测量被测量的石英振荡器的谐振频率。
    • 3. 发明专利
    • DEPOSITION APPARATUS AND DEPOSITION METHOD
    • JPH1161384A
    • 1999-03-05
    • JP24041297
    • 1997-08-19
    • MIYOTA KKCITIZEN WATCH CO LTD
    • WAKASUGI MAKOTOAKUTSU SATORUYANAGISAWA KATSUNORISAKURAI HIDENORIIKEDA RYOTA
    • C23C14/24H03H3/02
    • PROBLEM TO BE SOLVED: To greatly improve the uniformization of the thickness of the films formed by vapor deposition, etc., by forming the shape of a film thickness correction plate fixed in the middle between a vapor deposition source and materials for vapor deposition to a triangular shape bulging at the hypotenuse and directing its vertex toward the central axis of revolution motion. SOLUTION: The silver evaporation source 61 to be heated is disposed on the bottom in a bell-jar having a bell-jar inside wall surface 1 and works (materials for vapor deposition) 4 mounted at 10 pieces of work holders 3 rotating horizontally around a perpendicular revolving shaft 2 are disposed in the upper part. The holders 3 are held at the front end of rotating shafts 5 having an angle of 45 deg. with the revolving shaft 2 and revolve around the revolving shaft 2 while rotating around the rotating shafts. The shape of the sheet-like film thickness correction plate 12 fixed to the middle between the silver evaporation source 61 and the works 4 is formed to the isosceles triangular shape bulging at the hypotenuse as shown by a broken line and the vertex of this triangular shape is directed toward the revolving shaft 2. As a result, the change in the particle beam density of the materials to be deposited by evaporation in the range where the resolving loci of the works 4 intersect with the film thickness correction plate is well corrected.