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1. 发明专利

JP2005099778A Antireflection laminate 有权
标题翻译：抗反射层压板
公开(公告)号：JP2005099778A
公开(公告)日：2005-04-14
申请号：JP2004246625
申请日：2004-08-26
申请人： Catalysts & Chem Ind Co Ltd , Dainippon Printing Co Ltd , 大日本印刷株式会社 , 触媒化成工業株式会社
发明人： SHINOHARA SEIJI , MIZUNO UTAKO , NAKAJO MIDORI , YOSHIHARA TOSHIO , NISHIDA HIROYASU , MURAGUCHI MAKOTO , HIRAI MASABUMI
IPC分类号： G02B1/11 , B32B7/02 , G02B1/10
摘要： PROBLEM TO BE SOLVED: To provide an antireflection laminate of low refractive index and excellent mechanical strength, furnished with a coating layer of ionizing radiation curable resin composition containing hollow silica microparticles having an ionizing radiation curable composition. SOLUTION: The antireflection laminate is composed, by providing at least a low refractive index layer of 1.45 or below refractive index on a light-transmitting base material. The low-refractive index layer comprises the ionizing radiation curable resin composition and silica microparticles having an outer shell layer and an interior being porous or void. The silica microparticles in part or as a whole have at least a portion of the surface of the silica microparticles treated with a silane-coupling agent having the ionizing radiation curable group. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决问题的方案为了提供一种具有低折射率和优异的机械强度的抗反射层压板，其具有包含具有电离辐射固化组合物的中空二氧化硅微粒的电离辐射固化树脂组合物的涂层。解决方案：通过在透光性基材上至少设置1.45以下的折射率低折射率层，构成防反射层叠体。低折射率层包括电离辐射固化树脂组合物和具有外壳层和内部为多孔或空隙的二氧化硅微粒。二氧化硅微粒部分或全部具有用具有电离辐射固化基团的硅烷偶联剂处理的二氧化硅微粒的表面的至少一部分。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2007145633A Manufacturing method of anisotropic-shape silica sol 有权
标题翻译：各向异性二氧化硅溶胶的制备方法
公开(公告)号：JP2007145633A
公开(公告)日：2007-06-14
申请号：JP2005341086
申请日：2005-11-25
申请人： Catalysts & Chem Ind Co Ltd , 触媒化成工業株式会社
发明人： NISHIDA HIROYASU , WAKAMIYA YOSHINORI , MATSUDA MASAYUKI , HIRAI TOSHIHARU
IPC分类号： C01B33/148 , B24B37/00 , B82Y10/00 , B82Y30/00 , B82Y99/00 , C01B33/141 , C01B33/142 , C09K3/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of an anisotropic-shape silica sol suited as a polishing material. SOLUTION: The anisotropic-shape silica sol is manufactured by adjusting the pH of a silica sol having an average particle size within the range of 3-20 nm through a cation-removing process to pH2-5, then subjecting to an anion-removing process, thereafter adjusting its pH by adding an alkaline aqueous solution to pH7-9, and heating it to 60-250°C. The obtained anisotropic-shape silica sol has an average particle size within the range of 4-25 nm and a minor axis/major axis ratio within the range of 0.05-0.5. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供适合作为研磨材料的各向异性形状的硅溶胶的制造方法。解决方案：通过将平均粒度在3-20nm范围内的二氧化硅溶胶的pH通过阳离子去除方法调节至pH2-5制备各向异性形状的二氧化硅溶胶，然后进行阴离子然后通过加入碱性水溶液至pH7-9调节其pH，并将其加热至60-250℃。得到的各向异性二氧化硅溶胶的平均粒径为4〜25nm，短轴/长轴比在0.05〜0.5的范围内。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2005119909A Antimony oxide coated silica particulate, manufacturing method thereof and substrate having coating film containing the particulate 有权
标题翻译：抗氧化涂层二氧化硅颗粒，其制造方法和具有包含颗粒的涂层膜的基材
公开(公告)号：JP2005119909A
公开(公告)日：2005-05-12
申请号：JP2003357113
申请日：2003-10-17
申请人： Catalysts & Chem Ind Co Ltd , 触媒化成工業株式会社
发明人： MURAGUCHI MAKOTO , KUMAZAWA MITSUAKI , NISHIDA HIROYASU , HIRAI TOSHIHARU
IPC分类号： B01J13/00 , B01J19/00 , C01B33/12 , C01B33/149 , C01B33/18 , C01G30/00 , C09C1/30 , H01B1/00 , H01B1/08
CPC分类号： H01B1/08 , C01P2006/40 , C01P2006/60 , C09C1/3054 , Y10T428/2991
摘要： PROBLEM TO BE SOLVED: To provide an antimony oxide-coated silica particulate having a low refractive index and conductivity. SOLUTION: The antimony oxide-coated silica particulate is prepared by coating a porous or hollow silica particulate with antimony oxide. The antimony oxide-coated silica particulate has a refractive index of 1.35-1.60, a volume resistivity of 10-5,000 Ω/cm, an average particle size of 5-300 nm and a thickness of the antimony oxide coating layer of 0.5-30 nm. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供具有低折射率和导电性的氧化锑涂覆的二氧化硅颗粒。解决方案：通过用氧化锑涂覆多孔或中空二氧化硅颗粒来制备氧化锑涂覆的二氧化硅颗粒。氧化锑涂覆的二氧化硅颗粒的折射率为1.35-1.60，体积电阻率为10-5000Ω/ cm，平均粒度为5-300nm，氧化锑覆层的厚度为0.5-30nm 。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2004002723A Polishing particle, method for preparing the same and abrasive 审中-公开
公开(公告)号：JP2004002723A
公开(公告)日：2004-01-08
申请号：JP2003074839
申请日：2003-03-19
申请人： Catalysts & Chem Ind Co Ltd , 触媒化成工業株式会社
发明人： NISHIDA HIROYASU , WAKAMIYA YOSHINORI , KOMATSU MICHIO
IPC分类号： B24B37/00 , B82Y10/00 , B82Y30/00 , B82Y99/00 , C01B33/141 , C09K3/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To prepare a polishing particle having a core-shell structure capable of controlling polishing speed by adjusting thickness and/or density of its shell part. SOLUTION: The polishing particle provides an abrasive having a core-shell structure wherein an average particle diameter (D) is in the range of 5-300 nm, the shell part is composed of silica having thickness (S T ) in the range of 1-50 nm, has density in the range of 1.6-2.2 g/cc and Na content of ≤ 10 ppm. COPYRIGHT: (C)2004,JPO

5. 发明专利

JP2003012460A Resin-coated spherical porous particle, method for producing the same, and cosmetic compounded with the same 有权
标题翻译：树脂包覆的球形多孔颗粒，其制造方法和与其组合的化妆品
公开(公告)号：JP2003012460A
公开(公告)日：2003-01-15
申请号：JP2001197056
申请日：2001-06-28
申请人： Catalysts & Chem Ind Co Ltd , 触媒化成工業株式会社
发明人： MIYAZAKI TAKUMI , NISHIDA HIROYASU , NAKAI MITSURU , TANAKA HIROKAZU
IPC分类号： A61K8/18 , A61K8/00 , A61K8/06 , A61K8/19 , A61Q1/00 , A61Q1/02 , A61Q1/12 , B01J2/00 , B01J2/04 , C01B13/14 , C01B33/12 , C01F7/02 , C01G23/04 , A61K7/02 , A61K7/00 , A61K7/021
摘要： PROBLEM TO BE SOLVED: To provide resin-coated spherical porous particles capable of regulating a wide range of touch and having good feeling in use such as easy spread and slipperiness.
SOLUTION: Each of the resin-coated spherical porous particles is composed of an inorganic oxide microparticle assembly having an average size of 1-100μm as aggregate of the inorganic oxide microparticles 2-250 nm in average size and a resin layer coating the assembly; wherein the resin layer comprises preferably a resin with rubbery elasticity 200-3,000 N/cm
2 in 100% tensile modulus, and the pore volume of the inorganic oxide microparticle assembly is preferably 0.01-1.5 cc/g.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供能够调节宽范围的触感并且具有良好的使用感觉，例如易于铺展和滑溜的树脂涂覆的球形多孔颗粒。解决方案：每个树脂涂覆的球形多孔颗粒由平均尺寸为1-100μm的无机氧化物微粒组件组成，其平均尺寸为无机氧化物微粒团聚体2-250nm，涂覆组合物的树脂层; 其中树脂层优选包含100％拉伸模量的橡胶弹性为200-3000N / cm 2的树脂，无机氧化物微粒组件的孔体积优选为0.01-1.5cc / g。

6. 发明专利

JP2007153692A Method for manufacturing anisotropic-shape silica sol 有权
标题翻译：制造各向异性二氧化硅溶胶的方法
公开(公告)号：JP2007153692A
公开(公告)日：2007-06-21
申请号：JP2005352661
申请日：2005-12-06
申请人： Catalysts & Chem Ind Co Ltd , 触媒化成工業株式会社
发明人： NISHIDA HIROYASU , WAKAMIYA YOSHINORI
IPC分类号： C01B33/151 , B24B37/00 , B82Y10/00 , B82Y30/00 , B82Y99/00 , C09K3/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To obtain an anisotropic-shape silica sol from a predetermined silica sol as a source material. SOLUTION: The anisotropic-shape silica sol is obtained by controlling the pH of a silicic acid liquid (a) to 10.0 to 12.0 by addition of an alkali aqueous solution, then intermittently or continuously adding a mixture of a silicic acid liquid (b) and a water-soluble metal salt having the valance of 2 or more under the temperature condition of 60 to 150°C. The obtained anisotropic-shape silica sol has an average particle size of 3 to 30 nm with a ratio of minor diameter/major diameter ranging from 0.01 to 0.5. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：从作为源材料的预定硅溶胶获得各向异性形状的硅溶胶。解决方案：通过添加碱性水溶液将硅酸液体（a）的pH控制在10.0〜12.0，然后间歇地或连续地加入硅酸液体（ b）和在60〜150℃的温度条件下具有2以上的价态的水溶性金属盐。得到的各向异性二氧化硅溶胶的平均粒径为3〜30nm，小径/长径比为0.01〜0.5。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2007153672A Method for manufacturing anisotropic-shape silica sol 有权
标题翻译：制造各向异性二氧化硅溶胶的方法
公开(公告)号：JP2007153672A
公开(公告)日：2007-06-21
申请号：JP2005351260
申请日：2005-12-05
申请人： Catalysts & Chem Ind Co Ltd , 触媒化成工業株式会社
发明人： NISHIDA HIROYASU , WAKAMIYA YOSHINORI
IPC分类号： C01B33/141 , C09K3/14
摘要： PROBLEM TO BE SOLVED: To provide an anisotropic-shape silica sol that is suitable as an abrasive material and to provide a method for manufacturing the same.
SOLUTION: The anisotropic-shape silica sol is manufactured by adding a poly-metal chloride by 0.01 to 70 parts by weight to 100 parts by weight of the silica solid content in a silica sol of the pH of 2 to 8 having dispersion of silica fine particles having a 3 to 25 nm average particle size measured by an alkali titration method, and then heating the mixture at 50 to 160°C.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供适合作为研磨材料的各向异性形状的硅溶胶，并提供其制造方法。解决方案：各向异性形状的二氧化硅溶胶通过在具有分散性的2至8的pH为2至8的二氧化硅溶胶中，相对于100重量份的二氧化硅固体含量加入0.01至70重量份的多金属氯化物来制造的通过碱滴定法测定的平均粒径为3〜25nm的二氧化硅微粒，然后在50〜160℃下加热。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2007153671A Method for manufacturing anisotropic-shape silica sol 有权
标题翻译：制造各向异性二氧化硅溶胶的方法
公开(公告)号：JP2007153671A
公开(公告)日：2007-06-21
申请号：JP2005351259
申请日：2005-12-05
申请人： Catalysts & Chem Ind Co Ltd , 触媒化成工業株式会社
发明人： NISHIDA HIROYASU , WAKAMIYA YOSHINORI
IPC分类号： C01B33/143 , B24B37/00 , B82Y10/00 , B82Y30/00 , B82Y99/00 , C09K3/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an anisotropic-shape silica sol that is suitable as an abrasive material and to provide a method for manufacturing the same. SOLUTION: A silica sol is prepared by adding a silicic acid liquid to an aqueous solution of a water-soluble silicate to prepare a mixture liquid of SiO 2 /M 2 O, wherein M is selected from alkali metals, tertiary ammonium, quaternary ammonium or guanidine, with a molar ratio of 30 to 65, to which a silicic acid solution is again intermittently or continuously added at 60 to 200°C. The obtained silica sol is heated in a range of pH 7 to 9 at 60 to 98°C. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供适合作为研磨材料的各向异性形状的硅溶胶，并提供其制造方法。解决方案：通过将硅酸液体加入到水溶性硅酸盐的水溶液中来制备二氧化硅溶胶，以制备SiO 2 / SB / M SB 2的混合液 > O，其中M选自摩尔比为30至65的碱金属，叔铵，季铵或胍，在60至200℃下再次间歇或连续加入硅酸溶液。将得到的硅溶胶在pH7〜9的范围内加热至60〜98℃。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2006080406A Composition for polishing 审中-公开
标题翻译：抛光组合物
公开(公告)号：JP2006080406A
公开(公告)日：2006-03-23
申请号：JP2004264796
申请日：2004-09-13
申请人： Catalysts & Chem Ind Co Ltd , 触媒化成工業株式会社
发明人： WAKAMIYA YOSHINORI , NISHIDA HIROYASU , KOMATSU MICHIO
IPC分类号： H01L21/304 , B24B37/00 , B82Y10/00 , B82Y99/00 , C09K3/14
摘要： PROBLEM TO BE SOLVED: To suppress a decrease in a polishing rate to the minimum regardless of long-term polishing service. SOLUTION: In a composition for polishing, a spheroidal particle whose sphericity is 0.9 or larger and 1.0 or smaller and a non-spheroidal particle whose sphericity is 0.3 or larger and less than 0.9 are dispersed in a water-based dispersive medium, and the weight ratio of the spheroidal particle to the non-spheroidal particle ranges from 2/98 to 35/65. The spheroidal particle and non-spheroidal particle are made of silica particles, the average grain size of the spheroidal particle ranges from 20 to 150 nm, and that of the non-spheroidal particle ranges from 5 to 100 nm. The pH of the composition for polishing ranges from 8 to 11.5, and the amount of basic impurities contained in the composition for polishing is 100 ppm or smaller to SiO 2 . COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：不管长期的抛光服务如何，都将抛光速率的降低抑制到最小。解决方案：在抛光用组合物中，将球状度为0.9以上且1.0以下的球状粒子和球形度为0.3以上且小于0.9的非球形粒子分散在水性分散介质中，并且球状颗粒与非球形颗粒的重量比为2/98〜35/65。球状颗粒和非球形颗粒由二氧化硅颗粒制成，球形颗粒的平均晶粒尺寸范围为20至150nm，非球形颗粒的平均晶粒尺寸范围为5至100nm。研磨用组合物的pH为8〜11.5，研磨用组合物中所含的碱性杂质的含量相对于SiO 2 <100>为100ppm以下。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2003342496A Silica-coated gold particulates, manufacturing method therefor and red pigment 有权
标题翻译：二氧化硅包覆金颗粒，其制造方法和红色颜料
公开(公告)号：JP2003342496A
公开(公告)日：2003-12-03
申请号：JP2002155268
申请日：2002-05-29
申请人： Catalysts & Chem Ind Co Ltd , 触媒化成工業株式会社
发明人： NISHIDA HIROYASU , WAKAMIYA YOSHINORI
IPC分类号： A61K8/30 , A61K8/19 , A61Q1/00 , A61Q1/02 , C09C1/62 , C09C3/06 , A61K7/02
摘要： PROBLEM TO BE SOLVED: To provide a useful red pigment that does not decrease clarity and is not discolored even when exposed to a high temperature.
SOLUTION: These silica-coated gold particles are obtained by coating with silica, the surface of gold particulates having an average particle size (DG) of 2-50 nm, wherein the average particle size (DP) of the silica-coated gold particulates is 4-150 nm. According to the production method, a surfactant is added to a dispersion of the gold particulates having an average particle size (DG) of 2-50 nm in water or a mixture of water and an organic solvent, an alkali is then added to the dispersion to adjust the pH of the dispersion in the range of 9-12, the dispersion is subject to heating/aging, if necessary, and an acidic silicic acid solution or a silica sol is added to the dispersion.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种有用的红色颜料，其即使在暴露于高温下也不会降低透明度并且不变色。解决方案：这些二氧化硅涂覆的金颗粒通过用二氧化硅涂覆获得，金颗粒的表面具有2-50nm的平均粒度（DG），其中二氧化硅涂覆的平均粒径（DP）金颗粒为4-150nm。根据制造方法，在水或有机溶剂的混合物中，在平均粒径（DG）为2-50nm的金粒子的分散液中加入表面活性剂，然后向分散体为了将分散体的pH调节在9-12的范围内，如果需要，将分散体进行加热/老化，并向分散体中加入酸性硅酸溶液或二氧化硅溶胶。版权所有（C）2004，JPO

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