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    • 1. 发明专利
    • Film thickness detection device and vapor deposition method
    • 薄膜厚度检测装置和蒸发沉积方法
    • JP2009001885A
    • 2009-01-08
    • JP2007165773
    • 2007-06-25
    • Canon Incキヤノン株式会社
    • YOSHIKAWA TOSHIAKIMASHITA SEIJIFUKUDA NAOTO
    • C23C14/24H01L51/50H05B33/10
    • PROBLEM TO BE SOLVED: To improve the operation efficiency of a vapor deposition apparatus by regenerating a resonator of a film thickness detection device provided in a vapor deposition chamber in such a state that the resonator is placed in the vapor deposition chamber.
      SOLUTION: A plurality of resonators 5 are installed in a resonator holder 4. When a vapor deposited film having a certain degree of thickness is stacked on the surface of the resonator 5 for measuring the film thickness in an operative position A, the resonator 5 is moved to an inoperative position B capable of being heated with a heater block 8 and covered with a wall face of a shield 1 whose periphery is cooled, and then the vapor deposited film on the surface of the resonator 5 is removed to regenerate the resonator 5. During this time, measuring of the film thickness is continued by using other resonator 5 in the operative position A. It becomes possible to continue vapor deposition for a long period of time without releasing the vapor deposition chamber to the atmospheric air by repeating these processes.
      COPYRIGHT: (C)2009,JPO&INPIT
    • 解决的问题:为了提高气相沉积装置的操作效率,通过在谐振器被放置在蒸镀室中的状态下再生设置在气相沉积室中的膜厚度检测装置的谐振器来提高其工作效率。 解决方案:多个谐振器5安装在谐振器保持器4中。当在谐振器5的表面上层叠具有一定厚度的蒸镀膜以测量操作位置A的膜厚时, 谐振器5移动到能够用加热器块8加热并被周围被冷却的屏蔽件1的壁面覆盖的非工作位置B,然后去除谐振器5的表面上的气相沉积膜以再生 在此期间,通过在操作位置A中使用其它谐振器5继续测量膜厚度。可以长时间地继续气相沉积,而不会通过以下方式将气相沉积室释放到大气中: 重复这些过程。 版权所有(C)2009,JPO&INPIT
    • 2. 发明专利
    • Vapor deposition apparatus
    • 蒸气沉积装置
    • JP2008115410A
    • 2008-05-22
    • JP2006297375
    • 2006-11-01
    • Canon Incキヤノン株式会社
    • YOSHIKAWA TOSHIAKIMASHITA SEIJIFUKUDA NAOTO
    • C23C14/24H01L51/50
    • PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which extends the usable life of a film thickness monitor and makes the tact time, the product yield rate, and the manufacturing cost appropriate.
      SOLUTION: This vapor deposition apparatus includes a vapor deposition source having an opening 5 for vapor deposition, and an opening 6 for a film thickness monitor. The opening 5 for vapor deposition is placed so as to face a quartz glass substrate which is a substrate to be vapor-deposited. The opening 6 for the film thickness monitor is placed towards a direction except the direction towards the quartz glass substrate which is the substrate to be vapor-deposited. The film thickness monitor 7 is placed at a position directly facing the opening 6 for the film thickness monitor.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种延长膜厚监测器的使用寿命的蒸镀装置,使得生产时间,产品成品率和制造成本适合。 解决方案:该蒸镀装置包括:蒸镀源,具有蒸镀用的开口部5和膜厚监视器的开口部6。 放置用于气相沉积的开口5以面对作为气相沉积基板的石英玻璃基板。 膜厚监视器的开口6朝向除了作为要气相沉积的基板的石英玻璃基板的方向以外的方向。 膜厚监视器7被放置在与膜厚监视器的开口6正对的位置处。 版权所有(C)2008,JPO&INPIT
    • 3. 发明专利
    • Vacuum deposition source and vacuum deposition device
    • 真空沉积源和真空沉积装置
    • JP2008024998A
    • 2008-02-07
    • JP2006200190
    • 2006-07-24
    • Canon Incキヤノン株式会社
    • MASHITA SEIJIYOSHIKAWA TOSHIAKIFUKUDA NAOTO
    • C23C14/24H01L51/50H05B33/10
    • PROBLEM TO BE SOLVED: To provide a vacuum deposition source which can prevent the generation of clogging at the opening of a crucible and enables stable film deposition for a long time.
      SOLUTION: The growth of a vapor deposition material 5 associated with the redeposition of the evaporated vapor deposition material 5 in the crucible is thermally suppressed by arranging an inner cap 3 having a good thermal conductivity at the inside of the crucible body 1 in such a constitution that the position of each opening part 3a of the inner cap 3 is different from the position of a crucible opening 1a formed in an upper cap in the vertical direction. That is to say, the heat from a heater 4 is transferred through the inner cap 3 to the central part of the vapor deposition material 5, and the local lowering of the temperature of the vapor deposition material 5 is prevented. Clogging can be further effectively prevented by additionally providing a columnar support or a partition having a good thermal conductivity between the inner cap 3 and the bottom wall of the crucible.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种可以防止在坩埚开口处产生堵塞的真空沉积源,并且能够长期稳定地进行膜沉积。 解决方案:通过在坩埚体1的内部布置具有良好导热性的内盖3,与坩埚中蒸发的蒸镀材料5的再沉积相关的蒸镀材料5的生长被热抑制 内盖3的各开口部3a的位置与在上下方向上形成的坩埚开口1a的位置不同的构成。 也就是说,来自加热器4的热量通过内盖3传递到蒸镀材料5的中心部分,并且防止蒸镀材料5的温度的局部降低。 通过在内盖3和坩埚的底壁之间另外提供具有良好导热性的柱状支撑件或隔板,可以进一步有效地防止堵塞。 版权所有(C)2008,JPO&INPIT
    • 5. 发明专利
    • Vapor deposition apparatus
    • 蒸气沉积装置
    • JP2013108182A
    • 2013-06-06
    • JP2013007327
    • 2013-01-18
    • Canon Incキヤノン株式会社
    • MASHITA SEIJITOKUNAGA YUZOOTSUKA MANABUYOSHIKAWA TOSHIAKIFUKUDA NAOTO
    • C23C14/24H01L51/50H05B33/10
    • PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus to be used when using a method of manufacturing an organic light emitting device which has high electron injection efficiency and can be driven at low voltage.SOLUTION: A vapor deposition apparatus includes: a housing container 23 for housing a vapor deposition material 25; and a heater (heat source 22) for changing the vapor deposition material 5 housed in the housing container 23 into a gas state. A medium 21 is provided in a position between the housing container 23 and a base material to be deposited, through which the gaseous vapor deposition material passes, wherein a shielding member for shielding heat generated by the medium 21 is provided between the medium 21 and the base material to be deposited.
    • 要解决的问题:提供一种当使用具有高电子注入效率并可在低电压下驱动的有机发光器件的制造方法时使用的气相沉积设备。 解决方案:气相沉积设备包括:用于容纳气相沉积材料25的容纳容器23; 以及用于将容纳在容纳容器23中的蒸镀材料5变更为气体状态的加热器(热源22)。 介质21设置在容纳容器23和待沉积的基底材料之间的位置,气相沉积材料通过该基底材料通过,其中用于屏蔽由介质21产生的热的屏蔽构件设置在介质21和 要沉积的基材。 版权所有(C)2013,JPO&INPIT
    • 7. 发明专利
    • Method for manufacturing organic el display device
    • 制造有机EL显示装置的方法
    • JP2012124128A
    • 2012-06-28
    • JP2010276176
    • 2010-12-10
    • Canon Incキヤノン株式会社
    • MASHITA SEIJI
    • H05B33/10H01L51/50
    • PROBLEM TO BE SOLVED: To solve such a problem that, when a sublimation material is formed by coating, an organic compound layer cannot be deposited in a consecutive vacuum, so that a manufacturing cost and a tact time is increased, in a method for manufacturing an organic EL display device, the method using a release layer comprising the sublimation material for patterning a luminous layer.SOLUTION: An organic EL display device is formed by a manufacturing method including the steps of: forming a release layer having a sublimation temperature lower than an evaporation temperature of a luminous layer on a predetermined pixel by vacuum deposition; forming the luminous layer over a substrate entirely by vacuum deposition; and heating the substrate at a temperature higher than the sublimation temperature of the release layer and lower than the evaporation temperature of the luminous layer to remove the release layer and the luminous layer formed on the predetermined pixel.
    • 解决的问题为了解决这样的问题,当通过涂布形成升华材料时,有机化合物层不能在连续的真空中沉积,从而增加制造成本和节拍时间 制造有机EL显示装置的方法,使用包括用于使发光层图案化的升华材料的剥离层的方法。 解决方案:通过包括以下步骤的制造方法形成有机EL显示装置:通过真空沉积形成具有比预定像素上的发光层的蒸发温度低的升华温度的剥离层; 通过真空沉积在基底上形成发光层; 在高于脱模层的升华温度的温度下加热基板,低于发光层的蒸发温度,除去形成在规定像素上的剥离层和发光层。 版权所有(C)2012,JPO&INPIT
    • 8. 发明专利
    • Vapor deposition source and vapor deposition apparatus
    • 蒸气沉积源和蒸气沉积装置
    • JP2007284788A
    • 2007-11-01
    • JP2007043094
    • 2007-02-23
    • Canon Incキヤノン株式会社
    • YOSHIKAWA TOSHIAKIMASHITA SEIJIFUKUDA NAOTO
    • C23C14/24H01L51/50H05B33/10
    • C23C14/243C23C14/12
    • PROBLEM TO BE SOLVED: To reduce the occurrence of splash in a vapor deposition source and to perform vapor deposition at a stable, high deposition speed. SOLUTION: A plurality of doughnut-shaped flat plates 2 is vertically stacked in a crucible 1, and a vapor deposition material 3 is thinly mounted on each of the doughnut-shaped flat plates 2. The vapor deposition material 3 on the doughnut-shaped flat plate 2 on each layer is heated by heaters 12 surrounding the crucible 1 to generate vapor from the vapor deposition material 3, and the vapor is made to flow through a flow space A on each layer into a vertical flow path B and discharged from an opening 10a at the top of the flow path B toward a substrate to be deposited. The conductance of the flow space A is smaller than the conductance of the flow path B. COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:为了减少气相沉积源中飞溅的发生并以稳定的高沉积速度进行气相沉积。 解决方案:将多个环形平板2垂直堆叠在坩埚1中,并且将蒸镀材料3薄薄地安装在每个环形平板2上。在圆环上的气相沉积材料3 形状的平板2由坩埚1周围的加热器12加热,以从蒸镀材料3产生蒸气,使蒸气流过各层的流动空间A成为垂直流路B而排出 从流路B顶部的开口10a朝向待沉积的基板。 流动空间A的电导小于流路B的电导。版权所有:(C)2008,JPO&INPIT