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1. 发明专利

JP2013070040A Radiation source 有权
标题翻译：辐射源
公开(公告)号：JP2013070040A
公开(公告)日：2013-04-18
申请号：JP2012190410
申请日：2012-08-30
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： AKKER JEROEN VAN DEN , KEMPEN ANTONIUS THEODORS WILHELMS , ANDRIAAN CORNELIS KUIJPERS
IPC分类号： H01L21/027 , H05G2/00
CPC分类号： H05G2/005 , G03F7/70033 , H05G2/006 , H05G2/008 , Y10T29/49815 , Y10T29/49817 , Y10T29/49826 , Y10T29/49865
摘要： PROBLEM TO BE SOLVED: To provide a system and a method capable of preventing or reducing the effect of unexpected or unintended trouble or limitation resulting from contamination of a fuel deposited on the inner surface of a nozzle.SOLUTION: The radiation source according to the first embodiment comprises a reservoir configured to hold the volume of a fuel, a nozzle in fluid-connection with the reservoir configured to guide the flow of the fuel along the track toward a plasma formation arrangement, a laser configured to generate radiation-generating plasma during use by guiding the laser radiation to the flow at the plasma formation arrangement, and a contamination filter assembly disposed in the fuel passage of the radiation source in the upstream of a nozzle outlet. The filter medium of the contamination filter assembly is held at an appropriate position therein by a clamp force provided by one or more object surrounding the filter medium at least partially.
摘要翻译：要解决的问题：提供一种能够防止或减少由于沉积在喷嘴的内表面上的燃料的污染导致的意外或非预期的故障或限制的影响的系统和方法。解决方案：根据第一实施例的辐射源包括储存器，其被构造成保持燃料的体积，与储存器流体连接的喷嘴，该储存器构造成沿着轨道将燃料的流动引向等离子体形成装置配置成在使用期间通过将激光辐射引导到等离子体形成装置处的流而产生辐射产生等离子体的激光器，以及设置在喷嘴出口上游的辐射源的燃料通道中的污染过滤器组件。污染过滤器组件的过滤介质通过至少部分地由过滤介质周围的一个或多个物体提供的夹持力保持在其中的适当位置。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2011258950A Hydrogen radical generator 审中-公开
标题翻译：氢辐射发生器
公开(公告)号：JP2011258950A
公开(公告)日：2011-12-22
申请号：JP2011124720
申请日：2011-06-03
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SHUSVOORT GERALD FRANZ JOSEPH , PHIBLESSE JEROEN MARCEL , VANEL ROELANT NICOLAS MARIA , ARNOLDUS JAN STORM , EDWIN TE SLIGTE , KEMPEN ANTONIUS THEODORS WILHELMS , YONKEL WATER AND LEES , PFIZER TIMO
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70925
摘要： PROBLEM TO BE SOLVED: To provide a method for reducing contaminant generated by a hydrogen radical generator and deposited on a lighting element of a lithographic apparatus.SOLUTION: The method according to the present embodiment includes allowing hydrogen molecules to pass through a first portion of a metal filament when temperature of a first part of a metallic oxide of the metal filament of the hydrogen radical generator is reduction temperature that is equal to or less than evaporation temperature of the metallic oxide.
摘要翻译：要解决的问题：提供一种减少由氢自由基产生器产生并沉积在光刻设备的照明元件上的污染物的方法。解决方案：根据本实施方式的方法包括当氢自由基发生器的金属丝的金属氧化物的第一部分的温度为还原温度时，允许氢分子通过金属丝的第一部分等于或小于金属氧化物的蒸发温度。版权所有（C）2012，JPO＆INPIT

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