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JP2008285405A Diamond thin film, modifying method of diamond thin film, modification of diamond thin film and thin film formation method, and processing method of diamond thin film 有权
标题翻译：金刚石薄膜，金刚石薄膜的修饰方法，金刚石薄膜的修饰和薄膜形成方法，以及金刚石薄膜的加工方法
公开(公告)号：JP2008285405A
公开(公告)日：2008-11-27
申请号：JP2008158773
申请日：2008-06-18
申请人： Applied Diamond:Kk , 有限会社アプライドダイヤモンド
发明人： MIYAKE MASAJI , TAKEDA SHUICHI
IPC分类号： C30B29/04 , C01B31/06
摘要： PROBLEM TO BE SOLVED: To provide a modifying method and a thin film formation method of a diamond thin film in which strain, defect, color or the like which exists in an independence diamond thin film (foil or plate) which removes a gas phase diamond thin film or a substrate formed on the substrate is removed or decreased effectively, or which can carry out modification to an orientation polycrystal or single crystal object.
SOLUTION: In a vacuum or in an atmosphere of inert gas, reducing gas, or a gaseous mixture thereof which can inhibit graphitization of diamond or the like, a diamond thin film is irradiated with the 1 GHz-500 GHz microwave and is heated, thereby, for example, a part of damage received with laser is recovered or the like, and modification of a diamond thin film is carried out. Therefore, a diamond thin film is obtained which film has a modified film thickness range in which a half value width of a diamond spectrum evaluated by a Raman spectroscopy of 0.1 μm or more along the direction of a film thickness of the diamond thin film is approximately constant, and the half value width is 85% or less of the maximum half value width of a film thickness remainder.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种金刚石薄膜的修饰方法和薄膜形成方法，其中存在于独立性金刚石薄膜（箔或板）中的应变，缺陷，颜色等，其去除气相金刚石薄膜或形成在基板上的基板被有效地去除或降低，或者可以对取向多晶体或单晶体进行改性。解决方案：在惰性气体，还原气体或其气体混合物的气体中，可以抑制金刚石等的石墨化，金刚石薄膜用1GHz-500GHz微波照射，并且是因此例如恢复用激光接收的部分损伤等，并且进行金刚石薄膜的改性。因此，获得金刚石薄膜，该薄膜具有改性膜厚度范围，其中通过拉曼光谱法估计的金刚石光谱的半值宽度在金刚石薄膜的膜厚度方向上为0.1μm或更大半值宽度为膜厚剩余部分的最大半值宽度的85％以下。版权所有（C）2009，JPO＆INPIT

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