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1. 发明专利

JP2009141378A Lithographic apparatus, illumination system and method for providing projection beam of euv radiation 有权
标题翻译：提供EUV辐射投影光束的照相装置，照明系统和方法
公开(公告)号：JP2009141378A
公开(公告)日：2009-06-25
申请号：JP2009007569
申请日：2009-01-16
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： IVANOV VLADIMIR VITALEVICH , BANINE VADIM YEVGENYEVICH , KOSHELEV KONSTANTIN NIKOLAEVIT
IPC分类号： G21K5/02 , H01L21/027 , G03F7/20 , H05G2/00
CPC分类号： G03F7/70858 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is not influenced by a problem caused by particles produced as a by-product of the EUV radiation production.
SOLUTION: The lithographic apparatus includes an illumination system that provides a beam of radiation and a support structure that supports a patterning structure. The patterning structure is configured to impart a pattern to the beam of radiation in its cross-section. The apparatus also includes a substrate support that supports a substrate and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is adjusted to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供不受由作为EUV辐射生产的副产物产生的颗粒引起的问题的光刻设备。光刻设备包括提供辐射束的照明系统和支撑图形结构的支撑结构。图案形成结构被配置为在其横截面中赋予辐射束的图案。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。照明系统包括产生极紫外辐射的辐射生产系统和收集极紫外辐射的辐射收集系统。作为极紫外线辐射产物的副产物产生的颗粒基本上沿颗粒移动方向移动。调整辐射收集系统以收集在与颗粒移动方向基本不同的收集方向上辐射的极紫外辐射。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2012109613A RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：JP2012109613A
公开(公告)日：2012-06-07
申请号：JP2012037310
申请日：2012-02-23
申请人： ASML NETHERLANDS BV
发明人： WASSINK ARNOLD CORNELIS , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVICH , KOSHELEV KONSTANTIN , CADEE THEODORUS PETRUS MARIA , CLIVITZN VLADIMIR MIKHAILOVICH , DERK JAN WILFRED KLUNDER , WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES , PAUL PETER ANNA ANTONIUS BROM , SOER WOUTER ANTHON , GLUSHKOV DENIS ALEXANDROVICH
IPC分类号： H01L21/027 , G03F7/20 , H05G2/00
摘要： PROBLEM TO BE SOLVED: To provide a radiation system for generating a beam of radiation that defines an optical axis.SOLUTION: The radiation system comprises a plasma-produced discharge source for generating EUV radiation. The discharge source comprises: a pair of electrodes provided with a voltage difference; and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also comprises a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided at a predetermined spherical angle relative to the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

3. 发明专利

JP2011018903A Radiation system, and lithographic device 审中-公开
标题翻译：辐射系统和光刻设备
公开(公告)号：JP2011018903A
公开(公告)日：2011-01-27
申请号：JP2010151526
申请日：2010-07-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LOOPSTRA ERIK ROELOF , IVANOV VLADIMIR VITALEVICH , MOORS JOHANNES HUBERTUS JOSEPHINA , SWINKELS GERARDUS HUBERTUS PETRUS MARIA , YAKUNIN ANDREY MIKHAILOVICH , DE GRAAF DENNIS , STAMM UWE BRUNO HEINI
IPC分类号： H01S3/08 , H01L21/027 , H01S3/00
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To provide a radiation system capable of improving conversion efficiency of EUV radiation/emission plasma, and to provide a lithographic device.SOLUTION: The radiation system includes a target material source for supplying droplets of a target material along a track, and a laser system including an amplifier and an optical system. The optical system establishes a first beam path which passes through the amplifier and a first point on the track, and establishes a second beam path which passes through the amplifier and a second point on the track. When a photon emitted from the amplifier is reflected along the first beam path by the droplet of the target material at the first point on the track, the laser system generates a first pulse of laser radiation. When a photon emitted from the amplifier is reflected along the second beam path by the droplet of the target material at the second point on the track, the laser system generates a second pulse of laser radiation.
摘要翻译：要解决的问题：提供能够提高EUV辐射/发射等离子体的转换效率并提供光刻设备的辐射系统。解决方案：辐射系统包括用于沿着轨道提供目标材料的液滴的靶材料源，以及包括放大器和光学系统的激光系统。光学系统建立通过放大器和轨道上的第一点的第一光束路径，并建立通过放大器的第二光束路径和轨道上的第二点。当从放大器发射的光子沿着第一光束路径被轨道上的第一点处的目标材料的液滴反射时，激光系统产生第一激光辐射脉冲。当从放大器发射的光子在轨道上的第二点处由靶材料的液滴沿着第二光束路径反射时，激光系统产生激光辐射的第二脉冲。

4. 发明专利

JP2005183950A Lithographic apparatus, illumination system, and method for providing projection beam of euv radiation 有权
标题翻译：光刻设备，照明系统和提供EUV辐射投影光束的方法
公开(公告)号：JP2005183950A
公开(公告)日：2005-07-07
申请号：JP2004350743
申请日：2004-12-03
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： IVANOV VLADIMIR VITALEVICH , BANINE VADIM YEVGENYEVICH , KOSHELEV KONSTANTIN NIKOLAEVIT
IPC分类号： G21K5/02 , G03F7/20 , H01L21/027 , H05G2/00
CPC分类号： G03F7/70858 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus that is not influenced by problems caused by particles that are produced by the by-product of EUV radiation production.
SOLUTION: The lithographic apparatus has an illumination system supplying a beam of radiation and a supporting structure supporting a patterning structure arranged. The patterning structure is formed to impart patterns to the cross section of the radiation beam. Moreover, the apparatus has a substrate support supporting a substrate and a projection system for projecting the patterned beam onto the target portion of the substrate. The illumination system has a radiation producing system of producing extreme ultraviolet radiation and a radiation collecting system of collecting extreme ultraviolet radiation arranged. The particles produced as the by-product of extreme ultraviolet radiation production move substantially in a particle movement direction. The radiation collecting system is regulated in such a manner as to collect the extreme ultraviolet radiation that radiates in the collecting direction that is largely different from the particle movement direction.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供不受由由EUV辐射生产的副产物产生的颗粒引起的问题的光刻设备。解决方案：光刻设备具有提供辐射束的照明系统和支撑布置图案化结构的支撑结构。形成图形结构以赋予辐射束横截面图案。此外，该装置具有支撑基板的基板支撑件和用于将图案化的光束投影到基板的目标部分上的投影系统。照明系统具有产生极紫外辐射的辐射产生系统和收集极紫外辐射的辐射收集系统。作为极紫外线辐射产生的副产物产生的颗粒基本上在颗粒移动方向上移动。辐射收集系统被调节成收集与颗粒移动方向大不相同的收集方向辐射的极紫外线辐射。版权所有（C）2005，JPO＆NCIPI

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