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    • 8. 发明专利
    • LIQUID CRYSTAL DISPLAY DEVICE
    • JPH04324420A
    • 1992-11-13
    • JP12226791
    • 1991-04-24
    • ASAHI GLASS CO LTDOPTREX KK
    • KO HIDEMASANAKAGAWA YUTAKAHAYATA YUJITSUBOTA HIROYOSHIIHARA SATOSHI
    • G02F1/133G09G3/36
    • PURPOSE:To provide a liquid crystal display element which is bright and good in contrast over a wide temperature difference range and has a wide view angle by providing a means which varies a driving voltage according to detected temperature and a means which varies a frame frequency. CONSTITUTION:The liquid crystal display device is equipped with a liquid crystal layer 9 sandwiched between substrates 4 and 4b with a couple of transparent electrodes 5a and 5b having parallel arranged orientation control films 7a and 7b and a driving circuit 10 which performs multiplex driving by applying a voltage between the transparent electrodes 5a and 5b. This display device is equipped with a means which reduces the driving voltage and increases the frame frequency as the temperature rises. For the variation in frame frequency, a frequency division ratio for setting the relation between, for example, the temperature and frame frequency is written in a program counter from a microcomputer to vary the frequency of a clock signal inputted a liquid crystal controller and then the frame frequency of a liquid crystal cell is therefore varied.
    • 10. 发明专利
    • FORMATION OF THIN FILM AND THIN FILM AND APPLICATION THEREOF
    • JPH045631A
    • 1992-01-09
    • JP10653690
    • 1990-04-24
    • ASAHI GLASS CO LTD
    • KIYOTO NORIYUKIKO HIDEMASANAKAGAWA YUTAKA
    • G02F1/1333G02F1/1343
    • PURPOSE:To obtain thin films of desired patterns by exposing the photosensitive material layer of a transparent substrate through opaque patterns as a mask from the opposite side thereof to partially expose the photosensitive material layer and subjecting the layer to development processing. CONSTITUTION:The photosensitive material layer 3 is formed on the transparent substrate 1. This material layer 3 is partially exposed and is subjected to the development processing, by which the thin films 2 of the desired patterns are formed. A photosensitive mixture composed of at least one kind among an org. Ti compd., org. In compd. and org. Zr compd. and an org. Si compd. is used as the photosensitive material. The opaque patterns 2 are formed of the desired patterns on the transparent substrate 1 and the photosensitive material layer 3 is formed thereon. The photosensitive material layer 3 is partially exposed by exposing the same from the rear side of the transparent substrate 1 and is subjected to the development processing, by which the thin films 4 of the desired patterns are formed. The thin films 4 having the desired patterns are obtd. with good productivity at a uniform film thickness.