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1. 发明专利

JPS5253884A PROCESS FOR PREPARING PENICILLINES CONTAINING A SUBSTITUTED PYRROLIDON E GROUP 失效
公开(公告)号：JPS5253884A
公开(公告)日：1977-04-30
申请号：JP12885675
申请日：1975-10-28
申请人： ASAHI CHEMICAL IND
发明人： SHIBUYA KAZUYUKI , ITOU HIRATAKA , USUBUCHI MINORU
IPC分类号： C07D499/76 , A61K31/43 , A61P31/04 , C07D499/12
摘要： PURPOSE:Penicillins of the formula I (where R1 is phenyl, tolyl, xylyl, mesityl, naphtyl, nitrophenyl, chlorophenyl, thienyl, furyl, pyridyl, etc.), and their nonpoisonous salts or esters, For example, 6-(trans-4-phenyl-2-pyrrolidone5-carboxyamide)-penicillanic acid may be cited.

2. 发明专利

JPS5168591A 11 aminoshikurohekisenirupenishirinruino seiho 失效
标题翻译： 11 AMINOSHIKUROHEKISENIRUPENISHIRINRUINO SEIHO
公开(公告)号：JPS5168591A
公开(公告)日：1976-06-14
申请号：JP14151574
申请日：1974-12-11
申请人： Asahi Chemical Ind
发明人： SHIBUYA KAZUYUKI , ITO HIRATAKA , USUBUCHI MINORU
IPC分类号： C07D499/74 , C07D499/12 , C07D499/64

3. 发明专利

JPS5814440B2 失效
公开(公告)号：JPS5814440B2
公开(公告)日：1983-03-18
申请号：JP790276
申请日：1976-01-29
申请人： ASAHI CHEMICAL IND
发明人： SHIBUYA KAZUYUKI , ITO HIRATAKA , USUBUCHI MINORU , AKAMINE MITSUAKI
IPC分类号： C07D501/20 , A61K31/545 , A61K31/546 , A61P31/04 , C07D501/06 , C07D501/22 , C07D501/28 , C07D501/34 , C07D501/36 , C07D501/40 , C07D501/46

4. 发明专利

JPS53135985A PREPARATION OF N*N**DIISUBSTITUTED TETRAHYDROO4*4**BIPYRIDYL 失效
公开(公告)号：JPS53135985A
公开(公告)日：1978-11-28
申请号：JP4986777
申请日：1977-05-02
申请人： ASAHI CHEMICAL IND
发明人： MISUMI TERUYUKI , USUBUCHI MINORU , KAWAI KENZOU
IPC分类号： C07D211/82 , C07D211/80 , C07D213/22 , C25B3/10
摘要： PURPOSE:To prevent the deposition of impurities to the electrodes in the preparation of the title compound useful as an intermediate of herbicide by the electrolytic reduction dimerization of N-substituted pyridinium salt, by supplying a cathode cell with the above starting compound through a cation exchange membrane.

5. 发明专利

JPS5289694A NOVEL CEPHALOSPORINS 失效
公开(公告)号：JPS5289694A
公开(公告)日：1977-07-27
申请号：JP581276
申请日：1976-01-23
申请人： ASAHI CHEMICAL IND
发明人： SHIBUYA KAZUYUKI , ITOU HIRATAKA , USUBUCHI MINORU , AKAMINE MITSUAKI
IPC分类号： C07D501/20 , A61K31/545 , A61K31/546 , A61P31/04 , C07D501/22 , C07D501/34 , C07D501/36 , C07D501/46
摘要： PURPOSE:Cephalosporins expressed by the formula I:(R1 is heterocyclic ring, lower alkyl-substituted heterocyclic ring; R2 is H, lower alkyl; A is H, OH, lower alkanoyloxy, etc.; M is H, lower alkyl, aralkyl, etc.). For example, 7-(2-thienylsulfinylacetamide)-3-(5-methyl-1,3,4-thiadiazole-2-ylthiom ethyl)-3-cephem-4-carboxylic-acid.

6. 发明专利

JPS5180885A 失效
公开(公告)号：JPS5180885A
公开(公告)日：1976-07-15
申请号：JP14917974
申请日：1974-12-28
申请人： ASAHI CHEMICAL IND
发明人： SHIBUYA KAZUYUKI , ITO HIRATAKA , USUBUCHI MINORU , AKAMINE MITSUAKI
IPC分类号： C07D501/20 , A61K31/545 , C07D501/06 , C07D501/22 , C07D501/28 , C07D501/36 , C07D501/40

7. 发明专利

JPH02146043A PHOTOSENSITIVE RESIN COPOSITION AND PHOTOSENSITIVE RESIN PRINTING MATERIAL USING THE SAME 失效
公开(公告)号：JPH02146043A
公开(公告)日：1990-06-05
申请号：JP14549289
申请日：1989-06-09
申请人： ASAHI CHEMICAL IND
发明人： USUBUCHI MINORU , OGURI TAKESHI , SUZUKI YOSHIO
IPC分类号： G03F7/027 , C08F283/00 , C08F290/00 , C08F299/00 , C08G18/60 , G03F7/00 , G03F7/032
摘要： PURPOSE:To obtain a printing material having high image resolution for picture and superior mechanical characteristics by using a specified polyamideimide elastomer. CONSTITUTION:A polyamideimide ester is produced from a monomer capable of producing a polyamide, an aromatic tricarboxylic acid or aromatic tetracarboxylic acid, capable of forming an imide ring, etc., a polyoxy alkylene glycol having 400-4,000 number average mol.wt. and/or alpha,omega-dihydroxy hydrocarbon. A thermoplastic elastomer comprising polyamideimide urethane, etc., is formed from the polyamideimide ester along or a mixture thereof with another polymer diol, with a diisocyanate compd. An ethylenic unsatd. compd. and a photopolymn. initiator are incorporated into the thermoplastic elastomer. Thus, a photosensitive resin compsn. capable of forming a relief having high image resolution for picture and having also suitable mechanical characteristics suitable for printing form is obtd.

8. 发明专利

JPS63305346A PHOTOSENSITIVE RESIN COMPOSITION 失效
公开(公告)号：JPS63305346A
公开(公告)日：1988-12-13
申请号：JP14089087
申请日：1987-06-05
申请人： ASAHI CHEMICAL IND
发明人： TAKAHASHI MOTOAKI , USUBUCHI MINORU
IPC分类号： G03F7/027
摘要： PURPOSE:To easily obtain a cured material which has the excellent sensitivity and no amine odor and the sufficient mechanical strength by exposing for a short period, by incorporating an amide compd. having a specified structure with a prescribed ratio together with a photopolymerization initiator in the titled material. CONSTITUTION:The titled composition contains the amide compd. shown by formula I and the photopolymerization initiator, and said amide compd. is necessary to be incorporated in the titled composition in an amount of >=5wt.% of the compd. based on the total weight of the titled composition. In the case that the additional mount of the compd. is about 3wt.%, the sensitivity of the titled composition somewhat increases, but, the sufficient effect is not obtd., in the reduction of an exposure time and the formation on a relief such as a minimum point, etc. The compounding amount of the photopolymerization initiator is usually 0.001-10wt.% based on the total weight of the titled composition. Thus, the cured material which has no amine order the excellent sensitivity measured based on insolubility of the cured material, and the excellent sensitivity measured based on the mechanical strength and the hardness is obtd.

9. 发明专利

JPS596315B2 JPS596315B2 - 失效
公开(公告)号：JPS596315B2
公开(公告)日：1984-02-10
申请号：JP15928976
申请日：1976-12-29
申请人： Asahi Chemical Ind
发明人： SHIBUYA KAZUYUKI , ITO HIRATAKA , USUBUCHI MINORU , AKAMINE MITSUAKI
IPC分类号： C07D333/34

10. 发明专利

JPS5832886A CEPHALOSPORIN 失效
公开(公告)号：JPS5832886A
公开(公告)日：1983-02-25
申请号：JP8643482
申请日：1982-05-24
申请人： ASAHI CHEMICAL IND
发明人： SHIBUYA KAZUYUKI , ITOU HIRATAKA , USUBUCHI MINORU , AKAMINE MITSUAKI
IPC分类号： C07D501/28 , A61K31/545 , A61K31/546 , A61P31/04 , C07D501/34
摘要： NEW MATERIAL:A compound of formulaI(R1 is 2-thienyl, 3-thienyl, 2-pyridyl, 4-pyridyl, 2-imidazolyl; A is acetoxy; M is H, alkali metal, amine salt ion where the sulfinyl group has the R configuration in which R configuration means that, among optical isomers at the sulfiniyl group of the compound of formula II, it has the same configurational structure as that showing positive specific rotary power[alpha]d in an alcohol). EXAMPLE:7-(2-Thienylsulfinylacetamide)cephalosporanic acid. USE:Anbiotic: it shows strong antibiotic effect against gram-positive and-negative bacteria. For example, it is used to treat bronchitis, cholecystitis or sepsis. PREPARATION:The reaction of a compound of formula III or its reactive derivative such as silyl ester with a R-carboxylic acid of formula II or its reactive derivative such as acid chloride give an objective compound of formulaI.

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