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    • 7. 发明专利
    • Method of cleaning a centrifugal thin film dryer
    • JP4945502B2
    • 2012-06-06
    • JP2008100285
    • 2008-04-08
    • 株式会社東芝
    • 通孝 三倉龍明 佐藤肇 岡村裕一 東海林貴司 相坂昌章 金子
    • B01D1/22C02F1/08
    • PROBLEM TO BE SOLVED: To provide a method of cleaning a centrifugal thin film dryer capable of suppressing the vibration of the centrifugal thin film dryer without detracting cleaning effect of conventional cleaning methods even if the target of cleaning is an accreted matter which exhibits insolubility or difficulty to dissolve to cleaning water. SOLUTION: The method of cleaning the centrifugal thin film dryer 10 (refer to Fig.1) includes: a second process reducing a rotational rate of a main shaft 18 after stopping to supply a waste liquid to a heat transfer cylinder barrel 13; a third process maintaining the reduced rotational rate of the main shaft 18 for a predetermined time; and a forth process going on increasing the reduced rotational rate of the main shaft 18 so as to satisfy a rotational rate increasing condition using an index which represents a load to the main shaft 18 or a blade 17 as the rotational rate increasing condition. The rotational rate of the main shaft 18 goes on increasing without exceeding an vibrational acceleration of 10 m/sec 2 allowed for the centrifugal thin film dryer 10 by the fourth process. Further, the cleaning effect by the conventional cleaning methods is maintained by the second and third processes. COPYRIGHT: (C)2010,JPO&INPIT