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    • 1. 发明专利
    • Organic electroluminescent element and its manufacturing method
    • 有机电致发光元件及其制造方法
    • JP2007194168A
    • 2007-08-02
    • JP2006013576
    • 2006-01-23
    • Denso Corp株式会社デンソー
    • TERA AKINOSUKEINO KOJIMORI KAORUISHIDA TAIZO
    • H05B33/22H01L51/50H05B33/10H05B33/12
    • PROBLEM TO BE SOLVED: To improve resistance characteristics of a gas barrier layer against an etching liquid and a cleaning liquid in a process after a gas barrier layer film forming in an organic EL element composed of sequentially laminating a color filter layer, the gas barrier layer, and an organic EL structure on a substrate. SOLUTION: In the organic EL element 100 composed of sequentially laminating the color filter layer 13, the gas barrier layer 20, and the organic EL structure 30 on the substrate 11, the gas barrier layer 20 is an amorphous thin film composed of AlxTiyOz which is a metal oxide of Al and Ti, and the ratio of the number of atoms of Ti to Al in a composition ratio of this AlxTiyOz is 10 atom% or more. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了在由顺序层叠滤色器层构成的有机EL元件中形成阻气层膜之后的工序中提高阻气层对蚀刻液和清洗液的电阻特性, 气体阻隔层和有机EL结构。 解决方案:在衬底11上依次层叠滤色器层13,阻气层20和有机EL结构30的有机EL元件100中,阻气层20是由 作为Al和Ti的金属氧化物的Al x Ti y O z,以及该Al x TiO y的组成比中的Ti与Al的原子数的比例为10原子%以上。 版权所有(C)2007,JPO&INPIT
    • 2. 发明专利
    • Thermoelectric conversion device and manufacturing method thereof
    • 热电转换装置及其制造方法
    • JP2007123530A
    • 2007-05-17
    • JP2005313360
    • 2005-10-27
    • Denso Corp株式会社デンソー
    • MATSUOKA AKIONIIMI YASUHIKOTERA AKINOSUKE
    • H01L35/30H01L35/32H02N11/00
    • PROBLEM TO BE SOLVED: To provide a thermoelectric conversion device and its manufacturing method, which prevent intrusion of moisture from outside into a thermoelectric element housing chamber.
      SOLUTION: In the thermoelectric conversion device, a pair of thermoelectric elements 12 and 13 and an electrode member 16 are electrically connected in series so that a plurality of heat exchange members 25 are separately arranged on a heat absorbing side and a heat radiating side. An insulating substrate 14 is provided with a pair of electrode element substrates 15 in which the plurality of electrode members 16 are arrayed in such a specified arrangement as corresponding to the arrangement of the pair of thermoelectric elements 12 and 13. With a thermoelectric element substrate 10 stacked in the pair of electrode element substrates 15, a moisture-proof/insulating layer 17 of inorganic material is formed on the outside surface of the heat exchange member 25 and the pair of electrode element substrates 15. So, intrusion of moisture from outside is prevented.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 解决的问题:提供一种防止水分从外部侵入到热电元件容纳室中的热电转换装置及其制造方法。 解决方案:在热电转换装置中,一对热电元件​​12,13和电极构件16串联电连接,使得多个热交换构件25分别布置在吸热侧和散热 侧。 绝缘基板14设置有一对电极元件基板15,其中多个电极部件16以与一对热电元件​​12和13的布置相对应的特定布置排列。利用热电元件基板10 堆叠在一对电极元件基板15中,在热交换部件25和一对电极元件基板15的外表面上形成无机材料的防湿绝缘层17.因此,外部的水分侵入 预防。 版权所有(C)2007,JPO&INPIT
    • 5. 发明专利
    • 熱交換器の製造方法および熱交換器
    • 热交换器制造方法和换热器
    • JP2014202390A
    • 2014-10-27
    • JP2013077625
    • 2013-04-03
    • 株式会社デンソーDenso Corp
    • KAFUKU KAZUAKIAZEYANAGI ISAOYAMANAKA YASUTOSHITERA AKINOSUKESANO YUKIHIRO
    • F28F19/02B23K1/00C23C16/40C23C16/455F28D7/00F28F1/40
    • B23P15/26C23C16/405C23C16/45555F28D7/1684F28D9/0062F28F3/027F28F2275/04
    • 【課題】腐食による貫通孔が生じることを確実に抑制できる熱交換器の製造方法および熱交換器を提供する。【解決手段】チューブ21およびフィン22を組み付ける組付工程と、組付工程の後に行われるとともに、チューブ21およびフィン22の表面に化学気相成長法によって被膜30を形成する被膜形成工程とを含んでいる。これによれば、被膜30により、チューブ21およびフィン22に腐食による貫通孔が生じることを抑制できる。このとき、被膜形成工程を組付工程の後に行うので、構成部品の搬送時や構成部品同士の組付時に被膜30に傷が付くことを防止できる。さらに、ドライコーティング法の一種である化学気相成長法によって被膜30を形成することで、被膜形成工程時に熱交換器内部の微細部において目詰まりを起こすことを防止できる。したがって、チューブ21およびフィン22に腐食による貫通孔が生じることを確実に抑制することが可能となる。【選択図】図5
    • 要解决的问题:提供一种能够确保抑制由于腐蚀而产生通孔的热交换器制造方法和热交换器。热交换器制造方法包括:组装管21和翅片22的组装步骤; 以及在组装步骤之后执行的涂膜形成步骤,通过化学气相生长法在管21和翅片22的表面上形成涂膜30。 根据该方法,能够抑制由于腐蚀导致管21和翅片22的通孔的产生。 此时,由于在组装步骤之后执行涂膜形成步骤,所以可以防止涂膜30在输送构成部件或将组成部件组装在一起时被损坏。 此外,由于通过作为干式涂布方法的化学气相生长法形成涂膜30,因此可以防止热交换器中的非常细的部分在涂膜形成步骤期间被堵塞。 因此,能够确保由于腐蚀而抑制管21和翅片22中的通孔的产生。
    • 6. 发明专利
    • Film deposition method and film deposition apparatus of amorphous hard carbon film
    • 非晶硬碳膜薄膜沉积方法及薄膜沉积装置
    • JP2014034685A
    • 2014-02-24
    • JP2012174875
    • 2012-08-07
    • Denso Corp株式会社デンソー
    • ITOMURA DAISUKETERA AKINOSUKE
    • C23C16/27
    • C23C16/0272C23C16/26C23C16/515
    • PROBLEM TO BE SOLVED: To provide a film deposition method and film deposition apparatus of a DLC film that can stably form plasma in a state of high electric field intensity to generate high-density plasma.SOLUTION: A plasma treatment apparatus is equipped with a cylindrical electrode to regulate a treatment chamber and a bar-shaped electrode arranged near the center of the treatment chamber, in which the distance between the bar-shaped electrode and the cylindrical electrode is 1-10 mm. In the plasma treatment apparatus, a substrate is subjected to plasma nitriding treatment in the presence of argon gas, hydrogen gas and nitrogen gas for pretreatment, and then consecutively subjected to film deposition of a middle layer after the pretreatment, and further consecutively subjected to film deposition of an amorphous hard carbon film by plasma CVD treatment in the presence of a carbon supply source.
    • 要解决的问题:提供能够在高电场强度的状态下稳定地形成等离子体的DLC膜的成膜方法和成膜装置,以产生高密度等离子体。解决方案:等离子体处理装置配备有圆柱形 用于调节处理室的电极和布置在处理室中心附近的棒状电极,其中棒状电极和圆柱形电极之间的距离为1-10mm。 在等离子体处理装置中,在氩气,氢气和氮气的存在下对基板进行等离子体氮化处理,进行预处理,然后在预处理后连续地进行中间层的膜沉积,并且进一步连续地进行膜 在碳供应源的存在下通过等离子体CVD处理沉积无定形硬碳膜。
    • 8. 发明专利
    • Thermal spraying apparatus, and coating film forming method
    • 热喷涂设备和涂膜成型方法
    • JP2012082443A
    • 2012-04-26
    • JP2010226878
    • 2010-10-06
    • Denso Corp株式会社デンソー
    • NINOMIYA YASUTOKUITO TOSHIKITERA AKINOSUKE
    • C23C4/12B05B7/22B05D1/08
    • PROBLEM TO BE SOLVED: To provide a thermal spraying apparatus capable of adequately cooling a base material without increasing the size of the apparatus.SOLUTION: When forming a coating film on a coating-film forming face 2a of a semi-conductor module 2 by thermal spraying, the semi-conductor module 2 is held by a holding member 5 so that a part of the semi-conductor module 2 including the coating film forming face 2a is located above the liquid surface of cooling water. Thus, the semi-conductor module 2 can be cooled with cooling water having the specific heat higher than that of a cooling gas such as air, and the cooling efficiency can be enhanced in comparison with a case of cooling the semi-conductor module 2 with air. Therefore, the semi-conductor module 2 does not need to firmly held and fixed by the holding member 5. As a result, a base material can be adequately cooled without increasing the size of the entire thermal spraying apparatus.
    • 要解决的问题:提供一种能够在不增加设备尺寸的情况下适当地冷却基材的热喷涂设备。 解决方案:通过热喷涂在半导体模块2的涂膜形成面2a上形成涂膜时,半导体模块2由保持部件5保持, 包括涂膜形成面2a的导体模块2位于冷却水的液面的上方。 因此,半导体模块2可以用比空气等冷却气体的比热更高的冷却水进行冷却,与半导体模块2的冷却的情况相比,可以提高冷却效率, 空气。 因此,半导体模块2不需要由保持构件5牢固地固定和固定。结果,可以在不增加整个热喷涂装置的尺寸的情况下充分冷却基材。 版权所有(C)2012,JPO&INPIT
    • 9. 发明专利
    • Plasma generating device
    • 等离子体发生装置
    • JP2010251008A
    • 2010-11-04
    • JP2009097044
    • 2009-04-13
    • Denso Corp株式会社デンソー
    • TERA AKINOSUKENISHIJIMA TADAOKUZUOKA TAKASHIITOMURA DAISUKE
    • H05H1/24C23C16/509
    • H05H1/48H05H1/3405
    • PROBLEM TO BE SOLVED: To provide a plasma generating device which performs plasma discharge at a fixed inter-electrode distance. SOLUTION: The plasma generating device includes a cylindrical chamber with a cylindrical electrode, an electrode correction ring capable of freely moving on inner peripheral surfaces of a bar-shaped electrode and the cylindrical electrode, and a chuck mounted on a base. In the device, the chuck can grip a lower end of the bar-shaped electrode at a point contact, a tapered positioning hole is arranged at the center of the electrode correction ring, and the cylindrical chamber is formed to move up and down so as to make the center axis of the cylindrical electrode coincide with the center axis of the chuck. When the cylindrical chamber descends while the electrode correction ring is positioned at a designated position on the inner peripheral surface of the cylindrical electrode, plasma discharge is carried out by fixing the inter-electrode distance wherein the bar-shaped electrode is position-corrected so as to mount on the center axis of the cylindrical electrode by the tapered positioning hole of the electrode correction ring. COPYRIGHT: (C)2011,JPO&INPIT
    • 解决的问题:提供一种以固定的电极间距离进行等离子体放电的等离子体发生装置。 解决方案:等离子体产生装置包括具有圆柱形电极的圆柱形室,能够在棒状电极和圆柱形电极的内周表面上自由移动的电极校正环和安装在基座上的卡盘。 在该装置中,卡盘可以在点接触处抓住棒状电极的下端,在电极校正环的中心设置锥形定位孔,并且形成圆柱形室以上下移动,以便 使圆柱形电极的中心轴线与卡盘的中心轴线重合。 当圆柱形室在电极校正环位于圆柱形电极的内周表面上的指定位置时下降,通过固定杆状电极位置校正的电极间距离来进行等离子体放电,以便 通过电极校正环的锥形定位孔安装在圆柱形电极的中心轴上。 版权所有(C)2011,JPO&INPIT