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    • 10. 发明专利
    • Method of manufacturing a color filter substrate
    • JP5266961B2
    • 2013-08-21
    • JP2008216348
    • 2008-08-26
    • 凸版印刷株式会社
    • 保浩 檜林美絵 清水港  浩一
    • G02B5/20G02B5/30G02F1/1335G03F7/004
    • PROBLEM TO BE SOLVED: To solve such a problem that the retardation of a color filter (CF) fabricated on a transparent substrate is wavy because of influences of multiple interferences in the CF with respect to wavelengths, and thereby, the retardation is not enough as a basic data for calculating a three-dimensional refractive index at each wavelength or the wavelength dependence. SOLUTION: A transparent substrate having a reflectance as low as possible from the CF is used, on which linearly polarized light is allowed to be incident perpendicular to the substrate to obtain the optical axis within the plane of the thin film (a layer in the CF); monochromatic polarized light propagating within a plane including the optical axis and perpendicular to the CF is allowed to be incident to the thin film at a plurality, at least three, of incident angles ϕi, to obtain the corresponding retardation R(ϕi); a calculation formula R(ϕi;n x , n y , n z , β) for the three-dimensional refractive index is determined; and the three-dimensional refractive index of the CF is determined by obtaining nx, ny, nz and β by using the above retardation R (ϕi) and the calculation formula R so as to minimize (R(ϕi)-R(ϕi;n x , n y , n z , β)) 2 . The CF substrate has a CF layer having a retardation controlled to -20 to 50 nm by using the above value. COPYRIGHT: (C)2010,JPO&INPIT