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    • 3. 发明专利
    • Security element
    • JP5350273B2
    • 2013-11-27
    • JP2009548623
    • 2008-02-07
    • レオンハード クルツ シュティフトゥング ウント コー. カーゲー
    • アンドレアス シリング
    • B42D15/10G02B5/32
    • B42D25/373B32B15/08B42D25/29B42D25/328B42D25/333B42D25/45B42D2035/16D21H21/42D21H21/44
    • The security document (3) in the form of a multilayer film body for viewing in incident light and in transmitted light, comprises a carrier film (31) and a partial metallic reflective layer in a first region (40) that is transparent/semi-transparent when viewed by a human in transmitted light. In the first region, linear/band shaped first zones (41) provided with the reflective layer, and second zones (42) not provided with the reflective layer, are alternately arranged. The first region has patterned region with dimensions of greater than 300 mu m and background region. The security document (3) in the form of a multilayer film body for viewing in incident light and in transmitted light, comprises a carrier film (31) and a partial metallic reflective layer in a first region (40) that is transparent/semi-transparent when viewed by a human in transmitted light. In the first region, linear/band shaped first zones (41) provided with the reflective layer, and second zones (42) not provided with the reflective layer, are alternately arranged. The first region has patterned region with dimensions of greater than 300 mu m and background region adjoining the patterned region partially enclosing the background region. The distances of consecutive second regions in the patterned region differ by 5-30% in relation to the distances of second regions in the background region. First information determined by the form of the patterned region is visible for human observer. The width and length of the first zones are smaller than 20-60 mu m and greater than 1000 mu m respectively. In the first region, the total area of the first zones occupies a surface portion of less than 10% of the total area of the first and the second zone. The longitudinal axis of the first zones is oriented in the direction of a first and second axes of the co-ordinate systems stretched in the first region. The surface focus lines of the first zones are varied along the first axis in the direction of the second axis according to a second specified information and are distanced from each other between 30-40 mu m in the direction of the second axis. The width of the first zones in the patterned and background regions differs from 15-25%. Each of the first and the second zones has dimension of less than 300 mu m. In the first zone, isotrope/anisotrope matt structures are formed on the reflection layer, which deflects the incident light partially from the mirror reflex of the plane stretched by the film body and the portion of the surface of the first zones on the total surface of each patterned region differentiates itself from the portion of the surface of the first zones on the total surface of each background region by 5-30%. Surface focus points of the first zones are separated from each other by less than 300 mu m and are uniformly spaced in the direction of the first and second axes. The minimum and the maximum average surface covered by the first zones in relation to a measurement of 300 mu m x 300 mu m of each patterned region differ by 5-30% from the minimum and the maximum average surface area of each background region. The average surface of the patterned and background regions is constant. The total surface of the first zones in the patterned region is occupied a portion of the surface of 5-30% of the total area of the patterned region. The matt structure in the reflection layer is formed in 30% of the area of the background and the patterned region and represents line structures, diffractive structures, and linear and/or crossed diffraction grid. The portion of the surface area of the reflection layer in the regions differs by 20%. The structure in the incident light provides a fourth information in the second region that partially covers the first region and has uniformly formed first and second pattern-like subareas that have measurements greater than 300 mu m. In the sub areas, different matt structures are formed in the reflection layer and/or the sub areas have different form. The optional/further subareas are arranged in the