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2. 发明专利

JP3600771B2 Print control apparatus, and the printing system 有权
公开(公告)号：JP3600771B2
公开(公告)日：2004-12-15
申请号：JP2000049165
申请日：2000-02-25
申请人：大日本スクリーン製造株式会社
发明人：勝也山口 , 正幸村井
IPC分类号： B41J5/30 , G06F3/12 , H04N1/00 , H04N1/21
摘要： PROBLEM TO BE SOLVED: To provide a technique capable of efficiently supplying the rasterize data of plural continuous printing jobs to a print outputting device. SOLUTION: A print controller 20 successively generates rasterize data related with plural jobs, and software compresses and stores the data in a system disk 4. At the time of outputting the rasterize data to a print outputting device 30, the data are temporarily expanded and restored by a first compressed data restoring part 8, and then hardware compressed so as to be highly densely compressed by a second compressed data generating part 10, and transferred to a page disk 15 as a cache disk, and outputted to the print outputting device 30. The rasterize data stored in the system disk 4 are software compressed so that the transferring efficiency of the data from the system disk 4 to the page disk 15 can be improved.

4. 发明专利

JP5290025B2 Substrate coating apparatus 有权
公开(公告)号：JP5290025B2
公开(公告)日：2013-09-18
申请号：JP2009086138
申请日：2009-03-31
申请人：大日本スクリーン製造株式会社
发明人：雅敏上野 , 正幸村井
IPC分类号： B05C5/00 , B05C11/00 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a substrate coating device capable of distinguishing a state wherein coating liquid is discharged from a nozzle in a liquid column shape from a state wherein a liquid reservoir is formed in the discharge hole of the nozzle and recognizing it, and preventing coating treatment in an abnormal state. SOLUTION: The substrate coating device 1 monitors light receiving signals output from the light receiving device 71b of a laser sensor 71. Then, on the basis of the time during which the light receiving signals are lowered, the substrate coating device 1 distinguishes the "first state" wherein an organic EL liquid is discharged from the nozzle in the liquid column shape from the "second state" wherein the liquid reservoir is formed at the lower end part of the nozzle. Thus, the substrate coating device 1 distinguishes the "first state" which is a normal state from the "second state" which is the abnormal state and recognizes it, and the coating treatment in the abnormal state is appropriately prevented. COPYRIGHT: (C)2011,JPO&INPIT

5. 发明专利

JP4994963B2 Substrate coating apparatus 有权
公开(公告)号：JP4994963B2
公开(公告)日：2012-08-08
申请号：JP2007157085
申请日：2007-06-14
申请人：大日本スクリーン製造株式会社
发明人：雅敏上野 , 正昭後藤 , 正幸村井
IPC分类号： B05C11/10 , B05C5/00 , H05B33/10
摘要： An apparatus for coating a chemical on a substrate, and a method for detecting a chemical by using the apparatus are provided to detect easily and quantitatively whether the chemical is normally discharged from a nozzle or not without stopping a nozzle. An apparatus for coating a chemical on a substrate comprises a stage(10) where a substrate is loaded; a chemical nozzle which discharges the chemical by a shape of liquid pillar; a moving unit(40) which moves the chemical nozzle between the supply position of the upper part of the stage and the stand-by position of the side part of the stage; and a detection unit which detects whether the liquid pillar of the chemical discharged from the chemical nozzle moving by the moving unit passesthrough a certain detection position or not.

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