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    • 1. 发明专利
    • Surface treatment apparatus
    • 表面处理设备
    • JP2011089023A
    • 2011-05-06
    • JP2009243636
    • 2009-10-22
    • Takamatsu Teisan Kk高松帝酸株式会社
    • MORI KAZUTAKA
    • C08J7/12
    • PROBLEM TO BE SOLVED: To provide a surface treatment apparatus that achieves a more accurate uniformity of surface treatment of a workpiece than an existing apparatus. SOLUTION: The surface treatment apparatus has a surface treatment chamber 21 where flow distribution members 25 and 26 as a means to distribute the mixed gas introduced into the surface treatment chamber 21 are arranged and flow distribution members 27 and 28 are arranged symmetrically to the flow distribution members 25 and 26 around center of housing 2. The flow distribution members 25 and 26 partition the surface treatment chamber 21 and form mixed gas distribution chambers 29 and 30. The flow distribution members 27 and 28 partition the surface treatment chamber 21 and form mixed gas collection chamber 31 and 32. The mixed gas distribution chambers 29 and 30 are connected directly with a mixed gas feed pipe 4. The gas collection chambers 31 and 32 are connected directly with a mixed gas collection pipe 7. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种能够比现有的设备实现工件表面处理更精确的表面处理的表面处理装置。 解决方案:表面处理装置具有表面处理室21,其中布置作为分配引入到表面处理室21中的混合气体的手段的分配构件25和26,流量分配构件27和28对称地布置成 流动分配构件25和26围绕壳体2的中心。分配构件25和26分隔表面处理室21并形成混合气体分配室29和30.分配构件27和28分隔表面处理室21和 形成混合气体收集室31和32.混合气体分配室29和30直接与混合气体供给管4连接。气体收集室31和32直接与混合气体收集管7连接。 :(C)2011,JPO&INPIT
    • 2. 发明专利
    • Surface treatment apparatus
    • 表面处理设备
    • JP2011063779A
    • 2011-03-31
    • JP2009218032
    • 2009-09-18
    • Takamatsu Teisan Kk高松帝酸株式会社
    • MORI KAZUTAKA
    • C08J7/00
    • PROBLEM TO BE SOLVED: To obtain a surface treatment apparatus that reliably treats one side of a film. SOLUTION: The surface treatment apparatus includes a housing 2 for treating, in its inside, the surface of a film 1 as a material to be treated, a mixed gas supply part 3 as a source of a mixed gas containing fluorine gas, a mixed gas supply pipe 4 connected to a predetermined part of the housing 2 and for supplying a mixed gas thereto from the mixed gas supply part 3, rolls 5, a feeding roll 6 having the film 1 wound therearound and feeding the film 1 to the rolls 5, a take-up roll 7 that takes up the film 1 fed via the rolls 5, and a detoxifying part 9 that recovers the mixed gas from the inside of the housing 2 via a gas discharge pipe 8 for removing the fluorine gas and detoxifying the mixed gas. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:获得可靠地处理膜的一侧的表面处理装置。 解决方案:表面处理装置包括:壳体2,用于在其内部处理作为待处理材料的膜1的表面,作为含氟气体的混合气体源的混合气体供给部3, 连接到壳体2的预定部分并从混合气体供应部分3供应混合气体的混合气体供应管4,辊5,具有卷绕在其上的膜1的进给辊6,并将膜1供给到 辊5,卷取辊7,其卷取经由辊5供给的膜1;以及解毒部9,其经由用于除去氟气的排气管8从壳体2的内部回收混合气体, 解毒混合气体。 版权所有(C)2011,JPO&INPIT
    • 3. 发明专利
    • Surface treatment apparatus
    • 表面处理设备
    • JP2009213947A
    • 2009-09-24
    • JP2008056952
    • 2008-03-06
    • Takamatsu Teisan KkToyo Tanso Kk東洋炭素株式会社高松帝酸株式会社
    • HIRAIWA JIROTAKEBAYASHI HITOSHIYOSHIMOTO OSAMUTANAKA NORIYUKIFUJITA ICHIROSASAKI HIROYOSHIMORI KAZUTAKA
    • B01J19/00B01D53/68C08J7/12
    • PROBLEM TO BE SOLVED: To provide a surface treatment apparatus which can suppress an impair of the apparatus by a gas used for a surface treatment and reforming. SOLUTION: The surface treatment apparatus 100 includes: a diluent gas supply unit 1 supplying a diluent gas; a fluorine gas supply unit 2 supplying a fluorine gas; a mixer 5 mixing the diluent gas and the fluorine gas to produce a mixed gas; and a reactor vessel 6 contacting the mixed gas with the object to be treated, and is characterized by further comprising: an exhaust equipment 7 discharging an exhaust gas from the reactor vessel inside; a plurality of passages 19, 20, 21, and 22 provided between the reactor vessel 6 and the exhaust equipment 7 and circulating the exhaust gas; and a plurality of valves 23, 24, 25, and 26 provided on each of a plurality of passages. COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:提供一种可以通过用于表面处理和重整的气体来抑制装置的损害的表面处理装置。 解决方案:表面处理设备100包括:稀释气体供应单元1,供应稀释气体; 供给氟气的氟气供给单元2; 将稀释气体与氟气混合以产生混合气体的混合器5; 以及与混合气体与待处理物体接触的反应器容器6,其特征在于还包括:排气设备7,其将来自反应器容器内部的废气排出; 设置在反应容器6和排气设备7之间的多个通道19,20,21和22,并使废气循环; 以及设置在多个通路中的每一个上的多个阀23,24,25和26。 版权所有(C)2009,JPO&INPIT
    • 6. 发明专利
    • VALVE CLOSE DETECTING DEVICE
    • JPH1078199A
    • 1998-03-24
    • JP23419396
    • 1996-09-04
    • TEISAN KK
    • YOKOKI KAZUO
    • F17C13/04F16K37/00
    • PROBLEM TO BE SOLVED: To precisely detect the closed state of a valve by forming a close position data on the basis of the stop position of a movable element before the opening and closing operation of the valve. SOLUTION: The initial set of a valve close detecting device 52 is performed. A control device 56 adds a prescribed bit number to the output bit number of a rotary encoder 54 corresponding to the stop position of a vane body (movable element) 22 obtained by the initial setting process by the valve close detecting device 52, and also subtracts it to form a close position data corresponding to the position range of the vane body 22 where a valve 14 is laid in close state. When the close position data is thus formed, the close position data is stored in the RAM 68 of a memory part 64, whereby the initial setting process is completed. After it, the environment capable of performing general valve opening and closing operation is formed. When the valve 14 is opened, the vane body 22 is rocked to the open end position, and when the valve 14 is closed, compressed air is supplied to the port of an actuator to rock the vane body 22 to the close position side.
    • 7. 发明专利
    • GAS FILLING METHOD AND EQUIPMENT
    • JPH1055943A
    • 1998-02-24
    • JP21135296
    • 1996-08-09
    • TEISAN KK
    • TAKEHARADA MITSUHIDENOZAWA NARUSADA
    • H01L21/02F17C5/06F17C13/04
    • PROBLEM TO BE SOLVED: To provide the gas filling method and equipment for suppressing the decline in purity of a filling gas. SOLUTION: Within the gas filling equipment, a gas feeding tube 44 is connected to a gas filling tube 28 fitted to gas containers 12 in an exclusive clean room 42 while the gas filling tube 28 is to be stored in another clean room 26. Thus, the capacity of the clean rooms can be reduced, also the cleanliness in each cleam room can be enhanced. Accordingly, even if the inside of the gas filling tube 28 is exposed in the air inside the clean rooms in case of handling the gas filling tube 28, the possibility of floating particles intruding into the gas filling tube 28 can be diminished. Furthermore, during the storage time of the gas filling tube 28, ultra high purity nitrogen gas is to be circulated into the clean room 26 so that the inside of the gas filling tube 28 used for filling gas may be kept in extremely clean state thereby enabling the decline in gas purity to be avoided.
    • 9. 发明专利
    • AIR SEPARATING METHOD AND AIR SEPARATING DEVICE USING THE METHOD
    • JPH08159655A
    • 1996-06-21
    • JP29987194
    • 1994-12-02
    • TEISAN KK
    • NAGAMURA TAKASHI
    • F25J3/04C04B28/08F25J3/08
    • PURPOSE: To facilitate maintenance and management of a raw material air feed line by a method wherein raw material air the volume of which is reduced after cooling is compressed at a compression process to increase a liquefying temperature, and raw material air in such a state to reduce a feed temperature is fed to a separation process. CONSTITUTION: Raw material air passing an air filter 4 is compressed at a low pressure compression process H being a low pressure compression means 8. The raw material air is then cooled at a cooling process E for adsorption of a second heat-exchanging means 2 and carbon dioxide and a moisture content are adsorbed and removed at an adsorption process D being an adsorbing means 5. The raw material air is fed to a separation process C, wherein separation is effected by a separating means 7, after the passage of it, in order, through a precooling process A wherein cooling is effected by a first heat-exchanging means 1 and a high pressure compression process B wherein compression is effected by a high pressure compression means 6. The raw material air fed to the separation process C is fed to a low temperature separation process G, wherein oxygen and nitrogen are separated from the raw material air by a low temperature separation device 14, through a cooling process F for separation wherein the raw material air is cooled to temperature approximately similar to a liquefaction temperature.
    • 10. 发明专利
    • TURN LOCK STRUCTURE FOR PRESSURE VESSEL
    • JPH0875099A
    • 1996-03-19
    • JP20586494
    • 1994-08-31
    • TEISAN KK
    • ISHITANI KINYA
    • F17C13/08B65D61/00
    • PURPOSE: To regulate rotating a plurality of pressure vessels around each axial line by fixing all internal thread members, screwed to respective external thread parts of the pressure vessel, tightened in a condition that screwing can not be advanced to a base end side of the external thread part. CONSTITUTION: In round nuts 7a, 7b fixedly tightened to each external thread part 6a, 6b of a cylinder 1, a knock pin 11 is inserted to a pin hole also fixedly welded to a fixed plates 2a, 2b, to lock turning the round nuts 7a, 7b against the fixed plates 2a, 2b. The longest cylinder 1A is fixed similarly to relating to the rear fixed plate 2b. In a cylinder 1B a little shorter than the cylinder 1A, a ring member 12 serving as a spacer is fixedly tightened previously to the external thread part 6a, and the round nut 7a is fixedly tightened in a condition that screwing can not be advanced to a base end side of the external thread part 6a. In a remarkably short cylinder 1C, in a condition that a large space 13 is formed between the front fixed plate 2a and the round nut 7a, turning the round nut 7a is locked against the front fixed plate 2a.