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1. 发明专利

JP2007011164A Method of manufacturing liquid crystal display panel by liquid crystal dropping lamination method, and liquid crystal dropping lamination device 审中-公开
标题翻译：通过液晶抛光层压方法制造液晶显示面板的方法和液晶抛光层压装置
公开(公告)号：JP2007011164A
公开(公告)日：2007-01-18
申请号：JP2005194538
申请日：2005-07-04
申请人： Nec Kagoshima Ltd , Nec Lcd Technologies Ltd , Nec液晶テクノロジー株式会社 , 鹿児島日本電気株式会社
发明人： TANAKA HIROMITSU , JINNO TAKASHI , INOUE DAISUKE , ITO HIDEKI
IPC分类号： G02F1/1339
CPC分类号： G02F1/1341 , G02F2001/13415
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a liquid crystal display device by which the liquid crystal display panel having low manufacturing cost and display characteristics of high quality can be manufactured while display unevenness is suppressed, and to provide a liquid crystal dropping lamination device.
SOLUTION: In the method of manufacturing the liquid crystal panel by dropping a liquid crystal material on at least one of a pair of substrates after alignment processing and then forming a gap by putting both the substrates back in an atmosphere after sticking them together under a vacuum, column heights of columnar spacers are measured at a plurality of measurement points on a display surface 20 of one substrate to estimate a distribution of column heights on the display surface 20 based upon the measured column heights, mean values of the column heights are calculated by division blocks 22 obtained by dividing the display surface 20 into a specified number based upon the distribution of column heights, and the drop amounts of the liquid crystal material 12 to be dropped on the respective division blocks 22 are calculated from differences between the mean values of column heights and a predetermined reference value. Consequently, the relation between the column heights and the amounts of liquid crystal is controlled with high precision to suppress the display unevenness.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决的问题：提供一种制造液晶显示装置的方法，通过该方法可以制造具有低制造成本的液晶显示面板和显示不均匀性的高品质的显示特性，并且提供液体晶体滴层装置。解决方案：在通过在对准处理之后将液晶材料滴落在一对基板中的至少一个上然后通过将两个基板粘贴在一起的气氛中再次形成间隙而形成间隙的液晶面板的制造方法中在真空下，在一个基板的显示表面20上的多个测量点处测量柱状间隔物的柱高度，以基于测量的列高度来估计显示表面20上的色谱柱高度的分布，列高度的平均值通过根据列高度的分布将显示面20分割为规定数而得到的分割块22计算出，并且由各分割块22的滴落量落入各分割块22中的液晶材料12的下降量由列高度的平均值和预定的参考值。因此，高精度地控制色谱柱高度和液晶量之间的关系以抑制显示不均匀。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2006317962A Method of fabricating liquid crystal display device 审中-公开
标题翻译：制造液晶显示装置的方法
公开(公告)号：JP2006317962A
公开(公告)日：2006-11-24
申请号：JP2006161141
申请日：2006-06-09
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： MAEDA AKIYOSHI , HAYASE TAKASUKE , YAMADA KEIKO , YAMASHITA MASAMI , NAKADA SHINICHI
IPC分类号： G02F1/1368 , G09F9/00 , G09F9/30 , H01L21/336 , H01L29/786
摘要： PROBLEM TO BE SOLVED: To prevent increase of resistance caused by plasma application in a method of fabricating a liquid crystal display device, in which a transparent conductive film is patterned on an interlayer insulating film having at least an organic insulating film. SOLUTION: The interlayer insulating film is comprised of an inorganic insulating film 32 and the organic insulating film 33 formed on the inorganic insulating film 32. A step to form transparent electrodes 71, 72, which are electrically connected to the switching device through the interlayer insulating film, on the interlayer insulating film is provided. The step includes a step to pattern the organic insulating film 33, a step to apply plasma to the substrate including the organic insulating film 33, a step to form contact holes 26, 27 throughout the inorganic insulating film 32, a step to deposit the transparent conductive film on the interlayer insulating film, and a step to form the transparent electrodes 71, 72 by patterning the transparent conductive film. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了防止在制造液晶显示装置的方法中引起的电阻增加，其中在具有至少一个有机绝缘膜的层间绝缘膜上图案化透明导电膜。解决方案：层间绝缘膜由无机绝缘膜32和形成在无机绝缘膜32上的有机绝缘膜33组成。形成透明电极71,72的步骤，其通过在层间绝缘膜上设置层间绝缘膜。该步骤包括图案化有机绝缘膜33的步骤，将等离子体施加到包括有机绝缘膜33的基板的步骤，在整个无机绝缘膜32中形成接触孔26,27的步骤，沉积透明层间绝缘膜上的导电膜，以及通过图案化透明导电膜形成透明电极71,72的步骤。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2006245593A Substrate processing apparatus 有权
标题翻译：基板加工设备
公开(公告)号：JP2006245593A
公开(公告)日：2006-09-14
申请号：JP2006077724
申请日：2006-03-20
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： KIDO SHUSAKU , IIO YOSHIHIDE , IKEDA MASAKI
IPC分类号： H01L21/027 , G03F7/40
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing apparatus for processing a substrate capable of accurately control a reflow distance L within a desired value. SOLUTION: The gas for exposure processing introduced in a chamber 101 is blown to a substrate 1 through openings 211 formed in a gas blowing plate 21. Since the gas 33 for exposure processing is uniformly blown to the substrate 1 by the gas blowing plate 21 under the pressure condition, a reflow distance may be controlled accurately over the entire surface of the substrate 1. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于处理能够将回流距离L精确地控制在期望值内的基板的基板处理装置。解决方案：在室101中引入的用于曝光处理的气体通过形成在气体吹入板21中的开口211吹送到基板1.由于用于曝光处理的气体33通过吹气均匀地吹向基板1 板21在压力条件下，可以在基板1的整个表面上精确地控制回流距离。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2006154122A Photomask for active matrix type display apparatus and method for manufacturing the same 有权
标题翻译：主动矩阵式显示装置的光电二极管及其制造方法
公开(公告)号：JP2006154122A
公开(公告)日：2006-06-15
申请号：JP2004342782
申请日：2004-11-26
申请人： Dainippon Printing Co Ltd , Nec Kagoshima Ltd , Nec Lcd Technologies Ltd , Nec液晶テクノロジー株式会社 , 大日本印刷株式会社 , 鹿児島日本電気株式会社
发明人： TAKAHASHI YOSHITOMO , MURAYAMA YOICHI , MORI HIROSHI , HIDA ATSUSHI , KUNIYOSHI MASAMI , BAN KIYOTO , KIDO SHUSAKU
IPC分类号： G02F1/1368 , G03F1/00 , G03F1/68 , H01L21/027 , H01L21/336 , H01L29/786
摘要： PROBLEM TO BE SOLVED: To provide a photomask used for a method of manufacturing an LCD, the photomask which forms islands in an a-Si layer including a signal terminal region while suppressing an increase in photolithography process and suppresses an increase in parasitic capacitance as a whole. SOLUTION: The photomask (590-1, 590-2) includes light-shielding portions (520-1, 520-2) in figures corresponding to a part of a drain electrode and a source electrode, and semitransparent portions (510-1, 510-2, 510-3, 510-4) in figures corresponding to other part of the drain electrode and the source electrode, a signal line, a signal terminal metal electrode and a leader line. By using the mask, a thin resist pattern can be formed in regions where the signal line, the signal leader line, the signal terminal, a part of the drain electrode and a part of the source electrode are to be formed, and a relatively thick resist pattern can be formed in a region with a short distance from a position where the drain electrode and the source electrode oppose to each other to over the gate electrode width. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供用于制造LCD的方法的光掩模，该光掩模在包含信号端区域的a-Si层中形成岛，同时抑制光刻工艺的增加并抑制寄生的增加电容作为一个整体。解决方案：光掩模（590-1,590-2）包括对应于漏电极和源电极的一部分的图案中的遮光部分（520-1,520-2）和半透明部分（510 -1,510-2,510-3,510-4），其对应于漏电极和源电极的另一部分，信号线，信号端子金属电极和引线。通过使用掩模，可以在要形成信号线，信号引出线，信号端子，漏电极的一部分和源电极的一部分的区域中形成薄的抗蚀剂图案，并且可以形成较厚的抗蚀剂图案可以在与漏电极和源电极彼此相对的位置相距较短距离的栅极电极宽度的区域中形成抗蚀剂图案。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2005164746A Liquid crystal display device 有权
标题翻译：液晶显示装置
公开(公告)号：JP2005164746A
公开(公告)日：2005-06-23
申请号：JP2003400732
申请日：2003-11-28
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： YOKOGAWA SHINJI , NOGAMI YUSUKE
IPC分类号： G02F1/1368 , G02F1/133 , G02F1/1343 , G02F1/136 , G02F1/1362
CPC分类号： G02F1/136259 , G02F1/134363 , G02F2001/136263
摘要： PROBLEM TO BE SOLVED: To provide a TFT array substrate in which an interlayer short circuit part is separated with laser repair etc. even when interlayer short circuit takes place between a shield common electrode and a drain wire due to a process factor in a lateral electric field type liquid crystal display device. SOLUTION: A slit part is arranged on a center of the shield common electrode which overlaps with the drain wire in mutually different layers. Although a serious line defect appears on a picture display in the case the interlayer short circuit takes place between the drain wire and the shield common electrode, the line defect can be repaired or made to disappear by cutting off both sides of the slit on which the short circuit has taken place with the laser repair etc. and separating the place where the short circuit has taken place. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供其中层间短路部分与激光修复等分离的TFT阵列基板，即使由于处理因子在屏蔽公共电极和漏极线之间发生层间短路，横向电场型液晶显示装置。解决方案：狭缝部分布置在屏蔽公共电极的与互不相同层的漏极线重叠的中心处。尽管在漏极线和屏蔽公共电极之间发生层间短路的情况下，在图像显示器上出现严重的线缺陷，但是可以通过切断狭缝的两侧来修复或使其消失，从而消除线缺陷激光修复等发生短路，分离发生短路的地方。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2005084200A Rubbing alignment treatment device and rubbing alignment treatment method of liquid crystal display panel 审中-公开
标题翻译：液晶显示面板的橡胶对准处理装置和橡胶对准处理方法
公开(公告)号：JP2005084200A
公开(公告)日：2005-03-31
申请号：JP2003313969
申请日：2003-09-05
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： MIZOGUCHI CHIKAAKI
IPC分类号： G02F1/13 , G02F1/1337
CPC分类号： G02F1/133784
摘要： PROBLEM TO BE SOLVED: To perform rubbing treatment so that eccentric unevenness can not be visualized, to eliminate scraping of an alignment layer due to high speed rotation and to eliminate the problem caused by scrapings, in a rubbing alignment treatment device and its method of the alignment layer 5 of a liquid crystal display substrate 3.
SOLUTION: In the device, the length in the circumference direction of a rubbing cloth 1 is made to be a half or below of the outer peripheral length of a rotary roll 2a, the eccentric unevenness generated by a seam of a rubbing roll 2 is made to be hardly visualized and rubbing density is reduced and scraping of the alignment layer is prevented by shortening the length of the rubbing cloth 1.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了进行摩擦处理，使得偏心不匀度不能被可视化，为了消除由于高速旋转引起的取向层的刮擦并且消除由刮削引起的问题，在摩擦取向处理装置及其液晶显示基板3的取向层5的方法。解决方案：在该装置中，将摩擦布1的圆周方向的长度设定为旋转体1的外周长度的一半以下由于辊2a的摩擦辊2的接缝产生的偏心不均匀性几乎不可视化，摩擦密度降低，并且通过缩短摩擦布1的长度来防止取向层的刮擦。版权所有（ C）2005，JPO＆NCIPI

7. 发明专利

JP2004240142A Liquid crystal display device and method for manufacturing the same 有权
公开(公告)号：JP2004240142A
公开(公告)日：2004-08-26
申请号：JP2003028850
申请日：2003-02-05
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： TAKACHI MASAYUKI
IPC分类号： G02F1/1333 , G02F1/1337
CPC分类号： G02F1/133784 , G02F2001/1316 , G02F2001/133388
摘要： PROBLEM TO BE SOLVED: To provide a liquid crystal display device in which quality of an alignment layer surface in a pixel region and furthermore display quality are kept on a higher level, with respect to alignment treatment of the alignment layer with a rubbing method, and a method for manufacturing the same.
SOLUTION: In the vicinity of at least one edge of the alignment layer of the pixel region of at least one out of a TFT substrate or a counter substrate, an alignment layer with a height higher than that of the alignment layer of the pixel region is disposed. Consequently, prior to the alignment treatment of the alignment layer of the pixel region, a rubbing cloth passes over the alignment layer with the height higher than that of the alignment layer of the pixel region. Foreign matters stuck to the rubbing cloth are wiped out and recovered with a difference in level of the high alignment layer. Thereby the suitable alignment treatment is carried out without scatter of the foreign matters on the alignment layer of the pixel region.
COPYRIGHT: (C)2004,JPO&NCIPI

8. 发明专利

JP2004172150A Method of manufacturing interconnecting line of laminated structure 审中-公开
公开(公告)号：JP2004172150A
公开(公告)日：2004-06-17
申请号：JP2002332485
申请日：2002-11-15
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： DOI SATOSHI
IPC分类号： H01L23/52 , H01L21/28 , H01L21/3205 , H01L21/336 , H01L29/417 , H01L29/45 , H01L29/49 , H01L29/786
CPC分类号： H01L29/66765 , H01L29/41733 , H01L29/458 , H01L29/4908 , H01L29/78669
摘要： PROBLEM TO BE SOLVED: To enable a laminated film, which is composed of a low-resistance core metal film sandwiched between an upper high-melting point metal film and a lower high-melting point metal film, to be improved in heat-resistant and corrosion-resistant properties at the same time.
SOLUTION: A low-resistance interconnecting line of laminated structure is composed of low-resistance core metal films 72 and 82 sandwiched between lower high-melting point metal films 71 and 81 and upper high-melting point metal films 74 and 84. The top surfaces, under surfaces and side walls of the low-resistance core metal films are thin coated with the oxide film, nitride film, or oxide nitride films 73 and 83 of the low-resistance core metal. In this case, the oxide film, nitride film, or oxide nitride films 73 and 83 of the low-resistance core metal covering the top surfaces, under surfaces and side walls of the low-resistance core metal films may be set different from each other.
COPYRIGHT: (C)2004,JPO

9. 发明专利

JP2004170620A Liquid crystal display device and manufacturing method thereof 有权
公开(公告)号：JP2004170620A
公开(公告)日：2004-06-17
申请号：JP2002335264
申请日：2002-11-19
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： ISHINO TAKAYUKI , YAMAMOTO YUJI , NAKADA SHINICHI , YAMASHITA MASAMI
IPC分类号： G02F1/1368 , G02F1/1335 , G02F1/1362 , H01L21/336 , H01L29/786
CPC分类号： G02F1/1362 , G02F1/133514 , G02F2001/13625
摘要： PROBLEM TO BE SOLVED: To provide a liquid crystal display device and manufacturing method thereof, which resolve a defect that it is hard for variations in brightness on a display part to be visually confirmed and has excellent display properties. SOLUTION: An exposure process of forming an image electrode and a pixel opposing electrode performs divided exposure to the same area to be divided by shifting boundary parts at each of respective arrays corresponding to colors of red, green and blue, respectively. In this case, it is possible for each exposure process to use reticles with the same pattern in a manner of shifting at each of the respective arrays. Thereby, in the display device manufactured by a divided exposure method, the defect that line width differences of electrodes are caused among adjacent display areas to sandwich the boundary parts so that the line width differences are visually confirmed as brightness differences among the adjacent display areas and display quality is not sufficient. COPYRIGHT: (C)2004,JPO

10. 发明专利

JP2004146690A Method for manufacturing thin film transistor 有权
公开(公告)号：JP2004146690A
公开(公告)日：2004-05-20
申请号：JP2002311525
申请日：2002-10-25
申请人： Nec Kagoshima Ltd , 鹿児島日本電気株式会社
发明人： SAIGO SHINGO
IPC分类号： H01L29/786 , H01L21/336
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin film transistor for shortening the process by using an organic film as a mask, and forming a gate electrode and an island layer in a batch, and for preventing disconnection of the drain wiring by reflow soldering the organic film to protect the gate electrode side wall in a tapered shape and improving the coverage performance.
SOLUTION: An organic film(for example, a soluble polyimide) is used as a mask, and a base layer(an ohmic layer, a semiconductor layer, a gate insulating layer, a gate electrode) is etched, and the gate electrode is formed (Fig. 3(not shown)). The organic film(for example, the soluble polyimde) is exposed in an N-methy-2-pyrrolidine atmosphere (20 to 150°C), for reflow soldering. The gate electrode side wall is protected in the tapered shape by the organic film in a capillary phenomenon (figure). Furthermore, the organic film(for example, the soluble polyimide) is burnt at 180 to 250°C and insulated. As a result, even when a thin part is removed after reflow soldering, the variations of the plane shape of a thick part can be reduced between the substrates and in the substrate, and the organic film can be formed with high reproducibility. Also, the etching pattern of an etched film with the organic film as a mask can be provided with high precision.
COPYRIGHT: (C)2004,JPO

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