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    • 1. 发明专利
    • Large area microwave plasma apparatus with adaptable applicator
    • 大面积微波等离子体设备与适应适应器
    • JP2010045037A
    • 2010-02-25
    • JP2009211797
    • 2009-09-14
    • Energy Conversion Devices Incエナージー コンバーション デバイセス インコーポレイテッドEnergy Conversion Devices, Inc.
    • DOEHLER JOACHIM
    • H05H1/46C23C16/511H01J37/32H01L21/205H01L21/302H01L21/3065H01L21/31
    • H01J37/32229H01J37/32192
    • PROBLEM TO BE SOLVED: To provide a microwave plasma apparatus for sustaining substantially uniform plasma over a relatively large area, easily adaptable for usage in a various microwave frequencies. SOLUTION: The large area microwave plasma apparatus is composed of: a vacuum vessel 12 for sustaining plasma in plasma regions 20, 20a; a means in the vacuum vessel 12 for supporting a substrate in parallel with the plasma regions 20, 20a; a means for sustaining the vacuum vessel 12 at a desired pressure; means 18, 18a for introducing action gas into the vacuum vessel 12; a non-evanescent microwave applicator 40 with a means for controlling cutoff wavelength, wherein at least part of the microwave applicator 40 extends into the vacuum vessel 12 and irradiates microwave energy from a power source into the vacuum vessel 12; and a means 60 for gas-insulating the applicator 40 from the plasma regions 20, 20a. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种微波等离子体装置,用于在相对较大的区域上维持基本上均匀的等离子体,容易适用于各种微波频率的使用。 解决方案:大面积微波等离子体装置包括:用于在等离子体区域20,20a中维持等离子体的真空容器12; 在真空容器12中用于与等离子体区域20,20a平行地支撑衬底的装置; 用于在期望压力下维持真空容器12的装置; 用于将动作气体引入真空容器12的装置18,18a; 具有用于控制截止波长的装置的非消逝微波施加器40,其中微波施加器40的至少一部分延伸到真空容器12中并将来自电源的微波能量照射到真空容器12中; 以及用于将施涂器40从等离子体区域20,20a进行气体绝缘的装置60。 版权所有(C)2010,JPO&INPIT
    • 10. 发明专利
    • SEPARATION VALVE
    • JPH02216819A
    • 1990-08-29
    • JP8669989
    • 1989-04-05
    • ENERGY CONVERSION DEVICES INC
    • DEBITSUTO EE GATSUTASOMASATSUGU IZU
    • H01L21/302C23C14/56C23C16/54F16J15/16H01L21/205H01L21/3065H01L21/31H01L31/04
    • PURPOSE: To manufacture a high-performance semiconductor device in which layers having different chemical compositions are homogeneously formed and joined with each other in excellent states by changing the course of substrates continuously passed through a plurality of chambers and the arrangement of the chambers in accordance with the alteration of the course. CONSTITUTION: A supply reel 12 and take-up reel 16 constitute a drive means and intermediate idler reels 20, 22, 24, and 26 constitute a guide means. When such a variable as the impurity, the other component of a reactive gas, the arranging order of chambers between a supply section 14 and take-up section 18 is changed, the arrangement of layers in the cross section of a semiconductor also changes accordingly. In such a continuous vapor-deposition method that an intrinsic layer (I-type layer) vapor-deposition chamber 30 is considerably longer than a P- or N-type layer vapor-deposition chamber 28 or 32, a film substrate 10 advances to the take-up reel 16 from the supply reel 12 at a substantially constant speed. Since an N-type layer, an intrinsic layer, and a P-type are continuously vapordeposited on various parts of the advancing film substrate 10, the thickness of the layer which is the function of the time spend in an arbitrary chamber decides the relative length of the chamber.