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1. 发明专利

JP2007148401A Axial symmetric glass lens 审中-公开
标题翻译：轴对称玻璃镜
公开(公告)号：JP2007148401A
公开(公告)日：2007-06-14
申请号：JP2006309162
申请日：2006-11-15
申请人： Chugoku Sarin Kigyo Kofun Yugenkoshi , 中國砂輪企業股▲分▼有限公司
发明人： HUANG JEN-SHEUAN , CHEN CHING-HUNG , LIN KUAN-HUNG , LIAO WEN-JEN , LIANG WEN-YU , YEH SHIH-WEI , TING WEN-CHIN
IPC分类号： G02B13/18 , C03B11/08 , G02B3/00 , G02B7/02
CPC分类号： C03B11/08 , C03B11/084 , C03B11/086 , C03B2215/07 , C03B2215/12 , C03B2215/17 , C03B2215/24 , C03B2215/49 , Y02P40/57
摘要： PROBLEM TO BE SOLVED: To provide an axial symmetric glass lens manufactured by a hot-press means. SOLUTION: The axial symmetric glass lens is provided with: an axial symmetric lens surface having an axial symmetric curved surface on a surface; a connection boundary presenting ring shape surrounding the lens surface and smoothly connected with the lens surface; and a plane part smoothly connected with the connection boundary. The absolute value of the radius of curvature of the connection boundary is always changed from the lens surface to the plane part and also is not a fixed numerical value. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过热压装置制造的轴对称玻璃透镜。解决方案：轴对称玻璃透镜设置有：在表面上具有轴对称曲面的轴对称透镜表面; 连接边界呈现出围绕透镜表面并与透镜表面平滑连接的环形形状; 和与连接边界平滑连接的平面部分。连接边界的曲率半径的绝对值总是从透镜表面改变到平面部分，也不是固定的数值。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2008038244A Cvd equipment having vertical coating plane and power source-controlled hot filament 有权
标题翻译：具有垂直涂层平面和电源控制的热丝的CVD设备
公开(公告)号：JP2008038244A
公开(公告)日：2008-02-21
申请号：JP2006286361
申请日：2006-10-20
申请人： Chugoku Sarin Kigyo Kofun Yugenkoshi , 中國砂輪企業股▲ふぇん▼有限公司
发明人： WANG MING-HUI , CHANG HSIAO-KUO , LIN KUAN-HUNG
IPC分类号： C23C16/44 , C23C16/52
CPC分类号： C23C16/44
摘要： PROBLEM TO BE SOLVED: To provide a CVD (chemical vapor deposition) equipment having a vertical coating plane and power source-controlled hot filaments.
SOLUTION: A CVD reactor mainly has a chamber, one or a number of rotating electrodes provided inside the chamber, hot filaments whose at least one end is connected to the surfaces of the rotating electrodes, and a rotating power source. A substrate as an object for coating is placed inside the chamber in a vertical position, and further, the substrate is subjected to coating in at least one side coating plane through the hot filaments. When the hot filaments expand due to a temperature change, the rotating power source rotates the rotating electrode(s) to stretch the hot filaments and to further maintain the predetermined tension of the hot filaments, thereby preventing loosing and vibration of the hot filaments so as not to interfere with the performance of the coating work and not to touch and damage the substrate upon flowing of a gas in the chamber.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有垂直涂层平面和电源控制的热丝的CVD（化学气相沉积）设备。解决方案：CVD反应器主要具有室，设置在室内的一个或多个旋转电极，其至少一端连接到旋转电极的表面的热丝和旋转电源。将作为涂布对象的基板在垂直位置放置在室内，此外，基板通过热丝在至少一个侧面涂层平面上进行涂布。当热丝由于温度变化而膨胀时，旋转电源使旋转电极旋转以拉伸热丝，并进一步保持热丝的预定张力，从而防止热丝的松动和振动，从而不会干扰涂层工作的性能，并且不会在气体在腔室中流动时接触和损坏基板。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2008038243A Cvd equipment having horizontal coating plane and power source-controlled hot filament 有权
标题翻译：具有水平涂层平面和电源控制热膜的CVD设备
公开(公告)号：JP2008038243A
公开(公告)日：2008-02-21
申请号：JP2006285161
申请日：2006-10-19
申请人： Chugoku Sarin Kigyo Kofun Yugenkoshi , 中國砂輪企業股▲ふぇん▼有限公司
发明人： WANG MING-HUI , CHANG HSIAO-KUO , LIN KUAN-HUNG
IPC分类号： C23C16/44 , C23C16/52
CPC分类号： C23C16/44
摘要： PROBLEM TO BE SOLVED: To provide a CVD (chemical vapor deposition) equipment having a horizontal coating plane and power source-controlled hot filaments.
SOLUTION: The CVD reactor mainly has a chamber, at least one or more rotating electrodes provided inside the chamber, hot filaments whose at least one end is connected to the surfaces of the rotating electrodes, and a rotating power source. In this invention, the rotating power source outputs rotating power to drive and rotate the rotating electrodes and to further stretch the hot filaments when the hot filaments expand due to a temperature change, thereby preventing the hot filaments from expanding and touching the substrate to damage the substrate.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有水平涂布平面和电源控制的热丝的CVD（化学气相沉积）设备。解决方案：CVD反应器主要具有室，设置在室内的至少一个或多个旋转电极，其至少一端连接到旋转电极的表面的热丝和旋转电源。在本发明中，旋转电源输出旋转动力来驱动和旋转旋转电极，并且当热丝由于温度变化而膨胀时进一步拉伸热丝，从而防止热丝膨胀并接触基底以损坏基质。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2009297879A Polishing tool 审中-公开
标题翻译：抛光工具
公开(公告)号：JP2009297879A
公开(公告)日：2009-12-24
申请号：JP2008157885
申请日：2008-06-17
申请人： Chugoku Sarin Kigyo Kofun Yugenkoshi , 中國砂輪企業股▲ふぇん▼有限公司
发明人： CHOU JUILIN , LIAO DONG-LIANG , CHIN YUZEN
IPC分类号： B24D11/00 , B24D3/00 , B24D15/02
摘要： PROBLEM TO BE SOLVED: To provide a polishing tool capable of enhancing total accuracy, extending use life, reducing manufacturing cost and raising processing efficiency, and to provide its manufacturing method.
SOLUTION: The manufacturing method for a polishing tool includes a step (A) of preparing a polishing sheet having a processing surface and a non-processing surface, a die having a control surface, and a back plate; a step (B) of connecting between the processing surface of the polishing sheet and control surface of the die, and fixing both surfaces with a connecting agent; a step (C) of forming an adhesive layer on the non-processing surface of the polishing sheet; a step (D) of fixing the back plate on the surface of adhesive layer; and a step (E) of removing the connecting agent and separating the die and the polishing sheet.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够提高总精度，延长使用寿命，降低制造成本和提高加工效率的抛光工具，并提供其制造方法。＆lt; P＆gt;解决方案：抛光工具的制造方法包括制备具有处理表面和非处理表面的抛光片，具有控制表面的模具和背板的步骤（A）在所述研磨片的处理面与所述模具的控制面之间进行连接的工序（B），以及将连接剂固定的两面; 在所述研磨片的非处理面上形成粘合剂层的工序（C）; 将背板固定在粘合剂层的表面上的步骤（D）; 以及去除连接剂并分离模具和抛光片的步骤（E）。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2008050683A Cvd equipment 审中-公开
标题翻译： CVD设备
公开(公告)号：JP2008050683A
公开(公告)日：2008-03-06
申请号：JP2006286173
申请日：2006-10-20
申请人： Chugoku Sarin Kigyo Kofun Yugenkoshi , 中國砂輪企業股▲ふぇん▼有限公司
发明人： CHUNG CHIH-HSIEN , CHANG HSIAO-KUO , LIN KUAN-HUNG
IPC分类号： C23C16/44 , C23C16/452 , H01L21/205
CPC分类号： C23C16/509 , C23C16/4557
摘要： PROBLEM TO BE SOLVED: To provide a CVD (chemical vapor deposition) equipment provided with a control mechanism of gas pre-heating, substrate heating, and electric field and magnetic field. SOLUTION: A CVD (chemical vapor deposition) reactor is provided with a reaction chamber, a gas tube heater, a substrate holder, a holder heater, a plurality of hot filaments, an electric field generator, and a magnetic field generator. The gas tube heater preheats the gas, the substrate holder and a plurality of the hot filaments heats the substrate, and the gas and substrate heating speed is accelerated by variously different heating systems, thereby saving much deposition time and greatly improving deposition efficiency. Matching with the electric field generator and the magnetic field generator, the ionization of applied gas in the reaction chamber is enhanced and the uniformity of the thickness of the deposited film on the surface of the substrate is increased. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有气体预热，基板加热，电场和磁场的控制机构的CVD（化学气相沉积）设备。解决方案：CVD（化学气相沉积）反应器设置有反应室，气体管加热器，基板保持器，保持器加热器，多个热丝，电场发生器和磁场发生器。燃气管加热器预热气体，基板保持器和多个热丝加热基板，气体和基板加热速度通过各种不同的加热系统加速，从而节省大量的沉积时间并大大提高沉积效率。与电场发生器和磁场发生器匹配，反应室中施加气体的电离增强，并且衬底表面上沉积膜的厚度均匀性增加。版权所有（C）2008，JPO＆INPIT

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