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    • 81. 发明专利
    • BIMOS SEMICONDUCTOR DEVICE
    • JPH06163833A
    • 1994-06-10
    • JP4222891
    • 1991-02-15
    • TOSHIBA CORP
    • FUSE TSUNEAKIHAMAZAKI TOSHIHIKOMATSUZAWA KAZUYAWATANABE SHIGEYOSHI
    • H01L27/06H01L21/8249
    • PURPOSE:To constitute a high-speed BiMOS circuit in a lower collector concentration and to contrive to improve the breakdown strength of a BiMOS semiconductor device by a method wherein the speed overshoot of carriers due to a miniaturization of the device and a two-dimensional effect are taken in a formula which shows a base extrusion effect. CONSTITUTION:The density of a collector current in a BiMOS circuit exceeds a boundary current density Jo, which is shown by the following descriptive formula Jo=qv[Nc+2epsilonsi(VCB+phibi)/qWc ], due to the speed overshoot of carriers and a collector impurity concentration Nc and a collector width Wc are set so that the responce time of an output terminal is shortest. In the formula, Jo is a boundary current to begin to generate a base extrusion effect, q is unit charge, v is the speed of carriers generating the speed overshoot, Nc is the collector impurity concentration, epsilonsi is the dielectric constant of a silicon film, VCB is the collector-base voltage, phibi is the built-in voltage of a collector junction and Wc is the collector width.