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    • 83. 发明专利
    • Method for producing sodium erythorbate
    • 生产硫酸钠的方法
    • JP2005139138A
    • 2005-06-02
    • JP2003378884
    • 2003-11-07
    • Fuso Chemical Co Ltd扶桑化学工業株式会社
    • SHIRAISHI TOSHIKUNIOKADA YUKIOMINAMIDA MASARU
    • C07D307/62B01D9/02
    • PROBLEM TO BE SOLVED: To provide a method for producing sodium erythorbate by which the sodium erythorbate can be produced in a yield higher than that by a conventional method for producing the sodium erythorbate and in a time shorter than that in the conventional method, and the highly safe sodium erythorbate can be produced because of extremely little fear of emergence of microorganisms in crystallization.
      SOLUTION: The method for producing the sodium erythorbate comprises (1) a step for crystallizing the sodium erythorbate by adding a liquid hardly dissolving the sodium erythorbate to a solution of the sodium erythorbate, and (2) a step for separating the crystal of the crystallized sodium erythorbate.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 待解决的问题:提供一种生产异抗坏血酸钠的方法,通过该方法可以以比常规生产异硫氰酸钠的方法更高的产率生产异抗坏血酸钠,并且在比常规方法短的时间内 ,并且可以生产高度安全的异抗坏血酸钠,因为对结晶中微生物的出现的恐惧极少。 解决方案:制备异抗坏血酸钠的方法包括:(1)通过将几乎不溶于异抗坏血酸钠的液体添加到异抗坏血酸钠的溶液中来结晶异硫氰酸钠的步骤,和(2)分离晶体的步骤 的结晶的异抗坏血酸钠。 版权所有(C)2005,JPO&NCIPI
    • 85. 发明专利
    • Silica sol and manufacturing method therefor
    • 二氧化硅溶胶及其制造方法
    • JP2005060219A
    • 2005-03-10
    • JP2004217655
    • 2004-07-26
    • Fuso Chemical Co Ltd扶桑化学工業株式会社
    • YAMAKAWA TAKAHIROTOMOTA YOSHIAKITOYAMA KEIJISAKAI MASATOSHI
    • C01B33/141
    • PROBLEM TO BE SOLVED: To prepare a silica sol which can be suitably used as a material such as a polishing material for an electronic material and a silicon wafer requiring high purity and which has excellent stability of the sol so that the silica concentration is easily increased and can be controlled to a level equal to or higher than a silica sol produced from water glass, and to provide a manufacturing method therefor.
      SOLUTION: The silica sol has silica fine particles dispersed in water and has 10 to 1,000 nm average secondary particle size of the silica fine particles, ≤1 ppm metal impurity content, and 10 to 50 wt.% silica concentration. The stable method for manufacturing the silica sol includes processes of: (a) subjecting a hydrolyzable silicon compound to hydrolysis and polycondensation to produce a silica sol; and (b) concentrating the silica sol obtained in the process (a) to a specified silica concentration or lower according to the particle size of the silica sol, substituting water for a dispersion medium and an alkali catalyst in the silica sol and controlling the pH to 6.0 to 9.0.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了制备适合用作电子材料用抛光材料和需要高纯度并且具有优异的溶胶稳定性的硅晶片等材料的二氧化硅溶胶,使得二氧化硅浓度 容易地增加并且可以控制到等于或高于由水玻​​璃制成的硅溶胶的水平,并提供其制造方法。 解决方案:二氧化硅溶胶具有分散在水中的二氧化硅微粒,二氧化硅微粒的平均二次粒径为10〜1000nm,金属杂质含量≤1ppm,二氧化硅浓度为10〜50重量%。 制造二氧化硅溶胶的稳定方法包括以下工序:(a)使水解性硅化合物进行水解和缩聚反应,生成二氧化硅溶胶; 和(b)根据二氧化硅溶胶的粒度,将方法(a)中得到的二氧化硅溶胶浓缩至规定的二氧化硅浓度以下,在二氧化硅溶胶中取代水分散介质和碱催化剂,控制pH 至6.0〜9.0。 版权所有(C)2005,JPO&NCIPI
    • 86. 发明专利
    • Silica sol and manufacturing method therefor
    • 二氧化硅溶胶及其制造方法
    • JP2005060217A
    • 2005-03-10
    • JP2004216371
    • 2004-07-23
    • Fuso Chemical Co Ltd扶桑化学工業株式会社
    • YAMAKAWA TAKAHIROTOMOTA YOSHIAKITOYAMA KEIJISAKAI MASATOSHI
    • C01B33/145C09K3/14
    • PROBLEM TO BE SOLVED: To prepare a silica sol which can be suitably used as a material such as a polishing material for an electronic material and a silicon wafer requiring high purity, which has uniform particle diameters of silica fine particles, and which has excellent long-term storage stability, an increased concentration of the silica fine particles in a reaction solution and excellent productivity, and to provide a manufacturing method therefor.
      SOLUTION: The method for manufacturing the silica sol is characterized in that an organic solvent containing tetramethoxy silane and a solvent containing an alkali catalyst and water are added to an organic solvent containing an alkali catalyst and water, thereby subjecting the tetramethoxy silane to hydrolysis and polycondensation to manufacture the silica sol. The silica sol has silica fine particles dispersed in water, and has 20 to 1,000 nm average secondary particle size of the silica fine particles, ≤1 ppm metal impurity content, and 10 to 50 wt.% silica concentration.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了制备适合用作电子材料用研磨材料的硅溶胶和需要高纯度的硅晶片,其具有均匀的二氧化硅微粒的粒径,并且其中 具有优异的长期储存稳定性,反应溶液中二氧化硅细颗粒的浓度增加和生产率优异,并提供其制备方法。 解决方案:制备二氧化硅溶胶的方法的特征在于,将含有四甲氧基硅烷和含有碱催化剂和水的溶剂的有机溶剂加入到含有碱催化剂和水的有机溶剂中,由此使四甲氧基硅烷 水解和缩聚以制造硅溶胶。 硅溶胶具有分散在水中的二氧化硅微粒,二氧化硅微粒的平均二次粒径为20〜1000nm,金属杂质含量≤1ppm,二氧化硅浓度为10〜50重量%。 版权所有(C)2005,JPO&NCIPI
    • 88. 发明专利
    • Formulating salt for high salinity treatment, treating liquid for laver, and laver treating method
    • 用于高盐度处理的配方盐,处理液体和停留处理方法
    • JP2005027557A
    • 2005-02-03
    • JP2003196077
    • 2003-07-11
    • Fuso Chemical Co Ltd扶桑化学工業株式会社
    • NAGASAWA TETSUOTANAKA HIROTAKAMATSUNAGA RYUICHI
    • A01G33/02A01N25/02A01N37/02A01N59/00A01N59/06A01N59/08A01N59/16A23L17/60A23L1/337
    • PROBLEM TO BE SOLVED: To provide formulating salt for high salinity treatment hardly changing pH of acidifying liquid even added to the acidifying liquid, and to provide a treating liquid for laver and a laver treating method each giving no harmful effect on the human body and the environment through including the formulating salt for high salinity treatment and effectively exterminating undesired alga and disease damage and performing protective treatment in a short time. SOLUTION: The formulating salt for high salinity treatment contains first inorganic salts of at least one kind selected from the group consisting of sodium chloride, potassium chloride, magnesium chloride, ammonium chloride, calcium chloride, ferric chloride, sodium nitrate, potassium nitrate, magnesium nitrate, ammonium nitrate, calcium nitrate, aluminum ammonium sulfate, and aluminum potassium sulfate, and at least one kind selected from (a) inorganic acid salt, (b) amino acid and/or amino acid salt and (c) second inorganic salts excluding the first inorganic salts. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了提供用于高盐度处理的配方盐,甚至添加到酸化液中的酸化液的pH几乎不变化,并且提供一种对人体没有有害影响的紫菜和紫菜处理方法 通过包括配制盐进行高盐度处理,有效消除不希望的藻类和疾病的损害,并在短时间内进行保护治疗。 解决方案:用于高盐度处理的配制盐含有选自氯化钠,氯化钾,氯化镁,氯化铵,氯化钙,氯化铁,硝酸钠,硝酸钾中的至少一种的第一种无机盐 硝酸铵,硝酸钙,硫酸铝铵和硫酸铝钾,以及选自(a)无机酸盐,(b)氨基酸和/或氨基酸盐中的至少一种,和(c)第二无机酸 不含第一无机盐的盐。 版权所有(C)2005,JPO&NCIPI