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    • 74. 发明专利
    • METHOD AND APPARATUS FOR MEASUREMENT OF ELECTROMAGNETIC FORCE
    • JPH07280907A
    • 1995-10-27
    • JP7516094
    • 1994-04-13
    • NIPPON STEEL CORP
    • MOGI TAKASHI
    • G01R33/12G01N21/00
    • PURPOSE:To measure an electromagnetic force acting between magnetic materials by a method wherein a gap is formed between the magnetic materials, a yoke is arranged, a magnetic field whose magnitude is changed, is applied to the materials, a laser luminous flux is applied to a steel plate and its scattered luminous flux is used for an interference by the phase difference between its incident light and reflected light. CONSTITUTION:A gap is formed between a steel plate sample to be measured and a yoke. The gap is made definite without being changed according to the sample. It is excited by a prescribed magnetic flux density, and it is excited while an AC current is made to flow in order to compute an acceleration. Since the sample is attracted by the yoke and vibrated at this time, the vibration amplitude of the sample is measured by a laser Doppler vibration meter, and the acceleration is computed by it. The acceleration is found by differentiating the vibration amplitude two times, and an electromagnetic force is found from it by means of the following expression: F=ma [where F represents the electromagnetic force, (m) represents the mass of the part of the steel plate sample to which the electromagnetic force is applied, and (a) represents the acceleration of the steel plate].
    • 75. 发明专利
    • MANUFACTURE OF ELECTROMAGNETIC SHIELD BOX
    • JPH06232576A
    • 1994-08-19
    • JP1646893
    • 1993-02-03
    • NIPPON STEEL CORP
    • MOGI TAKASHIOKAZAKI YASUO
    • H05K9/00
    • PURPOSE:To provide an electromagnetic shield box that is effective from low to high frequencies by using a ferromagnetic material having one side furnished with a high-conductivity substance facing in the direction of incidence of electromagnetic waves. CONSTITUTION:An electromagnetic shield box uses ferromagnetic material such as magnetic steel or other existing material, and conductive material such as copper, aluminum and tin. An object to be shielded is completely enclosed by a ferromagnetic material provided with conductor of high conductivity. If copper is used for shielding from electric field components in electromagnetic waves, it is more effective to reflect electromagnetic waves by attaching copper to the front surface of incidence of a magnetic steel plate than to the rear surface. If a magnetic steel plate is used on the surface of incidence, the shielding effects are improved. For frequencies above 20kHz, the shielding effects are improved by facing the copper toward the direction of incidence of electromagnetic waves.
    • 78. 发明专利
    • Indirect energization type continuous electrolytic etching method for metallic strip
    • 用于金属条的间接能量式连续电解蚀刻方法
    • JP2006037175A
    • 2006-02-09
    • JP2004220033
    • 2004-07-28
    • Nippon Steel Corp新日本製鐵株式会社
    • KOGA SHIGENOBUMOGI TAKASHIFUJIKURA MASAHIRO
    • C25F7/00
    • PROBLEM TO BE SOLVED: To provide an efficient indirect energization type continuous electrolytic etching method for a metallic strip.
      SOLUTION: The electrolytic etching method includes using an apparatus having a plurality of electrodes sequentially arranged so as to face an etched face of the metallic strip, in order of A series, B series, A series, B series and so on, in a traveling direction of the metallic strip; alternately repeating the periods of (I) when cathodic voltage is applied to A series electrodes for a predetermined period of time and of (II) when anodic voltage is applied to A series electrodes for a predetermined period of time, in between the A series and B series electrodes; and interposing a period of time when the voltage is not applied between the A series and B series electrodes, for α msec (α≥0) when converting the polarity of voltage from (I) to (II) and/or for β msec (β≥0) when converting the polarity of voltage from (II) to (I). The etching method also includes covering the metallic strip with an alkali-soluble etching mask; dissolving the region of the metallic strip, which is not covered with an etching mask, by electrolytic etching, in conditions of a voltage-applied period of time M in (I) set to 0.1 to 10 msec, a voltage-applied period of time N in (II) set to 4M to 20M msec, an effective current density applied to the region while the voltage of (II) is applied to the electrodes, set to 250 to 1,500 A/dm
      2 ; and dissolving the etching mask with an alkaline solution to remove it.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为金属带提供有效的间接通电型连续电解蚀刻方法。 解决方案:电解蚀刻方法包括按照A系列,B系列,A系列,B系列等的顺序依次配置有与金属带的蚀刻面相对配置的多个电极的装置, 在金属带的行进方向上; 当对A系列电极施加阴极电压达预定时间时,交替地重复(I)的周期,以及(A)当在A系列和A系列电极之间施加阳极电压达预定时间时 B系列电极; 并且当将电压从(I)转换为(II)至/(II)和/或βmsec时,将A系列和B系列电极之间未施加电压的时间段设为αmsec(α≥0) 将(II)的电压的极性转换为(I)时,β≥0)。 蚀刻方法还包括用碱溶蚀刻掩模覆盖金属条; 在电压施加期间M in(I)设定为0.1〜10msec的条件下,通过电解蚀刻溶解未被蚀刻掩模覆盖的金属带的区域,施加电压的时间段 (II)中的N(N)设置为4M至20Mmsec,施加到该区域的有效电流密度,同时将电压(II)施加到电极,设定为250至1,500A / dm 2。 并用碱性溶液溶解蚀刻掩模以将其去除。 版权所有(C)2006,JPO&NCIPI
    • 79. 发明专利
    • Direct energizing type continuous electrolytic etching method and direct energizing type continuous electrolytic etching apparatus for metallic strip
    • 直接加电类型连续电解蚀刻方法和直接加热型金属电泳连续电解蚀刻装置
    • JP2005226135A
    • 2005-08-25
    • JP2004036931
    • 2004-02-13
    • Nippon Steel Corp新日本製鐵株式会社
    • KOGA SHIGENOBUMOGI TAKASHIFUJIKURA MASAHIRO
    • C25F3/06
    • PROBLEM TO BE SOLVED: To provide direct energizing type continuous electrolytic etching method and apparatus for a metallic strip which realize stable treatment even under the condition of an electrolytic solution in which turbidity is increased by long time treatment.
      SOLUTION: In the etching method, one or more sets of a B system electrode arranged opposite to the etching face of a metallic strip and of an A system conductor roll pairing with the electrode are arranged in succession, and successively to the final one thereof, a set of an A' conductor roll and a B' electrode are arranged. An electrolytic solution is filled into the space between the metallic strip and each electrode, and each conductor roll is brought into contact with the other surface. Between the A system conductor roll and the B system electrode, (I) voltage application in which the B system electrode functions as an anode and (II) voltage application in which the B system electrode functions as a cathode are alternately repeated. Also, the time in which voltage is not applied to the space between the A system and B system electrodes is inserted when the voltage application is shifted from (I) to (II) and when shifted from (II) to (I). Further, voltage application in which the B' electrode functions as the cathode is performed to the space between the A' conductor roll and the B' electrode.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供即使在长时间处理使浊度增加的电解液的条件下也能够实现稳定处理的金属带状的直通型连续电解蚀刻方法和装置。 解决方案:在蚀刻方法中,一组或多组布置成与金属条的蚀刻面相对的B系电极和与电极配对的A系统导体辊相继布置,并连续地进行到最终 其中一个,一组A'导体辊和B'电极被布置。 电解液填充到金属带和每个电极之间的空间中,并且每个导体辊与另一个表面接触。 在A系统导体辊和B系电极之间,(I)B系统电极用作阳极的电压施加和B系统电极用作阴极的电压施加交替重复。 此外,当电压施加从(I)转移到(II)并且从(II)向(I)移动到(I)时,插入不施加电压到A系统和B系统电极之间的空间的时间。 此外,将B'电极用作阴极的电压施加到A'导体辊和B'电极之间的空间。 版权所有(C)2005,JPO&NCIPI
    • 80. 发明专利
    • Indirect energizing type continuous electrolytic etching method and indirect energizing type continuous electrolytic etching apparatus for metallic strip
    • 间接能量式连续电解蚀刻方法和间接能量型连续电解蚀刻装置金属条
    • JP2005226133A
    • 2005-08-25
    • JP2004036929
    • 2004-02-13
    • Nippon Steel Corp新日本製鐵株式会社
    • KOGA SHIGENOBUMOGI TAKASHIFUJIKURA MASAHIRO
    • C25F7/00C25F3/06C25F3/14
    • PROBLEM TO BE SOLVED: To provide an indirect energizing type continuous electrolytic etching method and an indirect energizing type continuous electrolytic etching apparatus for a metallic strip which realize stable electrolytic etching including fluctuation in the progressing velocity of a metallic strip.
      SOLUTION: In the indirect energizing type continuous electrolytic etching method, a plurality of electrodes are successively arranged in the order of A system, B system, A system, B system... so as to be opposite to the etching face in which the etching pattern is formed in the metallic strip. Between the A system and B system electrodes, (1)voltage application in which the A system electrode functions as a cathode while a time M is 3 to 10 msec and (2) voltage application in which the A system electrode functions as the anode while a time N is 4 M to 20 Mmsec are alternately repeated. Also, the time at which voltage is not applied to the space between the A system and B system electrodes is inserted when the voltage application is shifted from (I) to (II). Further, the progressing velocity of the metallic strip is detected, thus the magnitude of the voltage application in (I) and (II) and the length of the voltage application time in (I) and (II) per unit area of the metallic strip are kept almost constant.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供间接激励型连续电解蚀刻方法和用于金属条的间接激励型连续电解蚀刻装置,其实现包括金属带的进行速度的波动的稳定的电解蚀刻。 解决方案:在间接通电型连续电解蚀刻方法中,多个电极按照A系,B系,A系,B系等顺序依次配置,与 在金属条中形成蚀刻图案。 在A系统和B系统电极之间,(1)A系统电极用作阴极的电压施加,而时间M为3〜10msec,(2)A系统电极用作阳极的电压施加 交替重复时间N为4M至20Mmsec。 此外,当电压施加从(I)转移到(II)时,插入不施加电压到A系统和B系统电极之间的空间的时间。 此外,检测金属带的进行速度,因此在(I)和(II)中的施加电压的大小以及金属带的每单位面积的(I)和(II)中的施加电压的时间长度 保持几乎恒定。 版权所有(C)2005,JPO&NCIPI