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71. 发明专利

JPS61193256A FACILITIES GROUP CONTROL SYSTEM 失效
公开(公告)号：JPS61193256A
公开(公告)日：1986-08-27
申请号：JP3263685
申请日：1985-02-22
申请人： HITACHI LTD
发明人： TASHIRO TSUTOMU , TOSHIMA ISAO , KOMODA NORIHISA , KAIRA KAZUO , MATSUMOTO KUNIAKI
IPC分类号： G05B19/418 , G06Q50/00 , G06Q50/04
摘要： PURPOSE:To attain higher degree of control in case of processing the IF part and THEN part of the rule by enabling automatic starting of the procedure designated by the user, as necessary, and incorporating into the rule processing the user's indepen dent condition judgment processing, the input processing, or the like. CONSTITUTION:Heretofore, judgment of conditions of the IF part housed in the rule table 23 has been carried out only between the work table 21, whereas, in order to enable condition judgment between the internal information such as the reserve table 24, in case of processing the IF part of the rule, against the condition of the IF part, the user's designated condition judgment means 25 is started. The user's condition judgment procedure searches for the item satisfying the condition and passes on the information to the processor of the rule. Further, in processing the THEN part of the rule, against the conclusion of the THEN part, the user's designated conclusion execution procedure is started. In the user's conclusion execution procedure, dispatch of control command to the circuit, etc., processing of setting or the like, of tracking table etc., within the controller are performed, as necessary. In this way, it becomes possible to handle information other than condition input signal lines, command signal lines.

72. 发明专利

JPS61174641A METHOD OF OXIDATION AND DIFFUSION 失效
公开(公告)号：JPS61174641A
公开(公告)日：1986-08-06
申请号：JP1422585
申请日：1985-01-30
申请人： HITACHI LTD
发明人： MATSUBA IKUO , MOKUYA KINJI , MATSUMOTO KUNIAKI , YOSHINAKA AKIRA
IPC分类号： H01L21/31 , H01L21/22 , H01L21/316
摘要： PURPOSE:To enable to prevent the film thickness of an oxide film from being formed by oxygen in the air and to enable to form the uniform film thickness on all wafers by a method wherein the numerous wafers are mounted on one wafer capsule, the capsule is inserted in an oxidation and diffusion furnace, and at a point when the temperature of the wafers reaches a normal state, the prescribed gas is injected in the furnace only during the duration of the necessary time and the furnace is heated. CONSTITUTION:A furnace 1 is surrounded with heaters 2 and is heated, and gas 10 is injected in the furnace 1 from the injection hojle on the left side. Numerous wafers 3, which are to be subjected to a heat treatment, are mounted in a wafer capsule 4 and the insertion of the capsule 4 into the furnace 1 and the draw-out of the capsule 4 from the furnace 1 are performed by a wafer capsule insertion/draw-out rod (unit) 8. At the time of insertion and draw-out, the right side of the capsule 4 is bent by an air intrusion preventing cap 6 so that the air in the exterior of the furnace 1 does not intrude in the capsule 4. When the capsule is put in the furnace 1 and a heat treatment is being performed, the air intrusion preventing cap 6 is opened by a switching rod 7 for the air intrusion preventing cap 6 for making the injected gas 10 flow smoothly. The wafer capsule insertion/draw-out rod 8 and the switching rod 7 for the air intrusion preventing cap 6 are connected to an insertion draw- out unit 9 and are actuated.

73. 发明专利

JPS6132683B2 失效
公开(公告)号：JPS6132683B2
公开(公告)日：1986-07-29
申请号：JP9586775
申请日：1975-08-08
申请人： HITACHI LTD
发明人： MATSUMOTO KUNIAKI , SHIMAUCHI SHIGEYUKI , KASHIWAGI MASAHIKO
IPC分类号： F04B49/06 , F04B49/00 , G05B11/01 , G05B11/18 , G05B13/02 , G05D7/00

74. 发明专利

JPS61151707A SEQUENCE CONTROL SYSTEM 失效
公开(公告)号：JPS61151707A
公开(公告)日：1986-07-10
申请号：JP27291484
申请日：1984-12-26
申请人： HITACHI LTD
发明人： ONO YASUO , MURATA TOMOHIRO , KOMODA NORIHISA , MATSUMOTO KUNIAKI
IPC分类号： G05B19/02 , G05B19/042
摘要： PURPOSE:To apply the titled system even to a controlled system requiring high speed response by providing separately a processor executing operation start discrimination and a processor executing discrimination of an end signal and revision of management information and processing them in parallel. CONSTITUTION:The operation management processor 510 and the operation start processor 520 are provided separately, a common memory 550 is provided on a common bus 530 tying the two processors to transmit/receive information between the processors via the memory 550. The memory 550 is provided with an area storing the operating No. in response to the unit operation during operation and the information of the operation No. finished for the operation and the operation start discriminating section sets the information of the unit operation requiring discrimination and the operation management information section reads it, the storage is deleted from the memory 550. Conversely, the information of operation end detected by the operation management information section is set to the memory 550 and when the operation start discrimination section reads it, the information is deleted from the memory 550. Since a bus arbiter 540 is provided, the operation above does not cause any competition of the bus 530.

75. 发明专利

JPS61133405A Processing system of rule 失效
标题翻译：规则处理系统
公开(公告)号：JPS61133405A
公开(公告)日：1986-06-20
申请号：JP25543684
申请日：1984-12-03
申请人： Hitachi Ltd
发明人： ONO YASUO , KOMODA NORIHISA , TASHIRO TSUTOMU , MATSUMOTO KUNIAKI
IPC分类号： B23Q41/00 , G05B13/00 , G05B13/02 , G06F9/44 , G06N5/04 , G06Q50/00 , G06Q50/04
CPC分类号： Y02P90/30
摘要： PURPOSE: To decrease the memory capacity of a work table and to reduce the processing time by providing a state storage processing means erasing unnecessary status and conclusion in a status storage means so as to give a command of erasure to a conclusion section of a rule storage means.
CONSTITUTION: An internal code information storage processing section 12 deletes an unnecessary intermediate conclusion caused when deletion is designated to a THEN section of an IF-THEN type rule and the final conclusion is decided. An internal code information storage processing control section 141 decides to start either a deletion designation processing section 143 or a final conclusion deciding time processing section 141 according to request fed from a control section 13. The deletion designation processing section 143 is a section to delete a numerical code of a character string subjected to deletion designation, and the final conclusion deciding processing section 144 processes to delete the intermediate conclusion from an internal code information storage section 11f based on a table generated by the internal code information storage processing control section 141 when all control commands of a corresponding rule group are decided.
COPYRIGHT: (C)1986,JPO&Japio
摘要翻译：目的：通过提供状态存储处理手段来减少工作表的存储器容量并减少处理时间，在状态存储装置中消除不必要的状态和结论，以便向规则存储器的结论部分给出擦除命令手段。构成：内部代码信息存储处理部分12删除当将指定为IF-THEN类型规则的THEN部分的删除所导致的不必要的中间结论，并且确定最终结论。内部代码信息存储处理控制部分141根据从控制部分13提供的请求，决定启动删除指定处理部分143或最终结论确定时间处理部分141.删除指定处理部分143是删除经过删除指定的字符串的数字代码，最终结论判定处理部分144根据内部代码信息存储处理控制部分141生成的表格，处理从内部代码信息存储部分11f中删除中间结论确定相应规则组的控制命令。

76. 发明专利

JPS59229604A OPERATING METHOD OF DYNAMIC SYSTEM 失效
公开(公告)号：JPS59229604A
公开(公告)日：1984-12-24
申请号：JP10348683
申请日：1983-06-09
申请人： HITACHI LTD
发明人： NISHITANI TAKUJI , MATSUMOTO KUNIAKI , FUNAHASHI SEIJIYU , IBA DAIZOU
IPC分类号： G05B13/00 , G05B13/02
摘要： PURPOSE:To reduce storing capacity and the time required for calculation by formulating a dynamic system as a linear multi-step determination problem, finding out a ralative cost factor and repeating the same procedure as simplex method. CONSTITUTION:A dynamic system such as an energy control system in the iron industry is formulated so that status vectors minimizing an objective function J shown in the formula II under the linear simultaneous differential equation shown in the formula I and initial and restricted conditions. The formulated equations are decomposed in each step and variables included in each step is divided into basic variables and non-basic variables. Then, the relative cost factor is found out by using a basic reverse matrix in each step and an optimum answer satisfying optimum conditions is found out by repeating the same procedure as the symplex method. Thus, the dynamic system is operated by using the optimum answer so that the balance of the dynamic system is optimized.

77. 发明专利

JPS59167010A Control of semiconductor process 失效
标题翻译：半导体工艺控制
公开(公告)号：JPS59167010A
公开(公告)日：1984-09-20
申请号：JP3926883
申请日：1983-03-11
申请人： Hitachi Ltd
发明人： MATSUBA IKUO , MATSUMOTO KUNIAKI
IPC分类号： H01L21/265 , H01L21/027 , H01L21/18 , H01L21/31
CPC分类号： H01L21/18
摘要： PURPOSE:To reduce the scattering of the coating film thickness by a method wherein physical properties of a photoresist and the circumstances in a rotary coating equipment are reflected in a rotary coating film thickness model to determine the revolution of a spinner. CONSTITUTION:Film thickness test data 41 are given to a spinner revolution calculator 3 by a coating film thickness test equipment 4 after the rotary coating process. Signals 11 which show gas pressure, gas density, the biscosity of a photoresist and the like in a spinner rotating equipment are given to the spinner revolution calculator 3 by a rotary coating equipment 1 as the signals 12 through a controller 2. The target coating film thickness 5 determined by the design or the like is also given. After the film thickness is given like this way, the film thickness 5 is reflected in the rotary coating film thickness determined by the test value of the coating film thickness processed in the past to determine the revolution 21 of the spinner. The revolution 21 is given to the controller 2 and the equipment 1 is controlled by the controller 2 in accordance with the revolution signal 22 through the controller.
摘要翻译：目的：通过光刻胶的物理性质和旋转涂层设备中的环境反射在旋转涂膜厚度模型中以确定旋转器的旋转的方法来减少涂膜厚度的散射。构成：在旋转涂布处理之后，通过涂膜厚度测试设备4将膜厚度测试数据41提供给旋转器转速计算器3。在旋转旋转设备中显示气体压力，气体密度，光致抗蚀剂等的光泽度的信号11通过旋转涂布设备1作为信号12通过控制器2被提供给旋转器转速计算器3.目标涂膜还给出了由设计等确定的厚度5。在以这种方式给出膜厚度之后，膜厚度5反映在由过去处理的涂膜厚度的测试值确定的旋转涂膜厚度中，以确定旋转器的旋转21。旋转21给予控制器2，并且设备1由控制器2根据转速信号22通过控制器控制。

78. 发明专利

JPS59157705A Control system of irrigation water management 失效
标题翻译：灌溉水管理控制系统
公开(公告)号：JPS59157705A
公开(公告)日：1984-09-07
申请号：JP2935683
申请日：1983-02-25
申请人： Hitachi Ltd
发明人： WAKAMORI FUMIO , FUNABASHI SEIJIYU , MATSUMOTO KUNIAKI
IPC分类号： G05B11/00 , E02B13/00
CPC分类号： E02B13/00
摘要： PURPOSE:To grasp the quantity of water stored in a reservoir group by analyzing ground picture data based on pondage data at every moment of the reservoir group which is sent from a satellite or the like and calculating the area of the water surface of each reservoir. CONSTITUTION:In an irrigation water control station 10, surface observation information of an irrigated region transmitted by a satellite 1 for terrestrial observation is received by a receiver 2. Received data is processed into topographical picture data by a picture processing device 3. Topographical picture data is processed in an electronic computer 4 to calculate the pondage of each reservoir group. Meanwhile, information transmitted from various equipments 7-9 in an irrigated region 20 through a telemeter or the like are transmitted to the electronic calculator 4 similarly. The electronic computer 4 determines an operating plan of the whole of a irrigation water control system on a basis of pondages of reservoir groups, pondages sent from various equipments 7-9, and flow rate data and transmits operation control commands to various equipments 7-9 in the irrigated region 20.
摘要翻译：目的：通过基于从卫星等发送的水库组的每一刻的沉淀数据分析地面图数据，计算储层中储存的水量，并计算每个水库的水面面积。构成：在灌溉水控制站10中，由接收机2接收由卫星1发送的用于地面观测的灌溉区域的表面观测信息。接收到的数据由图像处理装置3处理成地形图像数据。地形图像数据在电子计算机4中进行处理，以计算每个储层组的沉淀。同时，类似地，向电子计算器4发送从灌溉区域20中的各种设备7-9通过遥测等传送的信息。电子计算机4基于水库组的池塘，从各种设备7-9发送的池塘和流量数据，确定整个灌溉水控制系统的运行计划，并将操作控制命令发送到各种设备7-9 在灌溉区20。

79. 发明专利

JPS5930915B2 JPS5930915B2 - 失效
公开(公告)号：JPS5930915B2
公开(公告)日：1984-07-30
申请号：JP937474
申请日：1974-01-23
申请人： Hitachi Ltd
发明人： MATSUMOTO KUNIAKI , SHIMAUCHI SHIGEYUKI
IPC分类号： F04B49/06

80. 发明专利

JPS58206161A Process control system 失效
标题翻译：过程控制系统
公开(公告)号：JPS58206161A
公开(公告)日：1983-12-01
申请号：JP8795182
申请日：1982-05-26
申请人： Hitachi Ltd
发明人： TAKEUCHI YOUICHI , OONARI MIKIHIKO , MATSUMOTO KUNIAKI , MATSUBA IKUO , TAKEUCHI MASARU , FUNABASHI SEIJIYU
IPC分类号： H01L21/66 , H01L29/78
CPC分类号： H01L29/78
摘要： PURPOSE:To reduce the quantity of variation of the electric characteristic to be generated at the manufacturing process of a semiconductor element by a method wherein the channel doping quantity under a gate is adjusted conforming to impurity density of a substrate and the deviation value of the shape of the gate from the aiming value. CONSTITUTION:At the manufacturing process of the semiconductor element having gate structure of an MOSFET, etc., the sheet resistance value is measured at first to be inputted to a CPU, and the impurity density of p type Si substrate 101 is calculated. Then after an oxide film to isolate between the FET's is formed, channel width (w) is measured. Then an oxide film is formed on the whole surface of the substrate, and film thickness (d) of the gate oxide film 102 is measured. Then channel doping is performed according to ion implantation to form a p type surface inversion layer in the whole region of the surface of the substrate. At this time, the channel doping quantity is calculated according to operation from impurity density of the substrate and the measured values (w), (d). After then, diffusion layers 103, 104 and electrodes 106, 107, 108 are formed.
摘要翻译：目的：为了减少在半导体元件的制造过程中产生的电特性的变化量，其中栅极下的沟道掺杂量被调整为符合衬底的杂质浓度和形状的偏差值的门从目标价值。构成：在具有MOSFET等的栅极结构的半导体元件的制造工序中，首先测量薄层电阻值以输入CPU，并计算p型Si衬底101的杂质浓度。然后在形成FET之后隔离氧化膜，测量通道宽度（w）。然后在基板的整个表面上形成氧化物膜，并且测量栅极氧化膜102的膜厚度（d）。然后根据离子注入进行沟道掺杂，以在衬底表面的整个区域中形成p型表面反转层。此时，根据基板的杂质浓度和测定值（w），（d）的运算计算沟道掺杂量。之后，形成扩散层103,104和电极106,107,108。

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