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    • 72. 发明专利
    • Expansion turbine
    • 膨胀涡轮机
    • JPS6116203A
    • 1986-01-24
    • JP13711484
    • 1984-07-04
    • Hitachi Ltd
    • NAKAMOTO HIDEKAZUHARADA SUSUMUMATSUDA NORIMOTOSAHO NORIHIDEIHARA KAZUO
    • F01D3/00
    • F01D3/00
    • PURPOSE:To reduce thrust force generated at the time of starting so as to increase the turbine speed up to the rated number of revolution in a short time by communicating together a turbine blade side and a brake fan side provided respectively on both ends of a main shaft through a bypass circuit and providing a control means for opening and closing the circuit. CONSTITUTION:High pressure gas from a compressor is supplied to an introducing unit 35 through a piping 34 and flowed to a turbine blade 32 of one end of a main shaft 24. While, a portion of the gas in the introducing unit 35 is flowed from an inlet 60b to a bypass circuit 55 and from an outlet 60a to a working gas introducing passage 38 for a brake fan 31 on the other end of the main shaft 24. This time, a breaking valve 53 limits gas flow amount so that the difference between the outlet pressure of a turbine blade 32 and the pressure of the brake fan introducing passage 38 becomes less than the predetermined differential pressure. And when the main shaft 24 starts to rotate, a portion of the high pressure gas of the inlet of the nozzle 33 is flowed by the bypass circuit 55, then said pressure difference becomes a constant pressure corresponding to the pressure of the inlet of the nozzle 33 and rapid and upward thrust force will not be generated.
    • 目的:为了减少启动时产生的推力,通过将分别设置在主体的两端的涡轮机叶片侧和制动风扇侧连通在一起,在短时间内将涡轮机转速提高到额定转数 轴通过旁路电路并提供用于打开和关闭电路的控制装置。 构成:来自压缩机的高压气体通过管道34供给到引入单元35,并流到主轴24的一端的涡轮机叶片32.而且,导入单元35中的一部分气体从 旁路回路55的入口60b和从出口60a到主轴24另一端的制动风扇31的工作气体导入通道38.此时,断路阀53限制气体流量, 在涡轮机叶片32的出口压力和制动风扇引入通道38的压力之间变得小于预定压差。 并且当主轴24开始旋转时,喷嘴33的入口的高压气体的一部分由旁通回路55流动,则所述压力差成为与喷嘴的入口的压力相对应的恒定压力 不会产生快速向上的推力。
    • 74. 发明专利
    • CRYOPUMP EQUIPPED WITH REFRIGERATOR
    • JPS60187781A
    • 1985-09-25
    • JP4204684
    • 1984-03-07
    • HITACHI LTD
    • MATSUDA NORIMOTOHARADA SUSUMUNAKAMOTO HIDEKAZUHOSOMI NOBUYUKI
    • F04B37/08
    • PURPOSE:To permit to produce extra high vacuum by a method wherein H2O, CO2 and the like are condensed and adsorbed by first panel, N2, O2 and Ar are condensed and adsorbed by second panel and H2, He and the like, having low condensing temperatures, are adsorbed by an adsorbent mounted on third panel. CONSTITUTION:The first panel 29 is mounted in the level of 70K, the second panel 30 is mounted in the level of 15K and the third panel 31 is mounted in the level of 4.5K in accordance with the levels of generating temperatures of small type helium refrigerators (not shown in the diagram) while the third panel 31 is mounted with the adsorbent 35. Gasses (H2O, CO2 or the like), having comparatively high condensing temperature, is condensed and adsorbed in the first panel 29 and a baffle 36 connected thereto and gasses (N2, O2, Ar and the like), passed through the baffle 36 and having low condensing temperature, are condensed and adsorbed by the second panel 30. Further, the gasses (H2, He or the like) having further lower condensing temperatures, are adsorbed by the adsorbent 35 bonded on the surface of the third panel 31. According to this method, the thermal load of the third panel 31 is reduced, the temperature of the adsorbent 35 is kept in low and the extra high vacuum may be produced.
    • 76. 发明专利
    • LAMINATION TYPE HEAT EXCHANGER
    • JPS6062595A
    • 1985-04-10
    • JP15528384
    • 1984-07-27
    • HITACHI LTD
    • MATSUDA NORIMOTOSAHO NORIHIDEHARADA SUSUMUOKUNO SUMIOTERASAKI MASAO
    • F28D9/00F28F3/08
    • PURPOSE:To restrict the reduction in the heat transfer performance to improve the heat exchanging performance by forming spacers for flow path separation with protrusions and depressions so that the transfer of heat from a high-temperature fluid to a low-temperature fluid may be increased not only in the radial direction but also in the circumferential direction. CONSTITUTION:Inside a spacer 10 for separation from the outside, a spacer 11 having protrusions and depressions for flow path separation is disposed, which together with the spacer 10 is alternatingly laminated with a heat transfer plate 12. A high-temperature fluid path 13' is disposed inside a low-temperature fluid path 14', and the high-temperature fluid flowing in the high-temperature fluid path 13' and the low-temperature fluid flowing in the low-temperature fluid path are flowing in the mutually opposing directions. The conduction of heat from the high-temperature fluid to the low-temperature fluid occurs in three ways, namely the radial direction, arrow mark 20, and the left and rightward circumferential directions, arrow marks 21, 22. Upon the heat exchange, the high-temperature fluid is cooled and the low-temperature fluid is heated. As the heat transfer flow from the high-temperature fluid to the low-temperature fluid is increased to the three ways in this manner, the reduction in the heat transfer performance is restricted, and the heat exchanging performance can be improved.
    • 77. 发明专利
    • SHROUD COOLING APPARATUS OF VACUUM APPARATUS
    • JPS6028224A
    • 1985-02-13
    • JP13580383
    • 1983-07-27
    • HITACHI LTD
    • MATSUDA NORIMOTO
    • C23C14/24C23C14/22C30B23/08H01L21/203H01L21/31
    • PURPOSE:To obtain a cooler which does not need the supply of liquid N2 by a method wherein a shroud in a semiconductor thin film forming apparatus is so designed as to be cooled by a small He freezer and the freezer is brought in thermally contact with a part of the shroud in such a manner that it can be attached and removed freely. CONSTITUTION:A shroud 5a filled with liqudized gas is contained in a vacuum chamber 1 with a vacuum space 26 between the chamber 1 and itself. A cylindrical supporting part 16 is protruded from the outside wall of the chamber 1 and a small He freezer 11 is attached to the flange 17 of the supporting part 16 through an O-ring 22 in such a manner that the freezer 11 can be attached and removed freely. A supplying part 13 and a discharging part 14 of He gas are provided to the side surface of the freezer 11 and a sheath cylinder 12 is protruded from the bottom of the freezer 11 toward the shroud 5a and a cylinder 21 which contains a normal temperature gas passage 23 and a low temperature gas passage 24 is housed in the sheath cylinder 12 to store a regenerative material 21. A cold station 15 composed of a cold head 18 is provided to the lower surface of the cylinder 21 while a gas expansion space 25 is formed and the bottom of the cold station 15 is made in contact with the shroud 5a.
    • 78. 发明专利
    • Vacuum exhaust apparatus
    • 真空排气装置
    • JPS59211778A
    • 1984-11-30
    • JP8572083
    • 1983-05-18
    • Hitachi Ltd
    • MATSUDA NORIMOTO
    • F04B37/08H01L21/203
    • F04B37/08
    • PURPOSE:To reduce running cost by using a shroud cooled by a helium refrigerator and using the helium refrigerator also for a super high vacuum pump in a film growing chamber, a sample preparating and analyzing chamber. CONSTITUTION:Operations similar to prior arts are carried out until vacuum in a film growing chamber reaches 10 Torr, and thereafter a helium compressor 27 and helium refrigerators 23, 28, 29 are run to operate criopumps 21, 22 for super high vacuum pump. Also shrouds 24a, 24b also operated for vacuum pumps. Further, criopumps 28, 29 are used for super high vacuum pumps in the film growing chamber 7 and material preparation and analysis chamber 6 and gas can be supplied to helium refrigerators 21, 22 and 23 by one unit of helium compressor 27 so that a simple and economical constitution is provided.
    • 目的:通过使用由氦制冷机冷却的导流罩并使用氦制冷机,为了降低运行成本,也可用于薄膜生长室中的超高真空泵,样品制备和分析室。 构成:进行与现有技术相似的操作,直到成膜室中的真空达到10 -4乇,然后运行氦压缩机27和氦制冷器23,28,29以操作criopumps 21,22以达到超高 真空泵。 罩24a,24b也用于真空泵。 而且,在成膜室7和材料制备分析室6中使用超高压真空泵,将燃料28,29用于氦制冷机21,22和23由氦压缩机27的一个单元供给, 并提供经济的结构。