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    • 75. 发明专利
    • METHOD FOR SUPPORTING FAILURE RESTORATION FOR COMPUTER SYSTEM
    • JPH1078894A
    • 1998-03-24
    • JP25248796
    • 1996-09-03
    • HITACHI LTD
    • KUNINISHI MOTOHIDEKATO HIROSHIITO TSUTOMUHIROZAWA TOSHIO
    • G06F11/30G06F11/00G06F11/14G06F11/22G06F11/34
    • PROBLEM TO BE SOLVED: To support the restoration of failure by shortening a restoring time and finding a job being the cause of the failure at the time of the generation of the failure in a computer system. SOLUTION: At the time of starting or ending the execution of a job in job execution control 102, or at the time of an input and output information capture processing 103 provided in the close processing of a file input and output processing, an event generation processing 107 is called, a job start event, job end event, and close event are generated, and an execution history 163 constituted of an end code, starting time, ending time, executing time, and input and output history or the like is prepared for each job based on those events by a monitor processing 151. Then, at the time of the generation of failure, a failure supporting processing 152 is activated, the execution history 163 is compared with a standard history 164 based on normal execution, the abnormality of the number of times of input and output, executing time, and end code is checked, an abnormality flag is stored in the execution history, and a job in which the abnormality is generated is defined as a job being the cause of the failure. Then, after the restoration and re-assignment of a file, a re-executing instruction is issued.
    • 76. 发明专利
    • DOCUMENT PROCESSOR
    • JPH1049339A
    • 1998-02-20
    • JP20446596
    • 1996-08-02
    • HITACHI LTD
    • TOZAKI TETSUROTERAKADO KENJITANIGUCHI SHIGEKITAKAGISHI KAZUFUMIKATO HIROSHI
    • G06F3/14G06F3/048H04M11/00
    • PROBLEM TO BE SOLVED: To change en bloc a condition of every communication in three operations and also to know a set content of a present communication condition in a single procedure by placing an icon on an off-screen to start a setting function of a communication condition against the communication abnormality, etc. SOLUTION: When a communication condition icon placed on an off-screen is selected through every communication screen, an off-screen function control part 12 starts a communication condition setting function. At the same time, a communication condition display control part 13 sets the information stored in the communication condition data 32 to the communication condition screen data 33 and shows a communication condition setting screen. When a communication condition item is changed on the communication condition setting screen, the data 33 are accordingly changed. Then an execution icon or a cancel icon is selected on a communication condition screen. When the execution icon is selected, a communication condition change control part 14 sets the information on the data 33 to the data 32 and closes the communication condition setting screen to reset the original communication screen.
    • 79. 发明专利
    • LITHOGRAPHY USING FOCUSSED BEAM
    • JPH0729790A
    • 1995-01-31
    • JP16764693
    • 1993-07-07
    • HITACHI LTD
    • KATO HIROSHISUZUKI TOSHIOTSUKIZOE AKIRA
    • H01L21/027
    • PURPOSE:To easily and accurately judge the region on which inpattern proximity effect is generated in a focussed beam lithography and a proximity effect correction treatment is conducted on the above-mentioned region in a simple manner. CONSTITUTION:A lithography pattern is divided into straight lines L12, L13... which are extending in the scanning direction (x-direction) of electron beam, and rectangular regions 10A, 10B,... using straight lines L21, L22... which orthogonally intersecting with the above-mentioned straight lines. Also, the line segment X, which comes in contact with the profile L0 of the pattern and extending in the x-direction, is worked out and the line segment Y, which comes in contact with the profile L0 and orthogonally intersecting with the scanning direction, is worked out. The shortest line segments Xa, Xb, Xc..., passing regions 10A, 10B..., are worked out for each region, and the shortest line segments Ya, Yb, Yc... of the line segment Y pssing the same regions, are worked out. In each region, the shorter one of the line segment X and Y is set on the parameter W which shows the width of region. This value W is compared with the base values W1 and W2, and the intensity I1 to I3 of the beam with which the region is irradiated are determined. They are conducted by one graphic operation treatment.
    • 80. 发明专利
    • PATTERN DATA PROCESSING
    • JPH06216012A
    • 1994-08-05
    • JP2177893
    • 1993-01-14
    • HITACHI LTD
    • KATO HIROSHI
    • H01L21/027
    • PURPOSE:To accurately conduct a pattern arithmetic operation for every hierarchy by a method wherein a pattern arithmetic operation is conducted on the pattern data which is recomposed by developing a part of the pattern data to be determined based on the pattern arithmetic operation influencing distance and the unnecessary part, which is determined based on the above-mentioned pattern arithmetic operation influencing distance, is removed. CONSTITUTION:A reference frame 13 is provided on the inside part in the distance (d) from the inner frame 12, and a reference frame 14 is provided on the inside part in the distance D from the inner frame 12. Among the patterns on a block B, the pattern outside of the reference frame 14 is developed on a block A and a block A1 is formed. The prescribed pattern arithmetic operation is conducted on the block A1 and the block B independently. In the pattern data A2, as the pattern inside of the reference frame 13 belongs to the block B intrinsically, it is eliminated and a treatment result data A2 is obtained. Also, as the pattern outside of the reference frame 13 is reflected on the treatment result data A2, it is eliminated. As a result, the treatment can be obtained.