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61. 发明专利

JPS61270371A VACUUM DEPOSITION DEVICE 失效
公开(公告)号：JPS61270371A
公开(公告)日：1986-11-29
申请号：JP11019985
申请日：1985-05-24
申请人： MITSUBISHI HEAVY IND LTD , NISSHIN STEEL CO LTD
发明人： SHIMOZATO YOSHIO , YANAGI KENICHI , KATO MITSUO , FURUKAWA HEIZABURO , TSUKIJI NORIO , AIKO TAKUYA , ITO TAKEHIKO
IPC分类号： C23C14/56
摘要： PURPOSE:To make uniform the film thickness distribution in the transverse direction by providing a control plate which can change optionally the vapor deposition area by moving along the progressing direction of an object for vapor deposition to a channel outlet connecting an evaporation vessel and the object for vapor deposition. CONSTITUTION:The vapor 10 emitted from the surface of the molten metal in the evaporation chamber 3 in a vapor deposition chamber 2 flows out through a shutter 7 to a channel 6 and deposits on a thin metallic sheet 5 which is the object for vapor deposition and is wound on a roll 9 in the outlet part of the channel. The control plate P for the vapor deposition rate which can change optionally the vapor deposition rate to the sheet 5 by changing the outlet area of the channel 6 is provided between the outlet of the channel 6 and the sheet 5. The plate P can be advanced into and retreated from the channel 6 by the engagement of a pinion S and a rack R when a shaft 11 is rotated. The pressure in the channel is maintained under the pressure adequate for the pressure in the vacuum vessel if the position of the plate P is selected. The film thickness is thus uniformly distributed in the transverse direction of the thin sheet.

62. 发明专利

JP2002202392A NUCLEAR TRANSFORMATION DEVICE AND METHOD 审中-公开
公开(公告)号：JP2002202392A
公开(公告)日：2002-07-19
申请号：JP2001201875
申请日：2001-07-03
申请人： MITSUBISHI HEAVY IND LTD
发明人： ITO TAKEHIKO , IWAMURA YASUHIRO , SAKANO MITSURU , SAKAI TOMOTSUGU
IPC分类号： G21B3/00 , C23C30/00 , C25B1/00 , G21F9/00 , G21G1/04 , G21B1/00
摘要： PROBLEM TO BE SOLVED: To transform nuclear species with a relatively small device. SOLUTION: The device 10 causing nuclear transformation is constituted by providing a nearly plate shape structure 11 made of palladium (Pd) or alloy of Pd, or other metals (Ti and the like for example) occluding hydrogen and a material 14 adhered to one surface 11A of the structure 11 sides which causes nuclear transformation. If one surface 11A side of the structure 11 is made a region 12 with higher deuterium pressure by pressurization or electrolysis and the like and the other surface 11B side is made a region 13 with lower deuterium pressure by vacuum exhaust and the like, a flow 15 of deuterium is produced in the structure 11 and nuclear transformation is caused by the reaction of deuterium and the material 14 causing nuclear transformation.

63. 发明专利

JPH1138169A MATERIAL OF ELECTRODE FOR NUCLEAR REACTION EQUIPMENT 失效
公开(公告)号：JPH1138169A
公开(公告)日：1999-02-12
申请号：JP19026897
申请日：1997-07-15
申请人： MITSUBISHI HEAVY IND LTD
发明人： ITO TAKEHIKO , IWAMURA YASUHIRO , GOTO NOBURO
IPC分类号： G21B3/00 , G21B1/00
摘要： PROBLEM TO BE SOLVED: To improve the reproducibility of a nuclear reaction in a solid for which the electrolysis of heavy water is utilized. SOLUTION: The material of an electrode for nuclear reaction equipment is so constituted as to have a base 1 of palladium Pd, a thin film 3 of the mixture of calcium oxide CaO - palladium Pd formed on the surface of the base 1 and a layer 5 of the palladium Pd formed on the surface of the thin film 3 of the mixture of the calcium oxide CaO - palladium Pd and having a thickness less than 1 μm. On the occasion of the use, the material is so disposed that the layer 5 of the palladium Pd comes into contact with an electrolytic solution.

64. 发明专利

JPH09313919A VACUUM APPARATUS, EXHAUST METHOD USING THE SAME AND APPARATUS UTILIZING VACUUM APPARATUS 失效
公开(公告)号：JPH09313919A
公开(公告)日：1997-12-09
申请号：JP12949796
申请日：1996-05-24
申请人： MITSUBISHI HEAVY IND LTD
发明人： GOTO NOBURO , TOYODA ICHIRO , TONEGAWA YUTAKA , ITO TAKEHIKO , IWAMURA YASUHIRO
IPC分类号： B01J3/00 , B01J23/02 , B01J23/04 , B01J23/08 , B01J23/20 , B01J35/02 , C23C14/00 , C23C16/00 , G01V7/00 , G21K1/00 , H01L21/203 , H01L21/31
摘要： PROBLEM TO BE SOLVED: To simply form high vacuum environment within a vacuum container within a short time. SOLUTION: In a vacuum apparatus equipped with a vacuum container holding an interior to vacuum environment, a coating film 4 composed of a photocatalyst material such as TiO2 optically dissociating a water molecule into hydrogen and oxygen molecules is applied to the inner surface of the vacuum container and a mercury lamp 5 capable of emitting light having a wavelength allowing the coating film 4 to optically dissociate a water molecule is provided in the vacuum container.

65. 发明专利

JPH08166477A IN-SOLID NUCLEAR REACTION DEVICE 失效
公开(公告)号：JPH08166477A
公开(公告)日：1996-06-25
申请号：JP31204594
申请日：1994-12-15
申请人： MITSUBISHI HEAVY IND LTD
发明人： ITO TAKEHIKO , IWAMURA YASUHIRO , GOTO NOBURO
IPC分类号： G21B3/00 , G21B1/00
摘要： PURPOSE: To clarify the reaction mechanism of nuclear reaction in cathode electrode. CONSTITUTION: One side of cathode electrode (palladium) 20 contacts electrolyte solution 8 in an electrolysis cell 7 and the other side of the cathode electrode 20 contacts vacuum atmosphere in a vacuum vessel 21, and the electrolysis cell 7 on the electrolysis solution side, the vacuum vessel 21 on the other side and the cathode electrode 20 are closed airtightly to each other. Inside of the vacuum vessel 21 is kept in vacuum of 10 Torr or less and a lead cable is fixed to the cathode electrode 20. With this cathode electrode 20 and the counter anode electrode (platinum) 9, electrolysis of the solution 8 is performed. At this moment, in the vacuum vessel 21, a nuclear product detector, for example a charged particle detector 17 and an X-ray detector 18 is placed and thus, charged particle non-penetrating in the electrolysis solution 8 and X-ray are detected with this nuclear product detector. To the electrolysis solution side surface and the vacuum side surface of the cathode electrode 20, terminals 11, 14 of a 4-terminal surface resistance meter are placed. The surface resistance of this cathode electrode is measured and the filling factor of heavy hydrogen (D) or light hydrogen (H) in the cathode electrode 20 is evaluated.

66. 发明专利

JPH0558063B2 失效
公开(公告)号：JPH0558063B2
公开(公告)日：1993-08-25
申请号：JP11019985
申请日：1985-05-24
申请人： MITSUBISHI HEAVY IND LTD , NISSHIN STEEL CO LTD
发明人： SHIMOZATO YOSHIO , YANAGI KENICHI , KATO MITSUO , FURUKAWA HEIZABURO , TSUKIJI NORIO , AIKO TAKUYA , ITO TAKEHIKO
IPC分类号： C23C14/56

67. 发明专利

JPH0517874A FORMATION OF SUPERFINE PARTICLE DISPERSED FILM UNDER GRAIN SIZE CONTROL 失效
公开(公告)号：JPH0517874A
公开(公告)日：1993-01-26
申请号：JP16985391
申请日：1991-07-10
申请人： MITSUBISHI HEAVY IND LTD
发明人： ITO TAKEHIKO
IPC分类号： C23C14/54
摘要： PURPOSE:To provide the film forming method which can control the grain sizes of superfine particles to form a dispersed film. CONSTITUTION:The method for forming the superfine particle dispersed film with good reproducibility which can control the grain sizes of the superfine particles is obtd. by previously obtaining the relation between the grain sizes of the superfine particles and the display film thickness of a film thickness gage and depositing the thin film raw materials evaporated from an evaporating source 3 by evaporation on the surface of a substrate 2 until the film thickness gage indicates a prescribed display film thickness, thereby forming the dispersed film consisting of the superfine particles of the prescribed grain sizes.

68. 发明专利

JPS6389651A VACUUM DEPOSITION APPARATUS 失效
公开(公告)号：JPS6389651A
公开(公告)日：1988-04-20
申请号：JP23442286
申请日：1986-10-03
申请人： MITSUBISHI HEAVY IND LTD , NISSHIN STEEL CO LTD
发明人： YANAGI KENICHI , FURUKAWA HEIZABURO , KATO MITSUO , TAGUCHI TOSHIO , HIRAI ETSURO , TSUKIJI NORIO , AIKO TAKUYA , MORIYAMA YOSHITERU , ITO TAKEHIKO
IPC分类号： C23C14/04 , C23C14/24 , C23C14/56
摘要： PURPOSE:To carry out uniform vacuum deposition on a substrate by placing porous flow regulating plates in the duct of a continuous vacuum deposition apparatus at a proper interval at right angles to the direction of a flow of metal vapor in the duct so as to make the flow uniform. CONSTITUTION:A vacuum deposition chamber 3 is evacuated with a vacuum pump 16, a molten metal 5 sucked from a melting furnace 12 is evaporated with a heater 8 and the evaporated metal 5 is deposited on a substrate 1 transferred by a winding roll 4 through a duct 7. The amount of the metal deposited is regulated by controlling the electric power of the heater 8, the degree of opening of a shutter 9 and the internal pressure of the chamber 3. Flow regulating plates 20a, 20b having many through holes 21 are further placed in the duct 7 at a proper interval at right angles to the direction (z) of a flow of metal vapor 5a so as to make the flow uniform. Thus, the thickness distribution of the resulting deposited film is made uniform, the quality of a plated product is improved and the yield of the metal 5 is increased.

69. 发明专利

JPS61195973A CONTINUOUS VACUUM DEPOSITION PLATING APPARATUS 失效
公开(公告)号：JPS61195973A
公开(公告)日：1986-08-30
申请号：JP3645385
申请日：1985-02-27
申请人： NISSHIN STEEL CO LTD , MITSUBISHI HEAVY IND LTD
发明人： MAEDA MASAYASU , ITO TAKEHIKO , TSUKIJI NORIO , AIKOU TAKUYA , KIKKO TOSHIHARU , MORITA ARIHIKO , YANAGI KENICHI , FURUKAWA HEIZABURO
IPC分类号： C23C14/56
摘要： PURPOSE:To perform the vacuum deposition plating without the limit of the weight to be deposited by the plating in case of plating a steel strip one side by one side in the first and the second vacuum deposition plating chambers by providing a means cooling the steel strip to the intermediate part of both the plating chambers. CONSTITUTION:After a steel strip 1 is continuously introduced into a pretreating chamber 2 and pretreated, it is passed through a pressurizing chamber 3 and introduced into the first vacuum deposition chamber 5 via the first sealing roll chamber 4 exhausted stepwise and the under surface of the steel strip 1 is vapor-deposited. Then it is introduced into an intermediate cooling chamber 8 via the first intermediate roll chamber 7 repressurized stepwise. This cooling chamber 8 is provided with the water cooled rolls 9, 9' and the pressure of the atmosphere around the rolls is kept to >=10Torr. The steel strip 1 cooled in this part is introduced into the second vacuum deposition chamber 5' via the second intermediate sealing roll chamber 7' redecompressed stepwise and the surface of the other side is vapor-deposited. Thereafter the steel strip 1 is conducted to the outside of the system via the second sealing roll chamber 4' and the second pressurizing chamber 3'.

70. 发明专利

JP2001165851A ANALYTICAL METHOD AND APPARATUS FOR SURFACE REACTION PROCESS OF DIFFUSING MATERIAL 失效
公开(公告)号：JP2001165851A
公开(公告)日：2001-06-22
申请号：JP35082899
申请日：1999-12-09
申请人： MITSUBISHI HEAVY IND LTD
发明人： ITO TAKEHIKO , SAKANO MITSURU , IWAMURA YASUHIRO
IPC分类号： G01N23/227 , G01N21/27 , G01N27/62 , G21B1/00 , G21B3/00
摘要： PROBLEM TO BE SOLVED: To accurately analyze a state of reaction of a diffusing material without a possibility of mixing with impurities. SOLUTION: Measurement and analysis of a state of a sample 1 before and after reaction in an occlusion chamber 2 and in a release chamber 3 respectively make it possible to analyze what reaction occurs on the sample 1, what substance is formed by the reaction, and to what state the sample after reaction changed from the state before reaction. Since the occlusion chamber 2, the sample 1 and the release chamber 3 are maintained airtight in a state of vacuum, where is no possibility of mixing with impurities. Thus, the state of the sample before and after reaction can be measured and analyzed accurately; accurate measurement and analytical data can be obtained; and a reaction process can be clearly analyzed.

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