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    • 63. 发明专利
    • SURFACE PLASMON SENSOR
    • JPH10239233A
    • 1998-09-11
    • JP4195397
    • 1997-02-26
    • FUJI PHOTO FILM CO LTD
    • NAYA MASAYUKI
    • G01N21/27G01N21/41
    • PROBLEM TO BE SOLVED: To allow change in incident angle of the light beam on a sensor surface with ease. SOLUTION: Relating to the sensor, a hologram optical element comprising lens function and aberration correction function is used as an input part 13 and an output part 14 of a coupler means 10. A light source optical means 20 and a photo-detecting means 30 are placed on stages 26 and 35, respectively, allowing them to move in X direction on the stages 25 and 35, respectively. Here, an light beam L projected from the light source optical means 20 is incident on the input part 13 and converged on a specified point of an interface 4 between a sensor substrate 2 and a metal film 3, thus incident at a specified incidence angle. By interlocking the light source optical means 20 with the photo-detection means 30 to move them in approaching direction or receding direction, the incident angle of the light beam L at the specified point is changed.
    • 64. 发明专利
    • SURFACE PLASMON SENSOR
    • JPH1078391A
    • 1998-03-24
    • JP23386796
    • 1996-09-04
    • FUJI PHOTO FILM CO LTD
    • NAYA MASAYUKI
    • G01N21/27
    • PROBLEM TO BE SOLVED: To provide a surface plasmon sensor which can measure two-dimensional physical property information on a substance in a sample. SOLUTION: A metallic film 12 is formed on one surface of a transparent base board 10 having a uniform thickness, on the one hand, a light input means 15 and a light output means 16 such as two-dimensionally expanding grating are respectively formed on the other surface opposed to this one surface, and a light beam 13 incident on this light input means 15 is two-dimensionally scanned in the expanding direction of the light input means 15 by a light scanning means 17. The light beam 13 emitted outside the transparent base board 10 from the light output means 16 by being totally reflected by an interface 10a between the transparent base board 10 and a metallic film 12, is detected by a light detecting means 18.
    • 68. 发明专利
    • MEASUREMENT OF SHAPE OF RESIST PATTERN
    • JPH0299804A
    • 1990-04-11
    • JP25326188
    • 1988-10-07
    • FUJI PHOTO FILM CO LTD
    • FURUKAWA KOJINAYA MASAYUKI
    • G01B11/24G01N21/88G01N21/93G01N21/956G03F7/26H01L21/027H01L21/30H01L21/66
    • PURPOSE:To enable measurement of the shape of a resist pattern and the verticality thereof, in particular, in an efficient and quantitative manner by applying a coherent light onto the pattern formed at equal intervals and by measuring the intensity of a primary diffracted light obtained by diffraction by the pattern. CONSTITUTION:A part of a laser light 2 emitted by a light source 1 is transmitted through a half mirror 3 and falls on a sample (whereon stripe-shaped resist patterns are formed at equal intervals) 5 (of which an inclination angle is set to be theta1=1 to 20 degrees so as to collect only a primary diffracted light). The intensity of the light diffracted and reflected on the surface of the sample 5 is detected by a photodetector 12, and a voltmeter 14 measures the intensity of the primary diffracted light. Besides, a light 14 of the laser light 2, which is reflected by the mirror 3, is measured as an intensity reference light by a photodetector 17. The intensity of the diffracted light and that of the reference light thus obtained are subjected to A/D conversion 18 and sent to CPU 19 and are subjected therein to a standardizing processing (for correction of variation of the laser light itself). It is known therefrom that the lower intensity of the primary diffracted light shows the less flat parts of the slit-shaped resist patterns.