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61. 发明专利

JP2004053345A Flat flow cell, manufacturing method of the same and measuring method 审中-公开
公开(公告)号：JP2004053345A
公开(公告)日：2004-02-19
申请号：JP2002209396
申请日：2002-07-18
申请人： Tosoh Quartz Corp , 東ソー・クォーツ株式会社
发明人： IKARI TAKAOMI , SAITO HIDEJI , HONDA KEIJI
IPC分类号： G01N21/05 , G01N21/59 , G01N30/74
CPC分类号： G01N21/05 , G01N2021/0346 , G01N2201/0642
摘要： PROBLEM TO BE SOLVED: To obtain sufficient detection sensitivity for a minute quantity of a sample and deal with miniaturization of an apparatus in liquid chromatograph.
SOLUTION: A chrome film 2 is formed on a surface of quartz glass 1. A groove as a flow path 3 is formed on the surface of the quartz glass 1 by photo-etching. The flow path 3 has a spiral shape so as to elongate a length of the flow path in a certain area. The quartz glass is finished as a mirror and welded as a lid, and a flow cell is formed. A region other than the flow path 3 is shielded by the chrome film 2. A light is transmitted through the flow path 3 only. The radiated light is radiated perpendicular to the flow path 3. A minute quantity of the sample receives the light in the certain area and can be measured, and the apparatus can be miniaturized.
COPYRIGHT: (C)2004,JPO

62. 发明专利

JP2003292337A Plasma corrosion resisting silica glass, manufacturing method therefor and apparatus using the same 审中-公开
标题翻译：等离子体腐蚀电阻二氧化硅玻璃及其制造方法及其设备
公开(公告)号：JP2003292337A
公开(公告)日：2003-10-15
申请号：JP2002098893
申请日：2002-04-01
申请人： Tohos Sgm Kk , Tosoh Corp , Tosoh Quartz Corp , 東ソ−・エスジ−エム株式会社 , 東ソー・クォーツ株式会社 , 東ソー株式会社
发明人： HASHIMOTO SHINKICHI , TAKAHATA TSUTOMU
IPC分类号： C03C3/083 , C03C3/06 , C03C4/00 , C03C4/20 , C03C10/04 , H01L21/3065
CPC分类号： C03C3/06 , C03C4/20 , C03C2201/32
摘要： PROBLEM TO BE SOLVED: To provide a silica glass, used for a semiconductor container, a tool, a bell jar for a plasma etcher, and the like, which has plasma resistance, particularly sufficient durability to fluorine plasma such as CF
4 /Ar/O
2 plasma, is free from metal contamination and has high viscosity at high temperatures, and to provide a method for producing the same and apparatuses for manufacturing a semiconductor or a liquid crystal comprising the plasma corrosion resisting silica glass.
SOLUTION: The plasma corrosion resisting silica glass essentially comprising SiO
2 as a glass forming substance comprises aluminum in an amount from more than 10 atomic % to 20 atomic %. The method for producing the plasma corrosion resisting silica glass and apparatuses using the same are provided.
COPYRIGHT: (C)2004,JPO
摘要翻译：解决方案：提供一种用于半导体容器的石英玻璃，用于等离子体蚀刻器的工具，钟罩，等离子体电阻，特别是足够的氟等离子体的耐久性，例如CF 3， SB> 4 / Ar / O 2 等离子体，没有金属污染，并且在高温下具有高粘度，并且提供其制造方法以及用于制造半导体的装置包含等离子体耐腐蚀石英玻璃的液晶。基本上包含作为玻璃形成物质的SiO 2 SB的等离子体耐蚀性硅玻璃包含大于10原子％至20原子％的量的铝。提供了等离子体耐蚀石英玻璃的制造方法和使用其的装置。版权所有（C）2004，JPO

63. 发明专利

JP2003021917A Method for manufacturing stamper for optical recording medium 审中-公开
标题翻译：用于制造用于光记录介质的冲压器的方法
公开(公告)号：JP2003021917A
公开(公告)日：2003-01-24
申请号：JP2001208094
申请日：2001-07-09
申请人： Tosoh Corp , Tosoh Quartz Corp , 東ソー・クォーツ株式会社 , 東ソー株式会社
发明人： TANAKA TAKESHI , ENDO SEIICHI
IPC分类号： G03F7/30 , G03F7/20 , G11B7/26
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a stamper for optical recording media by which stampers for optical recording media can be manufactured in a good yield by improving the adhesion of a resist to glass master disks.
SOLUTION: In the method for manufacturing a stamper for optical recording media in which a photoresist film formed on a glass master disk by coating is exposed with modulated laser light and developed to form a prescribed rugged pattern and a stamper is manufactured by electroforming, the surface of the glass master disk is subjected two or more times to HMDS coating for carrying out silylation before coating with a resist.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种用于制造用于光学记录介质的压模的方法，通过该方法可以通过改善抗玻璃母盘的粘附性，通过该方法可以以良好的收率制造用于光学记录介质的压模。解决方案：在用于制造光学记录介质的压模的方法中，其中通过涂覆在玻璃母盘上形成的光致抗蚀剂膜用调制的激光曝光并显影以形成规定的凹凸图案，并且通过电铸制造压模，的玻璃母盘经受两次或更多次的HMDS涂层，以在用抗蚀剂涂覆之前进行甲硅烷基化。

64. 发明专利

JP2002356345A METHOD FOR PRODUCING QUARTS GLASS HAVING CORROSION RESISTANCE AND MEMBER AND APPARATUS USING THE QUARTS GLASS 失效
公开(公告)号：JP2002356345A
公开(公告)日：2002-12-13
申请号：JP2001166314
申请日：2001-06-01
申请人： TOSOH CORP , TOSOH QUARTZ CORP , TOHOS SGM KK
发明人： HASHIMOTO SHINKICHI , MIZUTANI SHUZO
IPC分类号： C03C3/06
摘要： PROBLEM TO BE SOLVED: To provide quarts glass having both plasma corrosion resistance and good dispersibility of added elements while solving problems of conventional technology, a method for easily producing it, a quarts glass member utilizable for a semiconductor container, jig tools, a bell jar of a plasma etcher or the like, and apparatuses for producing semiconductor and liquid crystal provided with the member. SOLUTION: This method for producing anticorrosive quarts glass comprises the steps of mixing a solution of compounds containing aluminum and/or yttrium with silica powder, and after stirring, holding the mixed solution at 60 to 130 deg.C to gradually evaporate the solvent, raising temperature to 300 to 500 deg.C under oxidative atmosphere to convert the compounds containing aluminum and/or yttrium into oxides, then cooling it to obtain calcined powder, and electrically fusing the obtained powder at a temperature of 1700 deg.C or above under reduced pressure to obtain the quarts glass. The member and the apparatus use the quarts glass.

65. 发明专利

JP2002356338A METHOD FOR PRODUCING COMPOSITE QUARTS GLASS CONTAINING ALUMINUM AND/OR YTTRIUM AND APPARATUS THEREFOR 失效
公开(公告)号：JP2002356338A
公开(公告)日：2002-12-13
申请号：JP2001166306
申请日：2001-06-01
申请人： TOSOH CORP , TOSOH QUARTZ CORP , TOHOS SGM KK
发明人： KIYOHARA HIDEKI , HARADA YOSHINORI , MIZUTANI SHUZO
IPC分类号： C03B20/00 , C03B5/43 , C03B8/04 , C03B19/14 , C03C3/06
摘要： PROBLEM TO BE SOLVED: To provide a method for producing an aluminum- and/or yttrium- containing composite quarts glass ingot containing aluminum and/or yttrium, elements having plasma resistance, uniformly dispersed therein, and containing less impurities, and to provide an apparatus using the method. SOLUTION: This method for producing an aluminum- and/or yttrium- containing composite quarts glass comprises dropping silica powder containing aluminum and/or yttrium to a furnace using oxygen/hydrogen flame as the heat source, piling it up and extending it toward the outer circumferential direction to obtain an ingot in which aluminum and/or yttrium and silica are uniformly dispersed. The apparatus using the method is also provided.

66. 发明专利

JP2002356337A METHOD FOR PRODUCING COMPOSITE QUARTS GLASS CONTAINING ALUMINUM AND/OR YTTRIUM BY PLASMA FUSION AND ITS APPLICATION 失效
公开(公告)号：JP2002356337A
公开(公告)日：2002-12-13
申请号：JP2001166309
申请日：2001-06-01
申请人： TOSOH CORP , TOSOH QUARTZ CORP , TOHOS SGM KK
发明人： TAKAHASHI KATSUFUMI , HARADA YOSHINORI , MIZUTANI SHUZO
IPC分类号： C03B20/00 , C03B19/01 , C03B19/09 , C03C3/06
摘要： PROBLEM TO BE SOLVED: To provide a method for producing quarts glass having excellent viscosity at a high temperature, less impurities to be chemically inert, excellent impact resistance and strength even under high density plasma, and generating no corrosion during repetitive use, and to provide parts for apparatuses consisting of the quarts glass and utilizing halogenized product gas and the plasma. SOLUTION: This method for producing an aluminum- and/or yttrium- containing composite quarts glass ingot comprises adjusting the angle and positions of a plasma anode torch 24 and a plasma cathode torch 26 while rotating a container 18 for fusion at a predetermined speed, dropping silica powder raw material containing aluminum and/or yttrium to the center part of the furnace bottom through a plasma arc coupling zone to form aluminum- and/or yttrium-containing composite quarts glass fused in a small size. Thereafter, by continuously fusing and piling up while enlarging fusion area, the aluminum- and/or yttrium-containing composite quarts glass ingot in which aluminum and/or yttrium is uniformly dispersed is produced.

67. 发明专利

JP2002356336A METHOD FOR PRODUCING COMPOSITE QUARTS GLASS CONTAINING ZIRCONIUM BY PLASMA FUSION AND ITS APPLICATION 失效
公开(公告)号：JP2002356336A
公开(公告)日：2002-12-13
申请号：JP2001166308
申请日：2001-06-01
申请人： TOSOH CORP , TOSOH QUARTZ CORP , TOHOS SGM KK
发明人： TAKAHASHI KATSUFUMI , HARADA YOSHINORI , MIZUTANI SHUZO
IPC分类号： C03B20/00 , C03B19/01 , C03B19/09 , C03C3/06
摘要： PROBLEM TO BE SOLVED: To provide a method for producing quarts glass having excellent viscosity at a high temperature, less impurities to be chemically inert, excellent impact resistance and strength even under high density plasma, and generating no corrosion during repetitive use, and to provide parts for apparatuses consisting of the quarts glass and utilizing halogenized product gas and the plasma. SOLUTION: This method for producing a zirconium-containing composite quarts glass comprises passing a mixed powder obtained by adding zirconium- containing substance to silicious raw material powder through plasma arc coupling zone where at least two electrodes have reverse polarity and at least two plasma arcs are coupled, and fusing the mixed powder. The zirconiumcontaining composite quarts glass member and parts for apparatuses obtained by the method are provided.

68. 发明专利

JP2002137928A WELDING METHOD FOR QUARTZ GLASS COMPONENT AND VERTICAL WAFER PORT ASSEMBLY APPARATUS 失效
公开(公告)号：JP2002137928A
公开(公告)日：2002-05-14
申请号：JP2000328343
申请日：2000-10-27
申请人： TOSOH QUARTZ CORP
发明人： NAKAGAWA KOJI , SEKI KOJI , MATSUZAKA MAKI
IPC分类号： C03B23/20 , C03B23/207
摘要： PROBLEM TO BE SOLVED: To provide a welding method not to cause surface deformation and not necessary to reform the joined surface when a rod quartz glass component is welded with a plate component. SOLUTION: The rod quartz glass component 2 of which the one end has a convex shape like a conical shape or the like is positioned vertically to be 1-3 mm apart from the surface of the plate quartz glass component 1. The oxygen burners are set opposite each other at both the side of the rod component 2 to be the flame angle of 5-45 degrees. The heated and softened plate quartz glass component 1 and the rod quartz glass component 2 are transferred relatively and made contact bonding by the pressure on the joining surface toward vertical direction.

69. 发明专利

JP2002037637A MANUFACTURING METHOD OF FUSED SILICA GLASS 失效
公开(公告)号：JP2002037637A
公开(公告)日：2002-02-06
申请号：JP2000225760
申请日：2000-07-26
申请人： TOSOH QUARTZ CORP
发明人： GOTO YOSHIHIKO , SATO MIYUKI
IPC分类号： C03B20/00 , C03B19/14
摘要： PROBLEM TO BE SOLVED: To provide an efficient manufacturing method of a large size silica glass ingot which has a good fusion of siliceous powder and homogeneous quality without blister. SOLUTION: Siliceous powder is dropped from a furnace ceiling 2 and accumulated/piled on the bottom of a rotating furnace 1 which has an inclined outer periphery wall 11. Then heated and piled fused silica glass flows toward the outer periphery wall and form a silica glass ingot whose outer diameter has inclination. The outer periphery wall 11 is moved to a horizontal position. The inclined outer diameter of the ingot is heated/melted and the upward lamination of the outer diameter area of the ingot is adjusted approximately horizontally. Thus silica glass ingot of slab shape of high homogeneity is manufactured.

70. 发明专利

JP2002020132A BURNER FOR MANUFACTURING MOLTEN QUARTZ GLASS 失效
公开(公告)号：JP2002020132A
公开(公告)日：2002-01-23
申请号：JP2000195042
申请日：2000-06-28
申请人： TOSOH QUARTZ CORP
发明人： SATO SHINICHI , GOTO YOSHIHIKO
IPC分类号： F23D14/38 , C03B19/14 , C03B20/00 , F23D14/56
摘要： PROBLEM TO BE SOLVED: To manufacture large-sized quartz glass ingots which are good in melting of siliceous glass powder and are free of the generation of foam with good production efficiency. SOLUTION: Gaseous hydrogen enters an annular gaseous hydrogen chamber 30 from a gaseous hydrogen supply pipe 3 and is sent along a tapered external wall 22 of a gaseous oxygen chamber 2 into a barrel 1. The gaseous hydrogen flowing down at the outer peripheral side of the barrel 1 withdraws the siliceous glass powder into gaseous hydrogen flow and is released from the aperture of the barrel 1. The gaseous hydrogen introduced by being deflected in a central direction by colliding against a gaseous hydrogen guide plate 5 is released from the aperture of the barrel 1 through the clearances of plural gaseous oxygen nozzles 21 arrayed on a concentric circle disposed on the lower side of a gaseous oxygen chamber 20 and is immediately mixed with the oxygen released from a gaseous oxyhydrogen nozzle. The oxyhydrogen flames are formed to a wide range by the hydrogen released from the outer periphery of the barrel and the hydrogen released from the clearances of the gaseous oxygen nozzles. by which the siliceous glass powder in the gaseous hydrogen flow is uniformly melted and deposited on a target and the large-sized quartz glass ingots are efficiently formed.

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