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51. 发明专利

JP2004119120A Manufacturing method for device 审中-公开
标题翻译：装置的制造方法
公开(公告)号：JP2004119120A
公开(公告)日：2004-04-15
申请号：JP2002279182
申请日：2002-09-25
申请人： Canon Inc , キヤノン株式会社
发明人： SUZUKI NORIHIRO
IPC分类号： H01J9/38
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method suitable for a device to fix a bar-shaped member on a substrate.
SOLUTION: This manufacturing method for the device has the substrate and the bar-shaped member fixed to the substrate while having a longitudinal direction parallel to the inner surface direction of the substrate. It has a process to fix a plurality of mutually separated spots of the bar-shaped member to the substrate; a process to form a space between the substrate and the bar-shaped member in a region sandwiched between two adjacent spots among the plurality of the spots or a process to widen the space between the substrate and the bar-shaped member; and a process to spray a fluid onto the substrate or a process to clean the substrate, with the space formed.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种适用于将棒状部件固定在基板上的装置的制造方法。解决方案：该装置的制造方法具有将基板和棒状构件固定到基板，同时具有与基板的内表面方向平行的纵向方向。其具有将棒状构件的多个相互分离的点固定到基板的工序; 在夹在多个斑点中的两个相邻点之间的区域中在基板和棒状构件之间形成空间的过程或扩大基板和棒状构件之间的空间的过程; 以及在形成有空间的情况下将流体喷射到基底上的过程或清洁基底的过程。版权所有（C）2004，JPO

52. 发明专利

JP2004087384A Manufacturing method of cathode-ray tube 审中-公开
公开(公告)号：JP2004087384A
公开(公告)日：2004-03-18
申请号：JP2002248943
申请日：2002-08-28
申请人： Toshiba Corp , 株式会社東芝
发明人： CHIGUSA TAKASHI , MATSUDA SHUZO , FUKAZAWA HIROYOSHI , AOKI KATSUYUKI
IPC分类号： H01J9/38 , H01J9/20
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of a cathode-ray tube in which effective cleaning of a front face of a face plate is carried out, and formation of a surface-treated film of high quality is enabled.
SOLUTION: This method is provided with a process of sharpening the front face of the face plate of the cathode-ray tube by means of sharpening dispersion solution into which a surface active agent is added, and a process of forming the surface-treated film on the front face of the sharpened face plate.
COPYRIGHT: (C)2004,JPO

53. 发明专利

JP2004079470A Cleaning device of atmospheric pressure resisting structure in image forming device 审中-公开
标题翻译：图像形成装置中大气压力电阻结构的清洁装置
公开(公告)号：JP2004079470A
公开(公告)日：2004-03-11
申请号：JP2002241881
申请日：2002-08-22
申请人： Canon Inc , キヤノン株式会社
发明人： KOYANAGI KAZUO , SHIOTANI YASUSHI
IPC分类号： H01J9/38
摘要： PROBLEM TO BE SOLVED: To clean multiple atmospheric pressure resisting structures at the same time by eliminating contact among them through a problematic fluid even if their arrangement intervals are small when the atmospheric pressure resisting structures are pulled out of the fluid in cleaning them.
SOLUTION: In relation to the cleaning of the atmospheric pressure resisting structure (spacer) disposed between a face plate and a rear plate in an image forming device, this cleaning device is characterized by having a mechanism for vibrating the atmospheric pressure resisting structure in a direction parallel to the fluid level when a cleaning jig and the atmospheric pressure resisting structure of a cleaning object are pulled out of the fluid after cleaning it by rocking it in a direction vertical to the fluid level in the cleaning fluid or a rinse fluid.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为了通过消除有问题的流体中的它们之间的接触来同时清洁多个耐大气压结构，即使当在大气压力结构被清除时从流体中拉出时，它们的排列间隔小。解决方案：关于在图像形成装置中清洁设置在面板和后板之间的耐压结构（间隔件），该清洁装置的特征在于具有用于使大气压耐受结构振动的机构当清洁对象的清洁夹具和大气压力抵抗结构在清洁它之后通过在垂直于清洁流体或冲洗流体中的流体水平的方向摇摆而将其清除之后，在平行于流体水平的方向上。版权所有（C）2004，JPO

54. 发明专利

JP2004071440A Manufacturing method and apparatus of image display device 审中-公开
标题翻译：图像显示装置的制造方法和装置
公开(公告)号：JP2004071440A
公开(公告)日：2004-03-04
申请号：JP2002231095
申请日：2002-08-08
申请人： Toshiba Corp , 株式会社東芝
发明人： KUWABARA YUJI , MURATA HIROTAKA , IZEKI YASUSHI , KOIDE SATORU , OZOEGAWA MASAKUNI
IPC分类号： H01J9/38
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method and apparatus of an image display device capable of manufacturing an image display device having an excellent breakdown voltage characteristic, and improved in display performance and reliability.
SOLUTION: In a vacuum atmosphere, at least one of a front substrate 11 and a back substrate is faced to a processing electrode 34 equipped with linear members 36, and an electric field is applied between at least the one substrate and the linear members to subject the substrate(s) to a breakdown voltage treatment. After the electric field treatment, an envelope is formed by sealing the front substrate and the back substrate to each other in a condition where they are kept in the vacuum atmosphere.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供能够制造具有优异的击穿电压特性的图像显示装置的图像显示装置的制造方法和装置，并且显示性能和可靠性提高。解决方案：在真空气氛中，前基板11和后基板中的至少一个面向配备有线性部件36的处理电极34，并且在至少一个基板和线性元件之间施加电场成员以使基板受到击穿电压处理。在电场处理之后，通过在保持在真空气氛中的状态下将前基板和后基板彼此密封来形成外壳。版权所有（C）2004，JPO

56. 发明专利

JP2003528422A 失效
公开(公告)号：JP2003528422A
公开(公告)日：2003-09-24
申请号：JP2001512612
申请日：2000-06-30
IPC分类号： H01J7/18 , H01J7/24 , H01J9/38 , H01J9/52 , H01J29/94

57. 发明专利

JP2003262715A METHOD FOR REMOVING MATERIAL, METHOD FOR REGENERATING BASE MATERIAL, METHOD FOR MANUFACTURING DISPLAY DEVICE, AND ELECTRONIC APPARATUS EQUIPPED WITH THE DISPLAY DEVICE MANUFACTURED BY THE MANUFACTURING METHOD 审中-公开
公开(公告)号：JP2003262715A
公开(公告)日：2003-09-19
申请号：JP2002063850
申请日：2002-03-08
申请人： SEIKO EPSON CORP
发明人： KAWASE TOMOKI , ITO TATSUYA , KATAUE SATORU
IPC分类号： G02B5/20 , G03F7/42 , H01J9/38 , H01L27/32 , H01L51/56
摘要： PROBLEM TO BE SOLVED: To provide a method for effectively reusing a display raw material in which a display element is introduced into a region fractioned by a barrier wall and to provide a method for manufacturing a display device by using the above method. SOLUTION: In the regenerating process of a base material, a color filter substrate shown in Fig. (a) is immersed in a developer liquid E as shown in (b). As for the developer liquid E, a specified developer liquid which can be used for the development to form barrier walls 6, particularly a specified alkali solution is used. The developer liquid E may not be the same developer liquid that is used to form the barrier walls. An ultrasonic cleaning tank is used in the immersing process in the developer liquid E so as to apply vibration or stress on a filter element 3 as a display element, and thereby, the filter element 3 as the display element is peeled as shown in (c). Then the substrate is washed with water as shown in (d), dried as shown in (e) and sent to the process of forming a color filter substrate. COPYRIGHT: (C)2003,JPO

58. 发明专利

JP2003257316A MANUFACTURING METHOD FOR DISPLAY DEVICE 审中-公开
公开(公告)号：JP2003257316A
公开(公告)日：2003-09-12
申请号：JP2002051156
申请日：2002-02-27
申请人： SONY CORP
发明人： YAMANAKA HIDEO
IPC分类号： H01J9/38 , H01J11/20 , H01J11/44 , H01J11/02
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method for a display device, capable of reducing impurity gas remaining in a discharge space of a display device using gas discharge such as a plasma display device. SOLUTION: A chemical seed rich in energy is generated by discharge, and impurity is removed by physical and chemical action thereof. In glow discharge taking hydrogen gas as discharge gas, hydrogen base active seed (hydrogen atom or hydrogen ion) having a strong reducing action is generated to thereby remove water adsorbed to the inner wall and oxides such as an oxide coat on an electrode by reducing. Organic contaminant is decomposed by reducing to be changed into small molecules easy to be exhausted. In the glow discharge taking oxygen gas as discharge gas, oxygen active seed (oxygen atom and oxygen ion rich in energy) having a strong oxidizing action is generated to thereby decompose organic contaminant adhering to the inner wall by oxidizing so that the contaminant is changed into small molecules easy to be exhausted. As a result, impurity gas such as water remaining in the discharge space can be decreased so as to stabilize the discharge characteristic and lengthen the life of the device. COPYRIGHT: (C)2003,JPO

59. 发明专利

JP2003203568A CLEANING TREATMENT METHOD AND CLEANING TREATMENT DEVICE OF FACE PANEL FOR COLOR CATHODE-RAY TUBE 审中-公开
公开(公告)号：JP2003203568A
公开(公告)日：2003-07-18
申请号：JP2001400412
申请日：2001-12-28
申请人： TOSHIBA CORP
发明人： SUZUKI YOSHIHIRO
IPC分类号： H01J9/38
摘要： PROBLEM TO BE SOLVED: To provide a cleaning treatment device capable of surely performing cleaning treatment by adding respective optimal cleaning conditions of a new face panel and a regenerating face panel. SOLUTION: A cleaning solution for cleaning an inside surface of the regenerating face panel is composed of a solution including a tannic acid of at least 10% to a 1 to 5% solution of acid ammonium fluoride. A face panel inside surface cleaned by this solution is cleaned by spray. A first cleaning device 16, a first water washing device 17, a second cleaning device 18, and a second water washing device 19 are arranged in order along a carrying device 15 for mixedly carrying the new face panel 35 and the regenerating face panel 37. Cleaning is performed by using the cleaning solution in the first cleaning device 16. Cleaning is performed by using a fluoric acid in the second cleaning device 18. High pressure spray water washing is performed by using pure water in the first and second water washing devices 17 and 19. COPYRIGHT: (C)2003,JPO

60. 发明专利

JP3425063B2 失效
公开(公告)号：JP3425063B2
公开(公告)日：2003-07-07
申请号：JP15132397
申请日：1997-06-09
IPC分类号： C03C17/245 , H01J9/02 , H01J9/20 , H01J9/38 , H01J11/12 , H01J11/22 , H01J11/24 , H01J11/26 , H01J11/34 , H01J11/36 , H01J11/38 , H01J11/40 , H01J11/42 , H01J11/50 , H01J11/02

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