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51. 发明专利

JP2847610B2 失效
公开(公告)号：JP2847610B2
公开(公告)日：1999-01-20
申请号：JP15959693
申请日：1993-06-29
申请人： RAION KK
发明人： MAENO SEIJI , USHAMA HIROTOSHI
IPC分类号： B05B13/02 , B08B3/00 , B08B11/02 , C08K3/02 , C08K3/04 , C08L101/00 , H05K3/26

52. 实用新型

JP2588854Y2 失效
公开(公告)号：JP2588854Y2
公开(公告)日：1999-01-20
申请号：JP397993
申请日：1993-01-19
IPC分类号： B08B11/02 , H01L21/68 , H01L21/683

53. 发明专利

JPH10323635A ULTRASONIC CLEANING DEVICE 失效
公开(公告)号：JPH10323635A
公开(公告)日：1998-12-08
申请号：JP13467197
申请日：1997-05-26
申请人： SONY CORP
发明人： SATO NOBUAKI , NISHIZAKI MITSUHIRO
IPC分类号： B08B3/12 , B08B11/02 , H01L21/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an ultrasonic cleaning device for emitting ultrasonic waves effectively all over a face the be cleaned of a wafer to enhance the cleaning effect. SOLUTION: Supporting members 28a and 28b for holding a wafer 7 in a cleaning liquid 6 in the given posture are set on the positions of respectively different height, and ultrasonic protective plates 24a and 24b are provided respectively on the front faces of ultrasonic wave generators 23 and 24 set on both side walls of an ultrasonic wave tank 2. The ultrasonic wave protective plates are movable respectively to the front faces of the ultrasonic wave generators and to the standby positions retracted from the front faces, and when ultrasonic waves are emitted from the other side, the plates are positioned on the front faces. The ultrasonic wave generators 23a and 23b are actuated alternately, and ultrasonic waves are emitted all over a face 7a to be cleaned of the wafer 7 by emitting ultrasonic waves from the other side to ultrasonic wave unreceived areas 29a (29b) not having received ultrasonic waves when the ultrasonic waves are emitted from one side to the wafer 7.

54. 发明专利

JPH10321580A SUBSTRATE CLEANING UNIT AND SUBSTRATE CLEANING SYSTEM 失效
公开(公告)号：JPH10321580A
公开(公告)日：1998-12-04
申请号：JP13914897
申请日：1997-05-15
申请人： TOKYO ELECTRON LTD
发明人： KITAHARA SHIGENORI
IPC分类号： B08B11/02 , B08B3/02 , B08B3/04 , B08B13/00 , B65G49/07 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To reduce the displacement volume in a cleaning solution atmosphere by minimizing the installed area of a substrate cleaning unit by arranging a cleaning chamber above a cleaning tank in which wafers are cleaned by immersing the wafers in a first cleaning solution and cleaning the surfaces of the wafers by discharging a second cleaning solution and elevating and lowering the cleaned wafers by means of an elevating/lowering mechanism provided between the cleaning tank and cleaning chamber. SOLUTION: After wafers W are cleaned by immersing the wafers W in a first cleaning solution contained in a cleaning tank 20, the wafers W are further cleaned by supplying a second cleaning solution obliquely downward to the surfaces of the wafers W from pluralities of spraying holes bored around a pair of nozzles 40 provided in a cleaning chamber 21 arranged above the cleaning tank 20. In this case, the holding member of an elevating/lowering device 22 provided between the cleaning tank 20 and cleaning chamber 21 is elevated and lowered so as to carry the wafers in and out of the tank 20 and chamber 21. Therefore, the installed area of a substrate cleaning unit can be effectively utilized and the displacement volume of the cleaning solution atmosphere can be reduced. In addition, the complexity of a cleaning system can be suppressed.

55. 发明专利

JPH10270409A CLEANING DEVICE 失效
公开(公告)号：JPH10270409A
公开(公告)日：1998-10-09
申请号：JP7503897
申请日：1997-03-27
申请人： NEC CORP
发明人： YAMAZAKI SHINYA
IPC分类号： B08B11/02 , B08B3/08 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a cleaning device which can effectively clean and rinse a semiconductor substrate, liquid crystal substrate, etc. SOLUTION: On the bottom of a water washing tank 1, a carrier holding tool 8 and height adjusting tools 9 having different heights in a step-like state are provided. When a carrier 5 containing wafers 4 is placed on the carrier holding tool 8, the height adjusting tools 9 vertically hold the wafers 4 in the carrier 5 at different heights in a step-like state. When the tools 9 hold the wafers 4, pure water is supplied through bottom water inlets 10 and side-face water inlets 11 and flows on the wafers 4 in an oblique direction. Since the wafers 4 are respectively held at different heights in the step-like state, the pure water easily flows in the spaces among the wafers 4 and, after washing the surfaces of the wafers 4, overflows the tank 1.

56. 发明专利

JPH10230228A WASHER 失效
公开(公告)号：JPH10230228A
公开(公告)日：1998-09-02
申请号：JP3357797
申请日：1997-02-18
申请人： HITACHI LTD
发明人： HIROKI MINORU , ISHIDA YASUHIKO
IPC分类号： B08B11/02 , B08B3/02 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To enable washing with high cleanliness by vertically rotating work cases and at the same time, horizontally rotating them and performing washing by spray water from a nozzle member installed around the work cases in such an operation state. SOLUTION: A spray water nozzle member 2 having a many nozzles is installed in a washing chamber 1, and in the lower part of the washing chamber 1, a driving base 4 is mounted. And on the driving base 4, a horizontal driving member 5 and a horizontal moving member 7 are fixed. In the upper part of the washing chamber 1, a vertical rotary driving member 8 and work cases 12 on the right and the left thereof are installed, and work 9 can be set in the work cases 12. In this way, the work cases 12 are vertically rotated and at the same time they are horizontally rotated in the washing chamber to spray water.

57. 发明专利

JPH10125647A SUBSTRATE TREATING EQUIPMENT 失效
公开(公告)号：JPH10125647A
公开(公告)日：1998-05-15
申请号：JP29973396
申请日：1996-10-23
申请人： DAINIPPON SCREEN MFG
发明人： KAWATANI MASASHI
IPC分类号： B08B11/02 , C23F1/08 , C23G3/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide substrate treating equipment, wherein damages to a treating chemical liquid bath is prevented even if supporting member is deformed. SOLUTION: A treating chemical liquid bath 12 made of quartz is secured inside an outer bath made of resin, when the supporting rods 14a, 14b, 14c, 14d formed on the side walls of the treating chemical liquid bath 12 are supported on supporting members 16a, 16b, 16c, 16d. Recesses 17 are formed on the upper faces of the supporting members 16a, 16b in order to anchor the supporting rods 14a, 14b and the upper faces of the supporting members 16c, 16d that support the supporting rods 14a, 14b are flat. Projections are formed on the portions of the supporting members 16a, 16b, 16c, 16d to be brought into contact with the supporting rods 14a, 14b, 14c, 14d.

58. 发明专利

JPH105713A COMPOSITE PALLET 失效
公开(公告)号：JPH105713A
公开(公告)日：1998-01-13
申请号：JP16143396
申请日：1996-06-21
申请人： IBIDEN CO LTD
发明人： TAKAMI TORU
IPC分类号： B08B11/02
摘要： PROBLEM TO BE SOLVED: To improve productivity by saving time and effort spent in transferring parts in each stage. SOLUTION: This composite pallet is constituted so that plural parts are treated en bloc and the parts are supplied to a working machine or recovered from the machine one by one. In this case, a positioning pallet 20 on which a pin 24 for supporting the inner periphery of the part 11 from below is provided at specified plural positions and a frame 36 corresponding to the pin 24 and supporting the outer periphery of the part 11 from below are provided, and a rack 30 placed detachably on the pallet 20 is furnished. The parts 11 are respectively supported on the frame 36 of the rack 30, the rack 30 is placed on the pallet 20, and the parts 11 are transferred on the pin 24 of the pallet 20 from the frame 36.

59. 发明专利

JPH08257469A SUBSTRATE ROTATING DEVICE AND SUBSTRATE TREATING DEVICE 失效
公开(公告)号：JPH08257469A
公开(公告)日：1996-10-08
申请号：JP6668695
申请日：1995-03-02
申请人： CANON KK , CANON SALES CO INC
发明人： MATSUO MANABU
IPC分类号： G03F7/16 , B05C11/02 , B05C11/08 , B08B3/02 , B08B11/02 , B23Q3/08 , B25B11/00 , H01L21/027 , H01L21/304 , H01L21/683 , H01L21/68
摘要： PURPOSE: To prevent the vibration and the movement of a substrate by a simple and inexpensive structure. CONSTITUTION: A substrate rotating device is provided with a turntable 3 horizontally arranged, a substrate supporting member 2 arranged on the turntable 3 and for vertically supporting a substrate 1 mounted thereon and also positioning the outer periphery of the substrate 1, and a driving means 6 for rotating the turntable 3. The turntable 3 is provided with an opening 8, and also means 4, 5, 6 for forcedly exhausting air from a space between the turntable 3 and the substrate 1 from the opening 8 by rotating the turntable 3 as one body are provided.

60. 发明专利

JPH08508345A 失效
公开(公告)号：JPH08508345A
公开(公告)日：1996-09-03
申请号：JP51632794
申请日：1994-01-14
IPC分类号： G02C7/04 , A45C11/00 , A61L12/02 , A61L12/08 , B08B1/00 , B08B7/00 , B08B11/02 , C11D3/00 , C11D11/00 , G02C13/00

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