专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明专利

JP2005123225A Color solid-state imaging device and its manufacturing method 有权
标题翻译：彩色固态成像装置及其制造方法
公开(公告)号：JP2005123225A
公开(公告)日：2005-05-12
申请号：JP2003353298
申请日：2003-10-14
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： KITAMURA TOMOHITO , FUKUYOSHI KENZO , OGATA KEISUKE
IPC分类号： H01L27/14 , H04N5/335 , H04N5/359 , H04N5/361 , H04N5/367 , H04N5/369 , H04N5/372 , H04N5/374 , H04N9/07 , H04N101/00
摘要： PROBLEM TO BE SOLVED: To provide a color solid-state imaging device which is equipped with color filters that have a few agglomerate growing black marks and are excellent in shape even when pixels are each 5 μm or below in size, affords to allow a sufficient exposure margin, is equipped with color pixels which are hardly separated off, and high in productivity; and to provide a method of manufacturing the same.
SOLUTION: The color solid-state imaging device has a flattening layer 3 flattening the rugged surfaces of a plurality of light receiving elements 2 on the surface of a semiconductor substrate 1 equipped with the light receiving elements 2, a color filter layer composed of color pixels 5 to 7 which are of two or more different colors and each paired up with the light receiving element, and micro-lenses 9 which condense light on the light receiving elements and are each paired up with the light receiving element formed on the flattening layer 3. The flattening layer 3 has recesses which are each paired up with the light receiving element so as to correspond with each other, and the color filter layer is provided so as to fill up the recesses.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种彩色固态成像装置，其配备有具有少量附聚物生长黑色标记的彩色滤光片，并且即使像素大小为5μm或更小，也具有优异的形状，允许足够的曝光余量，配有几乎不分离的彩色像素，生产率高; 并提供其制造方法。颜色固态成像装置具有将装有光接收元件2的半导体衬底1的表面上的多个光接收元件2的凹凸表面平坦的平坦化层3，构成具有两个或多个不同颜色并且与光接收元件配对的彩色像素5至7以及将光接收在光接收元件上并且与形成在光接收元件上的光接收元件成对的微透镜9 平坦化层3.平坦化层3具有与光接收元件相互对应的凹槽，并且滤色器层设置成填充凹部。版权所有（C）2005，JPO＆NCIPI

52. 发明专利

JP2005005419A Solid-state imaging element 审中-公开
标题翻译：固态成像元件
公开(公告)号：JP2005005419A
公开(公告)日：2005-01-06
申请号：JP2003166137
申请日：2003-06-11
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： KITAMURA TOMOHITO , FUKUYOSHI KENZO , OGATA KEISUKE
IPC分类号： G02B5/20 , H01L27/14 , H04N5/335 , H04N5/357 , H04N5/369
摘要： PROBLEM TO BE SOLVED: To provide a solid-state imaging element wherein noise, sensitivity unevenness and sensitivity deterioration which are to be caused by buzzing of shape of coloring pixels and film thickness are hardly generated even in pixel size whose one edge is 4 μm or less. SOLUTION: Film thickness of coloring pixels which are arranged to first color array is in a range of 0.6-1.2 μm. To the film thickness of the coloring pixels which are arranged to the first color array, film thickness of central parts of coloring pixels after second color array which are arranged horizontally and vertically adjacent to each other is thicker than the film thickness of the coloring pixels which are arranged to the first color array within a range of 0.1-0.3 μm. The coloring pixels are composed of three primary colors of red, blue and green, and the first color array is green. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种固态成像元件，其中即使在像素尺寸的一个边缘是像素尺寸的情况下也难以产生由着色像素的形状和膜厚度的嗡嗡声引起的噪声，灵敏度不均匀性和灵敏度劣化 4μm以下。解决方案：布置成第一颜色阵列的着色像素的膜厚度在0.6-1.2μm的范围内。对于布置在第一颜色阵列上的着色像素的膜厚度，彼此水平和垂直相邻布置的第二颜色阵列之后的着色像素的中心部分的膜厚度比着色像素的膜厚度厚被布置在0.1-0.3μm的范围内的第一颜色阵列。着色像素由红色，蓝色和绿色的三原色组成，第一种颜色阵列为绿色。版权所有（C）2005，JPO＆NCIPI

53. 发明专利

JP2004342793A Solid-state imaging element 审中-公开
标题翻译：固态成像元件
公开(公告)号：JP2004342793A
公开(公告)日：2004-12-02
申请号：JP2003136939
申请日：2003-05-15
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： OGATA KEISUKE , FUKUYOSHI KENZO , KITAMURA TOMOHITO
IPC分类号： H01L27/14 , H04N5/335 , H04N5/357 , H04N5/369
摘要： PROBLEM TO BE SOLVED: To provide a solid-state imaging element wherein color mixture by migration does not occur in a first flattened layer even if collar resist which contains dye inside is used for formation of a color filter, and spectral characteristic is superior.
SOLUTION: In the solid-state imaging element, the first planarize layer 2 served as migration prevention of dye. In the first planarize layer 2, organic resin is main component, and saturation content addition of migration inhibitor which does not have absorption in visible region is performed. The migration inhibitor is dye or ultraviolet absorber or infrared absorption agent or photopolymerizable monomer or photopolymerization initiator. The dye is decolorized by thermal treatment.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种固态成像元件，其中即使使用含有染料的轴环抗蚀剂用于形成滤色器，也不会在第一平坦层中发生通过迁移的混色，并且光谱特性为优越。解决方案：在固态成像元件中，第一平面化层2用作染料的迁移防止。在第一平坦化层2中，有机树脂是主要成分，并且进行在可见光区域不具有吸收的迁移抑制剂的饱和含量添加。迁移抑制剂是染料或紫外线吸收剂或红外吸收剂或光聚合单体或光聚合引发剂。染料通过热处理脱色。版权所有（C）2005，JPO＆NCIPI

54. 发明专利

JP2012108438A YELLOW COLORED COMPOSITION FOR COLOR FILTER AND COLOR FILTER 审中-公开
公开(公告)号：JP2012108438A
公开(公告)日：2012-06-07
申请号：JP2010259029
申请日：2010-11-19
申请人： TOYO INK SC HOLDINGS CO LTD , TOPPAN PRINTING CO LTD
发明人： MIYAMURA MORITSUGU , YAMADA YUKI , OGATA KEISUKE , YAMAUCHI TAKASHI
IPC分类号： G02B5/20 , C09B29/20 , C09B45/14 , C09B45/22 , C09B57/04 , C09B67/20 , G02B5/22 , G02F1/1335 , G03F7/004
摘要： PROBLEM TO BE SOLVED: To provide a yellow colored composition to be used for manufacturing a color filter having a high contrast ratio, high lightness and a wide color reproducing region, and to provide a liquid crystal display device using the composition, the device capable of representing a bright color with high contrast.SOLUTION: The yellow colored composition for a color filter comprises a coloring matter (a), a binder resin (b), an organic solvent (c), an active energy ray polymerization initiator (d), and an active energy ray-curable monomer (e). The coloring matter (a) contains a coloring matter (a1) essentially comprising an azo-based yellow pigment having a specific surface area of 90 m/g or more by a BET method and a coloring matter (a2) for color matching, which is another yellow pigment or an orange-color pigment. The coloring matter (a2) for color matching is included by 0.07 wt.% or more and less than 20 wt.% in total 100 wt.% of the coloring matter (a), and shows a specified spectrum.

55. 发明专利

JP2006222290A SOLID-STATE IMAGING ELEMENT AND ITS MANUFACTURING PROCESS 审中-公开
公开(公告)号：JP2006222290A
公开(公告)日：2006-08-24
申请号：JP2005034620
申请日：2005-02-10
申请人： TOPPAN PRINTING CO LTD
发明人： OGATA KEISUKE , FUKUYOSHI KENZO , KITAMURA TOMOHITO , ISHIMATSU TADASHI , NAKAO MITSUHIRO
IPC分类号： H01L27/14 , H04N9/07
摘要： PROBLEM TO BE SOLVED: To provide a solid-state imaging element, formed without producing defects in shape and residues, while exhibiting proper adhesion to a substrate and comprising a color filter, having reflectivity that does not have dispersion between pixels, and to provide its manufacturing method. SOLUTION: In the manufacturing method of a solid-state image sensor comprising photoelectric conversion elements arranged two-dimensionally on a semiconductor substrate, and a color filter arranged in filter pattern of a plurality of colors on the semiconductor substrate, in correspondence with respective photoelectric conversion elements, the filter pattern of a plurality of colors is formed by a step of patterning a predetermined color filter layer by dry etching, and a step of patterning other color filter layers by photolithography, and at least the color filter pattern being formed at first out of the plurality of color filter patterns is patterned by dry etching, and remaining color filter patterns are patterned by photolithography. COPYRIGHT: (C)2006,JPO&NCIPI

56. 发明专利

JP2006222291A SOLID-STATE IMAGING ELEMENT AND ITS FABRICATION PROCESS 有权
公开(公告)号：JP2006222291A
公开(公告)日：2006-08-24
申请号：JP2005034621
申请日：2005-02-10
申请人： TOPPAN PRINTING CO LTD
发明人： OGATA KEISUKE , FUKUYOSHI KENZO , KITAMURA TOMOHITO , ISHIMATSU TADASHI , NAKAO MITSUHIRO
IPC分类号： H01L27/14 , H04N5/335 , H04N5/367 , H04N5/369 , H04N5/372 , H04N5/374 , H04N9/07 , H04N101/00
摘要： PROBLEM TO BE SOLVED: To provide a solid-state image element, formed without producing defects in shape and residues, while thinning and comprising a color filter having reflectivity that does not have dispersion between pixels, and to provide its manufacturing process. SOLUTION: In the fabrication process of a solid state image sensor comprising photoelectric conversion elements arranged two-dimensionally on a semiconductor substrate, a color filter having filter patterns of a plurality of colors arranged on the semiconductor substrate, in correspondence with respective photoelectric conversion elements, and a planarization layer formed partially or entirely on the semiconductor substrate, unwanted part of at least the color filter pattern being formed at first out of the filter patterns of a plurality of colors and the underlying planarization layer are patterned by dry etching and other color filter patterns are patterned through photolithography. COPYRIGHT: (C)2006,JPO&NCIPI

57. 发明专利

JP2003258224A SOLID STATE IMAGE SENSOR AND ITS FABRICATING METHOD 审中-公开
公开(公告)号：JP2003258224A
公开(公告)日：2003-09-12
申请号：JP2002060099
申请日：2002-03-06
申请人： TOPPAN PRINTING CO LTD
发明人： FUKUYOSHI KENZO , ISHIMATSU TADASHI , KITAMURA TOMOHITO , OGATA KEISUKE
IPC分类号： G02B5/00 , G02B3/00 , H01L27/14 , H04N5/335 , H04N5/357
摘要： PROBLEM TO BE SOLVED: To provide a solid state image sensor, and its fabrication method, in which the sensitivity does not deteriorate even in case of a high resolution solid image sensor having an inter-lens gap of 0.3 μm or less, and noise is reduced by controlling reflection light especially from the non-opening part between lenses. SOLUTION: A low refractive index resin 29 is provided above the surface of microlenses 28 while having an interface thermally fused therewith and the low refractive index resin is provided in nonplanar shape in the recesses. A pattern of thermal flow resin and the low refractive index resin are formed on an undercoat layer 16, and at the same time as the lenses are formed by heat treatment, the interface between the low refractive index resin and the lenses is thermally fused thus forming the low refractive index resin in nonplanar shape in the recesses. COPYRIGHT: (C)2003,JPO

58. 发明专利

JP2003222719A COLOR FILTER USING ORGANIC PIGMENT 审中-公开
公开(公告)号：JP2003222719A
公开(公告)日：2003-08-08
申请号：JP2002021220
申请日：2002-01-30
申请人： TOPPAN PRINTING CO LTD
发明人： FUKUYOSHI KENZO , KITAMURA TOMOHITO , OGATA KEISUKE
IPC分类号： G02B5/20 , G02B5/22 , G02F1/1335 , H01L27/14
摘要： PROBLEM TO BE SOLVED: To provide a color filter that controls 'float' on the side of long wavelength at more than 600 nm in each color filter, B, G and C and uses organic pigment that excels in color separation. SOLUTION: Two color filters, green and blue ones, constituting primary color filters or one of the color filters include a near-infrared absorbent having absorption on the side of long wavelength at not less than 600 nm. A cyan color filter constituting complementary color filters includes the near-infrared absorbent having the absorption on the side of long wavelength at not less than 600 nm. The cyan color filter constituting four complementary color filters and a green color filter for complementary colors include the near-infrared absorbent having the absorption on the side of long wavelength at not less than 600 nm. COPYRIGHT: (C)2003,JPO

59. 发明专利

JP2003209234A SOLID-STATE IMAGING DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
公开(公告)号：JP2003209234A
公开(公告)日：2003-07-25
申请号：JP2002007130
申请日：2002-01-16
申请人： TOPPAN PRINTING CO LTD
发明人： FUKUYOSHI KENZO , ISHIMATSU TADASHI , OGATA KEISUKE , KITAMURA TOMOHITO
IPC分类号： H01L27/14 , H01L31/0232 , H04N5/335 , H04N5/357 , H04N5/369
摘要： PROBLEM TO BE SOLVED: To provide a solid-state imaging device which can have a high accuracy and an inter-lens gap of 0.3 μm or less, can prevent reduction of a sensitivity, and can suppress reflected light from microlenses, in particular, from a non-opening part between the microlenses to reduce noise, and also to provide a method for manufacturing the element. SOLUTION: A resin 12 having a low refractive index is provided so that the resin is thin on the upper-side surfaces of microlenses 10 and has such a shape 22 as to expand the region of the microlenses in a recess between the microlenses. The low-refractive-index resin is formed as coated on the microlenses and then subjected to dry etching. Whereby the resin has a constant thickness 27 on the upper-side surfaces of the microlenses and has such a shape 22 as to expand the region of the microlenses in the recess between the microlenses. COPYRIGHT: (C)2003,JPO

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式