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51. 发明专利

JP2007027589A Method of forming film pattern, device, electrooptical apparatus, and electronic equipment 审中-公开
标题翻译：形成薄膜图案的方法，设备，电子设备和电子设备
公开(公告)号：JP2007027589A
公开(公告)日：2007-02-01
申请号：JP2005210655
申请日：2005-07-20
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： HIRAI TOSHIMITSU , MORIYA KATSUYUKI
IPC分类号： H01L21/288 , B05D1/26 , G02F1/13 , G02F1/1343 , G09F9/00 , G09F9/30 , H01L21/3205 , H01L21/336 , H01L29/786 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a method of forming film patterns which can eliminate film thickness between film patterns to be formed in such a case where a functional liquid is arranged in a pattern forming region having some regions with different widths. SOLUTION: The method of forming a film pattern by arranging a functional liquid in pattern forming regions 55, 56 segmented by a bank 34 provided on a substrate 48 includes a bank forming process of forming a reversely tapered bank 34 having a cross sectional shape gradually increasing toward the substrate side on the substrate 48; a volatilization processing process of applying volatilization processing to the formed bank; a functional fluid arranging process of arranging the functional liquid to pattern forming regions 55, 56 segmented by the bank 34 after the volatilization processing process; and a process of drying the arranged functional liquid. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种形成膜图案的方法，其可以消除在具有一些具有不同宽度的区域的图案形成区域中布置功能液体的情况下可以形成的膜图案之间的膜厚度。解决方案：通过在由设置在基板48上的堤34分割的图案形成区域55,56中布置功能液体来形成膜图案的方法包括形成具有横截面的倒锥形槽34的堤形成工艺形状朝向衬底48上的衬底侧逐渐增加; 对形成的银行进行挥发处理的挥发处理过程; 将功能液排列到挥发处理工序后由堤34分割的图案形成区域55,56的功能流体排列工序; 以及干燥排出的功能液的工序。版权所有（C）2007，JPO＆INPIT

52. 发明专利

JP2006331665A Transparent conductive film, method of manufacturing the same, electro-optical device, and electronic equipment 有权
标题翻译：透明导电膜，其制造方法，电光器件和电子设备
公开(公告)号：JP2006331665A
公开(公告)日：2006-12-07
申请号：JP2005149100
申请日：2005-05-23
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： HIRAI TOSHIMITSU , MORIYA KATSUYUKI
IPC分类号： H01B13/00 , G02F1/1343 , G02F1/1368 , H01B5/14 , H01L21/288
CPC分类号： C23C18/06 , C23C18/04 , C23C18/1216 , C23C18/1225 , G02F1/13439 , H01L27/1292 , H01L2924/0002 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a transparent conductive film on which fine patterning can be applied, prevented from change of characteristics and lowering of transmittance caused by gas or moisture, and to provide a manufacturing method of the same, an electro-optical device provided with the transparent conductive film, and elecronic equipment. SOLUTION: The method of manufacturing the transparent conductive film comprises a process of forming a bank B4 corresponding to a formation area of a pixel electrode (a transparent conductive film) 19 on a substrate P by using a material of which skeleton is composed of polysiloxane; a process of applying first function liquid containing transparent conductive fine particles to an area demarcated by the bank 4 by a liquid-drop discharge method; a process of forming a first layer film 19c by drying the first function liquid; a process of applying second function liquid containing a metal compound on the first layer film 19c by the liquid-drop discharge method; and a process of forming the transparent conductive layer 19a composed of the first layer film 19c and metal oxide filling in pores in the film by collectively baking the first layer film 19c and the second function liquid. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供可以应用精细图案化的透明导电膜，防止由气体或水分导致的特性变化和透射率降低，并且提供其制造方法，设置有透明导电膜的光学装置和电子设备。解决方案：制造透明导电膜的方法包括通过使用构成骨架的材料在衬底P上形成与像素电极（透明导电膜）19的形成区域相对应的衬底B4的工艺的聚硅氧烷; 通过液滴放电法将包含透明导电微粒的第一功能液体施加到由堤岸4划定的区域的过程; 通过干燥第一功能液形成第一层膜19c的工序; 通过液滴放电法在第一层膜19c上施加含有金属化合物的第二功能液的工序; 以及通过共同烘烤第一层膜19c和第二功能液，形成由第一层膜19c和填充在膜中的孔中的金属氧化物构成的透明导电层19a的工序。版权所有（C）2007，JPO＆INPIT

53. 发明专利

JP2006319230A Bank structure, method for forming wiring pattern, device, electrooptical device, and electronic apparatus 有权
标题翻译：银行结构，形成布线图案的方法，设备，电子设备和电子设备
公开(公告)号：JP2006319230A
公开(公告)日：2006-11-24
申请号：JP2005142192
申请日：2005-05-16
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MORIYA KATSUYUKI , HIRAI TOSHIMITSU
IPC分类号： H01L21/288 , B05D1/32 , H01L21/28 , H01L21/3205 , H01L21/336 , H01L21/768 , H01L29/786 , H01L51/50
CPC分类号： H01L51/0005 , G02F2001/136295 , H01L27/1292 , H01L27/3246 , Y10T29/49117 , Y10T29/49126 , Y10T29/49128 , Y10T29/49155 , Y10T29/49158 , Y10T29/49162 , Y10T428/23943 , Y10T428/24802
摘要： PROBLEM TO BE SOLVED: To provide a bank structure in which film thickness is eliminated between film patterns formed when functional liquid is arranged in a pattern forming region having different wiring width, and to provide a method for forming a film pattern, a device, an electrooptical device, and an electronic apparatus. SOLUTION: The bank structure 1 sections a pattern forming region P where functioning liquid is arranged and flows by means of a bank 34. The pattern forming region P has a first pattern forming region 56, and a second pattern forming region 55 continuous to the first forming region 56 and wider than the first forming region 56. At least one partition bank 34a for regulating the flowing direction of functional liquid by partitioning the second forming region 55 is provided in the second forming region 55, and the partition width H in the direction substantially perpendicular to the flowing direction of functional liquid regulated by the partition bank 34a is formed within ±20% of the width H2 of the first forming region 56. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决的问题：为了提供在功能液体配置在具有不同布线宽度的图案形成区域中形成的膜图案之间消除膜厚度的堤结构，并且提供形成膜图案的方法，设备，电光设备和电子设备。解决方案：堤岸结构1在其上布置有功能液体并通过堤岸34流动的图案形成区域P形成。图案形成区域P具有第一图案形成区域56，第二图案形成区域55连续到第一形成区域56并且比第一形成区域56宽。在第二形成区域55中设置有至少一个用于通过划分第二形成区域55来调节功能液体的流动方向的分隔堤34a，并且分隔宽度H 在与分隔堤34a调节的功能液体的流动方向大致正交的方向上形成在第一成形区域56的宽度H2的±20％以内。（C）2007，JPO＆INPIT

54. 发明专利

JP2006319160A Method for forming conductive pattern, method for manufacturing thin film transistor, electrooptical device, and electronic apparatus 有权
标题翻译：形成导电图案的方法，制造薄膜晶体管的方法，电子设备和电子设备
公开(公告)号：JP2006319160A
公开(公告)日：2006-11-24
申请号：JP2005140737
申请日：2005-05-13
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MORIYA KATSUYUKI , HIRAI TOSHIMITSU
IPC分类号： H01L29/786 , G02F1/1343 , G02F1/1368 , H01L21/288 , H01L21/3205 , H01L21/336 , H01L21/768 , H01L29/417 , H01L29/423 , H01L29/49
摘要： PROBLEM TO BE SOLVED: To provide a method for forming a conductive pattern of wiring, or the like, well especially by liquid drop ejection without causing diffusion of its component elements. SOLUTION: The method for forming a conductive pattern 82 by arranging functional liquid containing a conductive material on a substrate P comprises: a step for forming a bank B1 corresponding to the forming region of the conductive pattern 82 on the substrate P; a step for arranging the functional liquid in a region sectioned by the bank B1 by liquid drop ejection method; a step for arranging polysilazane liquid on the functional liquid thus arranged by liquid drop ejection method; and a step for forming a conductive pattern 82 by covering a conductive film 80 composed of a conductive material with an inorganic layer 81 having a frame of polysiloxane by performing predetermined process on the functional liquid and polysilazane liquid arranged in the region sectioned by the bank B1. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于形成布线的导电图案等的方法，特别是通过液滴喷射而不引起其组分元件的扩散。解决方案：通过在衬底P上布置含有导电材料的功能性液体来形成导电图案82的方法包括：形成与衬底P上的导电图案82的形成区域相对应的堤坝B1的步骤; 通过液滴喷射方法将功能液体排列在由堤坝B1分割的区域中的步骤; 通过液滴喷射法将聚硅氮烷液体排列在功能液上的步骤; 以及通过对由布置在由银行B1分割的区域中的功能液体和聚硅氮烷液体进行预定处理而覆盖由导电材料构成的导电膜80与具有聚硅氧烷框架的无机层81形成导电图案82的步骤。版权所有（C）2007，JPO＆INPIT

55. 发明专利

JP2006259687A Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus 审中-公开
标题翻译：形成薄膜图案的方法，制造装置的方法，电光装置和电子装置
公开(公告)号：JP2006259687A
公开(公告)日：2006-09-28
申请号：JP2005328485
申请日：2005-11-14
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： SAKASHITA YUKI , MORIYA KATSUYUKI , HIRAI TOSHIMITSU
IPC分类号： G09F9/00 , G02F1/1343
CPC分类号： H05K3/1258 , G02B5/201 , H01L51/0005 , H01L51/56 , H05K3/125 , H05K3/381 , H05K2203/013 , H05K2203/0568
摘要： PROBLEM TO BE SOLVED: To provide a method of forming a film pattern which is capable of consistently forming a fine film pattern with high performance.
SOLUTION: The method of forming a film pattern by disposing a functional liquid on a substrate includes: a bank forming step S1 of forming banks corresponding to the film pattern on the substrate; an irregularity forming step S4 of forming irregularities on bottoms between the banks by using the banks as a mask; and a material disposing step S5 of disposing the functional liquid between the banks and on the bottoms formed with the irregularities.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种形成能够一致地形成具有高性能的细膜图案的膜图案的方法。解决方案：通过在基板上设置功能液来形成膜图案的方法包括：堤形成步骤S1，其形成与衬底上的膜图案相对应的堤; 不规则形成步骤S4，通过使用堤作为掩模在堤之间的底部形成凹凸; 以及将功能液体设置在堤岸之间和形成有凹凸的底部的材料配置步骤S5。版权所有（C）2006，JPO＆NCIPI

56. 发明专利

JP2006147827A Method for forming wiring pattern, process for manufacturing device, device, electrooptical device, and electronic apparatus 审中-公开
标题翻译：形成布线图案的方法，制造装置的方法，装置，电子装置和电子装置
公开(公告)号：JP2006147827A
公开(公告)日：2006-06-08
申请号：JP2004335590
申请日：2004-11-19
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MORIYA KATSUYUKI , HIRAI TOSHIMITSU
IPC分类号： H01L21/3205 , G02F1/1343 , G09F9/00 , H01L21/288 , H01L21/336 , H01L23/52 , H01L29/786
CPC分类号： H05K3/125 , G02F2001/136295 , H01L21/288 , H01L21/76838 , H01L21/7685 , H01L27/3295 , H01L51/0022 , H05K3/1258 , H05K3/245 , H05K2201/09909 , H05K2203/013 , H05K2203/1476
摘要： PROBLEM TO BE SOLVED: To provide a method for forming a wiring pattern by laying a plurality of materials in layers while reducing quality problems such as cracking and disconnection, and to provide a device, an electrooptical device, and an electronic apparatus. SOLUTION: The method for forming a wiring pattern 79 in a predetermined region on a substrate P by liquid drop ejection method comprises a step for forming a bank B on the substrate P, a step for imparting lyophilic properties to the substrate P, and a step for imparting liquid repellency to the bank B. The method further comprises a step for forming a first layer underlying film 71 between the banks B imparted with liquid repellency, a step for forming a second layer conductive film 73 on the first layer, and a step for forming a third layer diffusion prevention film 77 on the second layer. The method also comprises a step for collectively calcinating a wiring pattern 79 constituted of the underlying film 71, the conductive film 73, and the diffusion prevention film 77. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种通过在层中铺设多种材料来形成布线图案的方法，同时减少诸如破裂和断开的质量问题，并提供装置，电光装置和电子装置。解决方案：通过液滴喷射方法在基板P上的预定区域中形成布线图案79的方法包括在基板P上形成堤坝B的步骤，向衬底P赋予亲液性的步骤，以及向堤B施加拒液性的步骤。该方法还包括用于在施加拒液性的堤岸B之间形成第一层下面的膜71的步骤，在第一层上形成第二层导电膜73的步骤，以及在第二层上形成第三层扩散防止膜77的步骤。该方法还包括用于共同煅烧由下面的膜71，导电膜73和扩散防止膜77构成的布线图案79的步骤。版权所有（C）2006，JPO＆NCIPI

57. 发明专利

JP2006140451A Thin film pattern forming method, semiconductor device, electro-optic device, and electronic apparatus 有权
标题翻译：薄膜图案形成方法，半导体器件，电光器件和电子设备
公开(公告)号：JP2006140451A
公开(公告)日：2006-06-01
申请号：JP2005292125
申请日：2005-10-05
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MORIYA KATSUYUKI , HIRAI TOSHIMITSU
IPC分类号： H01L21/3205 , G02F1/1343 , G02F1/1368 , H01L21/28 , H01L21/288 , H01L21/336 , H01L29/786
摘要： PROBLEM TO BE SOLVED: To provide a thin film pattern forming method which is capable of forming a thin film having a sufficient cross-sectional area and a required cross-sectional shape for implementing the function of the resultant thin film by filling the whole sectional area of a thin film forming region with a functional fluid, a semiconductor device, an electro-optic device, and an electronic apparatus. SOLUTION: A thin film pattern forming method comprises a step of forming a second thin film having affinity for a functional fluid containing a material that makes up a first thin film, a step of performing treatment that makes the surface of the second thin film repellent to the functional fluid, a step of forming a concave that defines a pattern shape of the first thin film by removing a part of the second thin film, a step of discharging the functional fluid to the concave, and a step of forming the first thin film by drying the functional liquid discharged to the concave. A semiconductor device has circuit wiring formed by using the thin film pattern forming method. An electro-optic device has the semiconductor device, and an electronic apparatus has the electro-optic device. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供薄膜图案形成方法，其能够形成具有足够的横截面积和所需截面形状的薄膜，以通过填充所得薄膜来实现所产生的薄膜的功能具有功能流体的薄膜形成区域的整个截面积，半导体器件，电光器件和电子设备。解决方案：薄膜图案形成方法包括形成对含有构成第一薄膜的材料的功能流体具有亲和性的第二薄膜的步骤，进行使第二薄膜表面的处理的步骤对功能流体具有驱避能力，通过去除一部分第二薄膜来形成限定第一薄膜的图案形状的凹部的步骤，将功能流体排放到凹部的步骤，以及形成第一薄膜通过干燥排出到凹面的功能液体。半导体器件具有通过使用薄膜图案形成方法形成的电路布线。电光器件具有半导体器件，电子设备具有电光器件。版权所有（C）2006，JPO＆NCIPI

58. 发明专利

JP2006108148A Pattern forming structure, method of forming pattern, device and electro-optical device, electronic apparatus 有权
标题翻译：图案形成结构，形成图案的方法，器件和电光器件，电子设备
公开(公告)号：JP2006108148A
公开(公告)日：2006-04-20
申请号：JP2004288696
申请日：2004-09-30
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： HIRAI TOSHIMITSU , USHIYAMA TOSHIHIRO
IPC分类号： H01L21/3205 , G02F1/1368 , G09F9/00 , H01L21/336 , H01L23/52 , H01L29/786 , H01L51/50 , H05B33/12 , H05B33/22
CPC分类号： B82Y30/00 , G02F1/136286 , G02F2001/136295 , H01L21/4867 , H01L23/49855 , H01L23/5386 , H01L2924/0002 , H05K3/1241 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a bank structure which forms a flat region on the top surface of a region including a pattern by making heights of a fine pattern and other patterns the same at the time of forming the pattern, and to provide a method of forming the pattern, an electro-optical device and an electronic apparatus. SOLUTION: A barrier structure in which a protrusion 35 corresponding to the pattern formed of a functional liquid is provided includes a first recess 55 formed corresponding to the first pattern, a second recess 56 connected to the first pattern and formed corresponding to the second pattern narrower in width than the first pattern, and at least one or more projections 35 formed in the first recess 55. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在形成图案时通过使精细图案的高度和其它图案相同的方式在包括图案的区域的顶表面上形成平坦区域的堤结构，并且提供形成图案的方法，电光装置和电子设备。解决方案：提供对应于由功能液体形成的图案的突起35的阻挡结构包括：与第一图案对应形成的第一凹部55，与第一图案相连的第二凹部56，形成在第一凹部55中的至少一个或多个突起35。（C）2006，JPO＆NCIPI

59. 发明专利

JP2006081985A Pattern-forming method, electronic instrument making method and substrate making method 审中-公开
标题翻译：图形形成方法，电子仪器制作方法和基板制作方法
公开(公告)号：JP2006081985A
公开(公告)日：2006-03-30
申请号：JP2004267874
申请日：2004-09-15
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： HIRAI TOSHIMITSU , SAKAI MARI
IPC分类号： B05D1/26 , B05D5/12 , H05K3/10
CPC分类号： H05K3/125 , B41J29/393 , H05K2201/09909 , H05K2203/013
摘要： PROBLEM TO BE SOLVED: To form a bank pattern or a liquid-repellent pattern corresponding to a thin-film pattern so as to form a good thin-film pattern in a section extending obliquely to the running direction of a droplet-discharging unit. SOLUTION: A pattern forming method comprises the step of forming a bank pattern bordering a pattern formation area so that the area of the first projection image where the impacting position (m, n) lies nearly at the center of the first projection image of the first droplet and the area of the second projection image where the impacting position (m+i, n+j) lies nearly at the center of the second projection image of the second droplet are positioned within the pattern formation area. The distance between the positions (m, n) and (m+i, n+j) is determined so that the first and second droplets join mutually after spreading in the pattern formation area. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了形成对应于薄膜图案的堤形图案或疏液图案，以便在与液滴喷射的行进方向倾斜地延伸的部分中形成良好的薄膜图案单元。解决方案：图案形成方法包括以下步骤：形成与图案形成区域相邻的排列图案，使得冲击位置（m，n）几乎位于第一投影图像的中心的第一投影图像的区域的第一液滴和第二投影图像的其中冲击位置（m + i，n + j）几乎位于第二液滴的第二投影图像的中心的区域位于图案形成区域内。确定位置（m，n）和（m + i，n + j）之间的距离，使得第一和第二液滴在图案形成区域中扩展之后相互连接。版权所有（C）2006，JPO＆NCIPI

60. 发明专利

JP2006080179A Forming method of wiring pattern and forming method of source electrode as well as drain electrode for tft 审中-公开
标题翻译：导线图形的形成方法和源电极的形成方法作为TFT的漏电极
公开(公告)号：JP2006080179A
公开(公告)日：2006-03-23
申请号：JP2004260549
申请日：2004-09-08
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： HIRAI TOSHIMITSU , SAKAI MARI
IPC分类号： H01L21/288 , B05D1/26 , B05D7/00 , B41J2/01 , H01L21/3205 , H01L21/336 , H01L29/786
CPC分类号： H01L29/458 , H01L21/288 , H01L21/76879 , H01L27/1292 , H05K3/125 , H05K2201/09909 , H05K2203/013
摘要： PROBLEM TO BE SOLVED: To prepare a source electrode or a drain electrode for TFT by discharging liquid drop out of a liquid drop discharging device. SOLUTION: The forming method of wiring pattern comprises a step (A) wherein the drop of liquid conductive material is discharged to a predetermined section in a pattern forming region rimmed by a bank pattern to form a conductive material layer covering the pattern forming region. When the length of the section along the X-axis direction of the same is shown by L and the length of the same along the Y-axis thereof is shown by M, the diameter ϕ of the discharged drop is smaller than L and smaller than M. Further, the step (A) comprises a step (a1) wherein the liquid drop is discharged so as to hit a position apart from the bank pattern by at least 1/2 times of the diameter ϕ by the center of the drop. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过将液滴从液滴排出装置中排出来制备用于TFT的源电极或漏电极。解决方案：布线图案的形成方法包括步骤（A），其中液体导电材料的液滴被排放到由堤形图案所围成的图案形成区域中的预定部分，以形成覆盖图案形成的导电材料层地区。当沿着X轴方向的截面长度为L，其长度沿Y轴方向显示时，放电液滴的直径φ小于L，小于此外，步骤（A）包括步骤（a1），其中液滴被排出，以便使离开堤岸图案的位置达到直径φ的至少1/2倍通过液滴的中心。版权所有（C）2006，JPO＆NCIPI

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