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41. 发明专利

JPH03111690A VACUUM PUMP 失效
公开(公告)号：JPH03111690A
公开(公告)日：1991-05-13
申请号：JP24756689
申请日：1989-09-22
申请人： TOKUDA SEISAKUSHO
发明人： KURIYAMA NOBORU
IPC分类号： F04C18/16 , F04C23/00 , F04C28/26
摘要： PURPOSE:To reduce energy loss, and to achieve smooth gas exhaust by forming screw parts in multiple stages on a screw rotor, and by providing a relief valve on an inter-stage position of the screw rotor of a casing, while a gas introducing port on a screw rotor position on the exhaust side. CONSTITUTION:Screw rotors 7, 8, 9 are coaxially installed along shaft at a certain interval, and a screw part of a screw rotor is formed in each stage so as to form the transfer capacity of the screw rotor on the exhaust side smaller than that on the suction side. On the outer surface of a casing 2 on the side of each gap, relief valves 10, 11 are mounted, so as to prevent the pressure of the gas exceeding which gas is in the gap between the respective screw rotors 7, 8, 9. A gas introduction port 12 is connected to the side surface of the casing 2 on the position of the third stage screw rotor, through which the gas in a form of air pressure is supplied in the casing 2 in the vicinity of the third screw rotor 9, and a certain flow of gas stream is formed in the casing 2 and is discharged from an exhaust port 4 at the same time.

42. 发明专利

JPH01143928A ION GAUGE 失效
公开(公告)号：JPH01143928A
公开(公告)日：1989-06-06
申请号：JP30274687
申请日：1987-11-30
申请人： TOKUDA SEISAKUSHO
发明人： KURIYAMA NOBORU
IPC分类号： G01L21/32
摘要： PURPOSE:To reduce variance in measurement sensitivity by arranging a cylindrical spiral, or cage-shaped auxiliary electrode outside a grid and a filament. CONSTITUTION:An ion collector 13 which extends into a glass pipe 11 having an opening part in its side part from atop is provided in the glass pipe 11. The spiral grid 14 is provided outside the ion collector 13 and the filament 15 is arranged nearby the grid 14. Further, the cylindrical auxiliary electrode 16 is arranged outside the grid 14 and filament 15. Thus, the cylindrical auxiliary electrode 16 is arranged outside the grid 14 and filament 15, so the majority of ions generated outside the grid 14 are entered into the auxiliary electrode 16 and variance in measurement sensitivity is reduced almost to variance of a triode type.

43. 发明专利

JPH01106212A SWITCHING DRIVING CIRCUIT 失效
公开(公告)号：JPH01106212A
公开(公告)日：1989-04-24
申请号：JP26420087
申请日：1987-10-20
申请人： TOKUDA SEISAKUSHO
发明人： KURIYAMA NOBORU
IPC分类号： G01N27/64 , G01L21/32 , G05F1/56 , H01J37/04 , H03K17/08 , H03K17/28
摘要： PURPOSE:To prevent a switching transistor (TR) from being damaged by detecting voltage applied to both the ends of a load and controlling the ON/OFF operation of the TR. CONSTITUTION:An ionization vacuum gage 10 in an emission control device is constituted of a filament 11, a glid 12 and a collector 13 and an ion current measuring circuit 14 and a glid constant voltage circuit 15 are connected to the vacuum gage 10. Power is supplied from a power source 21 to the filament 11 through a switching driving circuit 22. Emission current is detected by a resistor R4. In addition, a Schmitt circuit consisting of an operational amplifier 23 and a reference voltage power supply 24, a photocoupler 25, etc., are arranged in the device. Since the voltage applied to both the terminals of the load is reduced as compared to a normal voltage when the load is shorted, the abnormality of the load is detected and power supply to the load is automatically stopped.

44. 发明专利

JPH01106211A EMISSION CONTROL DEVICE 失效
公开(公告)号：JPH01106211A
公开(公告)日：1989-04-24
申请号：JP26419987
申请日：1987-10-20
申请人： TOKUDA SEISAKUSHO
发明人： KURIYAMA NOBORU
IPC分类号： G01N27/64 , G01L21/32 , G05F1/56 , H01J41/02 , H03K17/08
摘要： PURPOSE:To improve responsiveness by comparing an emission current detecting value with a reference value and controlling the ON/OFF of filament current based on a compared output. CONSTITUTION:A triode type ionization vacuum gage 10 in an emission control device is constituted of a filament 11, a glid 12 and a collector 13. An ion current measuring circuit 14 is connected to the collector 13 and a constant voltage circuit 15 is connected to the glid 12. On the other hand, power is supplied from a power source 21 to the filament 11 through a power transistor Q1 and a switch 22. The emission current is detected by a resistor R4. In addition, a Schmitt circuit consisting of an operational amplifier 23 and a reference voltage power source 24, a photocoupler 25 and an abnormality detecting circuit 26 are also arranged in the device. Thus, the detecting value is compared with the reference value to control the ON/OFF of current through the filament.

45. 发明专利

JPH01106210A EMISSION CONTROLLER 失效
公开(公告)号：JPH01106210A
公开(公告)日：1989-04-24
申请号：JP26419887
申请日：1987-10-20
申请人： TOKUDA SEISAKUSHO
发明人： KURIYAMA NOBORU
IPC分类号： G01N27/64 , G01L21/32 , G05F1/56 , H01J41/02 , H03K17/08
摘要： PURPOSE:To improve responsiveness by comparing an emission current detecting value with a reference value and controlling the ON/OFF operation of filament current based on the compared output. CONSTITUTION:In the emission controller, a triode type ionization vacuum gauge 10 is constituted of a filament 11, a glid 12 and a collector 13. An ion current measuring circuit 14 is connected to the collector 13 in the vacuum gauge 10 and a constant voltage circuit 15 is connected to the glid 12. On the other hand, power is supplied from a power source 21 to the filament 11 through a power transistor (Tr) Q1 and a switch 22. Emission current is detected by a resistor R4. In addition, the controller is provided with a Schmitt circuit constituted of an operational amplifier 23, a reference voltage power supply 24, etc., a photocoupler 25 and an abnormality detecting circuit 26. Thus, the Tr Q1 can be previously prevented from being damaged due to the short of the filament circuit.

46. 发明专利

JPS63297559A METHOD AND DEVICE FOR ARC BREAKING OF GLOW DISCHARGER USING HIGH-FREQUENCY POWER SUPPLY 失效
公开(公告)号：JPS63297559A
公开(公告)日：1988-12-05
申请号：JP20855887
申请日：1987-08-22
申请人： TOKUDA SEISAKUSHO
发明人： KURIYAMA NOBORU
IPC分类号： C23C14/54
摘要： PURPOSE:To eliminate the damage of a sample and the generation of splashes so that a glow discharge is smoothly continued by interrupting a power supply upon detection of a change element at the time of a shift from the glow discharge to arc discharge and restarting the discharge after a processing period. CONSTITUTION:High-frequency current of a prescribed frequency is supplied from a high-frequency power supply PS via a coupling capacitor C, etc., to a glow discharger DD. The components superposed with the frequency of the power supply PS and the frequency higher than said frequency are removed from the DC voltage VDC generated between the electrodes of the discharger DD by a filter circuit F. The change in the output level of the DC voltage VDC' of the circuit F from which the superposed components mentioned above are removed is detected by a control circuit CC. The feeding of the above-mentioned power supply PS is stopped when the above-mentioned level falls below the prescribed value. The circuit CC starts the power supply PS after lapse of the time when the discharging can be restarted and thereafter, the discharge is shifted to the normal discharge. The glow discharge is thereby continued without problems even if said discharge is the large-power glow discharge having an easy tendency to shift to the arc discharge.

47. 发明专利

JPS63134145A ELECTROSTATIC CHUCK 失效
公开(公告)号：JPS63134145A
公开(公告)日：1988-06-06
申请号：JP27941586
申请日：1986-11-22
申请人： TOKUDA SEISAKUSHO
发明人： KURIYAMA NOBORU
IPC分类号： B23Q3/15 , H01L21/68 , H01L21/683
摘要： PURPOSE:To cool a wafer so efficiently, by installing an electristatic chuck electrode in upper and lower surfaces of a tray, impressing DC voltage from an electric conductor of a water cooled electrode, and clamping the tray and the wafer as well as the tray and the water cooled electrode to an electrostatic chuck. CONSTITUTION:The wafer 20 mounted on a tray 19 is conveyed to the inside of a vacuum vessel 1, and mounted on a pin 18 piercing through a flat plate part of a lifting shaft 6 and an electrode 8. And, this lifting shaft 6 is made to go up, and the tray 19 is mounted on the electrode 8, while a peripheral edge of the tray 19 is made contact with a projecting part 2 of the vessel 1 and pressed thereto. Under this state, a conductive spring 14 and an electrostatic chuck electrode 23 of the tray 19 are made contact with each other. At this time, DC voltage is impressed via an electrostatic wire 17, and the wafer 20 is clamped to the tray and, in turn, the tray onto the electrode 8 electrostatically, respectively. Thus, the tray 19 is positively clamped to a water cooled electrode 8, thus positive cooling for the wafer 20 is performable.

48. 发明专利

JPS63131536A MANUFACTURE OF ELECTROSTATIC CHUCK ELECTRODE 失效
公开(公告)号：JPS63131536A
公开(公告)日：1988-06-03
申请号：JP27818586
申请日：1986-11-21
申请人： TOKUDA SEISAKUSHO
发明人： KURIYAMA NOBORU
IPC分类号： B23Q3/15 , H01L21/68 , H01L21/683
摘要： PURPOSE:To accurately form a desired pattern matched to the shape of a cooling plate by forming an electrode and an insulator by printing. CONSTITUTION:An insulator 8 having a through hole at the center of a cooling plate 2 is buried, an insulating film 9 is printed by silk screen printing in a desired pattern on the plate 2, and a conductor film 10 is formed on the film 9. The film 10 is etched in a desired pattern, an insulating film 11 is printed by silk screen printing on a part except the wire removing part on the film 10 to form an electrostatic chuck electrode. Thus, even if the cooling plate is of any shape, the pattern matched to the shape can be easily formed without bending, and the electrode can be formed on the wafer to the outermost of the outer diameter.

49. 发明专利

JPS61261473A SPUTTERING DEVICE 失效
公开(公告)号：JPS61261473A
公开(公告)日：1986-11-19
申请号：JP10341385
申请日：1985-05-15
申请人： TOKUDA SEISAKUSHO
发明人： KURIYAMA NOBORU
IPC分类号： C23C14/34
摘要： PURPOSE:To form a sputtered film having high purity by providing a nozzle which discharges intermittently an inert gas and a power source for sputtering and making possible the impression of intermittent voltages between a cathode and anode in synchronization with the gas pulses. CONSTITUTION:The inert gas stored in a gas vessel 10 is intermittently injected onto a target 5 provided between the cathode 2 and the anode 3 via the nozzle 12 by the pulse signal from a pulse controller 15 and 1-0.1Pa pressure is exerted onto the target 5. The voltage is intermittently impressed between the cathode 2 and the anode 3 from the power source 4 for sputtering in synchronization with the gas pulses from the nozzle 12, by which 50-100kW electric power is thrown thereto. Plasma of high density is generated between the above- mentioned two electrodes 2 and 3 and the target metal is stuck onto a substrate 6 without increasing the temp. of the target 5 and the substrate 6.

50. 发明专利

JPS59129779A Electrostatic chucking device of sputtering device 失效
标题翻译：溅射装置的静电切割装置
公开(公告)号：JPS59129779A
公开(公告)日：1984-07-26
申请号：JP288783
申请日：1983-01-13
申请人： Tokuda Seisakusho Ltd
发明人： KURIYAMA NOBORU
IPC分类号： C23C14/40 , C23C14/50 , C23F4/00
CPC分类号： C23C14/50
摘要： PURPOSE:To chuck electrostatically an object to be treated by providing an insulating layer on the surface of an electrode on which the object to be treated is placed, charging between the electrode and the object with said insulating layer in-between, and inserting a current limiting resistor in a current conducting passage for charging. CONSTITUTION:An object 30 to be treated is fed into a treating chamber 11 and is placed on a lifting table 25 in a descending state. The inside of the chamber 11 is put in the condition of enabling formation of plasma ion in this state. The table 25 is then moved upward to bring the top surface of the object 30 into contact with an insulating layer 24, and a DC power source E is connected to a high frequency electrode 23 by closing a switch S1 and opening S2. The object 30 is grounded via the table 25 and a current limiting resistor R and therefore the object 30 is brought into tight contact with the insulator 24 by the electrostatic attraction force between the same and the electrode 23. The table 25 is then lowered and sputtering is performed.
摘要翻译：目的：通过在其上放置待处理物体的电极的表面上设置绝缘层来静电吸附待处理的物体，使电极与物体之间的绝缘层在其间进行充电，并且插入电流用于充电的电流传导通道中的限流电阻。构成：待处理物体30被送入处理室11，并且处于下降状态而放置在升降台25上。在这种状态下，室11的内部处于能够形成等离子体离子的状态。然后将工作台25向上移动以使物体30的顶表面与绝缘层24接触，并且通过闭合开关S1和开口S2将DC电源E连接到高频电极23。物体30经由工作台25和限流电阻器R接地，因此物体30通过其与电极23之间的静电吸引力与绝缘体24紧密接触。然后将工作台25降低并进行溅射被执行。

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