专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明专利

JPH05140752A PLASMA TREATING DEVICE FOR DISK SUBSTRATE AND ITS TREATMENT 失效
公开(公告)号：JPH05140752A
公开(公告)日：1993-06-08
申请号：JP30476391
申请日：1991-11-20
申请人： HITACHI LTD
发明人： INABA HIROSHI , KOKADO YUICHI , ABE KATSUO , SHIGE NORIYUKI , IECHIKA KEIGO , HONDA YOSHINORI , FUJIMAKI SHIGEHIKO , KITO MAKOTO
IPC分类号： C23C16/50 , C23C14/34 , C23C16/505 , H01L21/205
摘要： PURPOSE:To enable the uniform film formation on a disk substrate with good efficiency by constituting electrodes of projecting parts facing the hole of the disk substrate and parts enclosing a plasma space to prevent the leakage and biasing of the plasma. CONSTITUTION:The electrodes 5 and ground potential members 24b are disposed on both sides of the disk substrate 2 which is to be treated and is inserted from a spacing part 23 of a vacuum chamber 1. The electrodes 5 are constituted of the projecting parts 5a facing the hole of the disk substrate 2, the parts 5b facing the substrate as well as flank parts 5c and end parts 5d. Gas introducing ports 5e are provided on the flanks of the projecting parts 5a. The electrodes 5 are made movable forward and backward by a cylinder 22. Gas introducing ports 4d are provided in the ground potential members 24b as well. Gases from these gas introducing ports 5e, 24d are introduced into the vacuum chamber 1 and a high-frequency voltage is impressed to the electrodes 5 to generate plasma. This plasma is confined in the plasma space enclosed by the respective electrode members 5a to 5d and the leakage of the plasma from the hole of the disk substrate 2 is prevented.

42. 发明专利

JPH03104015A MAGNETIC RECORDING DISK 失效
公开(公告)号：JPH03104015A
公开(公告)日：1991-05-01
申请号：JP23994389
申请日：1989-09-18
申请人： HITACHI LTD
发明人： MATSUNUMA SATORU , KOKADO YUICHI , KITO MAKOTO , FUJIMAKI SHIGEHIKO
IPC分类号： G11B5/72 , C10M105/52 , C10N40/18 , G11B5/64 , G11B5/66 , G11B5/725 , G11B5/73 , G11B5/738 , G11B5/84
摘要： PURPOSE:To improve reliability by coating an amorphous carbon protective film with a carbon fluoride group. CONSTITUTION:A chromium film of 0.5mum and the amorphous carbon film of 0.05mum are formed by sputtering on a 5.25 inch disk substrate 10 made of aluminum subjected to nickel-phosphorus plating and thereafter, the substrate 10 is put into a reaction chamber 1 and is fixed by a substrate supporting device 2. While the inside of the chamber 1 is evacuated by a vacuum pump 5, tetrafluoromethane is introduced from a raw material tank 4 through a piping 6 into the chamber 1 until the pressure in the chamber 1 attains 5 Torr. While the disk 10 is rotated by the rotating mechanism of the device 2, an IR laser beam 8 from an IR Raman laser is projected onto the substrate 10 by a condenser system 7 and the condenser system 7 is slowly moved in the radial direction of the substrate 10, by which the entire surface of the disk 10 is irradiated with light 8. The stable lubricating characteristics are provided under all environmental conditions and the longer life and the higher reliability are obtd.

43. 发明专利

JPH01286117A METHOD AND DEVICE FOR FORMING PROTECTION FILM 失效
公开(公告)号：JPH01286117A
公开(公告)日：1989-11-17
申请号：JP11365988
申请日：1988-05-12
申请人： HITACHI LTD
发明人： KOKADO YUICHI , KITO MAKOTO , HONDA YOSHINORI
IPC分类号： G11B5/84
摘要： PURPOSE:To form a protection film with superior wear resistance by arranging a third electrode at a position enclosable plasma, and sputtering graphite as impressing a positive voltage on the electrode. CONSTITUTION:The plasma 18 is generated by impressing a high voltage from a high voltage power source 4, and the positive voltage of 50 to 300V is impressed on the third electrode 9 which encloses the plasma 18, and a substrate electrode 14 is sent from a fitted cassette 15 as holding the plasma 18. While the electrode 14 passes the plasma area of a reaction chamber, the graphite of a targeted material 7 is sputtered on the surface of the electrode 14. In such a way, since the plasma can be maintained as prescribed positive potential than that of the substrate 14, a positive ion in the plasma can be accelerated, and flows into the substrate 14, then, a hard carbonaceous protection film can be formed on the substrate 14.

44. 发明专利

JPS63297435A METHOD FOR FORMING PATTERN 失效
公开(公告)号：JPS63297435A
公开(公告)日：1988-12-05
申请号：JP13141287
申请日：1987-05-29
申请人： HITACHI LTD
发明人： KOKADO YUICHI , KITO MAKOTO
IPC分类号： C08J7/00 , G03F7/075 , G03F7/09 , G03F7/11 , G03F7/16 , G03F7/26 , G03F7/36 , G11B5/31 , H01L21/027
摘要： PURPOSE:To form a fine and precise pattern even on a substrate having large surface unevenness using a dry-etching method composed mainly of physical sputtering technique, by forming a resist film by plasma polymerization. CONSTITUTION:A resist pattern 4a of a resist film is formed on a substrate 1 having large difference in thickness of the face to be processed. A processing material free from said resist film is removed by dry etching process to form a pattern on the processing surface. In the above process, said resist film is formed by plasma polymerization. The plasma polymerization is carried out preferably by using a monomer capable of forming a photo-sensitive polymeric compound (e.g. methyl methacrylate) in pure state or in a state of a gaseous mixture with vapor of other organic compound or inert gas.

45. 发明专利

JPS63206471A METHOD AND DEVICE FOR FORMING CARBON FILM 失效
公开(公告)号：JPS63206471A
公开(公告)日：1988-08-25
申请号：JP3980087
申请日：1987-02-23
申请人： HITACHI LTD
发明人： KITO MAKOTO , HONDA YOSHINORI , KOKADO YUICHI
IPC分类号： C23C16/26 , C23C16/50 , G11B5/64 , G11B5/72 , G11B5/73 , G11B5/735 , G11B5/738 , G11B5/82
摘要： PURPOSE:To easily form a hard carbon film on a disk by disposing a disk and counter electrode having an area larger than the area of the part to be treated of the disk into a vacuum vessel and allowing high-energy ions to flow onto the surface to be treated. CONSTITUTION:A plasma treatment chamber 3 is formed of the disk 9 held by a disk carrier 10 and the counter electrode 7 having the area sufficiently larger than the area of the part to be treated of the disk 9 in the vacuum vessel 1. The disk carrier 10 is grounded. A reactive gas is then introduced from a gas introducing port 6 into the plasma treatment chamber 3 through small holes 8 and a high-frequency voltage is supplied to the counter electrode 7 from a high-frequency impressing mechanism 4. The condition for admitting the high-energy ions into the surface of the part to be treated is thereby created and the hard carbon film is easily formed on the disk 9.

46. 发明专利

JPS63187421A MAGNETIC DISK 失效
公开(公告)号：JPS63187421A
公开(公告)日：1988-08-03
申请号：JP1830787
申请日：1987-01-30
申请人： HITACHI LTD
发明人： HONDA YOSHINORI , KITO MAKOTO
IPC分类号： G11B5/72 , G11B5/64 , G11B5/82
摘要： PURPOSE:To obtain a magnetic disk having a protective film which is highly resistant to sliding and corrosion by forming the protective layer of a mixture composed of SiO2 and graphite and providing said layer on a magnetic layer. CONSTITUTION:SiO2 in the mixed layer of SiO2 and graphite formed on the surface of the magnetic layer 10 contributes to an improvement in the resistance to moisture and corrosion and the graphite acts to improve the lubricity and non-tackiness. As a result, the protective film 11 having the resistance to moisture and corrosion as well as the lubricity and non-tackiness in combination is obtd. Since SiO2 and graphite are formed as one mixed layer in this case, the adhesive power of the graphite and SiO2 does not come into problem. The resistance to sliding and corrosion is thereby greatly improved and the thin film magnetic disk having high reliability is obtd.

47. 发明专利

JPS6375042A PLASMA TREATMENT OF INNER SURFACE OF PLASTIC TUBE 失效
公开(公告)号：JPS6375042A
公开(公告)日：1988-04-05
申请号：JP21932686
申请日：1986-09-19
申请人： HITACHI LTD
发明人： TAKEMOTO KAZUNARI , KITO MAKOTO
IPC分类号： C08J7/00
摘要： PURPOSE:To form a plasma-polymerized film exclusively on the inner wall of a plastic tube, by using a tubular reaction chamber and a plastic tube having an inner diameter equal to that of the reaction chamber at both ends of the plastic tube, arranging the tube in a manner that the center axes of the tube and the reaction chamber are on the same line and introducing a treatment gas into the plastic tube. CONSTITUTION:A plastic tube is placed in a tubular reaction chamber and the inner surface of the tube is subjected to plasma-treatment by introducing a treatment gas from an end of the chamber and exhausting from the other end. In the above process, the inner diameter of the reaction chamber is made to be equal to that of the plastic tube at both ends of the plastic tube and the center axes of the tube and the chamber are aligned on the same line. The shape of the cross-section of the reaction chamber from the introducing part to the end of the plastic tube is free from a sharp step, preferably is a streamline shape.

48. 发明专利

JPS62102415A MAGNETIC DISK 失效
公开(公告)号：JPS62102415A
公开(公告)日：1987-05-12
申请号：JP24142285
申请日：1985-10-30
申请人： HITACHI LTD
发明人： HONDA YOSHINORI , KITO MAKOTO , KOKADO YUICHI
IPC分类号： G11B5/66 , C10M107/40 , C10M177/00 , C10N40/18 , G11B5/72 , G11B5/725 , G11B5/73 , G11B5/82
摘要： PURPOSE:To improve wear resistance and stability in floating of a head by forming an org. solid lubricating protective film to a specific thickness by a coating method on a magnetic layer. CONSTITUTION:An org. material layer 4 is coated and formed on a magnetic disk which is provided with an alumite layer 2 on an Al alloy substrate 1 and consists of a magnetic layer 3 formed thereon. The layer 4 is formed by coating a soln. consisting of an org. solid component and solvent which can solve the org. solid component on the magnetic layer to

49. 发明专利

JPS6283471A METHOD AND APPARATUS FOR FORMING CARBON FILM 失效
公开(公告)号：JPS6283471A
公开(公告)日：1987-04-16
申请号：JP22354785
申请日：1985-10-09
申请人： HITACHI LTD
发明人： KOKADO YUICHI , KITO MAKOTO , HONDA YOSHINORI
IPC分类号： C23C16/24 , C08J7/00 , C08J7/06 , C23C16/26 , C23C16/27 , C23C16/50 , C23C16/54
摘要： PURPOSE:To continuously and stably form a hard carbon film on the surface of a film-like substrate by making the area of a counter electrode larger than the area of the aprt to be treated of a rotary electrode and flowing the ions of high energy to the surface to be treated. CONSTITUTION:The rotary electrode 8 is used as an electrode on the ground side and a high-frequency voltage is impressed to the counter electrode 11 to hold the plasma of a gaseous mixture. The carbon film is thereby forming on the surface of the film-like substrate of the rotary electrode 8. The area of the counter electrode 11 in contact with the plasma is made substantially larger than the area of the part to be treated of the rotary electrode 8. The plasma potential is made higher than the potential on the surface of the part to be treated by such mechanism, by which the ions of high energy are admitted into the surface of the part to be treated. The hard carbon film is thus easily formed.

50. 发明专利

JPS6247819A BASE MATERIAL FOR MAGNETIC RECORDING MEDIUM 失效
公开(公告)号：JPS6247819A
公开(公告)日：1987-03-02
申请号：JP18723385
申请日：1985-08-28
申请人： HITACHI LTD
发明人： KOKADO YUICHI , KITO MAKOTO , HONDA YOSHINORI
IPC分类号： C08L67/00 , G11B5/73
摘要： PURPOSE:To improve the resistance characteristic of a floppy disk to sliding with a head and to extend the life thereof by bringing a gaseous hydrocarbon into reaction in an electric discharge atmosphere thereby forming a hard carbon film having a prescribed value or above of elastic modulus in tension on the surface of a film-like high-polymer base material. CONSTITUTION:A film 7 consisting of the film-like high-polymer base material 1 is set to a film feed mechanism consisting of a delivery roll 6, a treating roll 8 and a take-up roll 9 of a vacuum chamber 5. After the inside of a treatment chamber 10 is preliminarily evacuated, benzene vapor is introduced therein through a gas introducing port 11 and is adjusted to a prescribed pressure. While the film 7 is fed at a prescribed seed, a high-frequency voltage of a prescribed frequency is impressed between the film and the roll 8 to generate electric discharge. The hard carbon film having 2,000Angstrom thickness and >=1,000kg/md elastic modulus in tension is formed on the film 7 by such operation. The hard carbon films are formed on both faces of the film 7 if necessary. The resistance characteristic thereof to the sliding with the head is thus improved.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式