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41. 发明专利

JP2011067904A Abrasive cloth 有权
标题翻译：砂布
公开(公告)号：JP2011067904A
公开(公告)日：2011-04-07
申请号：JP2009221211
申请日：2009-09-25
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , TAKAGI MASATAKA
IPC分类号： B24B37/24 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an abrasive cloth that suppresses scratches so as to improve flatness of an object to be polished. SOLUTION: The abrasive cloth includes a polishing layer 2 having a polishing surface P. The polishing layer 2 is formed by slicing an elastic yarn bundle in a direction intersecting with the longitudinal direction. The elastic yarn bundle is configured such that each monofilament of a polyurethane elastic yarn, formed of a spun yarn comprising a polyurethane polymer, is arranged in parallel in the longitudinal direction. In the polishing layer 2, a large number of columnar elastic materials 3 is planarly laid so as to circumscribe with each other on the peripheral surface. The elastic material 3 is formed to have an almost uniform diameter and height. The adjacent elastic materials 3 are fused at each circumscribing part so as to form each fused part Mp. In the polishing layer 2, each void Ga is formed among the elastic members 3. Each void Ga is formed so as to penetrate through in the thickness direction of the polishing layer 2, thereby allowing polished chips generated during polishing to be easily stored in the voids Ga. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供抑制划痕以提高待抛光物体的平坦度的研磨布。研磨布包括具有研磨面P的研磨层2.通过在与长度方向交叉的方向上切断弹性纱线束而形成研磨层2。弹性纱线束构成为使得由包含聚氨酯聚合物的细纱形成的聚氨酯弹性丝的每根单丝沿纵向平行布置。在抛光层2中，大量的柱状弹性材料3被平面地放置成在周面上彼此外接。弹性材料3形成为具有几乎均匀的直径和高度。相邻的弹性材料3在每个外接部分处熔合以形成每个熔化部分Mp。在抛光层2中，在弹性部件3之间形成有各自的空隙Ga。形成各空穴Ga，使其在研磨层2的厚度方向贯穿，从而能够容易地将研磨时产生的抛光的屑保存在版权所有（C）2011，JPO＆INPIT

42. 发明专利

JP2010240790A Holding pad 有权
标题翻译：保持垫
公开(公告)号：JP2010240790A
公开(公告)日：2010-10-28
申请号：JP2009093528
申请日：2009-04-08
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： KUME TAKAHIRO , MIYAZAWA FUMIO , FUJII TAKATOSHI
IPC分类号： B24B37/30 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a holding pad preventing an object to be polished from being lowered, enhancing cushion responsiveness, and improving precision in flattening of the object to be polished. SOLUTION: This holding pad 10 includes a urethane foam material 2 made of polyurethane resin, the urethane foam material 2 is integrally formed by a wet solidification method and has a holding part 2a, a cushion part 2b, and an intermediate part 2c. The holding part 2a has a holding face P for holding the object to be polished. A lot of foams 4 being vertically long in the direction of thickness are formed in the holding part 2a while they are substantially uniformly dispersed. A lot of foams 5 larger than the foams 4 are formed in the cushion part 2b while they are substantially uniformly dispersed. The intermediate part 2c cannot form the foams 4, 5 and is formed between the holding part 2a and the cushion part 2b. This holding pad provides satisfactory cushion responsiveness to correspond to minute recessed and protruding parts of the object to be polished, and rigidity of the holding part 2a is increased. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种防止被抛光物品降低的保持垫，提高缓冲响应性，并提高待抛光对象的平整精度。解决方案：该保持垫10包括由聚氨酯树脂制成的聚氨酯泡沫材料2，聚氨酯泡沫材料2通过湿固化方法一体形成，并具有保持部分2a，缓冲部分2b和中间部分2c 。保持部2a具有用于保持待抛光对象的保持面P。在保持部2a中形成大致均匀分散的大量沿厚度方向垂直长的泡沫4。在基本上均匀分散的情况下，在缓冲部2b中形成大于泡沫4的大量泡沫5。中间部分2c不能形成泡沫4,5，并且形成在保持部分2a和缓冲部分2b之间。该保持垫提供令人满意的缓冲响应性，以对应于待抛光对象的微小凹凸部分，并且保持部分2a的刚性增加。版权所有（C）2011，JPO＆INPIT

43. 发明专利

JP2010076076A Polishing sheet used in polishing pad for use in polishing, and the polishing pad 有权
标题翻译：用于抛光抛光垫的抛光片和抛光垫
公开(公告)号：JP2010076076A
公开(公告)日：2010-04-08
申请号：JP2008250212
申请日：2008-09-29
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： ITOYAMA MITSUNORI , TAKAHASHI DAISUKE , MIYAZAWA FUMIO
IPC分类号： B24B37/24 , C08G18/66 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing sheet used in a polishing pad for use in polishing, and capable of moderating a degree of abrasion and stabilizing polishing performance. SOLUTION: The polishing pad includes a urethane sheet having a polishing surface. The urethane sheet is formed of a mixture of a polyisocyanate compound, a polyol compound, a dispersion liquid having water dispersed in the polyol compound, and a polyamine compound, and includes a foam structure. A content HSC of hard segments is controlled to be in a range of 32-42%, an equivalence ratio R in a range of 0.7-0.9, a bulk density D in a range of 0.45-0.55 g/cm 3 , and a thickness T in a range of 0.5-2.0 mm, respectively. Abrasion loss on the polishing surface ranges from 100 to 200 mg. The bulk density D correlates with the foam structure, the content HSC correlates with hardness, and the thickness T correlates with a service life, respectively. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于抛光用的抛光垫中的抛光片，并且能够调节磨损程度和稳定抛光性能。抛光垫包括具有抛光表面的聚氨酯片。氨基甲酸酯片由多异氰酸酯化合物，多元醇化合物，分散在多元醇化合物中的水分散液和多胺化合物的混合物形成，并且包括泡沫结构体。将硬链段的内容物HSC控制在32-42％的范围内，当量比R在0.7-0.9的范围内，堆积密度D在0.45-0.55g / cm 3的范围内< / SP>，厚度T分别为0.5〜2.0mm的范围。研磨面上的磨损量为100〜200mg。体积密度D与泡沫结构相关，含量HSC与硬度相关，厚度T分别与使用寿命相关。版权所有（C）2010，JPO＆INPIT

44. 发明专利

JP2009279684A Polishing pad and method of manufacturing polishing pad 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2009279684A
公开(公告)日：2009-12-03
申请号：JP2008132315
申请日：2008-05-20
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , ITOYAMA MITSUNORI , TAKAHASHI DAISUKE , TAKADA NAOKI
IPC分类号： B24B37/24 , C08K3/00 , C08K3/22 , C08K5/00 , C08L75/04 , C08L101/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of uniforming foaming structure and keeping excellent polishing characteristics. SOLUTION: The polishing pad comprises a polyurethane sheet of the foaming structure. The polyurethane sheet has an isocyanate-group containing compound as a main component, and has a polishing surface to abut to a polished object via slurry in the polishing process. Hemispherical particulates 3 are approximately regularly and evenly dispersed on the polyurethane sheet. The particulate 3 has an opening in a resin shell 3a, and a cavity 3b is formed at the center. A polishing component 5a is included in the shell 3a. The polishing surface side of the polyurethane sheet is ground. Pores are formed on the polishing surface, and cross sections of the shells 3a are exposed from the pores. The polishing component 5a included in the shells 3a is eluted or released by the wear of the polyurethane sheet 2. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够使发泡结构均匀并且保持优异的抛光特性的抛光垫。抛光垫包括发泡结构的聚氨酯片。聚氨酯片具有含异氰酸酯基的化合物作为主要成分，并且在抛光工序中具有通过浆料与研磨对象物接合的研磨面。半球状颗粒3近似均匀地分散在聚氨酯片上。颗粒3在树脂壳体3a中具有开口，并且在中心形成空腔3b。抛光部件5a包括在壳体3a中。研磨聚氨酯片的研磨面侧。在抛光表面上形成孔，并且孔3a的横截面从孔露出。包含在壳体3a中的抛光组分5a被聚氨酯薄片2的磨损洗脱或释放。版权所有（C）2010，JPO＆INPIT

45. 发明专利

JP2009208165A Polishing pad and manufacturing method of polishing pad 有权
标题翻译：抛光垫的抛光和制造方法
公开(公告)号：JP2009208165A
公开(公告)日：2009-09-17
申请号：JP2008051075
申请日：2008-02-29
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO
IPC分类号： B24B37/24 , B24B53/017
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of retaining stable polishing efficiency for a long period of time. SOLUTION: This polishing pad has a polyurethane sheet with a foaming structure. The polyurethane sheet is composed of a primarily isocyanate group-containing compound and has a polishing surface coming into contact with a workpiece via slurry during the polishing. The polyurethane sheet is formed by surface-polishing a polyurethane molding molded of a liquid mixture which is formed by mixing the isocyanate group-containing compound, a chain extender and spherical particles 3 formed with thermoplastic resin outer shells 3a. The spherical particle 3 contains polishing components 5a contributing to the polishing work in the outer shell 3a. The spherical particles 3 are cut on the polishing surface to form openings and expose cross sections of the outer shells 3a. The polishing components 5a contained in the outer shells 3a are gradually eluted and released. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供能够长时间保持稳定的抛光效率的抛光垫。解决方案：该抛光垫具有发泡结构的聚氨酯片。聚氨酯片材由主要含异氰酸酯基的化合物组成，并且在抛光期间具有通过浆料与工件接触的抛光表面。聚氨酯片材通过表面抛光由通过混合含异氰酸酯基的化合物，扩链剂和由热塑性树脂外壳3a形成的球形颗粒3而形成的液体混合物的聚氨酯模制而形成。球形颗粒3包含有助于在外壳3a中进行抛光加工的抛光组分5a。在抛光表面上切割球形颗粒3以形成开口并暴露外壳3a的横截面。包含在外壳3a中的抛光组分5a逐渐被洗脱和释放。版权所有（C）2009，JPO＆INPIT

46. 发明专利

JP2009066675A Polishing pad, and method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2009066675A
公开(公告)日：2009-04-02
申请号：JP2007235117
申请日：2007-09-11
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , MORISHITA NOBUYA , KURIHARA HIROSHI , TAKADA NAOKI
IPC分类号： B24B37/24 , C08J5/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad, by which a polishing fluid is stably supplied, and the flatness of a workpiece is improved. SOLUTION: A foamed body is formed by making a mixed liquid of isocyanate base compound, a dispersed and diluted liquid produced by preliminarily making a chemical foaming agent A, and a chemical foaming agent B dispersed and diluted in a polyol compound, polyamine compound, and non-reactive gas to these components, and then by pouring the mixed liquid into a die frame and then by solidifying the mixed liquid. After that, the polishing pad 1 is formed by slicing the foamed body. The temperature of thermal decomposition is different in the chemical foaming agent A and the chemical foaming agent B. The foam 3a and the foam 3b having two-polarized sizes are formed inside the polishing pad 1 so as to be almost uniformly dispersed by the two kinds of the chemical foaming agent A and the chemical foaming agent B existing in the mixed fluid. Openings 4a, 4b having two-polarized diameters are formed on the surface of the polishing pad so as to be almost uniformly dispersed. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种抛光垫，通过该抛光垫稳定地供应抛光液，并且提高了工件的平坦度。解决方案：通过制备异氰酸酯基化合物，通过预先制备化学发泡剂A制备的分散和稀释液体的混合液体和分散和稀释在多元醇化合物中的化学发泡剂B，多胺化合物和非反应性气体，然后将混合液倒入模架中，然后固化混合液体。之后，通过将发泡体切片而形成抛光垫1。化学发泡剂A和化学发泡剂B中的热分解温度不同。在抛光垫1的内部形成具有二极化尺寸的泡沫体3a和泡沫体3b，使其几乎均匀地分散在两种的化学发泡剂A和存在于混合流体中的化学发泡剂B. 在抛光垫的表面上形成具有两个极化直径的开口4a，4b，以便几乎均匀地分散。版权所有（C）2009，JPO＆INPIT

47. 发明专利

JP2009061569A Polishing pad and method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2009061569A
公开(公告)日：2009-03-26
申请号：JP2007233576
申请日：2007-09-10
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , MORISHITA NOBUYA , KURIHARA HIROSHI , TAKADA NAOKI
IPC分类号： B24B37/24 , B24B37/26 , C08G18/00 , C08G101/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad suppressing the shortening of service life by securing stable polishing performance and enhancing dressing performance. SOLUTION: This polishing pad 1 comprises a polishing surface P brought into contact with the surface to be polished of a work through a slurry during the polishing. The polishing pad 1 formed by slicing a foam body made by hardening a compound liquid of an isocyanate base-containing compound, a chain elongation agent, a hydrolytic alkoxy silane, a non-reactive gas, and water. Foams 3 are generally distributed in the polishing pad 1 by the water not reacted with the hydrolytic alkoxy silane among the mixed water and a part of the non-reactive gas. Since a part of the foams 3 opens on the polishing surface P of the polishing pad 1, opening holes 4 are formed. The condensation product of a silicon dioxide is generated by the hydrolysis of a hydrolytic alkoky silane, exerts the effect of reinforcing hard segments. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：通过确保稳定的抛光性能和增强敷料性能来提供抑制使用寿命缩短的抛光垫。解决方案：抛光垫1包括抛光表面P，抛光表面P在抛光期间通过浆料与待抛光工件的表面接触。抛光垫1通过将通过使含异氰酸酯基的化合物，链延长剂，水解烷氧基硅烷，非反应性气体和水的复合液体硬化而制成的泡沫体切片而形成。泡沫3通常在混合水和一部分非反应性气体中通过与水解烷氧基硅烷反应的水分散在抛光垫1中。由于一部分泡沫3在抛光垫1的研磨面P上开口，所以形成开孔4。通过水解烷基硅烷的水解产生二氧化硅的缩合产物，发挥加强硬链段的作用。版权所有（C）2009，JPO＆INPIT

48. 发明专利

JP2008115513A Zeolite crystal-containing polyurethane-based elastic yarn and method for producing thereof 审中-公开
标题翻译：含沸石结晶聚氨酯弹性纱及其生产方法
公开(公告)号：JP2008115513A
公开(公告)日：2008-05-22
申请号：JP2006302538
申请日：2006-11-08
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , FUJII TAKATOSHI
IPC分类号： D06M11/79
摘要： PROBLEM TO BE SOLVED: To obtain a zeolite crystal-containing polyurethane-based elastic yarn excellent in elastic characteristics and durability by preventing yarn breakage in producing the zeolite crystal-containing polyurethane-based elastic yarn.
SOLUTION: The polyurethane-based elastic yarn containing zeolite crystals on the surface and the in fibers is obtained by subjecting a urethane-based elastic yarn containing 3-50 wt.% acetylcellulose to impregnation in the presence of a basic material by stepwisely increasing the concentration of a mixed aqueous solution of a water soluble silicon compound and a water soluble aluminum compound, subsequently to heat treatment.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：待解决的问题：通过在制备含沸石结晶的聚氨酯类弹性纱线中防止纱线断裂，得到弹性特性和耐久性优异的含沸石结晶的聚氨酯系弹性丝。解决方案：含有表面和内部纤维中的沸石晶体的聚氨酯类弹性纱通过使含有3-50重量％乙酰纤维素的氨基甲酸酯类弹性丝在碱性物质存在下逐步浸渍而获得随后进行热处理，提高水溶性硅化合物和水溶性铝化合物的混合水溶液的浓度。版权所有（C）2008，JPO＆INPIT

49. 发明专利

JP2008095253A Wound body of polyurethane elastic yarn and method for producing the same 审中-公开
标题翻译：聚氨酯弹性丝的身体及其制造方法
公开(公告)号：JP2008095253A
公开(公告)日：2008-04-24
申请号：JP2006280874
申请日：2006-10-16
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , YOSHIKAWA KINGO , NAKAMURA YUTAKA
IPC分类号： D01F6/94
摘要： PROBLEM TO BE SOLVED: To obtain a wound body of a polyurethane elastic yarn having good wound form free from distortion, preventing the agglutination of the yarns, having moderate loosening property and having small resistance variation to a knitting needle, a guide, etc.
SOLUTION: The method for producing a wound body of a polyurethane elastic yarn comprises a first step to add and disperse solid fine particles in a polydimethylsiloxane in amounts of 0.05-5.0 wt.% of the solid fine particles and 0.1-3.0 wt.% of the polydimethylsiloxane based on the polyurethane elastic yarn and perform the surface treatment of the solid fine particles with the polydimethylsiloxane, a second step to add and disperse a solvent and/or a polyurethane polymer to the treated dispersion to obtain a stable dispersion liquid having a viscosity of 0.5-5 Pa s, and the third step to add and disperse a dispersion liquid to a spinning dope of the polyurethane elastic yarn, extruding the dope through a spinning nozzle into a hot-air atmosphere and winding the extruded yarn.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决问题的方法为了获得没有变形的缠绕形状良好的聚氨酯弹性丝的卷绕体，防止具有适度的松弛性和对织针具有小的电阻变化的纱线的凝集，导向件，聚氨酯弹性丝的卷绕体的制造方法包括将固体微粒添加到分散在聚二甲基硅氧烷中的第一步骤，其量为固体微粒的0.05-5.0重量％，和0.1- 基于聚氨酯弹性丝的3.0重量％的聚二甲基硅氧烷，并用聚二甲基硅氧烷进行固体微粒的表面处理，第二步是将溶剂和/或聚氨酯聚合物加入并分散到经处理的分散体中以获得稳定的分散液的粘度为0.5〜5Pa·s，第3工序为将分散液添加到聚氨酯弹性丝的纺丝原液中并将其分散， g喷嘴进入热空气气氛并缠绕挤出的纱线。版权所有（C）2008，JPO＆INPIT

50. 发明专利

JP2006124841A Polyurethane polyurea elastic yarn for thermobonding 审中-公开
标题翻译：聚氨酯聚氨酯弹力纱
公开(公告)号：JP2006124841A
公开(公告)日：2006-05-18
申请号：JP2004310297
申请日：2004-10-26
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO
IPC分类号： D01F6/94
摘要： PROBLEM TO BE SOLVED: To obtain a polyurethane polyurea elastic yarn for thermobonding, capable of preventing yarn slippage and yarn escape when applying the yarn to a woven or knitted fabric, a nonwoven fabric or a film.
SOLUTION: The polyurethane polyurea elastic yarn for thermobonding having excellent adhesiveness and elastic characteristics is obtained by adding 20-30 wt.% thermoplastic elastomer having 80-160°C melting point to a polyurethane polyurea having ≥170°C melting point and spinning the mixture by a dry spinning method or a wet spinning method. The thermoplastic elastomer has 8-12 solubility parameter value.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：获得用于热粘合的聚氨酯聚脲弹性纱线，当将纱线施加到编织物或针织物，无纺织物或膜时，能够防止纱线滑脱和纱线逸出。解决方案：具有优异的粘合性和弹性特性的用于热粘合的聚氨酯聚脲弹性纱通过将具有80-160℃熔点的20-30重量％热塑性弹性体加入到具有≥170℃熔点的聚氨酯聚脲中，通过干纺法或湿法纺丝法纺出混合物。热塑性弹性体具有8-12溶解度参数值。版权所有（C）2006，JPO＆NCIPI

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