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31. 发明专利

JPH03200967A PHOTOSENSITIVE RESIN COMPOSITION 失效
公开(公告)号：JPH03200967A
公开(公告)日：1991-09-02
申请号：JP5593690
申请日：1990-03-07
申请人： TOPPAN PRINTING CO LTD
发明人： MARUMICHI HIROTAKE , WATANABE EIZABURO , YONEZAWA MASAJI , SUGIURA TAKEO
IPC分类号： G03F7/008 , C08L33/04 , C08L33/14 , G03F7/012 , G03F7/027 , G03F7/033
摘要： PURPOSE:To form a colored pattern preventing film roughening by adding a bisazido compd. as a photo-cross-linking agent to a copolmer based on a monomer having a specified cyclic ether group, one of tert. amine and quat. ammonium salt monomers and a monomer having a specified N-alkoxymethyl group. CONSTITUTION:A bisazido compd. is added to a copolymer based on a monomer having a cyclic ether group represented by formula I, at least one of monomers having the structures of tert. amine and quat. ammounium salt represented by formulae II, III and a monomer having an N-alkoxymethyl group represented by formula IV. In the formulae I-IV, R is H or CH3, X is an acid group and n is an integer of 1-4. A colored pattern preventing film roughening can be formed.

32. 发明专利

JPH0344291B2 失效
公开(公告)号：JPH0344291B2
公开(公告)日：1991-07-05
申请号：JP9462084
申请日：1984-05-14
申请人： NIPPON TELEGRAPH & TELEPHONE
发明人： TANAKA HARUYORI , MORITA MASAO , IMAMURA SABURO , TAMAMURA TOSHIAKI , KOGURE OSAMU
IPC分类号： C08L83/06 , C08L83/00 , C08L83/04 , G03F7/008 , G03F7/012 , G03F7/038 , G03F7/075 , G03F7/09 , H01L21/027

33. 发明专利

JPH03135565A PHOTOSENSITIVE MIXTURE AND RECORDING MATERIAL MANUFACTURED FROM SAID MIXTURE 失效
公开(公告)号：JPH03135565A
公开(公告)日：1991-06-10
申请号：JP16394890
申请日：1990-06-21
申请人： HOECHST AG
发明人： WARUTORAUTO MIYUURAA HESU , DEIITAA MOORU , MACHIASU KUROOGERU
IPC分类号： G03F7/012 , G03F7/021 , G03F7/032
摘要： PURPOSE: To permit the printing plate to be developed with a pure aqueous solution by incorporating a photosetting compound or a combination of photosetting compounds and a specified polymer binder having repeating vinylacetal units. CONSTITUTION: The photosensitive mixture comprises the photosetting compound or its combination and the polymer binder having repeating vinylacetal units, and the binder is a graft polymer and its main chain is a polyurethane and chains each comprising vinylacetal units derived from vinyl alcohol units and hydroxy-aldehyde are grafted from the main polyurethane chain, thus permitting the printing plate to be obtained by developing without causing troublesome attached matter in the case of using an aqueous developer containing tap water but no solvent.

34. 发明专利

JPH0318703B2 失效
公开(公告)号：JPH0318703B2
公开(公告)日：1991-03-13
申请号：JP3458983
申请日：1983-03-04
申请人： HITACHI SEISAKUSHO KK , HITACHI KASEI KOGYO KK
发明人： KOJIMA MITSUMASA , KATAOKA FUMIO , SHOJI FUSAJI , YOKONO ATARU
IPC分类号： C08L79/08 , G03F7/004 , G03F7/012 , G03F7/038

35. 发明专利

JPH02125260A RESIST COMPOSITION 失效
公开(公告)号：JPH02125260A
公开(公告)日：1990-05-14
申请号：JP27903988
申请日：1988-11-04
申请人： NIPPON ZEON CO
发明人： OIE MASAYUKI , YAMADA TAKAMASA , KAWADA MASAJI , KAMIYA SHIGEMITSU
IPC分类号： G03F7/012 , G03F7/023 , G03F7/038
摘要： PURPOSE:To improve the balance among sensitivity, resolution, etching resistance and preservable stability by incorporating a specific alkaline soluble phenolic resin and photosensitive compd. into the above compsn. CONSTITUTION:This compsn. contains the alkaline soluble phenolic resin having the structural unit expressed by the formula I and the photosensitive compd. In the formula, R1, R2 are the same or different and are selected from hydrogen, >=3C (usually =3C alkyl group or alkenyl group. The ratio of the photosensitive compd. to be compounded is 1 to 100pts.wt. per 100pts.wt. resin. The pattern formation is not possible if the ratio is below 1pt.wt. Incomplete development is liable to arise if the ratio exceeds 100pts.wt. The resist compsn. which is excellent in the balance among the sensitivity, resolution, etching resistance and preservable stability is obtd. in this way.

36. 发明专利

JPH02125259A RESIST COMPOSITION 失效
公开(公告)号：JPH02125259A
公开(公告)日：1990-05-14
申请号：JP27904088
申请日：1988-11-04
申请人： NIPPON ZEON CO
发明人： OIE MASAYUKI , KAMIYA SHIGEMITSU
IPC分类号： G03F7/012 , G03F7/038
摘要： PURPOSE:To improve the balance among sensitivity, resolution, etching resistance and preservable stability by incorporating an alkaline soluble compd. obtd. from a phenolic compd. contg. a specific compd. and an aldehyde compd. CONSTITUTION:This compsn. contains the alkaline soluble compd. obtd. from the phenolic compd. contg. at least 5wt.% compd. expressed by the formula I and the aldehyde compd. In the formula, R denotes an alkenyl group or alkenyloxy group; R denotes hydrogen, alkyl group, alkoxy group or halogen. The sensitivity is insufficient and the residual film rate falls drastically if the content of the compd. expressed by the formula I is below 5wt.%. The resist compsn. which is excellent in the balance among the sensitivity, resolution, etching resistance and preservable stability is obtd. in this way.

37. 发明专利

JPH02125258A PHOTOSENSITIVE RESIN 失效
公开(公告)号：JPH02125258A
公开(公告)日：1990-05-14
申请号：JP27876788
申请日：1988-11-04
申请人： TOPPAN PRINTING CO LTD
发明人： SAKAKAWA MAKOTO , HOSHI HISAO , SUGIURA TAKEO
IPC分类号： G03F7/012 , G02B5/20 , G03F7/008 , G03F7/021 , G03F7/032 , G03F7/04
摘要： PURPOSE:To allow the use of an alkali-ion free dye by adding a photosensitive agent to a succicinylated peptide resin which is chemically modified by succinic anhydride. CONSTITUTION:The dyes which do not contain alkali ions in the dye include basic dyes, etc. Of the basic dyes, the dyes called cation dye are more preferable in terms of color tones, light stability, etc. The succicinylated peptide resin which is formed by chemically modifying the amino group of a peptide resin prepd. to have 5,000 to 20,000mol.wt. by hydrolysis of gelatin with succinic anhydride to provide a carboxyl group and is added with the photosensitive agent is excellent in sensitivity, resolution, dyeability, etc., as the photosensitive resin which can be dyed by the cation dye. Color filters contg. the alkali ions at a lower ratio are produced by dyeing the relief patterns formed by using the photosensitive resin with the cation dye to form colored layers in this way.

38. 发明专利

JPH02106753A PATTERN FORMING METHOD 失效
公开(公告)号：JPH02106753A
公开(公告)日：1990-04-18
申请号：JP26004288
申请日：1988-10-14
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： ENDO MASATAKA , TANI YOSHIYUKI , SASAKO MASARU , NOMURA NOBORU
IPC分类号： G03F7/008 , G03F1/76 , G03F7/012 , G03F7/016 , G03F7/021 , G03F7/20 , H01L21/027 , H01L21/30
摘要： PURPOSE:To improve the sensitivity, the resolution and the shapeability of a resist pattern by forming a pattern by irradiating an alkaline-soluble resin film with ArF excimer laser rays. CONSTITUTION:A polymer solution 2 is applied on a substrate 1 of a semiconductor, etc., while rotating the substrate to form a pattern, and a resist 2 is pulse- likely and selectively exposed by the ArF excimer laser rays 4. Finally, the unexposed part 20 of the resist 2 is removed by being subjected the resist 2 to a usual alkali development processing to obtain a resist pattern 2a. Thus, the fine pattern which has a finer width than a short wavelength of the ArF excimer laser rays, is obtd., and the negative type pattern with good shapeability is formed by selectively exposing the ArF excimer laser rays on the resist pattern.

39. 发明专利

JPH02103049A PHOTORESIST COMPOSITION 失效
公开(公告)号：JPH02103049A
公开(公告)日：1990-04-16
申请号：JP25485688
申请日：1988-10-12
申请人： TOSOH CORP
发明人： KOSHIYOU MASAAKI , YAMAMOTO TAKASHI , NAGAOKA TSUNEKO , KIYOTA TORU
IPC分类号： G03F7/012 , G03F7/023 , G03F7/20
摘要： PURPOSE:To obtain a photoresist compsn. having high sensitivity and superior transparency in far ultraviolet region and excimer laser region of wavelength by using a combined compsn. of a copolymer of styrene with maleic acid deriv. and a photosensitive material. CONSTITUTION:A photoresist compsn. is constituted of a compsn. consisting of a polymer prepd. by esterifying 5-80% of a carboxylic acid expressed by the general formula I with 1-5C alkyl group and a photosensitive material. In the formula I, R is 1-10C alkyl group or a cycloalkyl group; X is 50-30. The polymer I is prepd. by treating a 1:1 crosslinked polymer obtd. by the radical polymn. of styrene and maleic anhydride, with an alcohol. The polymer has superior transparency in a wavelength region of far ultraviolet rays and excimer laser, having also superior coatability and developability. Moreover, the polymer has appropriate solubility because of its degree of esterification between 5-80%, so the polymer is developable in usual alkali developing soln. Accordingly, a fine resist pattern having high precision is formed easily.

40. 发明专利

JPH0239155A COLORED PATTERN FORMING METHOD 失效
公开(公告)号：JPH0239155A
公开(公告)日：1990-02-08
申请号：JP18832888
申请日：1988-07-29
申请人： JAPAN SYNTHETIC RUBBER CO LTD
发明人： ENDO MASAYUKI , NISHIYAMA YOSHIHIRO , TOMOMITSU NAGAHIKO , HOSAKA YUKIHIRO
IPC分类号： G03F7/012 , C08F20/34 , C08F20/52 , C08F26/00 , C08F220/00 , C08F220/10 , C08F220/34 , C08F220/60 , C08F226/06 , C08L33/04 , G02B5/20 , G03F7/038 , G03F7/40
摘要： PURPOSE:To obtain a colored pattern suitable for use as black stripes having low light transmissivity and superior resolution especially in case of black by using specified dyeable radiation-sensitive resin in the form of a thin film having superior dyeability. CONSTITUTION:A substrate is coated with dyeable radiation-sensitive resin contg. a copolymer of vinyllactams with a monomer having the structure of quat. amine and a polymerizable unsatd. bond and (meth)acrylic ester. The coated substrate is irradiated with radiation and a pattern is formed by development and dyed with an acidic azo dye contg. a metallic complex salt to obtain a colored pattern. Though the colored pattern is formed by dyeing the pattern made of the dyeable material, high dyeability is ensured even in case of about 1mum thickness. Black stripes having superior light shielding property can be formed especially by dyeing the pattern black.

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